Production method and apparatus for trichlorosilane

A technology of trichlorosilane and its production method, which is applied in the direction of halosilane, silicon halide compound, energy input, etc., can solve the problems of insufficient recovery of synthesis tail gas, easy occurrence of overheating phenomenon, and consumption of low-temperature refrigerant, etc., to achieve beneficial The effect of detection and control, low production cost, and reduced consumption

Inactive Publication Date: 2008-10-08
CHINA BLUESTAR CHENGRAND CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The invention effectively prevents hydrogen chloride from corroding equipment, and solves problems such as low fluidization quality, difficulty in condensing a large amount of chlorosilane in the tail

Method used

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  • Production method and apparatus for trichlorosilane
  • Production method and apparatus for trichlorosilane

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Experimental program
Comparison scheme
Effect test

Embodiment 1

[0020] A kind of manufacture method of trichlorosilane, comprises the steps:

[0021] A, hydrogen chloride treatment: hydrogen chloride gas is dehydrated, then pressurized to 0.25Mpa (G) by a hydrogen chloride compressor and sent to the fluidized bed reactor after preheating;

[0022] B. Drying and pushing of silicon powder: transfer the silicon powder heated to 150°C to the bottom of the trichlorosilane large-scale fluidized bed reactor of the present invention to the silicon powder dried by hot nitrogen in the powder drying furnace;

[0023] C. Synthesis reaction: In the fluidized bed reactor, under the temperature control of 300°C and the pressure of 0.15Mpa (G), the silicon powder and hydrogen chloride undergo a gas-solid phase reaction to generate a mixture of trichlorosilane and silicon tetrachloride. The heat is removed by heat transfer oil, part of it is sent to waste heat boiler by-product steam and then merged into the steam pipe network, and part of it is directly u...

Embodiment 2

[0029] A kind of manufacture method of trichlorosilane, comprises the steps:

[0030] A. Hydrogen chloride treatment: Hydrogen chloride gas is dehydrated, then pressurized to 0.5Mpa (G) by a hydrogen chloride compressor and sent to the fluidized bed reactor after preheating;

[0031] B. Silicon powder drying and pushing: the silicon powder dried by hot nitrogen in the powder drying furnace is transported to the bottom of the fluidized bed reactor with nitrogen heated to 200°C;

[0032] C. Synthesis reaction: In the fluidized bed reactor, under the temperature control of 310°C and the pressure of 0.4Mpa (G), the silicon powder and hydrogen chloride undergo a gas-solid phase reaction to generate a mixture of trichlorosilane and silicon tetrachloride. The heat is removed by heat transfer oil, part of it is sent to waste heat boiler by-product steam and then merged into the steam pipe network, and part of it is directly used for some heat consuming equipment.

[0033] D. Dust remov...

Embodiment 3

[0038] A kind of manufacture method of trichlorosilane, comprises the steps:

[0039] A. Hydrogen chloride treatment: Hydrogen chloride gas is dehydrated, then pressurized to 0.5Mpa (G) by a hydrogen chloride compressor and sent to the fluidized bed reactor after preheating;

[0040] B. Silicon powder drying and pushing: the silicon powder dried by hot nitrogen in the powder drying furnace is transported to the bottom of the fluidized bed reactor with nitrogen heated to 180°C;

[0041] C. Synthesis reaction: In the fluidized bed reactor, under the temperature control of 310°C and the pressure of 0.4Mpa (G), the silicon powder and hydrogen chloride undergo a gas-solid phase reaction to generate a mixture of trichlorosilane and silicon tetrachloride. The heat is removed by heat transfer oil, part of it is sent to waste heat boiler by-product steam and then merged into the steam pipe network, and part of it is directly used for some heat consuming equipment.

[0042] D. Dust rem...

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Abstract

The invention relates to a method for producing chlorosilane, in particular to a method for producing trichlorosilane and a device thereof and pertains to the chemical field. The method comprises six steps, namely, hydrogenchloride treatment, silica powder drying and pushing material, synthesis reaction, dust removal and condensation, rectification separation and tail gas recovery, and the device relates to a special equipment large fluidized bed reactor. The invention reduces corrosion on the system equipment by hydrogenchloride gas and the fluidization quality of the reactor is high. The tail gas contains chlorosilane and is easy to be condensed, and the consumption of low temperature refrigerant is greatly reduced. The synthesis tail gas is recovered fully, no temperature runaway phenomenon happens at the expansion section of the reactor, reaction heat is removed by heat transfer oil and sent in a waste heat boiler to produce by product steam which is merged into a steam pipe network or directly applied in part heating equipment; the whole technique system is a closed system with self materials cycling and energy recycling. The technique of the invention is advanced and reliable, the reaction temperature can be adjusted accurately and the fluidized bed reactor has long service life and low production cost and is applicable to popularization and application.

Description

technical field [0001] The invention relates to a method and equipment for producing chlorosilane in the field of chemical industry, in particular to a method and equipment for producing trichlorosilane. Background technique [0002] Trichlorosilane is an organosilicon monomer with a very wide range of uses. It is mainly used as a raw material for the production of semiconductor silicon, single crystal silicon and polycrystalline silicon. It is widely used in various fields of national defense, national economy and even people's daily life. Trichlorosilane It is also an important raw material for the production of silane coupling agents and other organosilicon compounds. The existing domestic production of trichlorosilane generally adopts a small fluidized bed reactor with a diameter of less than 500mm, and its structure is mostly cylindrical. The straight section is the reaction section, the reaction section is covered with a heater, the upper part is provided with a silic...

Claims

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Application Information

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IPC IPC(8): C01B33/107
CPCY02P20/129
Inventor 侯于先罗秋生杨晓勇刘忠文张晓枫许峰蔡杰
Owner CHINA BLUESTAR CHENGRAND CO LTD
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