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66results about How to "Enhanced built-in electric field" patented technology

Silicon-based germanium photodetector

The present invention discloses a silicon-based germanium photodetector. The silicon-based germanium photodetector comprises an optical waveguide layer, a silicon oxide layer and a silicon substrate which are sequentially stacked from top to bottom; the optical waveguide layer includes an optical coupling region, a planar optical waveguide region and an optical output region which are distributed sequentially along the propagation direction of optical signals; a coupling grating for receiving the optical signals and guiding the optical signals to the planar optical waveguide region is formed in the coupling region; and the silicon-based germanium photodetector further comprises a germanium layer stacked on the optical output region, a silicon covering layer stacked on the germanium layer, a first electrode formed on the silicon covering layer, and a second electrode formed on the optical output region, wherein the germanium layer receives the optical signals from the optical output region and converts the optical signals into electrical signals. According to the silicon-based germanium photodetector of the invention, the silicon covering layer is adopted, so that bandwidth is greatly improved, the dark current of the device is greatly reduced, and therefore, the comprehensive performance index of the device can be improved, and the requirements of high-speed optical communication and optical interconnection systems can be better satisfied.
Owner:ZTE CORP

A kind of heterojunction solar cell and its preparation method

The invention relates to a heterojunction solar cell and a manufacturing method thereof and belongs to the technical field of solar cell apparatuses. The heterojunction solar cell is characterized in that: a first-type noncrystal silicon carbide layer is arranged between a transparent conductive film and a first-type noncrystal silicon and the thickness of the layer is 10 to 50nm; and a transparent conductive film is arranged between a quasi-monocrystal silicon layer and a metal film and the thickness of the layer is 100 to 300nm. The manufacturing method comprises the following steps of: manufacturing a double-layer porous silicon by using a p-type (or n-type) monocrystal silicon wafer, growing a p-type (or n-type) crystal silicon layer and an intrinsic crystal silicon layer successively after H2 annealing, performing H2 treatment on the surfaces of samples sequentially to manufacture the intrinsic crystal silicon layer, an n-type (or p-type) noncrystal silicon layer and an n-type (or p-type) noncrystal silicon carbide layer, and performing layer transfer after the manufacturing of an apparatus is finished. A silicon wafer can be reused on the premise of obtaining a high-quality silicon film; the conductivity and the transmissivity of a window layer are higher; and excellent electrode contact can be realized at a low temperature.
Owner:NANJING UNIV OF AERONAUTICS & ASTRONAUTICS

Method for preparing silicon heterojunction solar cell containing composite emission layer

The invention provides a method for preparing a silicon heterojunction solar cell containing a composite emission layer. The method includes the steps that an amorphous silicon back field N is deposited on one face of a substrate C on which a double-faced intrinsic amorphous silicon passivation layer I is deposited, an amorphous silicon layer P2 with the uniform structure is prepared on the face opposite to the amorphous silicon back field N under the conditions that doping concentration, hydrogen dilution and power density are low, a nanocrystalline silicon layer P1 with the uniform structure is prepared under the conditions that the doping concentration, the hydrogen dilution and the power density are improved, and an amorphous silicon / nanocrystalline silicon composite structure formed by the two silicon films serves as the emission layer of the silicon heterojunction solar cell. Materials have the advantages of being high in transmittance and conductivity through the structure, on the basis, the passivation effect of the surface of crystalline silicon can be improved, short wave response and output characteristics of the cell are improved, and the method for preparing the silicon heterojunction solar cell is simple and easy to carry out.
Owner:捷造科技(宁波)有限公司

Heterojunction solar cell and interfacing processing method and preparing technology thereof

The invention discloses a heterojunction solar cell and an interfacing processing method and preparing technology thereof. According to the interface processing method of the heterojunction solar cell, in the preparing technology of the heterojunction solar cell, highly doping processing is conducted on the front surface of a crystalline silicon wafer with the ion implantation technology or the diffusion technology so that a heavy doped layer can be formed on the front surface of the crystalline silicon wafer, and then the Fermi level of the surface of the crystalline silicon water of the heterojunction solar cell is changed and an built-in electric field is enhanced. According to the method, the built-in electric field of the substrate interface of crystalline silicon can be enhanced, separation and conveyance of current carriers on the border of a depletion region can be promoted more effectively, film/crystalline silicon abrupt junction formation is facilitated, the width of a depletion layer on the base region of the crystalline silicone is reduced, light absorption efficiency is improved, recombination losses of the current carriers are reduced, and the voltage characteristic of a heterojunction efficient battery is improved.
Owner:TRINA SOLAR CO LTD

P-type amorphous silicon carbon-nanoparticle silicon multi-quantum well window layer material

The invention discloses a p-type amorphous silicon carbon-nanoparticle silicon multi-quantum well window layer material. The p-type amorphous silicon carbon-nanoparticle silicon multi-quantum well window layer material is a multilayer material which is prepared by using a cascading deposition method and formed by alternately growing broadband gap amorphous silicon carbon thin films and narrowband gap p-type nanoparticle silicon thin films, wherein the thickness of each amorphous silicon carbon thin film is between 2 nm and 8 nm; the thickness of each p-type nanoparticle silicon thin film is between 2 nm and 8 nm; by repeated deposition, a p-type amorphous silicon carbon-nanoparticle silicon multi-quantum well material of which the total thickness is between 20 nm and 50 nm is formed; and the p-type amorphous silicon carbon-nanoparticle silicon multi-quantum well window layer material is applicable to a silicon-based thin film solar cell. The p-type amorphous silicon carbon-nanoparticle silicon multi-quantum well window layer material has the advantages that an optical band gap can reach 2.0 to 3.7 eV, and electric conductivity can reach 0.1 to 5.0 S/cm; and the material is applicable to the silicon-based thin film solar cell, so the open-circuit voltage of the cell can be remarkably improved, the optical absorption loss of a window layer is reduced, the short wave response and short-circuit current density of the cell are improved, and photoelectric conversion efficiency is improved.
Owner:NANKAI UNIV

Perovskite solar cell based on p-methoxyphenylacetic acid passivator

The invention discloses a perovskite solar cell based on an organic molecule passivator and a preparation method of the perovskite solar cell, and belongs to the field of solar cells. The structure comprises a transparent conductive substrate, an electron transport layer, a perovskite absorption layer, an organic molecule passivation layer, a hole transport layer and a metal electrode. The organic molecule passivator is at least one of compounds and derivatives thereof, wherein benzene rings of the compounds comprise -COOH or -CH3O, such as p-methoxyphenylacetic acid, anisole and phenylacetic acid. When the passivator is used for passivating the upper surface and the lower surface of the perovskite thin film or the interior of the thin film, the defect density on the surface of the perovskite thin film or in the perovskite thin film can be effectively reduced, non-radiative recombination is inhibited, the built-in electric field of the perovskite thin film is enhanced, and the performance of the perovskite solar cell is improved. The organic molecule passivator provided by the invention is suitable for single-junction perovskite solar cells, perovskite/crystalline silicon or perovskite/perovskite multi-junction laminated solar cells and the like, and has a wide application prospect.
Owner:NANKAI UNIV

MoS2/Si photovoltaic device with ITO/Pd double-layer structured composite electrode and preparation method thereof

The invention discloses a MoS2/Si heterojunction photovoltaic device with an ITO/Pd double-layer structured composite electrode. The device is of a composite layer layered structure, and sequentially comprises an ITO transparent conductive layer, a Pd metal layer, a MoS2 thin film layer, a Si single crystal substrate with the upper surface and the lower surface being provided with a SiO2 passivation layer and a metal In back electrode from top to bottom. The preparation method comprises the steps that the surfaces of different target materials are sequentially bombarded by using high-energy electrons through mainly adopting a DC magnetic control sputtering technology, a MoS2 target material is firstly bombarded, then a Pd target material is bombarded and finally an ITO target material is bombarded so as to sputter a large number of ions, and the ions are successively deposited at the surface of the Si single crystal substrate on which passivation processing is performed and superimposed into a multi-layer structured material; and a back electrode layer is prepared. The light conversion efficiency of the MoS2/Si photovoltaic device with the ITO/Pd double-layer structured composite structure is improved over 100% compared with similar products in the prior art. The MoS2/Si photovoltaic device is simple in process, simple and convenient to control, high in rate of finished products, low in manufacturing cost and suitable for industrial production.
Owner:CHINA UNIV OF PETROLEUM (EAST CHINA)

2D/2D heterojunction pressure-photocatalyst and preparation method thereof

The invention discloses a 2D/2D heterojunction pressure-photocatalyst and a preparation method thereof. The 2D/2D heterojunction pressure-photocatalyst is composed of a piezoelectric NaNbO3 nano-sheetand a MoS2 nano-layer, and the NaNbO3/MoS2 heterojunction pressure-photocatalyst is hydrothermally synthesized by adopting a simple two-step process. The 2D/2D nano NaNbO3/MoS2 heterojunction can collect fine vibration energy in an environment through a piezoelectric effect to induce the surface to generate electron hole pairs so as to drive the decomposition of organic pollutants; besides, due to the formation of the heterojunction and the synergistic effect of a built-in electric field caused by mechanical vibration, charges are effectively separated, and the photocatalytic activity is effectively enhanced, so that synchronous collection and utilization of mechanical vibration energy and visible light are realized. According to the design of the nano-composite material based on a 2D piezoelectric material, the limitation that a single piezoelectric material serves as a catalyst is broken through, efficient coupling utilization of mechanical vibration and visible light is achieved, anew way is provided for environmental remediation and renewable energy production, and the preparation method of the nano-composite material is simple and suitable for industrial production.
Owner:NANCHANG HANGKONG UNIVERSITY

Solar cell based on three-dimensional/two-dimensional perovskite and preparation method thereof

The invention relates to a three-dimensional/two-dimensional perovskite-based solar cell and a preparation method thereof. The solar cell sequentially comprises a transparent conductive substrate, an electron transport layer, a three-dimensional perovskite active layer, a two-dimensional perovskite active layer, a hole transport layer and a counter electrode from bottom to top, in the two-dimensional perovskite active layer, the structure of the two-dimensional perovskite is lt; 110gt, 110gt; and shaping. According to the preparation method, a high-quality three-dimensional perovskite thin film is prepared by adopting low-pressure auxiliary treatment, and then a nonlinear long-chain organic amine salt solution is used for treatment, so that the thin film with the 1t is generated on the upper surface of the three-dimensional perovskite in situ; 110gt, 110gt; the invention discloses a two-dimensional perovskite layer. The preparation method is efficient, the preparation process is simple, and the obtained three-dimensional/lt is achieved; 110gt, 110gt; the two-dimensional perovskite thin film is better in film-forming property and fewer in defect, the carrier transport performance of the perovskite solar cell prepared on the basis of the two-dimensional perovskite thin film is improved, and the photoelectric conversion efficiency is remarkably improved.
Owner:HEBEI UNIV OF TECH

Organic solar cell and manufacturing method thereof

The invention discloses an organic solar cell. The organic solar cell comprises a transparent insulating substrate, a transparent anode electrode layer, a photosensitive layer, a cathode electrode layer and an organic protective layer, wherein the transparent anode electrode layer, the photosensitive layer, the cathode electrode layer and the organic protective layer are sequentially stacked on the transparent insulating substrate. A metal nano-particle layer is formed on at least one face of the cathode electrode layer, the work function value of metal nano-particles in the metal nano-particle layer is smaller than the work function value of the cathode electrode layer, the cathode electrode layer is formed by a layer of graphene thin film or double layers of graphene thin films or multiple layers of graphene thin films, the thickness of the cathode electrode layer ranges from 0.5 nm to 10 nm, and the thickness of the photosensitive layer ranges from 100 nm to 1000 nm. According to a manufacturing method of single-layer solar cell devices, the solar cell devices are sequentially formed on all layers, all the layers are tightly and firmly connected, the performance of the solar cell devices is stable, production efficiency is high, production cost is reduced, and the solar cell is suitable for industrial production.
Owner:GUANGXI ZHITONG ENERGY SAVING ENVIRONMENTAL PROTECTION TECH

Cathode interface modification layer material and perovskite solar cell

The invention discloses a cathode interface modification layer material and a perovskite solar cell. The structural formula of the cathode interface modification layer material is as shown in the specification, wherein Ar is as shown in the specification, n is equal to 1, 2, 3 or 4, and n1 is equal to 1, 2, 3 or 4; and R is H, F, Cl, Br, I, CN, NO3, NH3, CH3 or OCH3. When the cathode interface modification material with the above structure is used for preparing a perovskite solar cell with an inverted structure, the cathode interface modification material has the advantages that the roughnessof an electron transport layer can be reduced, and the collection of carriers by a cathode is facilitated; by introducing the cathode interface modification layer as shown above, a built-in electric field of the device can be improved, so that collection of electrons by the device is facilitated. As the cathode interface modification material has good water-alcohol solubility, the cathode interface modification material can be spin-coated in an electron transport layer through a solution spin-coating method while the electron transport layer is not damaged, the operation is simple, and the cathode interface modification material is compatible with a roll-to-roll process.
Owner:PEKING UNIV SHENZHEN GRADUATE SCHOOL

Heterojunction solar cell and manufacturing method thereof

The invention relates to a heterojunction solar cell and a manufacturing method thereof and belongs to the technical field of solar cell apparatuses. The heterojunction solar cell is characterized in that: a first-type noncrystal silicon carbide layer is arranged between a transparent conductive film and a first-type noncrystal silicon and the thickness of the layer is 10 to 50nm; and a transparent conductive film is arranged between a quasi-monocrystal silicon layer and a metal film and the thickness of the layer is 100 to 300nm. The manufacturing method comprises the following steps of: manufacturing a double-layer porous silicon by using a p-type (or n-type) monocrystal silicon wafer, growing a p-type (or n-type) crystal silicon layer and an intrinsic crystal silicon layer successively after H2 annealing, performing H2 treatment on the surfaces of samples sequentially to manufacture the intrinsic crystal silicon layer, an n-type (or p-type) noncrystal silicon layer and an n-type (or p-type) noncrystal silicon carbide layer, and performing layer transfer after the manufacturing of an apparatus is finished. A silicon wafer can be reused on the premise of obtaining a high-quality silicon film; the conductivity and the transmissivity of a window layer are higher; and excellent electrode contact can be realized at a low temperature.
Owner:NANJING UNIV OF AERONAUTICS & ASTRONAUTICS
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