Method for simultaneously measuring multi optical parameters of plane waveguide

A technology for measuring optical parameters and measuring planes, which is applied in the direction of testing optical properties, etc., can solve problems such as large errors in film thickness and refractive index, poor measurement accuracy, and dependence on measurement accuracy, and achieve the effects of easy operation, high measurement accuracy, and simple principle

Inactive Publication Date: 2005-04-13
SHANGHAI JIAO TONG UNIV
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Problems solved by technology

The measurement accuracy of this method is high, but the measurement accuracy depends on the similarity between the film to be tested and the known mathematical model, if there is a large difference between the two, the measurement accuracy is poor
When the refractive index of the film is close to the refractive index of the substrate, the error of the film thickness and refractive index measured by ellipsometry at the same time is large

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  • Method for simultaneously measuring multi optical parameters of plane waveguide
  • Method for simultaneously measuring multi optical parameters of plane waveguide
  • Method for simultaneously measuring multi optical parameters of plane waveguide

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Embodiment Construction

[0037] In order to better understand the technical solution of the present invention, further description will be made below in conjunction with the accompanying drawings and specific embodiments.

[0038] The principle of measuring multiple optical parameters of planar waveguides by reflection method based on spatial Michelson interference is as follows: figure 1 and figure 2 shown. By directly measuring the optical path and return loss of the medium interface, multiple optical parameters such as the refractive index, thickness, insertion loss, absorption loss, reflectivity and diffuse reflectance of the waveguide are derived. In this embodiment, the measurement principle of the precision reflectometer is as follows: figure 1 As shown in the middle dotted box, the input light source is a width light source with a center wavelength of 1300 nm.

[0039] (1) First press figure 1 The measurement principle shown is used to construct the measurement setup. The measuring devic...

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Abstract

The simultaneous measuring process of several optical parameters of planar waveguide in planar waveguide technology field includes the following steps: constituting the measuring apparatus, measuring the optical path and echo loss corresponding to the fixed reflector before the measured waveguide insertion, installing the measured waveguide; measuring the optical path and echo loss corresponding to various interfaces after the measured waveguide insertion, calculating the refractive index and thickness of the measured sample, and calculating the insertion loss, absorption loss, reflectivity and diffuse reflection factor of the planar waveguide based on the measured optical path and echo loss of the direct interface reflections and multiple inner reflections between interfaces as well as the multiple reflection relation. The present invention has high measurement precision, simple calculation and other advantages.

Description

technical field [0001] The invention relates to a method for measuring optical parameters, in particular to a method for simultaneously measuring multiple optical parameters of a planar waveguide. Used in the field of planar waveguide technology. Background technique [0002] Planar waveguide is an important optical waveguide device. Refractive index, thickness, insertion loss, absorption loss, reflectivity, diffuse reflectance, etc. are important optical parameters of planar waveguides, which have an important impact on the transmission constant of the waveguide. There are many methods for measuring these optical parameters, such as ellipsometry, M-line method, interference method, and double-focusing fiber method. But these commonly used methods generally can only measure one or two optical parameters. In order to obtain multiple optical parameters of an optical planar waveguide, it is often necessary to conduct multiple measurements with different methods. Some measur...

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01M11/02
Inventor 王义平陈建平李新碗
Owner SHANGHAI JIAO TONG UNIV
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