210 results about "Trichlorosilane" patented technology

The invention relates to a preparation method and application of a long-acting antibacterial hydrophobic fabric, and belongs to the technical field of functional fabric materials. Aiming at the problems of antibacterial agent loss, hydrophobic function decline and antibacterial and hydrophobic synergism failure after repeated washing of the fabric, the method comprises the following steps: pre-treating the fabric to remove impurities, and constructing a functional layer step by step: immersing polyester or cotton fabric into a 2-8wt% chitosan quaternary ammonium salt aqueous solution, and carrying out vacuum pressurization impregnation at 75-85 DEG C to form an antibacterial layer; mixing octadecyl trichlorosilane with deionized water to prepare a pre-hydrolyzed emulsion, diluting the pre-hydrolyzed emulsion, and spraying the diluted pre-hydrolyzed emulsion on the surface of the fabric in a graded gradient manner to construct a hydrophobic layer; and finally, curing at 60-80 DEG C to form a coating layer. The fabric prepared by the method has lasting antibacterial property, super-hydrophobicity and blood adhesion resistance, can be used for medical protective articles such as operating gowns and medical bed sheets needing high-frequency cleaning, and can effectively prevent cross infection.

The invention discloses a catalyst for preparing trichlorosilane and a catalytic preparation method of trichlorosilane. The catalyst is prepared from the following components in percentage by mass: weighed copper nitrate, zinc nitrate, aluminum nitrate, lanthanum nitrate and the balance of a carrier, the preparation method comprises the following specific steps: S1, filling a catalyst; S2, purifying raw material gas; S3, reacting; and S4, separating and purifying a product, namely discharging a reacted gas product from an outlet of a reactor, and condensing through a condenser. In the prepared catalyst, the activity and selectivity of the catalyst are remarkably improved through the synergistic effect of the copper-zinc-aluminum composite oxide and the rare earth element lanthanum, the electronic structure and the surface acid-base property of the catalyst can be adjusted through doping of lanthanum, the reaction of silicon powder and hydrogen chloride is promoted, meanwhile, side reactions are inhibited, and the service life of the catalyst is prolonged. And the yield of trichlorosilane is improved.

The invention belongs to the technical field of trichlorosilane purification, and discloses an adsorbent for adsorbing phosphorus impurities in trichlorosilane and a preparation method and application thereof.The preparation method comprises the steps that activated carbon is immersed in a solution containing ammonium metavanadate and oxalic acid, ultrasonic treatment and drying are conducted, and a vanadium oxide / carbon material mixture is obtained; calcining the vanadium oxide / carbon material mixture, and performing reduction treatment to obtain the oxygen vacancy-rich activated carbon loaded vanadium oxide adsorbent. The activated carbon loaded vanadium oxide adsorbent rich in oxygen vacancies is prepared by using a dipping-calcining-reducing method, and phosphorus impurities are adsorbed and removed by using the interaction of the activated carbon loaded vanadium oxide adsorbent and PCl3. The active carbon loaded vanadium oxide adsorbent rich in oxygen vacancies interacts with PCl3, so that trace PCl3 can be efficiently removed.

The system comprises a gradient catalytic reaction rectifying tower and a temperature control system, the rectifying tower is sequentially provided with a rectifying section, a reaction section and a stripping section from top to bottom, the reaction section is filled with an ion exchange resin solid catalyst, and the stripping section is filled with an ion exchange resin solid catalyst. The radiuses of the catalyst bag units are distributed in a gradient mode from small to large along the height of the tower, the catalyst bag units have the functions of catalytic reaction and mass transfer separation, the rectifying section and the stripping section are filled with structured packing or high-separation-capacity metal wire mesh packing, a gas-liquid separator is arranged at an outlet of the stripping section, and a temperature control system achieves segmented monitoring through a multi-point temperature sensor. The surface of the catalyst can be subjected to functional treatment to improve the decomposition resistance; the method comprises the following steps: feeding trichlorosilane generated by cold hydrogenation into the upper part of a reaction section from a feed port, carrying out disproportionation reaction at the gradient temperature of 20-100 DEG C and the pressure of 0.3-0.6 MPa according to the reflux ratio of (15-30): 1 to generate silane, and carrying out rectification and extraction separation to obtain high-purity silane with the purity of 99.999% or above.

The invention relates to the technical field of chemical engineering, and discloses a trichlorosilane hydrogen reduction polycrystalline silicon growth monitoring system fusing multi-source data. Comprising a multi-sensor monitoring module, a multi-sensor data acquisition module, a multi-source data preprocessing module, a growth process data analysis module, a growth state online evaluation module, a process parameter online regulation and control module, a regulation and control result feedback module and a system collaborative management module, the multi-sensor monitoring module monitors the growth process of trichlorosilane hydrogen reduction polycrystalline silicon through multiple sensors, the multi-sensor data acquisition module acquires original data, the multi-source data preprocessing module preprocesses the data, the growth process data analysis module carries out data calculation, and the growth state online evaluation module carries out online comprehensive evaluation. The process parameter online regulation and control module regulates and controls process parameters online, the regulation and control result feedback module generates an adjustment strategy, and the system collaborative management module performs system parameter recording and storage, system optimization and exception handling.

The invention discloses a low-expansion silicon-carbon negative electrode material and a preparation method thereof, and belongs to the technical field of secondary batteries. The invention relates to a preparation method of a low-expansion silicon-carbon negative electrode material. The preparation method comprises the following steps: S1, depositing SiO2: depositing porous carbon for the first time by adopting silane with at least two ethyoxyl groups or methoxyl groups; then calcining to obtain a SiO2 deposition layer; s2, silicon deposition: carrying out secondary deposition on the material obtained in the step S1 by adopting monosilane, disilane and / or trichlorosilane; and S3, carbon coating: carrying out carbon coating on the material obtained in the step S2 by using a carbon source gas. According to the low-expansion silicon-carbon negative electrode material disclosed by the invention, porous carbon is firstly subjected to deposition modification by utilizing SiO2 deposition, so that the overall structural strength of a framework is improved; after silane deposition, silicon of the second deposition layer and silicon dioxide of the first deposition layer can react to generate SiO, and volume expansion of silicon crystal grains can be relieved.

A method is disclosed comprising providing a carbonaceous substrate; performing a chemical vapor deposition process on the carbonaceous substrate using a mixture of precursor gasses comprising a silicon precursor gas comprising trichlorosilane, and a carbon precursor gas selected from carbon-carbon double bond hydrocarbons and carbon-carbon triple bond hydrocarbons; and via said chemical vapor deposition process, forming a polycrystalline cubic silicon carbide layer with crystallographic orientation.

The invention discloses a preparation method of a warm-keeping and health-care composite fabric, and relates to the technical field of functional fabrics. The preparation method comprises the following steps: firstly, combining fumed silica with graphene oxide hydrogel to prepare mixed aerogel; the mixed aerogel is combined with allyl trichlorosilane, and is grafted to a macromolecular chain of polypropylene through maleic anhydride, so that the compatibility is improved, and the agglomeration problem is solved; secondly, calcining tourmaline, then directly carrying out quenching hydration modification, combining Si-OH groups on the surface with active groups in a polyester molecular chain, and spinning into hollow fibers; the mixed aerogel can absorb far infrared rays dissipated and emitted by the modified tourmaline, and the aerogel absorbing the far infrared rays can generate a resonance effect and a warm effect and permeate into the deep layer of the skin; the modified tourmaline has the capability of generating negative ions, and the gull rock powder is added for combined action, so that the antibacterial effect is achieved by destroying the structure of bacteria, and the health-care effect is achieved. The composite fabric prepared by the invention has warm-keeping and health-care effects.

The invention discloses a slow-start pneumatic switch valve device for trichlorosilane feeding, and belongs to the technical field of material preparation process valves. Comprising a switch valve and a pneumatic actuator, linear motion of a piston rod is converted into rotation fine adjustment through a swing arm rotation compensation mechanism, a solid / microgroove sealing ring and a sliding cavity wall are always kept on a theoretical contact line, abrasion microgaps are automatically compensated, zero-clearance sliding in the whole life cycle is achieved, and manual clearance adjustment is avoided; the solid sealing ring adopts surface-surface contact, so that the unit pressure is reduced by more than 50%, and the wear rate is obviously reduced; the omega-shaped groove of the microgroove sealing ring converts solid particles (10-50 microns Si) into groove edge elastic sealing, and the wear rate is reduced by 40% again; a sealing surface is provided with a uniform oil film, the dynamic and static friction coefficient difference is reduced, crawling / jumping in a 0-20% opening low-speed stage is eliminated, true slow starting is achieved, the water hammer effect during trichlorosilane feeding is avoided, the sealing surface is provided with the uniform oil film, the dynamic and static friction coefficient difference is reduced, and crawling / jumping in the 0-20% opening low-speed stage is eliminated.

The invention provides a photovoltaic glass surface self-cleaning coating and a preparation method thereof.The photovoltaic glass surface self-cleaning coating is prepared from a dehydrated organic solvent, 1-7 parts by mass of tetramethyl orthosilicate, 2-15 parts by mass of fluorosilane hydrophobic coupling agent, 10-20 parts by mass of silicon tetrachloride, 1-10 parts by mass of hydrophobic silane coupling agent, 5-15 parts by mass of dichloro (methyl) (3, 3, 5-trimethyl-1, 3, 5-trimethyl-1, 3, 5-trimethyl-1, 3, 5-trimethyl-1, 3, 5-trimethyl-1, 3, 5-trimethyl-1, 3, 5-trimethyl-1, 3, 5-trimethyl-1, 3, 5-trimethyl-1, 3, 5- and 1-10 parts of 2, 3, 3-trifluoropropyl) silane and 1-10 parts of dimethyl dichlorosilane. According to the preparation method, tetramethyl silicate with relatively low reaction activity is used as a raw material to react with silicon tetrachloride to form an intermediate species with moderate activity, and then a linear chain polymer modification layer is pre-formed on the surface by utilizing the difference of reaction rates; a fluorosilane substance added in the coating also can participate in the reaction to form an organic silicon linear polymer with a fluorosilane side chain; in the recombination process of polysiloxane, perfluoro side chains with lower surface energy migrate to the surface of the coating; meanwhile, by adding the dichlorosilane coupling agent and the trichlorosilane coupling agent, the flexibility and hydrophobicity of the coating are improved.

The application discloses a kind of feed dynamic regulation methods of synthesizing trichlorosilane, through multispectral synergistic detection, through the accurate calculation of key parameters such as hydroxyl inhibition factor, amorphous phase activity gain and metal impurity inhibition factor, the activity condition of silicon powder in fluidized bed can be accurately and real-time reflected, the technical bottleneck that silicon powder activity cannot be monitored on line is broken through, and then in industrial production, for the proportion of fluidized bed feed etc. Real-time regulation provides control basis.Through feed dynamic regulation mechanism, silicon powder feed rate, H2 / SiCl4 ratio and catalyst addition amount can be optimized in real time, ensure that silicon powder is always in high activity state, promote the reaction to proceed, improve trichlorosilane yield and purity, solve the problem that traditional fixed regulation mode and silicon powder dynamic activity do not match, and then improve regulation accuracy.

The invention relates to a method and a system for preparing trichlorosilane from ferrosilicon, the method comprises the following steps: taking ferrosilicon, silicon tetrachloride and hydrogen as raw materials, fully reacting in a fluidized bed reactor to obtain trichlorosilane and FeSiy alloy, xlt; 40). The system comprises a fluidized bed reactor (200), a cyclone separator (300), a washing tower (400), a gas-liquid separator (500) and a coarse distillation tower (600). Compared with the prior art, the method has the remarkable characteristics that the silazite is used as a silicon source and is low in cost and easy to obtain, the reaction activity of trichlorosilane and FeSiy generated by reaction of the silazite, silicon tetrachloride and hydrogen is high, the utilization rate of silicon elements in the compound is high, no extra catalyst needs to be added in the co-hydrogenation reaction, meanwhile, the byproduct FeSiy alloy is produced, and the production cost is low.

The invention discloses a method for preparing methyltriacetoxysilane from acetic anhydride-containing acetyl chloride distillation tailings, and relates to the technical field of organic silicon synthesis, the method comprises the following steps: adding methyl trichlorosilane and acetic anhydride-containing acetyl chloride distillation tailings into a reaction kettle, stirring and heating; after a total reflux condition is reached, maintaining total reflux for a period of time, and then starting to collect acetyl chloride; continuously heating until the collection of acetyl chloride is completed, stopping heating, and when the temperature of the kettle is reduced to room temperature, heating again and starting vacuum negative pressure; when the kettle temperature reaches a set value, stopping heating, stopping stirring, and closing vacuum negative pressure; and after the kettle temperature is reduced to room temperature, adding pretreated activated carbon, carrying out decoloration reaction, and carrying out suction filtration after the reaction is completed, thereby obtaining the product. According to the method, a large amount of acetic anhydride in the acetyl chloride distillation tailings is used as a raw material and directly reacts with methyl trichlorosilane to prepare methyltriacetoxysilane, and the quality of the obtained product is remarkably higher than that of a product prepared by a normal process.

The invention discloses a preparation method of a regenerated polyester fiber, and relates to the technical field of polyester fibers. The present invention first utilizes (4-formylphenyl) phosphonic acid to combine with 2-(3-nitroaniline) acetohydrazide to form a Schiff base structure, achieves antibacterial effect, and simultaneously introduces phosphorus element to achieve flame retardant and anti-wear effect; then forms a modified wear-resistant agent of a cross-linked network structure with butanediol, significantly enhancing the wear-resistant effect of fiber; then utilizes 1,7-octadiene-3-ol and octene trichlorosilane copolymerization to make a modifier, form a cross-linked network structure, enhance wear-resistant effect, and simultaneously be able to suppress the burning of flame, achieve flame retardant effect; then attracts the modifier by hydroxylated carbon nanotubes to prepare modified carbon nanotubes in situ polymerization on its surface, improve carbon nanotube dispersibility, prevent fiber from falling off, and improve the wear resistance of material; finally, regenerated polyester fiber, modified wear-resistant agent, and composite modified carbon nanotube are mixed and melt-spun to achieve wear-resistant, antibacterial, flame-retardant effect.

The application relates to a method for synthesizing and refining electronic-grade hexachloroethyldisilane, and specifically, trichlorosilane raw material is mixed with protective gas into a raw material buffer tank, a mixed gas obtained through the mixing is subjected to a catalytic synthesis reaction under the irradiation of an ultraviolet light source, a product obtained through the reaction is subjected to condensation separation, gaseous trichloromethane returns to the raw material buffer tank to continuously participate in the synthesis reaction, the mixed liquid in the cold trap is warmed and vaporized, hexachloroethyldisilane is obtained through two-step refining, and the purity of the product hexachloroethyldisilane can reach the electronic grade. The application takes trichlorosilane as the initial raw material, the price of the raw material is low; the photo-catalysis is used as the synthesis process, the synthesis process is simple, the reaction yield is high, energy is saved, and the environment is protected; the two-step method is used for refining and purifying the product, the depth of the refining and the efficiency of the refining are high, large-scale production is suitable, the monopoly of foreign enterprises is broken, and the application has important significance.

The present invention relates to a high-gloss high-glass-fiber-content nylon 66 composite material and a preparation method thereof, and belongs to the technical field of polymer composite materials. The components of the composite material are: 50-60wt% of alkali-free glass fiber, 2.2-3.5wt% of a high-gloss compatibilizer, 3.5-5wt% of a toughening agent, 0.15-0.2wt% of an antioxidant, and 0.6-0.9wt% of a processing aid, with the remainder being nylon 66 resin; the high-gloss compatibilizer is substituted by n-alkyl alcohol and vinyl trichlorosilane to form intermediate 1, and then intermediate 2 is prepared by initiating addition of methyl thioglycolate and the unsaturated double bond of intermediate 1, and finally amine transesterification is carried out by γ-aminopropyl triethoxysilane and the terminal methyl ester of intermediate 2; the high-gloss compatibilizer effectively reduces the high-crystalline region-low-crystalline region interface content in the composite system, reduces the scattering of light, and thus allows the composite material to maintain a higher gloss.

The invention provides a method for recovering tail gas generated in production of carbon nanotubes. The method comprises the following steps: compression: introducing tail gas containing methane and hydrogen into a compressor for pressurization; first-stage separation: the pressurized tail gas is introduced into a first-stage membrane separator for separation, methane and first-stage tail gas are obtained, and the main component of the first-stage tail gas is hydrogen; and second-stage separation: introducing the first-stage tail gas into a second-stage membrane separator for separation to obtain hydrogen and second-stage tail gas containing hydrogen. Through two-stage membrane separation, methane and hydrogen are recovered, the methane separated in the first stage can return to the continuous furnace to be continuously used as a raw material for producing carbon nanotubes, and the hydrogen separated in the second stage can be used for producing trichlorosilane, so that the recovery and utilization of resources can be realized.

The invention relates to a method and a system for improving SiC bulk doping yield based on retention boundary layer design, and relates to the technical field of semiconductor material preparation, chemical vapor deposition treatment is carried out on gas-phase raw materials on the surface of a substrate, and the gas-phase raw materials are gaseous methyl trichlorosilane, hydrogen, nitrogen and helium; the method comprises the following steps: collecting the flow rate and chemical vapor deposition processing parameters of a gas-phase raw material in real time, controlling the volume flow ratio of hydrogen to gaseous methyl trichlorosilane to be 3-15, and calculating the thickness of a retention boundary layer of the gas-phase raw material according to the flow rate and chemical vapor deposition processing parameters of the gas-phase raw material, the thickness of the retention boundary layer of the gas-phase raw material is compared with the preset thickness of the retention boundary layer, the flow velocity of the gas-phase raw material and / or chemical vapor deposition processing parameters are / is adjusted according to the comparison result, and the SiC block material prepared through the method is compact and free of pores or free carbon or silicon carbide nanowires, and the adjustable range of the resistivity is wide.

The utility model discloses a device for one-way preparation of electronic grade silane gas in a particle silicon process, the device comprises a preheater, a light component removal unit, a silane reaction unit, a condensation unit, a separation unit and a gasification purification unit which are connected in sequence, and the silane reaction unit comprises more than two silane reaction towers which are arranged in parallel. According to the utility model, more than two silane reaction towers are arranged in the silane reaction unit in parallel, so that trichlorosilane is converted into silane at one time after being sequentially subjected to the steps of preheating, light component removal, reactive distillation, condensation heat exchange, separation and gasification purification; the conversion per pass can be improved, the material condensation and reboiling processes are reduced, the energy consumption is reduced, and the production process cost is reduced.

To provide a method and a system for obtaining a high-quality cubic silicon carbide.SOLUTION: A method (200) is disclosed. The method (200) includes: a step (205) of supplying a carbon-based substrate (S); a step (210) of performing a chemical vapor deposition process on the carbon-based substrate using a mixture of precursor gases, the mixture including a silicon precursor gas including trichlorosilane and a carbon precursor gas selected from a carbon-carbon double bond hydrocarbon and a carbon-carbon triple bond hydrocarbon; and a step (215) of forming a polycrystalline cubic silicon carbide layer having a {111} orientation through the chemical vapor deposition process.SELECTED DRAWING: Figure 1

The application discloses a kind of continuous co-production diphenyl dichlorosilane and triphenyl chlorosilane method and system, belong to organic silicon monomer synthesis technical field.The method will silicon powder and chlorobenzene direct method synthesis high-temperature gas phase product, after cyclone separation precision filtration dust removal, in turn through cascade condensation, obtain rich one phenyl trichlorosilane stream;It is directly introduced into disproportionation reaction kettle, and aluminium trichloride catalyst is added to carry out disproportionation and redistribution reaction;After reaction, add tertiary butyl alcohol, make aluminium trichloride into solid tertiary butyl alcohol aluminum, and remove by solid-liquid separation;Filtrate is separated by reduced pressure distillation, ultra vacuum distillation, and high-purity diphenyl dichlorosilane and triphenyl chlorosilane are obtained.The process coupling is closely, and heat energy is reasonably utilized, and catalyst treatment is green and environmental protection, and no strong corrosive gas and chlorine-containing wastewater is generated, the yield and selectivity of high value-added phenyl chlorosilane monomer are significantly improved, and the process is continuous and stable, with high degree of automation, suitable for large-scale industrial production.

[Problem to be solved] Provided is a method that enables effective industrial use of an exhaust gas containing hydrogen to be discharged during production of trichlorosilane.[Solution] Provided is a method for producing trichlorosilane, the method comprising: reacting metallic silicon and tetrachlorosilane with a mixed gas containing hydrogen to generate trichlorosilane. The mixed gas containing hydrogen contains 1 to 500 molar ppm of hydrogen chloride and 100 to 10,000 molar ppm of silane hydride, and the mixed gas is heated at 100° C. to 450° C. and then reacted.

The present invention belongs to the technical field of dienyldichlorosilane, and specifically relates to a method for preparing dienyldichlorosilane. The preparation method comprises reacting a diene and trichlorosilane in the presence of a first catalyst to obtain an alkenyltrichlorosilane; and reacting the alkenyltrichlorosilane with a haloolefin in the presence of a second catalyst to obtain the dienyldichlorosilane. The dienyldichlorosilane produced by this method has a high synthetic yield and a considerable yield, and has application value for large-scale synthesis.

The invention provides a preparation method of 1-chloromethyl silazane, and relates to the technical field of chemical synthesis. The method specifically comprises the following steps: (1) adding a first catalyst and chloromethyl trichlorosilane into a mixed material containing an auxiliary solvent and a reactive solvent, and reacting to obtain a first material; the reactive solvent is a C1-C6 alcohol solvent; (2) distilling to remove hydrogen chloride in the first material to obtain a second material; (3) adding a catalyst alkali and a surfactant into the second material, and then adding triethanolamine for reaction; and precipitating the reacted material through an anti-solvent to obtain the high-purity 1-chloromethyl silatrane. The 1-chloromethyl silazane can be prepared by a one-pot method, and the second-stage reaction is directly carried out without separation and purification after the first-stage reaction is completed, so that the intermediate loss is reduced, and the yield of the target product is increased. According to the whole preparation method, the technological process is greatly simplified, operability is high, industrial production is easy, and important economic value is achieved.

The invention discloses a trichlorosilane deep rectification composite impurity removal process, and belongs to the technical field of polycrystalline silicon production raw material purification. According to the process, deep purification of crude trichlorosilane is achieved through the steps of pre-protection and primary adsorption, directional rectification enrichment of methyl dichlorosilane narrow fractions, concentration, mixing with silicon tetrachloride, catalytic reaction rectification conversion, differential pressure thermal coupling rectification purification, double-tank parallel deep purification, tail gas treatment and the like. According to the method, the impurity methyl dichlorosilane difficult to remove is precisely separated through side extraction, the impurity methyl dichlorosilane is converted into a component easy to separate through a catalytic reaction, and the boron and phosphorus impurities are deeply removed in combination with differential pressure thermal coupling energy saving and double-tank alternate adsorption. The process can efficiently remove moisture, metals and key impurities boron and phosphorus, obviously improves the purity of the trichlorosilane product, realizes gradient utilization of energy and hydrogen circulation, and has the advantages of high purity, low energy consumption and continuous production.

This invention provides an activation method for a liquid fatty amine, a preparation process for the liquid fatty amine and silane, wherein the liquid fatty amine has a tertiary amine group; the activation method involves activating the liquid fatty amine with silicon tetrachloride; this method can significantly improve the catalytic effect of the liquid fatty amine, and the activated liquid fatty amine exhibits higher catalytic activity in the process of disproportionation of trichlorosilane to prepare silane, which can effectively reduce the reaction activation energy, increase the reaction rate, and improve the single-pass reaction efficiency and conversion rate.

To provide a production method for silicon granules that are brought about by reusing waste generated when cutting silicon ingots and are particularly suitable for preparing trichlorosilane.SOLUTION: The production method comprises: a) a step of supplying silicon waste derived from substrates, wherein the waste comprises silicon particles covered with an insulating or metal surface layer; b) a step of chemically treating the silicon waste to remove the insulating or metal surface layer and drying the silicon particles to form a powder; c) a step of metallurgically treating the powder to melt the silicon particles and form a liquid silicon bath; d) a step of introducing at least one co-catalyst into the liquid silicon bath; and e) a step of solidifying the liquid silicon to form silicon granules, wherein the silicon granules comprise a size of 10 to 500 μm, a dopant comprising phosphorus or boron each having a mass fraction of less than 5 ppm, a co-catalyst having a mass fraction of 1 to 2500 ppm, and metal impurities excluding the co-catalyst and having a mass fraction of less than 50 ppm.SELECTED DRAWING: None

The application discloses a kind of molecular self-assembly film of programmable control droplet speed, preparation method and application, the molecular self-assembly film includes polydimethylsiloxane base and at least 2 self-assembly regions arranged on the surface of base, and the crosslinking agent of different self-assembly regions is different;Or at least 1 self-assembly region is provided, but not all covers the surface of base;The crosslinking agent is one of trichloro (3,3,3-trifluoropropyl) silane, trichloro (1H,1H,2H,2H-tridecafluoro-n-octyl) silane, 1H,1H,2H,2H-perfluorodecyl trichlorosilane, 1H,1H,2H,2H-perfluorododecyl trichlorosilane, propyl trichlorosilane, n-octyl trichlorosilane, decyl trichlorosilane and dodecyl trichlorosilane.The film is by zoned self-assembly different length and end functional group silane chain on PDMS, to achieve different regions have different water droplet speed.

The invention belongs to the technical field of silicon carbide epitaxial growth, and discloses a method for improving doping concentration uniformity of a P-type silicon carbide epitaxial wafer, which comprises the following steps of: introducing hydrogen with a preset flow into a reaction chamber, placing a silicon carbide substrate in the reaction chamber, keeping the input flow of the hydrogen unchanged, respectively adjusting the temperature and the pressure of the reaction chamber to a preset etching temperature and a preset etching pressure so as to etch the surface of the silicon carbide substrate to obtain the surface-etched silicon carbide substrate, and inputting ethylene gas and trichlorosilane gas into the reaction chamber through a lower channel of the layered gas homogenizing box so as to obtain the surface-etched silicon carbide substrate. Trimethylaluminum gas is input into the reaction chamber through an upper channel of the layered gas uniformizing box so as to promote the surface-etched silicon carbide substrate to grow an epitaxial layer, and a P-type silicon carbide epitaxial wafer with uniform doping concentration is prepared; reaction gas is separately input through the layered gas uniformizing box, the P-type silicon carbide epitaxial wafer with the uniform doping concentration is prepared, and the doping concentration uniformity of the P-type silicon carbide epitaxial wafer is improved.

The present application relates to a kind of preparation methods of thin layer high resistance silicon epitaxial wafer for photomultiplier tube device, by before the silicon substrate piece is mounted, design and carry out etching and polycrystalline silicon coating layer cycle cleaning process to reaction cavity and graphite base multiple hydrogen chloride gas, the growth environment of reaction cavity is purified, and by accurately adjusting the flow of process hydrogen, the flow of trichlorosilane, the temperature process parameter of silicon epitaxial layer reaction growth in the process of silicon epitaxial layer growth, the growth rate of silicon epitaxial layer is significantly reduced, to extend the reaction process of thin layer silicon epitaxial layer, expand the proportion of steady-state growth phase, realize the high uniformity distribution of thin layer high resistance silicon epitaxial layer, finally obtain a kind of preparation method of thin layer high resistance silicon epitaxial layer, the thickness of silicon epitaxial layer is in 1 μm order of magnitude, process is simple, strong compatibility, greatly improve production efficiency, save production cost, suitable for industrialized continuous production, meet the production order delivery requirements of thin layer high resistance silicon epitaxial wafer for photomultiplier tube device.