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Method for synthesizing polysilicon raw material trichlorosilane

A technology of trichlorosilane and polycrystalline silicon, which is applied in the direction of halosilane and silicon halide compounds, can solve the problems of resource waste, low heat transfer efficiency, and high yield, and achieve the effect of improving yield

Active Publication Date: 2008-10-08
HUBEI HUIFU NANOMATERIAL CO LTD
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  • Abstract
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Problems solved by technology

However, the current domestic technology is limited to small-scale production. Generally, the scale of a single set is 2 to 3 thousand tons. The diameter of the synthesis furnace is within 800mm. The heat transfer efficiency is not high. The yield of trichlorosilane is lower than 82%. The yield of silicon and other high boiling substances is high, and the tail gas is emptied by water washing, resulting in waste of resources

Method used

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  • Method for synthesizing polysilicon raw material trichlorosilane

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Experimental program
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Embodiment 1

[0022] See process flow diagram 1.

[0023] The raw silicon powder is transported in by tank truck, and is transported to the silicon powder raw material warehouse through pipelines under the protection of nitrogen. The silicon powder in the raw material bin is added to the bin-type pneumatic conveying pump through a star feeder, and the bin-type pneumatic conveying pump continuously feeds the silicon powder into the monomer at a rate of 1200 kg / hour (about 42,900 moles / hour) The powder drying furnace of the synthesis device, and the drying is carried out in the silicon powder drying furnace.

[0024] The qualified silicon powder dried by hot nitrogen in the powder oven is fed with 760 standard cubic meters per hour (about 33,900 mol / hour, the molar ratio of hydrogen chloride to silicon powder is about 0.78) at 100°C. Synthesis Reactor.

[0025] Reactive hydrogen chloride is synthesized by using liquefied chlorine as raw material and hydrogen. 2300 standard cubic meters per...

Embodiment 2

[0028] The silicon powder is continuously sent to the powder drying furnace of the monomer synthesis device at a rate of 1200 kg / hour; the temperature of the hydrogen chloride gas used for transportation is 100°C, the dosage is 900 standard cubic meters / hour, and the molar ratio of the dried hydrogen chloride to the input silicon powder About: 0.94:1; the hydrogen chloride used for the reaction is 2100 standard cubic meters per hour, and the molar ratio of hydrogen chloride and silicon powder is about 2.18; the mixing ratio of silicon tetrachloride and hydrogen chloride used for the reaction is: n silicon tetrachloride / n hydrogen chloride=1 / 8.5; the dried hydrogen is passed into from the bottom of the direct synthesis furnace according to the ratio of n hydrogen / n hydrogen chloride=1 / 11 in molar ratio. Other parameters and preparation steps remain unchanged, and the final yield of trichlorosilane is 88%.

Embodiment 3

[0030] The silicon powder is continuously fed into the powder drying furnace of the monomer synthesis device at a rate of 1200 kg / hour; the temperature of the hydrogen chloride gas used for transportation is 100°C, the dosage is 550 standard cubic meters / hour, and the molar ratio of the input silicon powder to the dry hydrogen chloride is About: 0.56: 1; the hydrogen chloride used for the reaction is 2400 standard cubic meters per hour, and the molar ratio of hydrogen chloride and silicon powder is about 2.48; the mixing ratio of silicon tetrachloride and hydrogen chloride used for the reaction is: n silicon tetrachloride / n hydrogen chloride=1 / 9.8; the dried hydrogen is passed into from the bottom of the direct synthesis furnace according to the molar ratio n hydrogen / n hydrogen chloride=1 / 14.5 ratio. Other parameters and preparation steps remain unchanged, and the final yield of trichlorosilane is 87%.

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Abstract

The invention discloses a method for the synthesis of a polysilicon raw material trichlorosilane. The method comprises the following steps: A) silica powder is conveyed to a trichlorosilane synthesis furnace by dried hydrogen chloride gas; B) hydrogen chloride for reaction is input into the synthesis furnace from the bottom of the trichlorosilane synthesis furnace proportionally and proper amount of hydrogen and silicon tetrachloride are added in the synthesis furnace at the same time; C) silica powder and hydrogen chloride react at the temperature of 280-310 DEG C to generate mixing gas containing trichlorosilane and silicon tetrachloride; D) the mixing gas of dust and high chlorosilane is removed, after water cooling and pressuring by a diaphragm compressor, trichlorosilane and silicon tetrachloride are condensed into liquid by a refrigerant with -40 DEG C, wherein, noncondensable gas containing H2 and HCI is separated. The method of the invention can improve the yield of trichlorosilane from 82 percent to more than 88 percent.

Description

technical field [0001] The invention relates to a method for synthesizing chemical products, in particular to a method for synthesizing polysilicon raw material trichlorosilane with high efficiency and energy saving. Background technique [0002] Trichlorosilane (HSiCl 3 ) is the main raw material of polysilicon. At present, with the rapid growth of domestic and foreign polysilicon market demand, the domestic polysilicon production scale is rapidly expanding, and the domestic demand for trichlorosilicon is growing rapidly. However, the current domestic technology is limited to small-scale production. Generally, the scale of a single set is 2 to 3 thousand tons. The diameter of the synthesis furnace is within 800mm. The heat transfer efficiency is not high. The yield of trichlorosilane is lower than 82%. The yield of high boiling substances such as silicon is high, and the tail gas is emptied by water washing, resulting in waste of resources. Contents of the invention [...

Claims

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Application Information

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IPC IPC(8): C01B33/107
Inventor 王跃林刘莉龙成坤
Owner HUBEI HUIFU NANOMATERIAL CO LTD
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