13 results about "Tetramethylsilane" patented technology

The utility model discloses a kind of continuous production device of high-purity tetramethylsilane, including receiving support, the receiving support top is fixedly connected with control electricity box, the receiving support top is fixedly connected with support sleeve frame, two installation conical barrels are fixedly sleeved in the support sleeve frame, the installation conical barrel side wall is connected with installation valve, the installation conical barrel top is provided with installation cover.The utility model, by mixed liquid falls into the inside of connecting drawer, and after being filtered by connecting filter screen, connecting filter element and connecting filter cloth, then be discharged into the inside bottom of adjusting shell through multiple liquid discharge holes on connecting drawer, so that hydrolysis impurity removal is accelerated, and the mixed liquid of hydrolysis is fully purified in multiple stages, to improve use effect.

The present application relates to a kind of trimethylchlorosilane preparation system, including sequentially connected: feed unit, preheating unit, reaction unit and light removal unit;Feed unit, including hydrogen chloride purification device and tetramethylsilane mixture storage tank;Preheating unit: preheating unit includes preheater;Raw material tetramethylsilane mixture and hydrogen chloride gas are preheated after preheating unit and enter reaction unit;Reaction unit: including fixed bed reactor, raw material is reacted in reaction unit after preheating, and product is obtained;Light removal unit: including light removal tower, reaction product enters light removal tower, and the mixture containing target product trimethylchlorosilane of light component removal is obtained by rectification, separation.The present application is not consumed on the basis of other organosilicon monomer, utilizes the hydrogen chloride gas generated by methylchlorosilane hydrolysis TMS comprehensive utilization, is converted into trimethylchlorosilane, and trimethylchlorosilane content in product reaches 93% or more.

The invention relates to the technical field of preparation of silicon carbide coatings, in particular to a method for preparing a silicon carbide coating on a hard alloy substrate. The method comprises the following steps that firstly, a hard alloy substrate is pretreated, then the pretreated substrate is placed on a clamp in hot filament chemical vapor deposition equipment, then tetramethylsilane and hydrogen are introduced into a reaction cavity, precursor cracking is excited through a hot filament, and the hard alloy substrate is obtained. The compact and uniform silicon carbide coating is obtained on the surface of the hard alloy substrate, and meanwhile the hard alloy substrate with more excellent performance is provided. According to the method, the applicable substrate of the preparation technology of the silicon carbide coating is widened, the application range of the silicon carbide coating is expanded, and the silicon carbide coating prepared on the hard alloy substrate has high purity, good crystal quality and excellent film-substrate adhesion strength; and the wear resistance and the service life of the cutter can be obviously improved when applied to the surface of the hard alloy cutter.

To provide a polycarbonate diol and the like excellent in colorless transparency comparable to that of one derived from petroleum, even when derived from a plant.SOLUTION: A polycarbonate diol has a repeating unit expressed by the following formula (1), and a terminal hydroxy group, where the integral value of a signal of 2.50-2.70 ppm is 0.01-1.0 when an integral value of a signal of 3.90-4.45 ppm is 1,000 in a 1H-NMR spectrum measured using chloroform-d as a solvent and tetramethylsilane as a reference material. In the formula, R1 expresses a divalent 2-20C aliphatic hydrocarbon.SELECTED DRAWING: None

The application discloses a purification method of tetramethylsilane, which comprises the following steps: S1, pre-purification treatment is performed on tetramethylsilane raw materials to obtain tetramethylsilane crude product; S2, the tetramethylsilane crude product is mixed with a catalyst, heated, and catalytic reaction is generated so that isopentane in the tetramethylsilane crude product is converted into isoamylene to obtain an intermediate product; and S3, rectification treatment is performed on the intermediate product to remove isoamylene in the intermediate product, and purified tetramethylsilane is obtained. According to the purification method of tetramethylsilane, most of the easily separated impurities in the tetramethylsilane raw materials are removed through pre-purification treatment, then the tetramethylsilane crude product is mixed with a catalyst, and the difficult-to-separate isopentane impurities are converted into isoamylene under the catalytic action of the catalyst; the boiling point of isoamylene is greatly different from that of tetramethylsilane, so the isoamylene is removed through rectification, and finally the purified tetramethylsilane is obtained.

This invention provides a filter membrane and its preparation method. The preparation method includes the following steps: placing a porous filter membrane substrate in an environment containing plasma and a precursor, and performing plasma treatment to obtain the filter membrane; wherein the precursor includes at least one selected from hexamethyldisiloxane, perfluorooctyltriethoxysilane, pentane, ethylene, toluene, perfluorohexane, styrene, divinylbenzene, hexamethyldisiloxane, tetramethylsilane, tetraethoxysilane, tetrafluoroethylene, and hexafluoropropylene. The filter membrane obtained by this preparation method can significantly reduce the swelling rate and simultaneously increase the permeation flux in organic solvents, achieving precise molecular weight cutoff.

The invention discloses a tetramethylsilane purification device and method, and the device comprises a raw material pretreatment assembly which comprises a station for placing a crude TMS storage tank and a precision filter connected to a raw material pipe, and the station is provided with a heating device; the vaporization assembly is a vaporizer communicated with the raw material pipe of the raw material pretreatment assembly; the membrane separation assembly comprises a membrane assembly of a ZSM-5 molecular sieve membrane with height b-axis orientation, the b-axis orientation value of the ZSM-5 molecular sieve membrane in the membrane assembly is 0.90-95, the thickness of a separation layer is 1-3 microns, and a membrane carrier is an alpha-Al2O3 porous ceramic tube; an inlet of the membrane component is communicated with a vaporization outlet of the vaporization component; the condensation and collection assembly comprises a condenser communicated with a second connecting pipe on the permeation side of the membrane separation assembly and a product tank communicated with an outlet of the condenser; the tail gas storage device is communicated with the first connecting pipe on the interception side of the membrane separation assembly. The continuous purification of the TMS is realized, the energy consumption is reduced, and the purity is improved to an electronic grade.

The utility model discloses an adsorption and purification device for a tetramethylsilane mixture, which comprises a vaporizer and further comprises a first-stage adsorption tower, a second-stage adsorption tower, a third-stage adsorption tower and a fourth-stage adsorption tower, the first-stage adsorption tower is an adsorption tower provided with activated carbon and / or a 13X molecular sieve; the second-stage adsorption tower is connected with the first-stage adsorption tower and is used for removing hydrochloric acid and low-carbon alkane; and the third-stage adsorption tower is connected with the second-stage adsorption tower and is used for removing isopentane. The adsorption and purification device disclosed by the utility model can be used for continuously adsorbing raw materials and removing various impurities contained in the raw materials, so that electronic-grade tetramethylsilane with the content of 99.99% is obtained.

The invention discloses a preparation process of a low-internal-stress thick nano coating for erosion-resistant low-friction solid lubrication at high temperature. The preparation process comprises the following steps: pretreating a matrix; vacuumizing and heating; etching and cleaning Ar ions on the surface of the matrix; starting a rotating cathode or a planar cathode filled with metal target materials such as Ti and Cr or alloy target materials such as TiAl and TiZr, and introducing N2 gas to carry out magnetron reactive sputtering; the method comprises the following steps: starting a hot filament arc gas ion source, introducing Si-containing precursors such as TMS tetramethylsilane, HMDS hexamethyldisilazane and SiH4 silane beside the hot filament arc gas ion source to obtain active Si ion and Si-C ion functional ionic groups, and depositing TiSiCN, CrSiCN and TiAlSiCN multi-element coatings on the surface in the presence of metal ions, Si ions, Si-C ions and nitrogen. According to the method, the silicon-doped multi-element nitride coating is deposited innovatively through the PVD and PECVD mixed vapor deposition technology, the technical problem of collaborative optimization of high temperature, erosion and low friction is solved, and the performance blank of an existing coating under the extreme working condition is filled up.

The invention discloses an etching stop layer for reducing RC delay and a preparation method thereof, and the preparation method employs a plasma enhanced chemical vapor deposition method to carry out the following deposition steps: S1, depositing a first nitrogen-doped carbon-based material layer on the surface of a dielectric layer, and employing a combination of tetramethylsilane and ammonia gas as a first reaction gas; s2, depositing a second nitrogen-doped carbon-based material layer on the surface of the first nitrogen-doped carbon-based material layer, wherein the adopted second reaction gas is a combination of tetramethylsilane, ammonia gas and propylene; and S3, depositing a third nitrogen-doped carbon-based material layer on the surface of the second nitrogen-doped carbon-based material layer, wherein the adopted third reaction gas is a combination of tetramethylsilane and ammonia gas. The dielectric constant k of the whole NDC barrier layer such as a SiCN thin film can be reduced, and therefore RC delay is reduced.

The invention belongs to the technical field of superconducting battery materials, and particularly relates to an olefin double-bond superconducting material and a preparation method and application thereof. The olefin double-bond superconducting material is prepared from the following raw materials in percentage by weight: 5 to 15 percent of polyol, 20 to 35 percent of beta-SiC, 20 to 35 percent of alpha-SiC, 10 to 20 percent of tetramethylsilane, 2 to 5 percent of polydimethylsiloxane and 10 to 25 percent of tetraethoxysilane. The olefin double-bond superconducting material has extremely high carrier conductivity density and mobility, extremely low resistivity and excellent conductivity, and when the olefin double-bond superconducting material is applied to a rechargeable battery, the sectional area of a battery conductive path is widened, the current density is reduced accordingly, the charge attraction capacity of an electrode material is improved accordingly, and the dynamic internal resistance limit is close to zero; the working temperature of the battery is effectively reduced, and the charging-discharging conversion rate and cycle life of the battery are improved.

The application provides a filter membrane and a preparation method thereof, and the preparation method comprises the following steps: placing a porous filter membrane substrate in an environment containing plasma and a precursor, and performing plasma treatment to obtain the filter membrane; wherein the precursor comprises at least one of hexamethyldisiloxane, perfluorooctyltriethoxysilane, pentane, ethylene, toluene, perfluorohexane, styrene, divinylbenzene, hexamethyldisiloxane, tetramethylsilane, tetraethoxysilane, tetrafluoroethylene, hexafluoropropylene. The filter membrane prepared by the preparation method can significantly reduce the swelling rate in an organic solvent, and simultaneously improve the permeation flux, so that the precise molecular weight cut-off is realized.

The invention relates to the technical field of bolt manufacturing, in particular to a high-temperature-resistant and high-pressure-resistant bolt surface protection technology which comprises the following steps that after the surface of a high-temperature-resistant and high-pressure-resistant bolt is cleaned, the high-temperature-resistant and high-pressure-resistant bolt is loaded into a vacuum chamber, and argon ion bombardment cleaning is A chromium metal bonding layer is deposited on the surface of the high-temperature-resistant and high-pressure-resistant bolt; keeping a magnetron sputtering tungsten target, introducing acetylene gas into the vacuum chamber, and depositing a layer of gradient transition layer of which the composition is in smooth transition from pure tungsten to tungsten carbide on the surface of the chromium metal bonding layer of the high-temperature-resistant and high-pressure-resistant bolt; depositing a tungsten-silicon co-doped diamond-like functional layer on the gradient transition layer of the high-temperature-resistant and high-pressure-resistant bolt in mixed gas of acetylene and tetramethylsilane; and after deposition is finished, the high-temperature-resistant and high-pressure-resistant bolt is taken out after being cooled. The problems that the bolt is prone to seizure and poor in tolerance under high temperature and high pressure are effectively solved, and the service life of the high-temperature-resistant and high-pressure-resistant bolt is remarkably prolonged.