Method for simultaneously measuring multi optical parameters of plane waveguide
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- SHANGHAI JIAO TONG UNIV
- Publication Date
- 2005-04-13
- Estimated Expiration
- Not applicable · inactive patent
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Abstract
Description
technical field
[0001] The invention relates to a method for measuring optical parameters, in particular to a method for simultaneously measuring multiple optical parameters of a planar waveguide. Used in the field of planar waveguide technology. Background technique
[0002] Planar waveguide is an important optical waveguide device. Refractive index, thickness, insertion loss, absorption loss, reflectivity, diffuse reflectance, etc. are important optical parameters of planar waveguides, which have an important impact on the transmission constant of the waveguide. There are many methods for measuring these optical parameters, such as ellipsometry, M-line method, interference method, and double-focusing fiber method. But these commonly used methods generally can only measure one or two optical parameters. In order to obtain multiple optical parameters of an optical planar waveguide, it is often necessary to conduct multiple measurements with different methods. Some measur...