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179 results about "Absorption loss" patented technology

Electromagnetic shielding composite material

The invention discloses an electromagnetic shielding composite material. Electromagnetic wave absorption layers and electromagnetic wave reflection layers are alternately overlapped to form electromagnetic shielding function bodies; the electromagnetic wave absorption layers are formed by compositing matrix resin, fiber carriers and electromagnetic absorption function bodies; the electromagnetic wave absorption layers are formed by compositing matrix resin and electromagnetic gradient reflection function bodies; in the overlapped electromagnetic wave reflection layers, the mass percentage compositions of short cut carbon fibers increase in gradient along the incident directions of the electromagnetic waves. According to the electromagnetic shielding composite material of the invention, the incident electromagnetic waves generate multi-reflection; the propagation paths of the electromagnetic waves in the material are increased; increase of the multi-reflection loss and absorption loss enables the shielding efficiency of the material to be increased; in adoption of the reflection layers of gradient structure, the electromagnetic waves will not escape away from the shielding material rapidly for reflection; more electromagnetic waves can enter the next shielding unit; therefore, the shielding efficiency of the material is further improved.
Owner:WUHAN UNIV OF TECH

Quantum dot light-emitting component, backlight module and display device

The embodiment of the invention provides a quantum dot light-emitting component, a backlight module and a display device, relating to the field of photoelectric devices. On the premise of not increasing the volume of the component, the absorption loss in a light transmission process is reduced; and the light output efficiency of the quantum dot light-emitting component is increased. The quantum dot light-emitting component comprises a support frame, an excitation light source, a first reflecting layer and a quantum dot layer, wherein the support frame is shaped as a groove; the excitation light source is arranged at the bottom of the groove in the support frame and used for emitting excitation light; the first reflecting layer is arranged on the side wall of the support frame and used for reflecting the excitation light emitted on the side wall of the support frame by the excitation light source; the quantum dot layer is arranged at the opening of the groove of the support frame and emits light by being excited by the excitation light; and the excitation light source, the quantum dot layer and the support frame are packaged together so as to form an integral closed structure. The embodiment of the invention is used for manufacturing the quantum dot light-emitting component.
Owner:HISENSE VISUAL TECH CO LTD

Method for measuring optical film absorption loss

A kind of method of measuring the optics thin film absorption loss and it is characterized in that: utilizes the drift phenomenon generating by the optics thin film component reflection or the transmitted spectrum changing with the temperature and collects the proper detection optical wavelength and adjusts the entrance angle of the detection laser-beam (low power) relative to the sample surface and makes the detection optical wavelength located in the maximum location of the brim of reflection or transmitted spectrum. Makes the strength cyclic modulate (high power) continuous or impulse leaser-beam as the heating light-struck thin film component thin layer and detecting the same or adjacent location and makes the detection light beam from the sample surface reflection or transmitted light strength modulated or generated the transient variation. Use the photoelectric detection to monitor the real-time variation of the detection light strength of the thin film component reflection or transmission of the illuminating process of heating leaser-beam and monitor the absorption loss water of the thin film and the real-time variation of the optics performance and it can realize the absolute measurement of actual absorption deterioration by scaling the signal amplitude of vibration. In addition that it can realize the two-dimension high resolution imaging of the absorption deterioration by scanning the lateral attitude of the thin film component. The method can enhance the sensitivity of measurement the absorption deterioration at some conditions.
Owner:INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI

Optoelectronic systems providing high-power high-brightness laser light based on field coupled arrays, bars and stacks of semicondutor diode lasers

A semiconductor diode laser having a broad vertical waveguide and a broad lateral waveguide is disclosed emitting laser-light in a single vertical mode and a single lateral mode narrow beam. The vertical waveguide comprises a coupled cavity structure, wherein light, generated in the active medium placed in the first cavity leaks into the second cavity and returns back. Phase matching conditions govern the selection of a single vertical mode. A multi-stripe lateral waveguide comprises preferably a lateral photonic band crystal with a lateral optical defect created by selected pumping of multistripes. This approach allows the selection of a single lateral mode having a higher optical confinement factor and / or a lower absorption loss and / or a lower leakage loss compared to the rest lateral optical modes. This enables a single lateral mode lasing from a broad area field coupled laser array. A laser system comprised of multiple field coupled laser arrays on a single wafer and a set of external mirrors enables an ultra-broad field coupled laser bar emitting a coherent laser light in a single vertical optical mode and a single lateral optical mode. A laser system comprised of multiple ultra-broad field coupled laser bars on different wafers and a set of external mirrors enables an ultra-broad field coupled laser stack emitting coherent laser light in a single vertical optical mode and a single lateral optical mode. This allows realization of ultrahigh power ultrahigh brightness laser systems based on semiconductor diode lasers.
Owner:VI SYST GMBH

Crystalline silicon solar cell and preparation method thereof

The present invention provides a crystalline silicon solar cell and a preparation method thereof. The crystalline silicon solar cell comprises: an N-type silicon substrate; a tunneling oxide layer formed on the back surface of the N-type silicon substrate; and a polysilicon layer formed on the tunneling oxide layer, wherein the polysilicon layer comprises alternatively distributed N+ polysilicon areas and P+ polysilicon areas, and a space is arranged between each neighboring N+ polysilicon area and P+ polysilicon area. The tunneling oxide layer, the N+ polysilicon areas and the P+ polysiliconareas form a passivation contact structure on the back surface of the N-type silicon substrate. According to the crystalline silicon solar cell and the preparation method thereof, the recombination rate of the back surface of a battery is effectively reduced, and the open circuit voltage of the battery is improved. Compared with the conventional back knot and back contact solar cells, the doping process of the front surface is saved, the battery preparation process is simplified, the absorption loss of light is reduced, and thus the solar cell can facilitate the improvement of battery performance and the reduction of cost.
Owner:INST OF MICROELECTRONICS CHINESE ACAD OF SCI

Method for measuring transmission loss of optical element

ActiveCN101995328ASolve the measurement problem of weak absorption lossIncrease amplitudeTransmissivity measurementsTesting optical propertiesResonant cavityOptical axis
The invention relates to a method for measuring transmission loss of an optical element. The method comprises the following steps that: continuous laser is reshaped through a mode matching lens, and then enters an optical resonant cavity along an optical axis; two iris diaphragms of which the standoff distance is slightly larger than the thickness of the optical element to be measured are placed into the optical resonant cavity, wherein the clear aperture is less than the aperture of the optical element to be measured; after a shutoff laser beam is triggered, an output signal of the optical resonant cavity is recorded to fit fading time tau 0; the optical element to be measured is placed between the two iris diaphragms in the optical resonant cavity; the optical element to be measured is adjusted to make the surface of the optical element vertical to the optical axis; the output signal of the optical resonant cavity is recorded to fit fading time tau 1; the angle of the optical element to be measured is adjusted to make directly reflected light on the surface escape from the optical resonant cavity; the output signal of the optical resonant cavity is recorded to fit fading time tau 2; the absorption loss A of the optical element to be measured can be acquired by using the tau 0 and the tau 1; and the surface antireflective film residual reflectance R of the optical element to be measured is acquired by using the tau 1 and the tau 2. The method has the advantages of simple structure, high measurement precision, low system cost and the like.
Owner:INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI

808nm large-power quantum well laser in non-aluminum active region of asymmetric structure

ActiveCN101340060AIncreased light confinement factorReduce leakageOptical wave guidanceLaser detailsIndium arsenideWaveguide
The invention provides an aluminum-free active region 808nm high-power quantum-well laser with asymmetric structure. From the bottom to the top, the structure of the laser sequentially comprises a substrate, a buffer layer, an N-type lower limiting layer, a lower waveguide layer, a quantum-well layer, an upper waveguide layer, a potential barrier limiting layer, a P-type upper limiting layer, a transition layer and an ohmic contact layer, wherein, the upper waveguide layer and the lower waveguide layer are made of aluminum-free material Indium gallium phosphide, the quantum-well layer made of gallium indium arsenide phosphide material, the waveguide layer and the quantum-well layer form the aluminum-free active region, and one layer potential barrier limiting layer which is made of P-type aluminum gallium indium phosphide material and 50nm-150nm thick and has a band gap wider than that of the upper limiting layer is arranged between the upper limiting layer and the upper waveguide layer. The laser of the invention can increase the optical limiting factor of the P-type material region, reduce the optical leakage towards the P-type material region, reduce optical absorption loss of a current carrier at the highly doped area, and improve the work efficiency of the laser; the structure of the invention also improves the limiting effect of the active region on the carrier, reduce the leakage of the carrier and is favorable to the decrease of the threshold current.
Owner:Shandong Huaguang Optoelectronics Co. Ltd.

Vertical-structure near ultraviolet light-emitting diode and preparation method thereof

The invention relates to the fields of illumination, display and optical communication, in particular to a vertical-structure near ultraviolet light-emitting diode and a preparation method thereof. The vertical-structure near ultraviolet light-emitting diode comprises a conductive substrate, a metal reflective layer, a nitride epitaxial layer, an N-type electrode and a P-type electrode, wherein the conductive substrate has a first surface and a second surface opposite to the first surface; the metal reflective layer is arranged on the first surface; the nitride epitaxial layer is arranged on the surface of the metal reflective layer, the nitride epitaxial layer comprises a P-type GaN layer, a quantum well layer, a preparation layer and an N-type AlGaN layer which are sequentially stacked in a direction perpendicular to the conductive substrate, and the thickness of the nitride epitaxial layer is less than a wavelength of near-ultraviolet light; the N-type electrode is arranged on the surface of the N-type AlGaN layer; and the P-type electrode is arranged on the second surface. The vertical-structure near ultraviolet light-emitting diode reduces the absorption loss inside the light-emitting diode and greatly improves the light-emitting efficiency.
Owner:NANJING UNIV OF POSTS & TELECOMM

Comprehensive testing method of optical performance of deep ultraviolet optical element

InactiveCN103712782AReal-time monitoring of optical performance stabilityLow costTesting optical propertiesTime changesFluorescence spectrometry
The invention provides a comprehensive testing method of the optical performance of a deep ultraviolet optical element. According to the comprehensive testing method, the absorption loss absolute value of the deep ultraviolet optical element is measured based on the laser heat measurement technology; the fluorescence spectrum of the deep ultraviolet optical element is measured based on the laser-induced fluorescence spectrum technology when the deep ultraviolet optical element is irradiated by a deep ultraviolet laser; the defect level, the contents of doping components and the content of impurities of a material of the deep ultraviolet optical element are measured based on the Raman spectra technology. Through measurement of the absorption loss feature, the fluorescence spectrum feature and the Raman spectral feature of the deep ultraviolet optical element at the deep ultraviolet laser wavelength, the comprehensive optical performance of the deep ultraviolet optical element is estimated. By measuring the real-time change of the absorption loss, the fluorescence spectrum and the Raman spectrum of the deep ultraviolet optical element in the process of deep ultraviolet laser irradiation, the stability of the performance of the deep ultraviolet optical element is monitored. By the adoption of the same device, the optical feature parameters of the deep ultraviolet optical element are measured and the change of the optical feature of the deep ultraviolet optical element in the process of deep ultraviolet laser irradiation is monitored in real time.
Owner:INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI

Display panel and control method thereof, and display device

The application provides a display panel and a control method thereof, and a display device. The display panel comprises a first substrate, a refractive layer and a second substrate which are sequentially stacked, wherein the second substrate comprises a grating layer for outputting part of incident light of the grating layer to the display panel at a preset angle. The refractive index of the refractive layer is adjustable, wherein the refractive index of the refractive layer is smaller than the first refractive index of the first substrate in a dark state, so that the incident light is totally reflected in the first substrate; the refractive index of the refractive layer is greater than or equal to the first refractive index in a bright state, so that the incident light is output to the display panel; the refractive index of the refractive layer changes to adjust the light-emitting efficiency of the display panel, thereby realizing the gray scale display, that is, the gray scale display of the display panel can be carried out without a polarizing plate, and the factors affecting the transmittance and the transparency are only the absorption loss of the first substrate, the refractive layer and the second substrate. Therefore, the display panel provided by the application can improve the transmittance and transparency of a display product.
Owner:BOE TECH GRP CO LTD
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