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Preparation of high film substrate bond strength photocatalysis TiO2 film

A technology combining strength and photocatalysis, applied in chemical instruments and methods, physical/chemical process catalysts, chemical/physical processes, etc., can solve the problems of long time-consuming and high cost of thin films

Inactive Publication Date: 2008-12-24
TAIYUAN UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This treatment method adopts the oxidation treatment of the workpiece coated with titanium in a vacuum tube furnace. First, the vacuum chamber of the tube furnace must be evacuated to a certain degree of vacuum, and then oxygen is filled into the vacuum chamber and heated for reaction. This method still has the problems of long time-consuming and high cost for preparing thin film

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment approach 1

[0017] First, the 1Cr13 type martensitic stainless steel metal matrix workpiece with good corrosion resistance is placed in a double-layer glow ion infiltration metal furnace, using a pure titanium plate as a sputtering target, and using argon as a working gas to infiltrate titanium. The process conditions of titanium infiltration are: the distance between the metal substrate workpiece and the sputtering target is 15cm; the air pressure is 40Pa; the sputtering target voltage is 1200V; the metal substrate workpiece voltage is 570V; the metal substrate workpiece temperature is 1000°C; the infiltration time is 2h.

[0018] Then put the 1Cr13 type martensitic stainless steel metal matrix workpiece after the titanium film on the surface is treated in a common heating furnace, directly use the oxygen and nitrogen in the air to react with the titanium film on the surface of the metal matrix workpiece, and the heating temperature is 600 ℃, the holding time is 2 hours, and then cooled t...

Embodiment approach 2

[0020] Firstly, the 0Cr18Ni9 type austenitic stainless steel metal matrix workpiece with good corrosion resistance is placed in a double-layer glow ionization metallization furnace, a pure titanium plate is used as a sputtering target, and argon gas is used as a working gas for titanium infiltration. The process conditions for infiltrating titanium are: the distance between the metal substrate workpiece and the sputtering target is 15cm; the air pressure is 35Pa; the sputtering target voltage is 1120V; the metal substrate workpiece voltage is 600V; the metal substrate workpiece temperature is 900°C; the infiltration time is 3h.

[0021] Then put the 0Cr18Ni9 type austenitic stainless steel metal matrix workpiece with titanium film on the surface to be processed in a common heating furnace, directly use the oxygen and nitrogen in the air to react with the titanium film on the surface of the metal matrix workpiece, and the heating temperature is 400 ℃, the holding time is 6 hours...

Embodiment approach 3

[0023]First, the 1Cr17 type ferritic stainless steel metal matrix workpiece with good corrosion resistance is placed in a double-layer glow ion infiltration metal furnace, using a pure titanium plate as a sputtering target, and using argon as a working gas to infiltrate titanium. The process conditions for infiltrating titanium are: the distance between the metal substrate workpiece and the sputtering target is 18cm; the air pressure is 40Pa; the sputtering target voltage is 1000V; the metal substrate workpiece voltage is 520V; the metal substrate workpiece temperature is 800°C; the infiltration time is 4h.

[0024] Then put the 1Cr17 type ferritic stainless steel metal matrix workpiece after the titanium film on the surface is treated in a common heating furnace, directly use the oxygen and nitrogen in the air to react with the titanium film on the surface of the metal matrix workpiece, and the heating temperature is 500 ℃, the holding time is 4 hours, and then cooled to room ...

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Abstract

A preparation method of a photocatalytic TiO2 film with high coating-substrate bonding strength belongs to the photocatalytic material preparation technical field, relating to a method for preparing a photocatalytic TiO2 film with high coating-substrate bonding strength on a metallic matrix. The method is characterized in that: firstly, by means of a double layer glow plasma metal impregnation technology, a titanium impregnation coating consisting of a diffused layer of titanium inside a matrix and a surface titanium settled layer is formed on the surface of the metal matrix at a high temperature of between 800 and 1,000 DEG C; the concentration of titanium inside a plating layer is increased from inside to outside and is in gradient distribution, thereby ensuring excellent bonding strength between a film and the matrix; then, a workpiece is placed inside an ordinary heating furnace, and undergoes heating treatment through making direct use of air within a temperature range of between 400 and 600 DEG C; therefore, the surface of the metal matrix is formed into a nitrogen-doped anatase-type TiO2 film with excellent photocatalytic performance. The preparation method has ideal process repeatability and easily controlled quality, and can be used in aspects such as water contaminant degradation and air purification.

Description

technical field [0001] A kind of photocatalytic TiO with high film-based binding strength of the present invention 2 The preparation method of the thin film belongs to the technical scope of photocatalytic material preparation, and particularly relates to a kind of photocatalytic TiO with high film base binding strength prepared on the metal substrate. 2 thin film method. Background technique [0002] TiO 2 It has the advantages of high photocatalytic activity, anti-photocorrosion, stable chemical properties, insoluble, non-toxic, etc. It is recognized as an ideal photocatalytic material, and it can better degrade many organic and inorganic pollutants in water and air. However, powdered TiO 2 In the process of use, there are problems such as easy aggregation, easy loss, and difficulty in separation and recovery. The effective way to solve these problems is to prepare supported TiO 2 Photocatalysts, i.e. preparation of TiO on selected substrates 2 film. [0003] TiO 2 ...

Claims

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Application Information

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IPC IPC(8): C23C14/34C23C14/08C23C14/54B01J21/06
Inventor 李秀燕唐宾王鹤峰张莹刘伟燕
Owner TAIYUAN UNIV OF TECH
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