Double polar plates for fuel battery and method for making surface azote chromium thin film
A fuel cell and film preparation technology, which is applied to fuel cells, fuel cell parts, battery electrodes, etc., can solve the problems of high material cost, power reduction, complex process, etc., and achieve the effect of improving corrosion resistance
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Embodiment 1
[0028] Put the stainless steel thin plate bipolar plate into the vacuum chamber of the arc ion plating equipment after pretreatment such as cleaning and drying, install pure chromium targets on all cathode arc source positions, and vacuumize to 5×10 -3Pa, pass argon gas to 0.4Pa, start the chromium target arc to obtain arc plasma, the arc current is 50A, add 800V×20kHz×60% pulse bias, use the ions in the plasma to remove the bipolar plate by ion sputtering Treat the passivation film for 10 minutes, reduce the bias voltage amplitude to -300V, adjust the arc flow of the chromium cathode to 80A, start to deposit the pure chromium layer for 5 minutes, and then pass nitrogen gas with a flow rate of 100sccm, and start to deposit the nitrogen-chromium layer. The time is 35 minutes. After the time is up, the post-processing of unloading the bias voltage, stopping the arc, stopping the gas, and keeping the vacuum furnace cold for 1 hour is performed. Finally, the vacuum is released to t...
Embodiment 2
[0030] Put the stainless steel thin plate bipolar plate into the vacuum chamber of the arc ion plating equipment after cleaning and drying. -3 Pa, pass argon gas to 0.8Pa, add 800V×20kHz×40% pulse bias to trigger glow plasma of inert gas argon, and use ion in the plasma to perform ion sputtering on bipolar plate to remove passivation film treatment 10 Minutes, reduce the bias voltage amplitude to -300V, change the partial pressure of argon to 0.4Pa, start the chromium cathode arc, set the arc flow at 80A, start to deposit pure chromium layer, the time is 5 minutes, and then pass nitrogen gas, the flow rate is 100sccm , start to deposit the nitrogen-chromium layer, and the duration is also 5 minutes, then stop sending nitrogen gas, and then pass nitrogen gas after 5 minutes...This process is repeated alternately, the total deposition and coating time is 40 minutes, and then the bias voltage is unloaded and the arc is stopped. , Stop the gas, keep the vacuum furnace cold for 1 h...
Embodiment 3
[0032] Put the stainless steel thin plate bipolar plate into the vacuum chamber of the arc ion plating equipment after cleaning and drying. -3 Pa, pass argon gas to 0.8Pa, add 800V×20kHz×40% pulse bias to trigger glow plasma of inert gas argon, and use ion in the plasma to perform ion sputtering on bipolar plate to remove passivation film treatment 10 Minutes, reduce the bias voltage amplitude to -300V, change the partial pressure of argon to 0.4Pa, start the chromium cathode arc, set the arc flow at 80A, start to deposit pure chromium layer, the time is 5 minutes, and then pass nitrogen gas, the flow rate is 100sccm , and then adjust the chromium arc flow again. The adjustment method is carried out in a way that changes continuously with time. Within 35 minutes, the arc flow is uniformly and continuously adjusted from 80A to 120A. After that time, unload the bias voltage, stop the arc, stop the gas, and maintain the vacuum The furnace is cooled for 1 hour for post-processing,...
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