5 results about "Entrance angle" patented technology

An optical component includes a light guide (2), which has an incident portion (2a) composed of a plurality of incident prisms having incident surfaces, an exit surface (2b) for emitting incident light outward, and an upper surface (2f) and a lower surface (2g) connecting the incident portion (2a) and the exit surface (2b). The direction along the extension direction of the incident prisms is defined as the y-direction, and the upper surface (2f) and the lower surface (2g) are inclined with respect to the z-direction, which is orthogonal to the y-direction, at angles ωu and ωd, respectively. With respect to the inclination reference angle ω, the upper surface (2f) and the lower surface (2g) satisfy ωu≤ω and ωd≥ω. The inclination reference angle ω is relative to the angle sin... ‑1 (sin(θx+α) / n) cosψx The calculated ωo satisfies ωo-10°≤ω≤ωo+10°. ψx is the tilt angle of the incident surface, α is the incident angle of the external light (L1), and θx is the tilt angle of the light guide (2) relative to the vertical direction.

The utility model discloses a multifunctional light phenomenon demonstrator which comprises a demonstration mechanism, a water injection mechanism and an atomization mechanism. The demonstration mechanism comprises a demonstration groove, a clamping column arranged on the side wall of the demonstration groove, an index plate clamped to the clamping column, a positioning plate arranged in the middle of the back face of the index plate, an inner rotating ring and an outer rotating ring, wherein the inner rotating ring and the outer rotating ring are rotationally connected into the positioning plate. According to the utility model, half of the index plate is submerged by a water source, the index plate is accurately divided into an upper part and a lower part, and the underwater laser transmitter and the overwater laser transmitter are respectively used underwater and overwater, so that the use is more flexible, the index plate is matched, and a water line is maintained at the circle center of the index plate; the incident angle is ensured to be at the circle center of the index plate, so that the scales on the index plate can accurately indicate the path of the current light, the atomization mechanism is arranged to further improve the visibility of the light, the practicability of the device is improved, teaching is more intuitive and simpler, and learning and memorizing are more vivid.

We provide ion implantation technology that can achieve the desired implantation profile. [Solution] The ion implantation method comprises: irradiating a wafer at a first temperature with a first ion beam set to an angle condition of the ion beam such that the incident angle is sufficiently smaller than the critical angle at which channeling occurs with respect to the crystal axis of the wafer, at a predetermined position on the surface of the wafer; and, after irradiation with the first ion beam, irradiating a wafer at a second temperature different from the first temperature with a second ion beam set to the same angle condition of the ion beam as the first ion beam at a predetermined position on the surface of the wafer. The angle condition of the ion beam is set by adjusting the angle of the wafer, thereby forming a desired implantation profile within the wafer.

To provide an incoming line angle enlargement suppression device and a method for producing an enamel wire.SOLUTION: An enamel wire producing device is equipped with a mechanism that passes a rolled conductor or a flat conductor through a flat wire drawing dies. The wire entry angle expansion suppression device is equipped with a measurement unit and an adjustment unit. The measurement unit, in the enamel wire producing device, measures the pitch angle, yaw angle, and roll angle of the rolled conductor or flat conductor relative to the flat rectangular wire drawing die. The adjustment unit, located upstream of the flat rectangular wire drawing die, moves or rotates the rolled conductor or flat conductor in a direction that reduces the pitch angle, yaw angle, and roll angle measured by the measurement unit.SELECTED DRAWING: Figure 4

The invention relates to the technical field of 3D (three-dimensional) sensors, and discloses a high-precision high-magnification imaging method for a 3D line laser sensor, which comprises the following steps: a light ray enters a first lens with a narrow-band coating film, and the light ray with non-405nm wavelength is filtered and then enters a second lens, so that the light ray is gathered; the gathered light enters the third lens to reduce the distortion of the light, and then sequentially enters the fourth lens, the diaphragm and the fifth lens to optimize the incident angle of the light; light emitted from the fifth lens enters the sixth lens, spherical aberration caused by the first lens, the second lens, the third lens, the fourth lens and the fifth lens is effectively compensated through the sixth lens, the light is deflected, and the angle when the light is emitted is reduced; the light emitted from the sixth lens sequentially enters the seventh lens and the eighth lens to deflect the light angle; light emitted from the eighth lens sequentially enters the first reflective mirror and the second reflective mirror, so that the total length of the high-precision and high-magnification imaging lens is shortened, and the light receiving efficiency is improved by controlling the angle at which the light enters the CMOS.