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Preparation method of nitrogen (N)-doped titanium dioxide (TiO2) porous film on surface of stainless steel matrix

A porous film, titanium dioxide technology, applied in the field of photocatalytic material preparation, can solve problems such as small specific surface area, small specific surface area of ​​film, unfavorable photocatalytic performance, etc., to improve light absorption efficiency and adsorption capacity, good film-base bonding strength and visible light. The effect of catalytic performance

Inactive Publication Date: 2013-09-04
TAIYUAN UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0009] Preparation of N-doped TiO on the surface of stainless steel substrate as above 2 The problem of the thin film technology is that since the Ti-N permeated layer is formed at high temperature, the Ti-N thin film on the surface presents the characteristics of dense structure and small specific surface area, so that the N-doped TiO produced by oxidation 2 The thin film also exhibits the same structural characteristics, and the small specific surface area of ​​the thin film is not conducive to the improvement of its photocatalytic performance.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment approach 1

[0020] (1) Put the 0Cr18Ni9 stainless steel substrate workpiece into a double-layer glow ion infiltration metal furnace, use a pure Ti plate as a sputtering target, use argon as a carrier gas and nitrogen as a reaction gas to perform Ti-N infiltration, and The process conditions of Ti-N infiltration are: the distance between the stainless steel workpiece and the sputtering target is 15 mm; the air pressure is 35 Pa, and the flow ratio of argon to nitrogen is 4:1; the sputtering target voltage is 1020 V; the stainless steel workpiece voltage is 540 V ; stainless steel workpiece temperature 900 ℃; penetration time 3 h.

[0021] (2) Use insulating glue to seal the surface of the stainless steel workpiece that is not impregnated with Ti-N, so that only the part coated with Ti-N film is exposed as the working surface, and the workpiece is placed in 1.0 wt% HF electrolyte as the anode, Pt The sheet is the cathode, turn on the magnetic stirring, and anodize at a DC voltage of 20 V at...

Embodiment approach 2

[0024] (1) Put the 1Cr13 stainless steel substrate workpiece into the double-layer glow ion metallization furnace, use pure Ti plate as the sputtering target, use argon as the carrier gas and nitrogen as the reaction gas to carry out Ti-N infiltration, and The process conditions of infiltrating Ti-N are: the distance between the stainless steel workpiece and the sputtering target is 18 mm; the air pressure is 45 Pa, and the flow ratio of argon to nitrogen is 8:1; the sputtering target voltage is 980 V; the stainless steel workpiece voltage is 500 V ; stainless steel workpiece temperature 860 ℃; penetration time 4 h.

[0025] (2) Use insulating glue to seal the surface of the stainless steel workpiece that is not coated with Ti-N, so that only the part coated with Ti-N film is exposed as the working surface, and the workpiece is placed in 1.5 wt% HF electrolyte as the anode, Pt The sheet is the cathode, turn on the magnetic stirring, and anodize at a DC voltage of 20 V at room ...

Embodiment approach 3

[0028] (1) Put the 00Cr17Ni14Mo2 stainless steel substrate workpiece into a double-layer glow ion infiltration metal furnace, use a pure Ti plate as a sputtering target, use argon as a carrier gas, and nitrogen as a reaction gas to perform Ti-N infiltration. The process conditions of Ti-N infiltration are: the distance between the stainless steel workpiece and the sputtering target is 16 mm; the air pressure is 40 Pa, and the flow ratio of argon to nitrogen is 1:1; the sputtering target voltage is 1100 V; the stainless steel workpiece voltage is 580 V ; stainless steel workpiece temperature 940 ℃; penetration time 2 h.

[0029] (2) Use insulating glue to seal the surface of the stainless steel workpiece that is not coated with Ti-N, so that only the part coated with Ti-N film is exposed as the working surface, and the workpiece is placed in 0.5 wt% HF electrolyte as the anode, Pt The sheet is the cathode, turn on the magnetic stirring, and anodize at a DC voltage of 30 V at ro...

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Abstract

The invention discloses a preparation method of a nitrogen (N)-doped titanium dioxide (TiO2) porous film on the surface of a stainless steel matrix, belonging to the field of the preparation technology of photocatalytic materials. The method is characterized by a technical scheme for preparing a high film-based bonding strength anatase type N-doped TiO2 porous film on a stainless steel matrix, and comprises the following steps of: firstly preparing a Ti-N diffusion coating layer composed of a Ti-N diffusion layer in the matrix and a surface Ti-N compound film on the surface of a stainless steel workpiece by use of a double glow plasma surface alloying technology; then performing anode oxidation on the Ti-N film on the workpiece surface to generate an N-doped TiO2 porous film; and finally performing thermal treatment in the air to prepare an anatase type N-doped TiO2 porous film. By adopting the preparation method disclosed by the invention, the prepared N-doped TiO2 porous film has the advantages of large specific surface area and good film-based bonding strength, and also has visible light catalysis performance; and the stainless steel after the N-doped TiO2 surface modification can be applied to the fields of photocatalysis self-cleaning, photocatalysis sterilization and the like.

Description

technical field [0001] The preparation method of the nitrogen-doped titanium dioxide porous film on the surface of a stainless steel substrate belongs to the technical field of photocatalytic material preparation, and in particular relates to an anatase-type N-doped TiO with high film-base bonding strength prepared on the surface of a stainless steel substrate 2 porous film method. Background technique [0002] Stainless steel materials have been widely used in food industry, office equipment, medical equipment and other fields. With the occurrence of public health events such as SARS and bird flu, people have higher and higher hygiene requirements for living environment and daily appliances. People hope that stainless steel utensils will not only have the characteristics of being stainless and clean as new, but also have functions such as antibacterial and self-cleaning, and these properties mainly depend on their surface properties. Forming a modified layer with specific ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C28/00
Inventor 李秀燕王鹤峰杨慧岩薛保平唐宾
Owner TAIYUAN UNIV OF TECH
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