1642 results about "Trichlorosilane" patented technology

The invention discloses super-hydrophobic and super-oleophobic surface preparation technology. In the preparation technology, aluminum or aluminum alloy sheets are subjected to two-step electrochemical treatment, and then are modified by using perfluorinated octadecyl trichlorosilane or perfluorinated polymethacrylate to prepare the super-hydrophobic and super-oleophobic surface. The surface has super-hydrophobic property on aqueous solution of which the pH value is between 1 and 14 and super-oleophobic property on various oil drops, wherein a contact angle of the surface on water is 171 degrees, and a rolling angle is less than 1 degree; the surface expresses the super-oleophobic property on various oil drops except for perfluorinated polymer liquid, and all contact angles between the oil drops and the surface are more than 150 degrees, and rolling angles are generally less than 10 degrees; and the surface can also be put in air for a long time and can still maintain the super-hydrophobic property and super-oleophobic property.

Oligonucleotides and other biomolecules are immobilized in high density on solid substrates through covalent forces using either a permanent thioether bond, or a chemoselectively reversible disulfide bond to a surface thiol. Substrates which have hydroxyl groups on their surfaces can be first silanized with a trichlorosilane containing 2-20 carbon atoms in its hydrocarbon backbone, terminating in a protected thiol group. The oligonucleotides or other biomolecules are first connected to a tether consisting of a hydrocarbon or polyether chain of 2-20 units in length which terminates in a thiol group. This thiol may be further modified with a halobenzylic-bifunctional water soluble reagent which allows the conjugate to be immobilized onto the surface thiol group by a permanent thioether bond. Alternatively, the oligonucleotide-tether-thiol group can be converted to a pyridyldisulfide functionality which attaches to the surface thiol by a chemoselectively reversible disulfide bond. The permanently bound oligonucleotides are immobilized in high density compared to other types of thiol functionalized silane surface and to the avidin-biotin method.

A silicon production process which improves the production efficiency of trichlorosilane while an industrially advantageous output is ensured and the amount of the by-produced tetrachlorosilane is suppressed. This process does not require a bulky reduction apparatus for the by-produced tetrachlorosilane, can construct a closed system, which is a self-supporting silicon production process, can easily control the amount of the by-produced tetrachlorosilane and therefore can adjust the amount of tetrachlorosilane to be supplied to a tetrachlorosilane treating system when the tetrachlorosilane treating system is used. This process comprises a silicon deposition step for forming silicon by reacting trichlorosilane with hydrogen at a temperature of 1,300° C. or higher, a trichlorosilane forming step for forming trichlorosilane by contacting the exhausted gas in the above silicon deposition step to raw material silicon to react hydrogen chloride contained in the exhausted gas with silicon, and a trichlorosilane first recycling step for separating trichlorosilane from the exhausted gas in the trichlorosilane forming step and recycling it to the silicon deposition step.

The invention relates to a method for producing chlorosilane, in particular to a method for producing trichlorosilane and a device thereof and pertains to the chemical field. The method comprises six steps, namely, hydrogenchloride treatment, silica powder drying and pushing material, synthesis reaction, dust removal and condensation, rectification separation and tail gas recovery, and the device relates to a special equipment large fluidized bed reactor. The invention reduces corrosion on the system equipment by hydrogenchloride gas and the fluidization quality of the reactor is high. The tail gas contains chlorosilane and is easy to be condensed, and the consumption of low temperature refrigerant is greatly reduced. The synthesis tail gas is recovered fully, no temperature runaway phenomenon happens at the expansion section of the reactor, reaction heat is removed by heat transfer oil and sent in a waste heat boiler to produce by product steam which is merged into a steam pipe network or directly applied in part heating equipment; the whole technique system is a closed system with self materials cycling and energy recycling. The technique of the invention is advanced and reliable, the reaction temperature can be adjusted accurately and the fluidized bed reactor has long service life and low production cost and is applicable to popularization and application.

A spirocyclo-biphosphine ligand is prepared from spirocyclo-biphenol through esterifying by trifluoro methylsulfonic acid anhydride, coupling with diaryloxyphosphine under catalysis of Pd, and reduction reacting on trichlorosilane. It includes d-and levo-spricyclo-biphosphine ligands, whose mixture is dl-spirocyclo-biphosphine ligand. It can be used for asymmetrical catalytic hydrogenation reaction of latent chiral ketone with high stereo selectivity and e.e. value up to 99.5%.

The silicon tetrachloride hydrogenating process of producing trichloro-hydrosilicon includes: mixing powdered nickel catalyst and silicon powder in the mass ratio of 1-10 and activating the mixture in hydrogen atmosphere and at the temperature of continuously change from 20 deg.C to 420 deg.c; and making mixed gas of hydrogen and SiCl4 in the molar ratio of 1-10 pass through the activated catalyst and silicon powder layer for hydrogenating SiCl4 continuously at 400-500 deg.c temperature and 1.2-1.5 MPa pressure. The equipment, system and operation of the present invention has high once SiCl4 converting rate and low power consumption and may be used in large-scale production.

The invention discloses a transparent super-hydrophobicity wood coating which comprises the following components in parts by weight: 20-50 parts of water dispersive polyurethane resin or water dispersive alkyd resin, 4.5-25 parts of nano silica sol, 3-16 parts of nano cellulose gel, 0.1-1 part of octadecyl trichlorosilane or tetrahydroperfluorodecyltrichlorosilane or stearic acid and 0-45 parts of nano talc powder or nano calcium carbonate. A preparation method of the transparent super-hydrophobicity wood coating comprises the following steps: adding matrix resin and filler into a stirring kettle, and stirring uniformly to obtain slurry; grinding the slurry with a sand mill; adding a low-surface energy substance and supported nano silica sol; performing ultrasonic sufficient mixing for 30 minutes to obtain the transparent super-hydrophobicity coating. The transparent super-hydrophobicity wood coating disclosed by the invention has the advantages of low cost, controllable process, adjustable size and good applicability and is suitable for a preparation method of large-area preparation of transparent super-hydrophobicity surface; the prepared super-hydrophobicity film has good self-cleaning property, antifouling property, hydrophobic property, oleophobic property and the like.

The present invention discloses a manufacturing method of IGBT silicon epitaxial wafer, the selecting P type of the heavily Boron-doped & 1t; 100 &g t; the polished piece, the electrical resistivity <= 0.02 Omega cm, the partial flatness <= 1.5 mm, the backing layer of oxide at side edge without the width <= 1mm; appropriate increasing polished time and improving the technique temperature, selecting appropriate HC1 flow quantity 8-10L at 1180 EDG C, polishing time 10 min, sweeping more than 10min by using high flow rate H2 after polishing; synthetic considering factors such as self-doping, crystal lattice quality, electric resistivity control and production efficiency, etc, selecting appropriate epitaxial process condition with double-layer, silicon source using ultra-pure trichlorosilane, first step developing temperature 1080-1100 EDG C, developing rate-controlling 0.8-1.0 Mu m, second step developing temperature 1120-1150 EDG C, developing rate-controlling 1.2-1.6 Mu m, the double-layer epitaxial growth controlled by different adulterate source accurately.

The invention relates to an improved method and equipment for the preparation of trichlorosilane and polysilicon. The trichlorosilane is prepared by a chlorine hydrogenation method during the preparation process of polysilicon. The process is as follows: a) the metallurgical silicon is put into a reactor after being heated to 300-500DGE C in a powder baker; b) the silicon tetrachloride is vaporized and heated through an external heating device, which generates the silicon tetrachloride gas at the temperature of 160-600DGE C; c) the hydrogen chloride gas is preheated to 150-300DGE C through the external heating device; d) the hydrogen gas is preheated to 300-600DGE C through a heater; and e) the gases of step b), c) and d) are added into the reactor; wherein, the molar ratio between the hydrogen gas and the silicon tetrachloride is 1-5:1, the molar ratio between the hydrogen chloride gas and the silicon tetrachloride is 1: 1-20; and the temperature in the reactor is maintained at 400-600DGE C and the pressure in the reactor is kept at 1.0-3.0MPa. The method of the invention can effectively prepare the polysilicon at a low cost, which suits for semiconductor industry and solar battery.

The invention provides a chelate resin and a production method and the application thereof, and the novel chelate resin can effectively remove impurities in trichlorosilane; the preparation method provided by the invention comprises the following steps: (1) zinc chloride is used as catalyzer, a white ball and chloromethyl ether are reacted to obtain chloromethylate white ball; (2) the chloromethylate white ball and hexamine are reacted, and then concentrated hydrochloric acid-ethanol mixing solution is used for decomposing, so as to obtain primary amine resin; (3) the primary amine resin is added in the chloroacetic acid aqueous solution, and the reaction is carried out for 10-30 hours at 55-70 DEG C to obtain the chelate resin; the chelate resin can effectively remove the metal impurities such as boron, phosphorus, calcium, magnesium, copper, ferrum and other impurities in trichlorosilane, the removal rate can reach more than 99 percent; the chelate resin has high processing capacity with 200t per cube and is the optimal choice for improving the product quality.

The invention discloses a method for synthesizing organic silicon, in particular provides a method for preparing methyl phenyl silicone resin which has low curing temperature by self and is not sticky repeatedly. The invention uses the monomers of methyl trichlorosilane, dimethyldichlorosilance, phenyl trichlorosilane, dichloromethylphenylsilane, diphenyl dichlorosilane and the like to obtain a methyl phenyl silicone resin with low curing temperature and a paint film which is not sticky repeatedly after being cured by the processes of adjusting the proportion of raw materials, controlling proper reaction temperature and polymerization time, carrying out hydrolysis reaction and polycondensation reaction, etc. The invention has the advantages that the methyl phenyl silicone resin prepared by the method has the characteristics of low curing temperature, being not sticky repeatedly, being clear and transparent, high and low temperature resistance, weather resistance, being insulating and the like; the methyl phenyl silicone resin is in particular fit for dip varnish higher than grade H; and the methyl phenyl silicone resin is used for confecting insulated paint, weather-resistant paint and heat resistant paint higher than grade H, is used for heat resistant parting agent and also can be used in the fields with rigorous using requirements, such as heat resistant water blocking and sand prevention for oil drilling, etc.

The invention relates to a production device and a method of high purity trichlorosilane by using heat pump distillation. Trichlorosilane raw materials enter a de-heavy fractionator to eliminate heavy components after light component elimination through a light component eliminating tower, thereby obtaining high purity trichlorosilane. On the basis, the light component eliminating tower and the de-heavy fractionator both adopt a heat pump distillation process. Cooling medium in a condenser absorbs heat after exchanging the heat with materials on the top of the tower and is evaporated into gas, the gas enters a reboiler as tower reactor heat source reactor liquid after pressure and temperature enhancement through compression, and the gas is condensed into liquid. The liquid returns to the condenser after reduction of expenditure and pressure so as to finish a cycle. Therefore, the heat at the low temperature part of the tower top is transferred to the high temperature part of a tower reactor through the cooling medium. The invention has the advantages that by adopting the heat pump distillation process, the energy consumption can be greatly lowered, and the annual economic benefit is greatly enhanced.

The invention relates to a method and an apparatus for preparing trichlorosilane through reaction rectification by using proportionate reaction. The method comprises the following steps of: reacting dichlorosilane with silicon tetrachloride in the upper middle part of a reaction rectification tower, obtaining incompletely reacted dichlorosilane at the top of the reaction rectification tower; reflowing at the top of the tower and in the middle of the tower, obtaining a mixture of dichlorosilane, trichlorosilane and silicon tetrachloride at the bottom of the tower, entering a light-end removal tower to remove a light component, obtaining the dichlorosilane at the top of the light-end removal tower; reflowing to the reaction rectification tower for recycling, obtaining a mixture of trichlorosilane and silicon tetrachloride at the bottom of the tower, entering a heavy-end removal tower to separate the trichlorosilane from the silicon tetrachloride, wherein the trichlorosilane at the top of the heavy-end removal tower is a product; and taking out the silicon tetrachloride at the side line of the lower part of the tower, entering the reaction rectification tower for recycling, and obtaining excessive silicon tetrachloride at the bottom of the tower. In the invention, by utilizing the proportionate reaction, the utilization ratio of the raw materials is enhanced; the problem of dichlorosilane and silicon tetrachloride enrichment is solved; and the final conversion ratio of the dichlorosilane is ensured to reach 100 percent theoretically.

A process for preparing high purity trichlorosilane (TCS) utilizing contaminated by-products of primary reaction products hydrogen chloride, metallurgical or chemical grade silicon stock, and / or by-products of the improved Siemens process, including “dirty” TCS containing low boiling impurities such as dichlorosilane (DCS) and “dirty” STC containing high boiling impurities. The “dirty” STC is first purified and a portion is reacted with “dirty” TCS containing DCS to produce additional TCS feedstock for the TCS purification process. Another portion of the purified STC is hydrogenated and converted back to TCS providing another feedstock to the TCS purification process. Overall net yield of high purity TCS produced is increased over established practice.

The invention relates to a hydrogen recovery method in the exhaust generated by producing polysilicon. The exhaust mainly comprises hydrogen, chlorine hydride, dichlorosilane, trichlorosilane and tetrachlorosilane. The method comprises the following steps: pressurizing and cooling the exhaust in order to turn trichlorosilane and tetrachlorosilane to liquid state while hydrogen, chlorine hydride and dichlorosilane still being gas state, so that the gas hydrogen, chlorine hydride and dichlorosilane can be separated from the liquid trichlorosilane and tetrachlorosilane by gas liquid separation; dissolving the gas chlorine hydride and dichlorosilane into the liquid tetrachlorosilane by passing gas hydrogen, chlorine hydride and dichlorosilane through the liquid tetrachlorosilane, so that separating the hydrogen from chlorine hydride and dichlorosilane. The invention recovers the hydrogen in the exhaust by dry treatment and the hydrogen can be reused in the polysilicon production, which makes good use of the material, reduces pollutants, settles the problem of environmental pollution, improves the product quality and reduces the cost.

The invention discloses a method for the synthesis of a polysilicon raw material trichlorosilane. The method comprises the following steps: A) silica powder is conveyed to a trichlorosilane synthesis furnace by dried hydrogen chloride gas; B) hydrogen chloride for reaction is input into the synthesis furnace from the bottom of the trichlorosilane synthesis furnace proportionally and proper amount of hydrogen and silicon tetrachloride are added in the synthesis furnace at the same time; C) silica powder and hydrogen chloride react at the temperature of 280-310 DEG C to generate mixing gas containing trichlorosilane and silicon tetrachloride; D) the mixing gas of dust and high chlorosilane is removed, after water cooling and pressuring by a diaphragm compressor, trichlorosilane and silicon tetrachloride are condensed into liquid by a refrigerant with -40 DEG C, wherein, noncondensable gas containing H2 and HCI is separated. The method of the invention can improve the yield of trichlorosilane from 82 percent to more than 88 percent.

The present invention relates to a flame-resistant and heat-resistant copper clad laminate preparation method, which comprises: adopting nanometer silica foam, dodecyl benzenesulfonic acid, bismuth nitrate pentahydrate, methyl trichlorosilane and polyoxyethylene sorbitan monooleate as a raw materials to obtain a filler; adopting DOPO, a bisphenol A cyanate ester monomer, a phenol compound, a m-nitrobenzene sulfonic acid pyridine salt, 2,3-epoxy cyclopentyl cyclopentyl ether and dimethyl phosphonate as raw materials to obtain a resin prepolymer; adding the filler to o-phthalic acid diglycidyl este to obtain an active filler; mixing the resin prepolymer and an indole compound, and then adding the active filler and isomeric undecanol polyoxyethylene ether phosphate potassium salt to obtain a composite system; and carrying out hot pressing molding on the composite system, a reinforced material and metal foil to obtain the flame-resistant and heat-resistant copper clad laminate, wherein the flame-resistant and heat-resistant copper clad laminate has characteristics of excellent flame retardant property and excellent heat resistance, and meets the development applications of the flame-resistant and heat-resistant copper clad laminate.

The invention discloses a method adopting trichlorosilane and dichlorosilane mixed raw materials to produce polycrystalline silicon. After trichlorosilane produced by hydrogenation of silicon tetrachloride or purchased outside is rectified and purified, the rectified and purified trichlorosilane is mixed with recycled trichlorosilane and dichlorosilane mixed materials, the volume percent of dichlorosilane in the mixed raw materials is controlled to be between 3% and 15%, preferably between 5% and 10%, then impurity removal by adsorption and vaporization operation are performed, vaporized chlorosilane mixed gas and high-purity hydrogen are mixed according to mole ratio of 1:2 to 1:10, preferably 1:4 to 1:6, and finally the vaporized chlorosilane mixed gas and the high-purity hydrogen enter into a reduction furnace to produce the polycrystalline silicon. After reactions, tail gas undergoes low-temperature condensation recycle, chlorosilane obtained by recycle is sent to a rectification process to perform separation of silicon tetrachloride and impurities, and the trichlorosilane and dichlorosilane mixed raw materials are obtained. The method makes full use of byproduct dichlorosilane in the polycrystalline silicon production process to improve sedimentation velocity of silicon and reduce power consumption and material consumption, simultaneously can reduce treatment cost and loss of silicon, and improves trichlorosilane utilization rate.

The invention provides a process for preparing methyltrimethoxy silane. The process comprises the following steps that: a. methanol is subjected to vaporization by a vaporizing cylinder and passes through a stripping tower, and enters the bottom part of a reaction tower, methyl trichlorosilane enters the reaction tower from the top and is sprayed downward, and methanol reacts with methyl trichlorosilane by counter current contact; b. a primary product is pumped in the top part of the stripping tower and subjected to steam stripping by methanol gases passing by the stripping tower, after falling onto the bottom part of the stripping tower, the primary product is pumped in a neutralization kettle, and the saturated sodium methylate solution is added in the neutralization kettle for neutralization; c. the coarse product of methyltrimethoxy silane is pumped in a rectification tower for rectification. The process has the characteristics of high working efficiency, stable process and big output, etc. Because the process of the invention is continuously carried out, the process has the advantages of having few operators, ensuring safe production and being capable of easily realizing the control of DCS computers; moreover, the product yield is 90 percent, the effective content of the product is high, and the content of methyltrimethoxy silane is more than 99 percent.

The invention relates to a trichlorosilane three-tower differential pressure coupling energy-saving rectifying and purifying system and an operating method. The trichlorosilane three-tower differential pressure coupling energy-saving rectifying and purifying system comprises a primary tower, a secondary tower and a tertiary tower; the three towers are connected in series from low pressure to highpressure or from high pressure to low pressure, and a condensation re-boiler is arranged between the primary tower and the secondary tower and between the secondary tower and the tertiary tower respectively; and the three towers can be used for light removal, heavy removal and light removal in turn, and also can be used for combining light removal, heavy removal and light removal. According to the characteristics of approach full tower composition and approach temperature in the process of rectifying the trichlorosilane, the invention provides a trichlorosilane differential pressure coupling rectifying process which is expected to greatly reduce the production cost and energy consumption and theoretically rectify and save energy by nearly 70 percent. The technology remarkably improves themarket competitiveness of polycrystal silicon materials and promotes the development of a photovoltaic and information material industry chain.

A process for preparing trichlorosilane by reacting silicon with hydrogen chloride, or silicon tetrachloride with hydrogen in the presence of silicon, and catalysts where the silicon and catalysts are laminated together and reduced in particle size prior to reaction.

The present invention includes a process and means for using two isolated by-products from the reaction of at least one of metallurgical silicon and silicon tetrachloride with at least one of anhydrous hydrogen chloride and hydrogen to produce trichlorosilane. The two isolated by-products are dichlorosilane and silicon tetrachloride. The present process reduces chlorosilane waste and improves efficiency of overall process for production of trichlorosilane for use in chemical vapor deposition of polysilicon for electronic and solar applications. The present invention further includes a chemical reactor for the reacting dichlorosilane with silicon tetrachloride to produce additional trichlorosilane.

The invention provides a system for separating and purifying trichlorosilane in production process of polysilicon and an operation method thereof. The system consists of a rectification working section and a recovery refining working section; wherein, the rectification working section comprises six towers, and the recovery refining working section includes three towers; the connection mode of the six towers of the rectification working section is that a lightness-removing tower I, a lightness-removing tower II, a weight-removing tower, a secondary lightness-removing tower, a secondary weight-removing tower I and a secondary weight-removing tower II are sequentially connected with each other; the connection mode of the three towers of the recovery refining working section is that a lower-removing tower, a higher-removing tower and a product refining tower are sequentially connected with each other. Chlorsilane rectification technical equipment can be one of main technical bottlenecks limiting the production of the high-quality polysilicon material in China. The invention can achieve the separation requirements and energy-saving aim under the condition that the mass flow rate elastic ratio between feeding of the rectification working section and feeding of the recovery working section is 1:1-1:5. The rectification technique is simplified and optimized, the separation efficiency is improved, the energy consumption of rectification products is reduced, the reliability and stability of system operation can be enhanced, and the content of phosphorus, arsenic, boron and metallic contamination in the rectification products can be lowered.

The invention relates to a trichlorosilane differential pressure coupling rectification system and an operation method thereof. The system comprises a low pressure rectifying tower, a pressurizing rectifying tower, a tower kettle reboiler, an overhead condenser and an auxiliary condenser; a condensation reboiler is arranged between the low pressure rectifying tower and the pressurizing rectifying tower, a vapor phase material outlet on the top of the pressurizing rectifying tower is connected with a heating medium inlet of the condensation reboiler, and a heating medium outlet returns to the top of the pressurizing rectifying tower; a liquid phase material outlet at the bottom of the low pressure rectifying tower is connected with a heated medium inlet of the condensation reboiler, and a heated medium outlet returns to the bottom of the low pressure rectifying tower. Raw materials are fed through different towers, so that two sets of process flow can be adopted; the process flow A adopts a low pressure tower as a front tower for removing lightness, and a feeding pump is added for feeding a pressurizing tower; the process flow B adopts the pressurizing tower as the front tower for removing lightness, and the feeding pump is not needed to be added for feeding the low pressure tower. The invention greatly reduces the production cost and energy consumption, and saved energy by about 40% in rectification. The technology remarkably improves the market competitiveness of the polysilicon material.

The invention relates to a methyl tri(2-chloroethoxy) silane compound which is used as a silicon-halogen synergistic flame-retardant plasticizer and a preparation method thereof. The methyl tri(2-chloroethoxy) silane compound has the following structural formula: CH3Si(OCH2CH2Cl)3. The preparation method of the methyl tri(2-chloroethoxy) silane compound comprises the following steps: dropwise adding and stirring chloroethanol at a certain molar ratio to methyl trichlorosilane, carrying out a reaction on the chloroethanol and the methyl trichlorosilane for a certain time at a certain temperature, and purifying after finishing hydrogen chloride release and reaction to obtain methyl tri(2-chloroethoxy) silane. The methyl tri(2-chloroethoxy) silane can be used as the good flame-retardant plasticizer, and the process for producing the methyl tri(2-chloroethoxy) silane is simple, has low equipment investment and cost and is easy to realize industrial production.

The invention discloses a preparation method of organic silicon modified polyester wire enamel. Divalent alcohol, trihydric alcohol and dibasic acid are combined into polyester of low polymerization in a molar ratio of 1: (0.08-0.2): (0.95-1); dialkyl dichlorosilane or dialkyl dioxolane silane and alkyl trichlorosilane or alkyl trialkoxysilane are combined into organic silicon resin prepolymer solution; then the organic silicon resin prepolymer solution reacts with resin of low polymerization; and a solvent and a film forming assistant are added to blend into the organic silicon modified polyester wire enamel. The heat-resistant degree of the polyester wire enamel is effectively improved, and production process is simple and reliable; the organic silicon modified polyester wire enamel can be produced at normal pressure and common vacuum degree, and the storage stability of the product is good; and the solvent with small toxicity is used for replacing phenol solvents so as to lower product toxicity.

The invention relates to a tail gas treatment process of the technical field of chemical industry, in particular to a method for recovering tail gas from trichlorosilane production and special equipment used in the method. The method for recovering the tail gas from the trichlorosilane production comprises the following steps: pressurizing followed by condensing the tail gas produced by synthesizing the trichlorosilane to condense chlorsilane to form condensate; allowing noncondensable gas to enter an absorption tower in which the chlorsilane absorbs chlorine hydride to obtain chlorsilane absorption solution, and discharging crude hydrogen from the top of the absorption tower; then transferring the condensate and the chlorsilane absorption solution to an analysis tower to analyze the hydrogen chloride dissolved in the chlorsilane, and discharging the hydrogen chlorine from the top of the analysis tower; and performing recovering procedure on the analyzed chlorsilane. Furthermore, the invention also discloses the special equipment for the method. The invention has the characteristics of simplicity, and practicality, and high recovery rate.

The invention discloses a large trichlorosilane fluidized bed reactor, comprising a lower reaction section and an upper extension section; the lower part of the reaction section is provided with a silicon powder inlet, and the lower part of a reactor is provided with an overhaul cap which is provided with a hydrogen chloride inlet and a discharge mouth; the extension section has a synthesized gas outlet, and a hydrogen chloride gas distributor is arranged between the overhaul cap and the reaction section; a heat transfer oil finger-shaped tube is arranged in the reaction section and the extension section and extends from the extension section till the bottom of the reaction section; the top of the extension section is provided with a finger-shaped overhaul flange with a finger-shaped tubular heat transfer oil inlet, and the extension section is provided with a finger-shaped tubular heat transfer oil outlet; the outside of the reaction section is provided with a reactor half-pipe jacket, and both ends of the half-pipe jacket of the reactor are provided with a coiled-pipe heat transfer oil inlet and a coiled-pipe heat transfer oil outlet. The heat transfer oil is adopted to heat the reactor during the temperature rising period and transfer the reaction heat during the reaction, and the reaction temperature can be controlled by regulating the quantity of the heat transfer oil, thus acquiring the stable product yielding.

The invention relates to the field of rectification and purification; at present, a conventional multi-stage rectification technology is adopted in existing polycrystalline silicon production to purify trichlorosilane, rectification stages are multiple, reflux ratio is large, energy consumption is large and device investment is high; in order to overcome the problems, a technical scheme in the invention adopts a novel process of combining resin adsorption with multi-stage rectification. Coarse trichlorosilane is pre-cooled and cooled, and pumped into an adsorbing device with special divinylbenzene resin by a pump to remove boron and phosphor impurities; and then, rectification is carried out on the adsorbed trichlorosilane liquor in a three-level rectification tower to obtain the high-purity trichlorosilane. The production process disclosed by the invention not only achieves the purpose in the invention, but also has high trichlorosilane purity, lower rectification separator impurity content and can recycle the trichlorosilane for use in disproportionated reaction, so that energy consumption is further lowered, and material utilization rate is improved.