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1497 results about "Silicon tetrachloride" patented technology

Silicon tetrachloride or tetrachlorosilane is the inorganic compound with the formula SiCl₄. It is a colourless volatile liquid that fumes in air. It is used to produce high purity silicon and silica for commercial applications.

Silicon/graphene laminar composite material for lithium ion battery cathode and preparation method thereof

The invention relates to a preparation method of a silicon/graphene laminar composite material for lithium ion battery cathode. The composite material adopts a laminar sandwich structure, silicon nano-particles are dispersed on each lamina of the grapheme, the laminas of the grapheme are separated from one another by the silicon nano-particles and the edges of the laminas are in lapped joint so as to constitute a laminar conductive network structure. The preparation method thereof comprises the steps of: formulating anhydrous silicon tetrachloride, surface active agent, sodium naphthalene and graphite oxide to tetrahydrofuran solution, adding the tetrahydrofuran solution into a reactor for reaction in vacuum at the temperature ranging from 380 to 400 DEG C, filtering the reactant to result in the product, and then washing, drying and heating the product to obtain the silicon/grapheme composite material. The preparation method of the invention has the advantages of simple preparation process and great easiness for industrial production; and the silicon/graphene laminar composite material prepared according to the method includes excellent conductivity, power performance, electrochemical activity and cycle stability, and is particularly suitable for manufacturing lithium ion battery cathode.
Owner:深圳清研紫光科技有限公司

Method of patterning lead zirconium titanate and barium strontium titanate

In an embodiment of the present invention, a method is provided of patterning PZT layers or BST layers. For example, a PZT layer or a BST layer is plasma etched through a high-temperature-compatible mask such as a titanium nitride (TiN) mask, using a plasma feed gas comprising as a primary etchant boron trichloride (BCl3) or silicon tetrachloride (SiCi4). Although BCl3 or SiCl4 may be used alone as the etchant plasma source gas, it is typically used in combination with an essentially inert gas. Preferably the essentially inert gas is argon. Other potential essentially inert gases which may be used include xenon, krypton, and helium. In some instances O2 or N2, or Cl2, or a combination thereof may be added to the primary etchant to increase the etch rate of PZT or BST relative to adjacent materials, such as the high-temperature-compatible masking material. A TiN masking material can easily be removed without damaging underlying oxides. The selectivity of PZT or BST relative to TiN is very good, with the ratio of the etch rate of the PZT film to the etch rate of the TiN mask typically being better than 20:1. In addition, the etch rate for PZT using a BCl3-comprising plasma source gas is typically in excess of 2,000 Å per minute. A substrate bias power is applied to direct ions produced from the BCl3 or SiCl4 toward the surface to be etched. The bias power is controlled to avoid sputtering of a conductive layer or layers in contact with the PZT layer, so that the surface of the etched PZT is not contaminated by a conductive material, which can cause the semiconductor device which includes the patterned PZT to short out.
Owner:APPLIED MATERIALS INC

Large-mode active optical fiber and manufacture method thereof

The invention relates to optical fiber and a manufacture method thereof, in particular to large-mode active optical fiber and a manufacture method thereof. The large-mode active optical fiber is formed by drawing a fiber core and a quartz glass inner cladding, a quartz glass outer cladding and a coating which are sequentially coated on the outer surface of the fiber core, wherein the fiber core is formed by depositing, melting and collapsing silicon tetrachloride doped with rare-earth ions in a quartz glass tube; the refractive index of the fiber core is a gradually changed refractive index, and a fiber core refractive index section parameter alpha is not smaller than 1 and not larger than 3; and the appearance of the quartz glass inner cladding is in a regular gengon shape. The large-mode active optical fiber has the advantages of large mode and similar single-mode output, improves the capacity of bearing laser power and the energy storage density of the active optical fiber, improves the light beam quality of output laser, solves the problem of hollow ring of the output laser, greatly improves the reliability of high-power optical fiber laser devices and the utilization rate of raw materials and reduces the manufacture cost.
Owner:FENGHUO COMM SCI & TECH CO LTD

Method and apparatus for preparing trichlorosilane through reaction rectification by using proportionate reaction

The invention relates to a method and an apparatus for preparing trichlorosilane through reaction rectification by using proportionate reaction. The method comprises the following steps of: reacting dichlorosilane with silicon tetrachloride in the upper middle part of a reaction rectification tower, obtaining incompletely reacted dichlorosilane at the top of the reaction rectification tower; reflowing at the top of the tower and in the middle of the tower, obtaining a mixture of dichlorosilane, trichlorosilane and silicon tetrachloride at the bottom of the tower, entering a light-end removal tower to remove a light component, obtaining the dichlorosilane at the top of the light-end removal tower; reflowing to the reaction rectification tower for recycling, obtaining a mixture of trichlorosilane and silicon tetrachloride at the bottom of the tower, entering a heavy-end removal tower to separate the trichlorosilane from the silicon tetrachloride, wherein the trichlorosilane at the top of the heavy-end removal tower is a product; and taking out the silicon tetrachloride at the side line of the lower part of the tower, entering the reaction rectification tower for recycling, and obtaining excessive silicon tetrachloride at the bottom of the tower. In the invention, by utilizing the proportionate reaction, the utilization ratio of the raw materials is enhanced; the problem of dichlorosilane and silicon tetrachloride enrichment is solved; and the final conversion ratio of the dichlorosilane is ensured to reach 100 percent theoretically.
Owner:TIANJIN UNIV

Method adopting trichlorosilane and dichlorosilane mixed raw materials to produce polycrystalline silicon

The invention discloses a method adopting trichlorosilane and dichlorosilane mixed raw materials to produce polycrystalline silicon. After trichlorosilane produced by hydrogenation of silicon tetrachloride or purchased outside is rectified and purified, the rectified and purified trichlorosilane is mixed with recycled trichlorosilane and dichlorosilane mixed materials, the volume percent of dichlorosilane in the mixed raw materials is controlled to be between 3% and 15%, preferably between 5% and 10%, then impurity removal by adsorption and vaporization operation are performed, vaporized chlorosilane mixed gas and high-purity hydrogen are mixed according to mole ratio of 1:2 to 1:10, preferably 1:4 to 1:6, and finally the vaporized chlorosilane mixed gas and the high-purity hydrogen enter into a reduction furnace to produce the polycrystalline silicon. After reactions, tail gas undergoes low-temperature condensation recycle, chlorosilane obtained by recycle is sent to a rectification process to perform separation of silicon tetrachloride and impurities, and the trichlorosilane and dichlorosilane mixed raw materials are obtained. The method makes full use of byproduct dichlorosilane in the polycrystalline silicon production process to improve sedimentation velocity of silicon and reduce power consumption and material consumption, simultaneously can reduce treatment cost and loss of silicon, and improves trichlorosilane utilization rate.
Owner:雅安永旺硅业有限公司

Novel coordinate flame retardant compound of three elements silicon, chlorine and bromine, and preparation method thereof

The invention relates to a novel coordinate flame retardant compound of three elements silicon, chlorine and bromine, and a preparation method thereof, and in particular relates to a silicon halide coordinate flame retardant plasticizer tetrabromobisphenol A bi[tri(dichloropropoxy) silicon acyloxy chloropropyl] ether compound and a preparation method. The structure of the compound is expressed by the following formula: n is equal to 1 when m is 0, the n is equal to 1 when the m is 1, and x is 0, 1, 2 or 3. The preparation method comprises the following steps of: under stirring, dissolving tetrabromobisphenol A bisepoxy propyl ether in an organic solvent; dropping the mixture in silicon tetrachloride at the temperature of 25 DEG C; after dropping, carrying out insulation reaction for 3-4 hours at the temperature of 70-80 DEG C; dropping epoxychloropropane according to a certain mole ratio; reacting for 7-8 hours at the temperature of 80-100 DEG C; and carrying out purification treatment to obtain the tetrabromobisphenol A bi[tri(dichloropropoxy) silicon acyloxy chloropropyl] ether. The product isa good flame retardant plasticizer, and is suitable for being used as a flame retardant plasticizing additive such as epoxy resin, polyvinyl chloride, unsaturated polyester resin, and polyurethane.
Owner:SUZHOU UNIV OF SCI & TECH
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