Silicon heterojunction solar cell and preparation method thereof
A solar cell and silicon heterojunction technology, applied in the field of solar cells, can solve the problems of difficult large-scale application, high cost, and low photoelectric conversion efficiency, and achieve the goals of easy industrial production, improved contact barrier, and improved photoelectric conversion efficiency Effect
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[0024] A method for preparing a silicon heterojunction solar cell proposed in a specific embodiment of the present invention comprises the following steps:
[0025] (1) Carry out texturing treatment to n-type silicon chip, then soak in acidic solution to remove the natural silicon oxide layer on the surface of n-type silicon chip;
[0026] (2) Passivate the n-type silicon chip: spin-coat a mixed solution containing yttrium n-propoxide and hafnium n-propoxide on the upper surface of the n-type silicon chip, and dry it, then apply the n-type silicon chip on the n-type silicon chip The lower surface of the n-type silicon wafer is spin-coated with the above-mentioned mixed solution containing yttrium n-propoxide and hafnium n-propoxide, and then annealed for the first time to form a passivation film on the upper and lower surfaces of the n-type silicon wafer;
[0027] (3) Preparation of strontium chloride interface modification film: the upper surface of the n-type silicon wafer o...
Embodiment 1
[0036] A method for preparing a silicon heterojunction solar cell, comprising the following steps: (1) carrying out texturing treatment to an n-type silicon wafer, and then soaking in an acidic solution to remove the natural silicon oxide layer on the surface of the n-type silicon wafer; (2) ) Passivating the n-type silicon chip: spin-coating a mixed solution containing yttrium n-propoxide and hafnium n-propoxide on the upper surface of the n-type silicon chip, and drying it, then coating the n-type silicon chip The lower surface of the chip is spin-coated with the above-mentioned mixed solution containing yttrium n-propoxide and hafnium n-propoxide, and then annealed for the first time to form a passivation film on the upper and lower surfaces of the n-type silicon chip; (3) strontium chloride Preparation of interface modification film: spin-coat an aqueous solution containing strontium chloride on the upper surface of the n-type silicon wafer obtained in step (2), wherein the...
Embodiment 2
[0040] A method for preparing a silicon heterojunction solar cell, comprising the following steps: (1) carrying out texturing treatment to an n-type silicon wafer, and then soaking in an acidic solution to remove the natural silicon oxide layer on the surface of the n-type silicon wafer; (2) ) Passivating the n-type silicon chip: spin-coating a mixed solution containing yttrium n-propoxide and hafnium n-propoxide on the upper surface of the n-type silicon chip, and drying it, then coating the n-type silicon chip The lower surface of the chip is spin-coated with the above-mentioned mixed solution containing yttrium n-propoxide and hafnium n-propoxide, and then annealed for the first time to form a passivation film on the upper and lower surfaces of the n-type silicon chip; (3) strontium chloride Preparation of interface modification film: spin-coat an aqueous solution containing strontium chloride on the upper surface of the n-type silicon wafer obtained in step (2), wherein the...
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