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Novel chelate resin and production method and application thereof

A chelating resin, a new type of technology, applied in chemical instruments and methods, other chemical processes, etc., can solve the problems of polysilicon production and quality improvement, raw material manufacturers are uneven, and achieve simplified operation, reduced load, and large processing capacity Effect

Active Publication Date: 2010-06-16
SUNRESIN NEW METERIALS CO LTD XIAN
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] At present, due to the unevenness of raw material manufacturers, especially the high content of impurities such as boron trichloride and phosphorus trichloride in raw materials, it has had a serious impact on the improvement of polysilicon production and quality.

Method used

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  • Novel chelate resin and production method and application thereof
  • Novel chelate resin and production method and application thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0041] Embodiment 1 (preparation and boron removal effect of LX-100 chelating resin)

[0042] In a 1000 ml three-necked bottle, add 400 ml of water and dissolve 0.5% (volume ratio) of polyvinyl alcohol (polymerization degree is 1000-2000, alcoholysis degree is 80-90%) and 15% (volume ratio) of toluene. 0.5 gram of benzoyl peroxide was dissolved in the mixed solution of 82.5 gram of styrene and 17.5 gram of divinylbenzene (content 42%), then added in the three-necked bottle. Stirring was started (desktop stirring with a laboratory iron frame), and the temperature was raised to 45°C. Then heat up to 80°C in 1 hour, maintain for 2 hours, raise to 85°C, maintain for 2 hours, boil at 95-100°C for 6 hours. Then the balls are filtered out (funnel type ceramic filter, vacuum suction filtration), washed with acetone, dried (80-100 ℃ laboratory oven, until there is no free water), and sieved (nylon mesh, hand sieve) to obtain White balls of 0.3-1.0 mm diameter. Get 100 grams of whit...

Embodiment 2

[0045] Embodiment 2 (preparation and boron removal effect of LX-600 chelating resin)

[0046] In a 1000 ml three-necked bottle, add 400 ml of water and dissolve 0.5% (volume ratio) of polyvinyl alcohol (polymerization degree is 1000-2000, alcoholysis degree is 80-90%) and 15% (volume ratio) of toluene. 0.5 gram of benzoyl peroxide was dissolved in the mixed solution of 80 gram of styrene and 20 gram of divinylbenzene (content 42%), then added in the three-necked bottle. Stirring was started (desktop stirring with a laboratory iron frame), and the temperature was raised to 45°C. Then heat up to 80°C in 1 hour, maintain for 2 hours, raise to 85°C, maintain for 2 hours, boil at 95-100°C for 6 hours. Then the balls are filtered out (funnel type ceramic filter, vacuum suction filtration), washed with acetone, dried (80-100 ℃ laboratory oven, until there is no free water), and sieved (nylon mesh, hand sieve) to obtain White balls 0.3-1.0 mm in diameter. Take 100 grams of white b...

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Abstract

The invention provides a chelate resin and a production method and the application thereof, and the novel chelate resin can effectively remove impurities in trichlorosilane; the preparation method provided by the invention comprises the following steps: (1) zinc chloride is used as catalyzer, a white ball and chloromethyl ether are reacted to obtain chloromethylate white ball; (2) the chloromethylate white ball and hexamine are reacted, and then concentrated hydrochloric acid-ethanol mixing solution is used for decomposing, so as to obtain primary amine resin; (3) the primary amine resin is added in the chloroacetic acid aqueous solution, and the reaction is carried out for 10-30 hours at 55-70 DEG C to obtain the chelate resin; the chelate resin can effectively remove the metal impurities such as boron, phosphorus, calcium, magnesium, copper, ferrum and other impurities in trichlorosilane, the removal rate can reach more than 99 percent; the chelate resin has high processing capacity with 200t per cube and is the optimal choice for improving the product quality.

Description

technical field [0001] The present invention relates to the preparation field of polysilicon, more specifically, the present invention relates to a kind of novel chelating resin that can be used for removing the impurity in trichlorosilane and its production method and application. Background technique [0002] With the development of the electronics industry, the requirements for the quality of polysilicon are constantly increasing, and the quality of trichlorosilane as the main raw material directly affects the quality and output of polysilicon products. [0003] At present, due to the unevenness of raw material manufacturers, especially the high content of impurities such as boron trichloride and phosphorus trichloride in raw materials, it has had a serious impact on the improvement of polysilicon production and quality. In this case, it is necessary to find new technical methods to remove some impurities such as boron trichloride and phosphorus trichloride through method...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C08F212/08C08F212/36C08F2/44C08F8/32C08F8/24B01J20/26
Inventor 寇晓康韦卫军王日升
Owner SUNRESIN NEW METERIALS CO LTD XIAN
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