106results about "Silicon hydrides" patented technology

The invention belongs to the field of polycrystalline silicon preparation, and particularly relates to a technology and system for preparing monosilane through fixed bed catalytic cracking of polycrystalline silicon high-boiling residues, the system comprises a feeding unit, a reaction unit and a condensation recovery unit which are connected in sequence, the feeding unit comprises a storage tank, a feeding pump and a preheating mixer which are connected in sequence, and the reaction unit comprises a reaction unit and a condensation recovery unit which are connected in sequence. The preheating mixer is also connected with a hydrogen feeding pipeline, the reaction unit is a fixed bed catalytic reactor filled with a catalyst, and the condensation recovery unit comprises at least one stage of cooler and a recovery tank. By adopting the system, the process disclosed by the invention has the advantages of extremely simple process, high yield, capability of realizing long-term, continuous and stable production, environmental friendliness, easiness in material separation, high conversion rate, good target product selectivity and high trichlorosilane content in a final product.

The utility model discloses a preparation device for purifying disilane, which comprises a preparation box, a purification component and a collection component, the purification component is fixedly arranged in the preparation box, the collection component is fixedly arranged on one side of the preparation box, the purification component is arranged to facilitate the purification of disilane, and the collection component is arranged on the other side of the preparation box. Waste gas generated after purification is collected and used through a collection assembly, the purification assembly comprises a collection box, a condenser, a partition plate, a refrigerator, a temperature probe and a temperature measurer, the collection box is fixedly installed in the preparation box, and the condenser is fixedly installed on one side of the collection box; according to the device, gas is guided into the preparation box, the spiral guide plate is used for removing impurities in the slowly entering gas, the gas enters the preparation box and then is subjected to primary purification through the collection box so as to remove heavy component impurities, hydrogen is further separated from the gas by using the adsorption filter screen, and then secondary purification is carried out, so that the purity of the gas is improved. Therefore, disilane with better purity is obtained.

The system comprises a gradient catalytic reaction rectifying tower and a temperature control system, the rectifying tower is sequentially provided with a rectifying section, a reaction section and a stripping section from top to bottom, the reaction section is filled with an ion exchange resin solid catalyst, and the stripping section is filled with an ion exchange resin solid catalyst. The radiuses of the catalyst bag units are distributed in a gradient mode from small to large along the height of the tower, the catalyst bag units have the functions of catalytic reaction and mass transfer separation, the rectifying section and the stripping section are filled with structured packing or high-separation-capacity metal wire mesh packing, a gas-liquid separator is arranged at an outlet of the stripping section, and a temperature control system achieves segmented monitoring through a multi-point temperature sensor. The surface of the catalyst can be subjected to functional treatment to improve the decomposition resistance; the method comprises the following steps: feeding trichlorosilane generated by cold hydrogenation into the upper part of a reaction section from a feed port, carrying out disproportionation reaction at the gradient temperature of 20-100 DEG C and the pressure of 0.3-0.6 MPa according to the reflux ratio of (15-30): 1 to generate silane, and carrying out rectification and extraction separation to obtain high-purity silane with the purity of 99.999% or above.

The utility model belongs to the technical field of electronic special material manufacturing, and particularly relates to a novel silane energy-saving production device which comprises a gas phase entering tower, the gas phase entering tower is connected with a first compressor and a first condenser through a pipeline, and the first compressor is connected with the first condenser through a pipeline. The right end of the first condenser is connected with a second compressor through a pipeline, and the second compressor is connected with a fourth compressor, a second heat exchanger and a third tower through pipelines. According to the device, a compressor pressure-increasing condensation theory is added, and gaseous compression pressure-increasing condensation is added between series disproportionation reactions to gradually purify a silane mixed raw material; the operation cost is reduced by increasing the condensation temperature and reducing the coolant requirement, and meanwhile, the efficiency of the tower is improved by feeding gaseous silane mixed gas for the first time, so that the loss of the whole system is reduced.

The utility model discloses an energy-saving rectification system for electronic-grade silane gas production. The energy-saving rectification system comprises a stripping tower condenser arranged on a stripping tower, and a trichlorosilane evaporator connected with a trichlorosilane tower, the trichlorosilane tower is respectively connected with a stripping tower reboiler arranged on the stripping tower and a dichlorosilane reboiler arranged on the dichlorosilane tower, the trichlorosilane tower is connected with a trichlorosilane return tank through a trichlorosilane air cooler, and the trichlorosilane return tank is respectively connected with the trichlorosilane tower and the dichlorosilane tower; the dichlorosilane tower is provided with a dichlorosilane air cooler, the dichlorosilane air cooler is connected with a dichlorosilane return tank, and the dichlorosilane return tank is respectively connected to the dichlorosilane tower and the second reactor feeding preheater; a discharge preheater of the first reactor is connected to a trichlorosilane tower, a discharge port of the second reactor is connected with a silane tower, and the silane tower is respectively connected with a dichlorosilane tower and a post-stripping tower. Therefore, efficient production of the electronic-grade silane gas is realized.

The electronic-grade silane gas continuous production preparation system comprises a cold hydrogenation treatment device, an inlet of the cold hydrogenation treatment device is connected with a raw material supply system, and an outlet of the cold hydrogenation treatment device is connected with a cold hydrogenation rectifying tower through a pipeline. The cold hydrogenation rectifying tower is sequentially connected with the boron and phosphorus removal adsorption column, the first-stage disproportionator, the first tower, the second tower, the second-stage disproportionator, the third tower and the fourth tower through pipelines, and electronic-grade silane in the fourth tower is used for being conveyed to a silane tank area; the first tower is used for removing silicon tetrachloride produced after the disproportionation reaction of the first-stage disproportionator; the second tower is used for separating the extracted chlorosilane material; the third tower is used for separating silane from chlorosilane; and the fourth tower is used for discharging light impurities and heavy impurities and conveying gas-phase electronic-grade silane into a silane tank area. The device and the method realize continuous, efficient and high-purity production of the electronic-grade silane gas, and have the advantages of low energy consumption, low cost, thorough impurity removal and the like.

The utility model provides a production system for producing silane gas by combining a fixed bed reactor and a reactive distillation tower, and relates to the technical field of silane gas production. The production system for producing the silane gas by combining the fixed bed reactor and the reactive distillation column comprises the fixed bed reactor which is provided with a DCS (Distributed Control System) feed port and can be used for performing DCS disproportionation reaction to prepare a one-step disproportionated product; the primary separation tower is communicated with the fixed bed reactor and can be used for rectifying and separating a one-step disproportionated product, crude SiH4 is extracted from the tower top of the primary separation tower, and a chlorosilane mixture is extracted from the tower kettle of the primary separation tower; the second-stage separation tower is communicated with the first-stage separation tower and can be used for rectifying and separating the chlorosilane mixture, and a TCS mixture is extracted from a tower kettle of the second-stage separation tower; and the reactive distillation tower is communicated with the second-stage separation tower, is provided with a TCS feed port, can perform a TCS disproportionation reaction and rectify and separate a product, and crude SiH4 is extracted from the tower top of the reactive distillation tower. According to the utility model, not only can the conversion rate of the DCS total reaction process be improved, but also the silane gas productivity can be improved, and the operation energy consumption can be reduced.

The invention relates to the field of silane production, and discloses an energy-saving type silane production and purification system which comprises a production unit used for converting trichlorosilane into silane gas and a chlorosilane compound and carrying out preliminary separation treatment on the silane gas and the chlorosilane compound. According to the invention, a disproportionation reaction rectification method is adopted, after pressurization by a compressor, the temperature and pressure of silane gas and other chlorosilane compounds are increased, and the boiling point of the chlorosilane compounds is increased, so that the chlorosilane compounds are more easily liquefied at a higher temperature, more effective condensation and separation in a precooler are facilitated, and the yield of the chlorosilane compounds is improved. And through the cooling effect of the precooler, part of the chlorosilane compound is condensed into a liquid state, so that preliminary separation of the chlorosilane compound and gaseous silane gas is realized, part of impurities are removed in advance, the content of the impurities entering the silane separation tower is reduced, and the separation efficiency of the separation tower is improved.

The present invention relates to a process for producing and for regenerating siloxane hydrogen carrier compounds.

The application discloses a process and equipment for producing silane by chlorosilane disproportionation with combined solid catalyst and liquid catalyst, and the process at least comprises a reaction rectification stage catalyzed by a solid catalyst and a reaction and separation stage catalyzed by a liquid catalyst. The process of the application uses the solid catalyst and the liquid catalyst simultaneously, and combines the homogeneous catalytic reaction rectification and the heterogeneous catalytic reaction rectification, so that the rate-controlling step of the disproportionation reaction is first balanced through primary disproportionation, then the generated intermediate product is subjected to secondary disproportionation, and the silane and the silicon tetrachloride are continuously removed, so that the chemical equilibrium is further transferred to the product site, that is, the limited reaction conversion of the very high or all chemical equilibrium is achieved. The chlorosilane disproportionation reaction which is not favorable to the reaction kinetics is strengthened, the reaction is promoted to reach the equilibrium, and the multiple disproportionation is used to improve the reaction conversion rate.

The utility model provides an impurity removal system for preparing disproportionation reaction silane gas, which comprises a dehydrogenation tower (1) for preparing silane, and further comprises a side production pipeline (5) arranged in the middle of the side of the dehydrogenation tower (1), the other end of the side production pipeline (5) is in fluid connection with a circulating water condenser (6), and the other end of the circulating water condenser (6) is in fluid connection with the dehydrogenation tower (1). A liquid phase outlet of the circulating water condenser (6) is in fluid connection with a buffer tank (7), and the buffer tank (7) is in fluid connection with a silane reaction tower (9) through a pump (8). According to the device, the content of heavy phosphorus impurities in silane gas can be reduced, and the quality of the product silane gas is improved; the dehydrogenation tower is transformed to reduce the influence of phosphorus impurities on the activity of the catalyst in the reaction tower.

The utility model relates to the technical field of chemical equipment, and discloses a disilane preparation device, which comprises a mounting plate, the supporting block is arranged on the mounting plate; the clamping sleeve is fixedly arranged above the supporting block; the reaction kettle is fixedly arranged in the jacket; the feeding hole is formed in the reaction kettle, and a feeding pipe is fixedly arranged in the feeding hole; the outlet is formed in the reaction kettle and is formed in one side of the feeding hole, and a discharging pipe is fixedly connected to the outlet; the gas inlet hole is formed in the reaction kettle, and the output end of a gas compressor is fixedly connected to the interior of the gas inlet hole; the stirring mechanism is arranged in the reaction kettle; the slag discharge pipe is communicated with the jacket and the reaction kettle, and the slag discharge pipe is arranged at the bottom of the reaction kettle; the rectifying tower is communicated with the discharging pipe, the top of the rectifying tower is connected with a condenser, the bottom of the rectifying tower is connected with a reboiler, and the rectifying tower is communicated with a storage tank. The disilane preparation device disclosed by the utility model is used for solving the problems of the existing equipment.

The utility model discloses a device for one-way preparation of electronic grade silane gas in a particle silicon process, the device comprises a preheater, a light component removal unit, a silane reaction unit, a condensation unit, a separation unit and a gasification purification unit which are connected in sequence, and the silane reaction unit comprises more than two silane reaction towers which are arranged in parallel. According to the utility model, more than two silane reaction towers are arranged in the silane reaction unit in parallel, so that trichlorosilane is converted into silane at one time after being sequentially subjected to the steps of preheating, light component removal, reactive distillation, condensation heat exchange, separation and gasification purification; the conversion per pass can be improved, the material condensation and reboiling processes are reduced, the energy consumption is reduced, and the production process cost is reduced.

The invention discloses a high-purity disilane production system and a high-purity disilane production method. The system comprises a reactor (100), a primary gas-solid separator (200), supercharging equipment (300), a secondary gas-solid separator (400), a gas separation membrane assembly (500), a light component removal tower (600) and a product tower (700) which are sequentially connected through pipelines. The core of the invention lies in that a two-stage gas-solid separation structure is adopted to effectively solve the contradiction between the low-pressure operation of the reactor and the high-pressure feeding of the membrane module, and core equipment is fully protected; meanwhile, a mixed matrix molecular sieve membrane is arranged in the gas separation membrane assembly, and screening of hydrogen and monosilane molecules can be efficiently achieved, so that the reaction byproduct hydrogen is removed through a one-step method. According to the method, monosilane is taken as a raw material, after reaction synthesis, primary dust removal, pressurization, fine dust removal, membrane-method dehydrogenation and rectification separation are sequentially carried out on a product, a high-purity disilane product is finally obtained, and unreacted monosilane is returned to a system for cyclic utilization.

Disclosed are Group V element-containing precursors, methods for their synthesis, and methods for their use in film deposition. The precursor is (SiR3) 3-m A(Si a H 2a+1 ) m , (SiR3) 3-n-p A(Si a H 2a+1 ) n (Si b H 2b+1 ) p , or A(Si a H 2a+1 )(Si b H 2b+1 )(Si c H 2c+1 ) (wherein a=1-6; b=1-6; c=1-6; a≠b≠c; m=1-3; n=1-2, p=1-2, n+p=2-3; A=As, P, Sb, Bi; R is C1-C 10 (A is selected from linear, branched, or cyclic alkyl, alkenyl, alkynyl groups of A). Synthesis methods include one-step, two-step, or three-step reaction between halo(poly)silanes and tris(trialkylsilyl) derivatives of A, or one-pot mixture reaction of two or three halo(poly)silanes with a mixture of tris(trialkylsilyl) derivatives of A. Deposition methods include CVD, PECVD, ALD, PEALD, flowable CVD, HW-CVD, epitaxy, etc.

The invention relates to the field of silane gas synthesis, in particular to a synthesis method for co-production of disilane and trisilane. The specific operation is as follows: monosilane is introduced into a metal pipeline reactor filled with a catalyst, a catalytic reaction is performed at the temperature of 450-550 DEG C and the pressure of 0.1-2 MPa to prepare a mixture of crude disilane and monosilane, and then the mixture enters an adsorption tower to collect disilane and trisilane with the purity greater than 99%. According to the method, the metal pipeline is used as a reactor, silane is pyrolyzed into SiH3 free radicals and H free radicals by regulating and controlling the temperature and ensuring the pressure and catalyst conditions, and the SiH3 free radicals and the H free radicals are mutually combined to form disilane and trisilane, so that the selectivity of the product is remarkably improved, and the purity of the collected product reaches 99% or above.

The present invention discloses a process for recovering hydrogen and silane from HJT solar cell production waste gas, which belongs to the field of waste gas treatment technology and includes the following steps: the waste gas is sequentially input into a combined adsorption tower through a vacuum pump and a blower to remove the silane or phosphine components in the waste gas; the gas after adsorption is sent to a deep cold box to liquefy the silane or phosphine that has not been completely removed and the nitrogen in the mixed gas; and is transported to a gas-liquid separator, which separates hydrogen + a small amount of nitrogen. The high nitrogen liquid after separation refluxes in a heat exchanger and performs heat exchange with the waste gas flowing in. The refluxed high nitrogen liquid is vaporized and transported to a combined adsorption tower; step five, hydrogen purification and recovery. The present invention realizes the recovery of hydrogen and silane gas from the waste gas discharged from the production of HJT solar cells by rationally designing the process of waste gas treatment and proposing a new molecular sieve configuration, and reuses them after purification.

Process for the preparation of halogenated oligosilanes Si n X 2n+2 with n = 2 to n = 6 as a pure compound or mixture of compounds whose substituents comprise chlorine or chlorine and hydrogen, characterized in that (a) the starting materials for the process comprise elemental silicon, SiCl4 and elemental hydrogen in at least a catalytic amount, b) the HCl gas produced in the process is recycled to more than 5%, preferably more than 20%, particularly preferably more than 50%, in particular more than 80%, into the process, c) the process comprises a reaction of elemental silicon with HCl as catalyst to form chlorinated oligosilanes, the reaction being carried out by a two-stage catalytic reaction step, d) the process comprises a plasma-chemical synthesis step which is operated in a pressure range of 0.1 hPa to 100 hPa, preferably 0.5 hPa to 30 hPa, particularly preferably 1 hPa to 10 hPa, in particular 1.5 hPa to 5 hPa, e) at least one further silane is used as starting material and / or intermediate, selected from the group of hydrogenated silanes, which includes HSiCl3, HSi2Cl5 and H2SiCl2, f) the reactants or the reactant mixture of the plasma-chemical synthesis step contain less than 1 atom% of C as such or in the form of its compounds and g) the process comprises at least one further step selected from a group comprising distillation, chlorination and thermolysis.

The utility model provides a monosilane buffer filling device which comprises a condenser (7) used for converting gaseous monosilane into liquid monosilane, the input end of the condenser (7) is the input end of the device, and the outlet of the condenser (7) is in fluid connection with a hollow monosilane buffer tank (3) used for storing monosilane. The monosilane buffer tank (3) is in fluid connection with the vaporizer (4) and used for converting liquid monosilane in the monosilane buffer tank (3) into a gas state, and the monosilane buffer tank (3) is provided with a gas state outlet, namely the output end of the device.

The invention relates to the technical field of silicon material preparation and semiconductor process, and discloses a high-purity silicon preparation and monocrystalline silicon growth integrated process based on a silane decomposition method, which comprises the following steps: carrying out silane synthesis in a silicon carbide-lined fluidized bed reactor, separating a reaction product by a cyclone separator at the top of the reactor, and drying the reaction product; industrial silicon powder and high-purity hydrogen react under set conditions to generate silane gas, the synthesized silane gas is introduced into a three-section type vertical pyrolyzing furnace and sequentially passes through a preheating zone, a main reaction zone and a cooling zone, silane is gradually decomposed in the preheating zone and the main reaction zone to generate high-purity silicon powder, undecomposed gas is recycled after being condensed and adsorbed, and the high-purity silicon powder is obtained. High-purity silicon powder is molten in a molten silicon liquid tank, molten silicon liquid is formed through electromagnetic induction heating, the molten silicon liquid is drawn into monocrystalline silicon through a continuous straight-pulling single crystal furnace, and the growth diameter of crystals is controlled in real time through a laser range finder, so that efficient preparation of high-purity silicon and monocrystalline silicon is achieved, and the production requirement of semiconductor-grade monocrystalline silicon is met.

The invention relates to a method and a device for gas-phase continuous preparation of disilane. The method comprises the following steps: S1, gas phase catalytic reaction-hydrogen separation integration: introducing a silane raw material into a tubular reactor filled with a palladium separation membrane, and carrying out a gas phase dehydrogenation condensation reaction under the action of the palladium separation membrane to obtain a component I and a component II; and S2, separation of silane, disilane and trisilane: carrying out three-stage separation on the component II to obtain disilane. The device comprises a catalytic reaction-separation integrated fixed bed device, a first distillation tower, a second distillation tower and a third distillation tower which are arranged along the material flow direction. The palladium separation membrane has the characteristics of catalytic activity and hydrogen separation function, the single-pass yield and selectivity of disilane are improved, generation of trisilane and deposition of silicon powder are inhibited, meanwhile, efficient utilization of raw materials is achieved, the reaction time is short, and no liquid or gas waste is generated in the whole process.

To provide a method for producing higher silanes that has high selectivity for disilanes even when a lower silane and a catalyst are reacted for a long time.　The present invention includes a method for producing higher silanes in which a porous oxide and a lower silane are brought into contact to convert the lower silane into a higher silane having more silicon atoms, wherein the higher silanes include disilanes, the estimated reaction time is from more than 200 hours to 10,000 hours, the temperature at which the porous oxide and lower silane are brought into contact is 100-400°C, and the retention time represented by formula (1) is from 5 seconds to less than 80 seconds.　Retention time [sec] = amount of porous oxide [L] × ((pressure [MPaG] + 0.101325) / 0.101325) × (273.15 / (temperature [°C] + 273.15)) × (3600 / amount of gas supplied [NL / h]) … (1) (In formula (1), the amount of porous oxide represents the amount of porous oxide brought into contact with the lower silane, the pressure and temperature each represent the pressure and temperature at which the porous oxide and lower silane are brought into contact, and the amount of gas supplied is the amount of raw material gas containing the lower silane supplied per unit time during contact with the porous oxide.)

The invention discloses a composite adsorbent, an adsorption column, a silane filtration system and a filtration method, and relates to the field of silane purification. The composite adsorbent includes 50 to 53 parts of granular activated carbon, 28 to 30 parts of UiO-66, 18 to 22 parts of cationic exchange resins, 5 to 15 parts of aluminum oxide, 1 to 10 parts of nano zinc oxide, and 1 to 10 parts of silane coupling agent modified molecular sieves. The composite adsorbent provided by the present invention realizes efficient purification of silane through the synergistic effect between the components, is suitable for various silane purification systems, and can flexibly adjust the adsorption parameters according to different working conditions, has a wide range of industrial application value, and overall reflects the significant advantages in adsorption performance, stability and applicability, and provides an efficient and reliable technical solution for the silane purification industry, with obvious technical advancement and practical value.

The utility model relates to the technical field of silane impurity removal, and provides a silane impurity removal system for removing impurities from crude silane gas containing impurity ammonia, which is used for purifying the crude silane gas containing the impurity ammonia, so that the operation cycle of the system is favorably improved, and the blocking risk is reduced. The system comprises a rectifying tower, a rectifying condenser, a rectifying condensing tank and a solidification separator, the rectifying tower is connected with the crude product gas conveying pipeline, so that ammonia in the silane crude product gas is rectified and separated, and rectified silane gas is obtained; an inlet of the rectification condenser is connected with the tower top gas outlet of the rectification tower through a pipeline; an inlet of the rectification condensation tank is connected with an outlet of the rectification condenser through a pipeline so as to perform condensation treatment on the silane gas treated by the rectification condenser and obtain ammonia condensate and a silane-containing gas phase; and the solidification separator is used for continuously carrying out condensation treatment on the silane-containing gas phase output from the rectification condensation tank to obtain liquid silane and ammonia crystal substances.

The utility model discloses a production device for improving the purity of silane, which comprises a first heat exchanger which is sequentially connected with a primary purification component and a secondary purification component through a pipeline, the primary purification assembly comprises a first resin column used for carrying out liquid phase adsorption on liquid silane and a first rectifying tower used for carrying out rectification separation on the silane, and the secondary purification assembly comprises a second resin column used for carrying out gas phase adsorption on silane gas and a second rectifying tower used for carrying out rectification separation on the silane. According to the utility model, two purification operations of resin complexing adsorption and rectification are combined for the first time, and the permutation and combination of rectification and complexing adsorption are optimized again, so that the purpose of removing impurities is achieved. According to the process, the removal and rectification load of trace impurities by single rectification operation is greatly reduced, and the rectification pressure and energy consumption can be effectively reduced.

The invention discloses a preparation method of high-purity silane suitable for a small experimental device, which comprises the following steps: sequentially connecting and arranging a main reactor, a second reactor, a condenser, a silane buffer tank, a booster pump and a silane steel cylinder, and injecting hydrogen, nitrogen and silicon tetrafluoride materials into the main reactor after passing through the same mass flow controller; then the material enters a second reactor through a gas phase outlet pipeline at the top of the main reactor, a gas phase outlet at the top of the second reactor is connected with an inlet at the bottom of a condenser, an outlet of the condenser is connected with a silane buffer tank, and an outlet pipeline is arranged at the top of the silane buffer tank; materials enter the booster pump through the outlet pipeline, are pressurized in the booster pump and then are fed into the silane steel cylinder to be stored, so that the complexity of the reaction device is simplified, the energy consumption is reduced, and the problems of huge device size, complex process conditions and the like are solved.

The utility model relates to the technical field of silane production, in particular to an electronic-grade silane system device which comprises a partition plate tower, the partition plate tower is communicated with a purification furnace through a first pipeline, the purification furnace is connected with a rectifying tower through a second pipeline, and a filter is arranged on the second pipeline. Process gas prepared by a silicon-magnesium method reaction kettle is conveyed to the middle of a partition plate tower, light component impurities such as H2 and N2 are removed at the top of the partition plate tower, and after non-metal hydride and high-order silane components such as silane and disilane are removed at the bottom of the tower, crude silane is extracted from the tower side and is introduced into a purification furnace through a first pipeline, and by means of the property that the thermal stability of the silane and the hydride impurities is different, the high-order silane is obtained. And adjusting the temperature of the purification furnace to a proper temperature, carrying out thermal decomposition on hydride impurities, filtering a silane gas phase obtained in the purification furnace through a filter on a second pipeline, introducing the filtered silane gas phase into a rectifying tower for refining, and finally extracting a liquid phase, thereby obtaining the high-purity electronic-grade silane.

The utility model provides a device for producing silane, monochlorosilane and dichlorosilane at the same time. The device comprises a first reactor, a second reactor, a trichlorosilane first separation tower, a trichlorosilane second separation tower, a silane crude separation tower, a silane rectification tower, a silane purification tower, a dichlorosilane buffer tank, a dichlorosilane delivery pump, a booster pump, a monochlorine / dichlorosilane crude separation tower, a dichlorosilane purification tower and a monochlorosilane purification tower. The trichlorosilane first separation tower / the trichlorosilane second separation tower is used for recovering trichlorosilane in circulating material flow, a booster pump is arranged at the bottom of the trichlorosilane first separation tower, and due to the fact that different rectification pressures are adopted and the two towers are coupled for heat exchange, energy consumption of the whole system is reduced; the operation is flexible and convenient; and the product at the bottom of the silane coarse separation tower is circulated to the trichlorosilane first separation tower for cyclic utilization, so that the utilization rate of by-products is improved, and the cost is saved.

The utility model provides a preparation device of electronic-grade silane. According to the preparation device, a first disproportionation reaction is carried out on the basis of the first reactor, dichlorosilane is rectified and separated to serve as a raw material for a second disproportionation reaction, silane can be obtained on the basis of cheap trichlorosilane and a catalytic reagent, and electronic-grade silane can be obtained on the basis of traditional purification after rectification; based on heat exchange between tower top materials of the rectifying tower I and a tower kettle reboiler of the rectifying tower II, differential pressure thermal coupling integration is realized, condensing equipment and operation steps can be omitted, energy consumption is reduced, and the defects of high preparation cost and high energy consumption of a silane preparation device in the prior art are overcome.

The invention discloses a preparation method for improving the conversion rate of aryl silane prepared by reducing aryl chlorosilane. Comprising the following steps: enabling aryl chlorosilane, a reducing agent and a phase transfer catalyst to form a reduction reaction system in an ether solvent; raising the temperature of the reduction reaction system for reaction, and performing reduced pressure distillation to obtain aryl silane; wherein the reducing agent comprises alkali metal hydride, and the phase transfer catalyst comprises alkali metal borohydride. According to the preparation method provided by the invention, the reducing capacity of the alkali metal hydride reducing agent is improved by taking the alkali metal borohydride as a phase transfer catalyst, so that the chemical reaction process of reducing aryl chlorosilane to prepare aryl silane is further improved, and the reaction is carried out towards a complete reaction direction; the content of an intermediate product in a final product, especially the content of aryl chlorosilane, is remarkably reduced, and high-purity aryl silane with extremely low chlorine content can be obtained.