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Method for recovering tail gas from trichlorosilane production and special equipment thereof

A technology of trichlorosilane and recovery methods, which is applied in separation methods, chemical instruments and methods, steam condensation, etc., can solve problems such as hydrogen film corrosion, hydrogen film blockage, production cannot continue normal operation, etc., and achieve a practical recovery rate. Effect

Active Publication Date: 2009-06-03
浙江富士特硅材料有限公司
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Problems solved by technology

The disadvantages of this patent are that the hydrogen film is prone to clogging, and the second is that the hydrogen film is corroded due to the presence of hydrogen chloride, so that the production cannot continue to operate normally.

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  • Method for recovering tail gas from trichlorosilane production and special equipment thereof

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Embodiment Construction

[0024] The specific implementation manner of the present invention will be described in detail below in conjunction with the accompanying drawings.

[0025] The recovery method of trichlorosilane production tail gas of the present invention, the method comprises the following steps:

[0026] 1. The tail gas produced by the synthesis of trichlorosilane is condensed after being pressurized by a pump, the pressure is 0.6MPa, and the condensation temperature is -40°C, so that most of the chlorosilanes in the tail gas are condensed to form a condensate.

[0027] 2. The non-condensable gas enters the absorption tower after being pressurized. The temperature of the absorption tower is controlled at -40°C and the pressure is 0.6MPa. In the absorption tower, chlorosilane is used to absorb hydrogen chloride to obtain a chlorosilane absorption liquid. Crude hydrogen gas comes out from the top of the absorption tower. Crude hydrogen enters the scrubber, the temperature of the scrubber is ...

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Abstract

The invention relates to a tail gas treatment process of the technical field of chemical industry, in particular to a method for recovering tail gas from trichlorosilane production and special equipment used in the method. The method for recovering the tail gas from the trichlorosilane production comprises the following steps: pressurizing followed by condensing the tail gas produced by synthesizing the trichlorosilane to condense chlorsilane to form condensate; allowing noncondensable gas to enter an absorption tower in which the chlorsilane absorbs chlorine hydride to obtain chlorsilane absorption solution, and discharging crude hydrogen from the top of the absorption tower; then transferring the condensate and the chlorsilane absorption solution to an analysis tower to analyze the hydrogen chloride dissolved in the chlorsilane, and discharging the hydrogen chlorine from the top of the analysis tower; and performing recovering procedure on the analyzed chlorsilane. Furthermore, the invention also discloses the special equipment for the method. The invention has the characteristics of simplicity, and practicality, and high recovery rate.

Description

technical field [0001] The invention relates to a tail gas treatment process in the technical field of chemical industry, in particular to a method for recovering tail gas from trichlorosilane production and special equipment for the method. Background technique [0002] Trichlorosilane (HSiCl 3 ) is a very versatile organosilicon monomer, mainly used in the production of semiconductor silicon, single crystal silicon and polycrystalline silicon, and widely used in various fields of national defense, national economy and even people's daily life. Trichlorosilane is also an important raw material for the production of silane coupling agents and other organosilicon compounds. [0003] In the production process of silicon trichloride, most of the chlorosilanes are condensed after the synthesis gas from the fluidized bed reactor is dedusted, cooled and condensed. However, due to the presence of hydrogen hydride and hydrogen in the mixed gas, there are still more chlorosilanes (...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B01D5/00B01D53/14B01D53/18
Inventor 李文宁徐慧芬周桂仙汪建阳邱贤辉
Owner 浙江富士特硅材料有限公司
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