Method for simultaneously measuring multi optical parameters of plane waveguide

Abstract

The simultaneous measuring process of several optical parameters of planar waveguide in planar waveguide technology field includes the following steps: constituting the measuring apparatus, measuring the optical path and echo loss corresponding to the fixed reflector before the measured waveguide insertion, installing the measured waveguide; measuring the optical path and echo loss corresponding to various interfaces after the measured waveguide insertion, calculating the refractive index and thickness of the measured sample, and calculating the insertion loss, absorption loss, reflectivity and diffuse reflection factor of the planar waveguide based on the measured optical path and echo loss of the direct interface reflections and multiple inner reflections between interfaces as well as the multiple reflection relation. The present invention has high measurement precision, simple calculation and other advantages.

Description

technical field [0001] The invention relates to a method for measuring optical parameters, in particular to a method for simultaneously measuring multiple optical parameters of a planar waveguide. Used in the field of planar waveguide technology. Background technique [0002] Planar waveguide is an important optical waveguide device. Refractive index, thickness, insertion loss, absorption loss, reflectivity, diffuse reflectance, etc. are important optical parameters of planar waveguides, which have an important impact on the transmission constant of the waveguide. There are many methods for measuring these optical parameters, such as ellipsometry, M-line method, interference method, and double-focusing fiber method. But these commonly used methods generally can only measure one or two optical parameters. In order to obtain multiple optical parameters of an optical planar waveguide, it is often necessary to conduct multiple measurements with different methods. Some measur...

AI Technical Summary

Problems solved by technology

The measurement accuracy of this method is high, but the measurement accuracy depends on the similarity between the film to be tested and the known mathematical model, if there is a large difference between the two, the measurement accuracy is poor

When the refractive index of the film is close to the refractive index of the substrate, the error of the film thickness and refractive index measured by ellipsometry at the same time is large

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