445 results about "Ion sputtering" patented technology

Method and system for producing a selected pattern or array of at least one of a single wall nanotube and/or a multi-wall nanotube containing primarily carbon. A substrate is coated with a first layer (optional) of a first selected metal (e.g., Al and/or Ir) and with a second layer of a catalyst (e.g., Fe, Co, Ni and/or Mo), having selected first and second layer thicknesses provided by ion sputtering, arc discharge, laser ablation, evaporation or CVD. The first layer and/or the second layer may be formed in a desired non-uniform pattern, using a mask with suitable aperture(s), to promote growth of carbon nanotubes in a corresponding pattern. A selected heated feed gas (primarily CH₄ or C₂H_n with n=2 and/or 4) is passed over the coated substrate and forms primarily single wall nanotubes or multiple wall nanotubes, depending upon the selected feed gas and its temperature. Nanofibers, as well as single wall and multi-wall nanotubes, are produced using plasma-aided growth from the second (catalyst) layer. An overcoating of a selected metal or alloy can be deposited, over the second layer, to provide a coating for the carbon nanotubes grown in this manner.

A method for producing thin film deposits of binary shape-memory alloys using an ion sputtering deposition process comprising using a hot pressed metal powder composition target.

The present invention provides composite reinforcing treatment process for aluminum or aluminum alloy substrate surface through both ion implantation and deposition. The present invention solves the problems of great residual stress, lower binding force and poor bearing capacity of diamond-like carbon film on aluminum or aluminum alloy substrate, and the low wear resistance of DLC film under high speed and heavy load condition. The composite reinforcing treatment process includes the following steps: ultrasonic cleaning of aluminum or aluminum alloy substrate; Ar ion sputtering cleaning; Ti ion implantation; PIIID deposition of Ti film; PIIID deposition of TiN film; PIIID deposition of Ti(CN) film; PIIID deposition of TiC film and synthesis of diamond-like carbon film. All the steps but the first mentioned one are completed in vacuum chamber. The DLC film of the present invention has 10 times over raised wear life compared with single DLC film in the same thickness and friction coefficient lower than 0.1.

The invention relates to a fuel cell metal bipolar plate carbon chromium gradient coating and a preparation method, which is characterized in that a closed field unbalanced magnetron sputtering technology is used for depositing the chromium and carbon elements with different proportions on the surface of a stainless steel thin plate to form the carbon chromium gradient coating. The preparation method comprises the following steps: 1) cleaning ion sputtering; 2) depositing a pure chromium base layer; 3) depositing a chromium and carbon transition layer; 4) depositing a chromium and carbon coexistence layer; and 5) depositing a pure carbon work layer. Compared with the prior art, the modified bipolar plate has high membrane-based combination force, corrosion resisting performance and conductive performance, and can satisfy the usage requirement of the fuel cell bipolar plate.

The invention relates to a heat flow density sensor, in particular to a diaphragm type heat-flow density sensor and a manufacturing method thereof. The diaphragm type heat-flow density sensor comprises a substrate, a first thermal resistant material, a second thermal resistant material, a thermoelectric pile consisting of a thermode A and a thermode B, and an outgoing line; the thermode A and the thermode B are mutually staggered to form the thermoelectric pile; and the thermal resistant materials are covered on the thermoelectric pile, and the thickness of the thermal resistant material on a high temperature end of the thermoelectric pile is smaller than that of the thermal resistant material on a low temperature end of the thermoelectric pile. In the diaphragm type heat-flow density sensor and the manufacturing method thereof, the thermode A and the thermode B are manufactured directly on the substrate of the thermal resistant material in a mode of vacuum ion sputtering, and a thermo electromotive force is measured through the thermoelectric pile formed by connecting the thermocouples in series, so the diaphragm type heat flow density sensor and the manufacturing method thereof have the advantages of high efficiency, lower cost, simple manufacturing, convenient measurement of a heat flow value, higher accuracy and larger practical application value.

Contact elements of sophisticated semiconductor devices may be formed by lithographical patterning, providing a spacer element for defining the final critical width in combination with increasing a width of the contact opening prior to depositing the spacer material. The width may be increased, for instance by ion sputtering, thereby resulting in superior process conditions during the deposition of a contact metal. As a result, the probability of generating contact failures for contact elements having critical dimensions of approximately 50 nm and less may be significantly reduced.

A method of dry cleaning a plasma processing system is described, wherein the formation of particulate during dry cleaning is substantially minimized. In one embodiment, the dry cleaning process is adjusted in order to substantially reduce spatial variations of the dry cleaning rate within the plasma processing system. In another embodiment, endpoint detection is utilized to determine the completion of the dry cleaning process in order to avoid excessive ion sputtering of the underlying process chamber components.

The invention discloses a preparation method of a metal nanometer line with a controllable size. The method comprises the following steps: first, using a secondary anodic oxidation method to obtain a through hole alumina template which is provided with peripheral aluminum and has the aperture of 30 nm to 70 nm; second, using an ion sputtering method to evaporate a gold film with the thickness of 90 nm to 130 nm on one side of the through hole alumina template , putting one non-evaporated surface of the through hole alumina template upwards, then, dripping an aqueous solution of metal chloride on the through hole alumina template and soaking for 1 hour to 3 hours, and afterwards, cleaning with water and drying; and third, putting the through hole alumina template with the metal nanometer line arranged in a hole into a strong slkali solution to erode the alumina template so as to prepare the metal nanometer line with the controllable size. The invention can evaporate the gold film at one side of the anodic alumina template by the reduction action of aluminum, can deposit the metal nanometer line in a nanometer pore canal of the anodic alumina template with peripheral aluminum, has stronger universality and simple operation and can manually effectively control the size of the prepared metal nanometer line.

A method for forming a protective bilayer on a magnetic read/write head or magnetic disk. The bilayer is formed as an adhesion enhancing underlayer and a protective diamond-like carbon (DLC) overlayer. The underlayer is formed of an aluminum or alloyed aluminum oxynitride, having the general formula AlO_xN_y or Me_zAlO_xN_y where Me_z symbolizes Ti_z, Si_z or Cr_z and where x, y and z can be varied within the formation process. By adjusting the values of x and y the adhesion underlayer contributes to such qualities of the protective bilayer as stress compensation, chemical and mechanical stability and low electrical conductivity. Various methods of forming the underlayer are provided, including reactive ion sputtering, plasma assisted chemical vapor deposition, pulsed laser deposition and plasma immersion ion implantation.

The invention discloses a mercapto-beta-cyclodextrin modified silver nano-rod array, its preparation method and its use. The array is a silver nano-rod array with the surface modified by mercapto-beta-cyclodextrin, wherein the lengths of silver nano-rods are 150-600nm, the diameters of the silver nano-rods are 60-90nm, the space between each two silver nano-rods is 10-40nm, and the substrate of the array is formed by superposing one or more than two of a silver film, a gold film, a copper film and a nickel film which have the thicknesses of 20-50mum. The preparation method comprises the following steps: obtaining a through hole alumina template through using a secondary anode oxidation method, sputtering a metal conductive film on one surface of the through hole alumina template through using an ion sputtering method to obtain an alumina template with the metal conductive film, carrying out electric deposition through placing the alumina template with the metal conductive film in a silver electrolyte to obtain an alumina template with holes provided with the silver nano-rods and one surface coated with the metal conductive film, etching off the alumina template through putting the resultant alumina template in an acidic or strongly alkaline solution, and immersing the resultant material in an aqueous solution of the mercapto-beta-cyclodextrin for at least 1h to prepare the mercapto-beta-cyclodextrin modified silver nano-rod array. The mercapto-beta-cyclodextrin modified silver nano-rod array can be used for rapidly detecting trace PCB77 or PCB101.

A method for forming a protective bilayer on a substrate that is a magnetic read/write head or a magnetic recording medium. The bilayer is formed as an adhesion enhancing and corrosion resistant underlayer and a protective diamond-like carbon (DLC) overlayer. The underlayer is formed of silicon oxynitride, having the general formula SiO_xN_y, where x can be within the range between 0.02 and 2.0 and y is in the range between approximately 0.01 and 1.5. By adjusting the values of x and y the underlayer contributes to such qualities as strong chemical bonding between the substrate and the DLC, wear and corrosion resistance, chemical and mechanical stability and low electrical conductivity. The underlayer may be formed by various methods such as reactive ion sputtering, plasma assisted chemical vapor deposition, reactive pulsed laser deposition, plasma surface treatment and plasma immersion ion implantation.

The invention discloses a fiber-shaped flexible electrochromic device comprising a transparent polymer protection layer, a silver wire counter electrode, an electrochromic layer, a transparent conductive layer and a core material. The invention further discloses a preparation method of the fiber-shaped flexible electrochromic device. The method comprises the following steps of: forming the transparent conductive layer on the surface of the core material by utilizing a thermal evaporation method or an ion sputtering method; forming the electrochromic layer on the transparent conductive layer by utilizing a coating method, a solution Czochralski method or an electric deposition method; coating a gel polyelectrolyte on the surface of the electrochromic layer to form a polyelectrolyte layer; placing the silver wire counter electrode into the polyelectrolyte layer which is parallel to the core material; and then, covering a transparent polymer protection layer on the outer surface of the polyelectrolyte layer, and carrying out heat seal treatment to obtain the device. According to the fiber-shaped flexible electrochromic device and the preparation method disclosed by the invention, the process is simple and the prepared fiber-shaped flexible electrochromic device is a flexible and bendable fiber-shaped abnormal structure; and the fiber-shaped flexible electrochromic device can be used as an assembling unit of a more complicated abnormal structure device, and a method foundation for assembling the other abnormal structure devices is provided.

The invention discloses a silver-gold porous nanorod array, a preparation method and a purpose of the silver-gold porous nanorod array. The array comprises porous gold nanorods coated with 3-15nm silver films and arranged on a methyl methacrylate substrate coated with a gold film, wherein the nanorods are 150-250nm in length, and 50-70nm in diameter; and holes are 5-20nm in diameter. The method comprises the steps of placing an aluminum oxide template coated with a gold film in a mixed electrolytic solution for electro-deposition, obtaining an aluminum oxide template coated with the gold film and provided with a gold-silver alloy nanorod array deposited in holes, placing the aluminum oxide template in a nitric acid solution for reaction to obtain an aluminum oxide template coated with the gold film and provided with a porous gold nanorod array in holes, coating the other side of the gold film with liquid methyl methacrylate, solidifying, then sequentially placing the aluminum oxide template in a silver nitrate electrolytic solution for the electro-deposition and aqueous alkali for removing the aluminum oxide template, or sequentially placing the aluminum oxide template in aqueous alkali for removing the aluminum oxide template, coating a silver film by an ion sputtering method, and obtaining the objective product. The array can serve as an SERS (Surface Enhanced Raman Scattering) activity substrate for detecting trace organic matters.

The invention discloses a real-time heat flow detection device and a real-time heat flow detection method thereof, belonging to the field of process parameter detection. The real-time heat flow detection device comprises a heat flow sensor, a signal processing system and a display system, wherein high-purity metal films are subjected to vacuum ion sputtering on the upper end surface and the lower end surface of an electrically insulated heat resistance plate substrate of the heat flow sensor to form a thin-film and non-inductive metal hot resistor respectively on the upper end surface and the lower end surface through laser melting, and the outgoing line of each hot resistor adopts a three-line connection method; the signal processing system is used for processing signals output by the heat flow sensor to obtain temperature difference of the two end surfaces, thus obtaining the heat flow density; and a display device is used for displaying the value of the heat flow density. By adopting the pure metal thin films as temperature measuring materials, the heat flow sensor can fundamentally avoid the limitation that the thermoelectricity of a thermoelectric pile type thermocouple can not be guaranteed to be known and detected, and the thermoelectricity nonlinearity of the thermocouple in a thermoelectric pile and the thermoelectric potential output of a measuring circuit of the thermoelectric pile are influenced by an alternating electromagnetic field.

An electrode structure wherein galvanic corrosion at adhesion layers formed between electrodes and electronic or electro-optic substrates is eliminated. The electrode structure includes an electro-optic crystalline substrate, an amorphous layer disposed on the crystalline substrate, the amorphous layer having a composition substantially similar to a composition of the crystalline substrate, and a gold layer disposed directly on the amorphous layer. The amorphous layer is created using ion sputtering etching techniques that clean and activate the surface of the crystalline substrate such that the gold layer is able to adhere to it.

The invention discloses an optical component surface cleaning method based on ion beam polishing. The method comprising the following steps of: machining the surface of a machining object by adopting an ion beam polishing method based on a low-energy ion sputtering principle by taking an optical component subjected to single-point diamond turning or magnetorheological polishing as the machining object; during the machining process, controlling ion beams to uniformly sweep the surface of the optical component; and after the machining is concluded, cleaning the surface of the optical component. The optical component surface cleaning method disclosed by the invention is simple and practicable, low in requirements on equipment, and capable of reducing the surface roughness of the optical surface component and removing the surface impurities of the optical component.

The invention discloses a lithium ion secondary battery and a preparation method thereof, and belongs to the field of lithium ion secondary batteries. The anode layer of the lithium ion secondary battery has a layered structure, and comprises an anode current collector. An anode material layer consisting of two outer hard carbon material layers and a lithium metal layer between the two hard carbon material layers is adhered to one or two surfaces of the anode current collector, wherein the lithium metal layer is plated on the hard carbon material layers by adopting an ion sputtering method. An irreversible capacity compensation layer of the lithium ion secondary battery is the lithium metal layer sandwiched between the hard carbon material layers, is uniformly distributed, and can avoid the risk that a diaphragm is pierced by lithium metal or lithium dendrites, wherein the lithium ion secondary battery has the advantages of high charging and discharging efficiency, high safety and the like.

The invention discloses a gold nanoparticle-silver nano-semisphere array as well as a preparation method and the application of the array. The array is an ordered array which is placed on a silver membrane of a substrate and attached with silver nano-semispheres, wherein the sphere diameter of the silver nano-semisphere is 85-95 nm; the sphere interval is less than or equal to 10 nm; the gold nanoparticles are modified on the silver nano-semispheres; the particle size of the gold nanoparticle is 5-10 nm. The preparation method comprises the following steps: sequentially performing secondary anodic oxidation, reaming treatment and silver membrane plating on one side of an aluminum sheet, so as to obtain an aluminum oxide template covered with the silver membrane on one side and collected with the silver nano-semispheres in the hole; adhering and fixing the substrate to the silver membrane; then, placing the aluminum oxide template covered with the silver membrane and the substrate on one side and collected with the silver nano-semispheres in the hole in an alkali solution to etch off the aluminum oxide template, and then putting the rest in an ion sputtering device to perform gold sputtering for 8-12 s under the sputtering current is 35-45 mA, so as to obtain the objective product. The array can be taken as an active substrate for enhancing raman scattering on the surface, so that the content of trace rhodamine or polychlorinated biphenyl 3 attached on the array can be measured by a laser raman spectrometer.

The invention discloses a novel bionic surface-enhanced Raman spectrum base and a preparation method thereof. The base is prepared by the following steps: 1) pre-treating raw materials, namely ultrasonically cleaning the cicada wings, removing the veins, cutting into small blocks, fixing and flattening to obtain a biological template; 2) preparing the base, namely placing the biological template obtained in the step 1) in a direct current ion sputtering instrument, sputtering and depositing precious metal on the biological template in an intermittent sputtering mode by using high-pure precious metal as a target under an inert atmosphere, so as to obtain the novel bionic surface-enhanced Raman spectrum base, wherein the high-pure precious metal is gold and/or silver with the purity not less than 99.99%; the intermittent sputtering mode means that stopping lasts for 45-75s after sputtering lasting for 45-75s, the sputtering process and the stopping process are combined as a period. The two-dimensional or three-dimensional prepared by using the cicada wings which are abundant in source, convenient for material taking and simple in treatment as the template is clean in surface, high in enhancement factor, good in reproducibility and strong in stability.

The invention provides a photoconductive switch manufacturing method based on a SiC substrate, and relates to the technical field of wide bandgap semiconductor material photoelectronic devices. SiC with the thickness of 400 micrometers after polishing serves as a substrate in the photoconductive switch manufacturing method based on the SiC substrate. The photoconductive switch manufacturing method based on the SiC substrate comprises the steps that the SiC substrate is prepared; a SiO2 insulation protective layer is generated through thermal oxidation, and a window is formed through photoetching; in high vacuum low temperature Ar atmosphere, a Ti electrode is deposited on the carbon surface, and a Ni electrode is deposited on the silicon surface; after high temperature rapid thermal processing in the Ar atmosphere, a Au protective film is deposited through a small-size ion sputtering instrument, and a photoconductive switch of a Au/Ti/SiC/Ni/Au different-surface opposite-electrode structure is formed by being encapsulated through transparent Si3N4 after a copper electrode is bonded. According to the photoconductive switch manufacturing method based on the SiC substrate, due to the fact that epitaxy of an n-type or p-type SiC epitaxial layer with high doping concentration is not carried out through devices such as CVDs, the technological process of semiconductors is reduced, the rate of finished products is improved, and production cost is lowered. Technical assurance is provided for the production of devices having hash requirements for large power, high frequency and high temperature resistance in future.

The invention discloses an electric propulsion plume test evaluation method, which comprises the following steps: measuring ion beam density, electron concentration and space plasma potential of a main beam plume region and a backflow plume region to obtain a force effect of plume on a satellite solar wing and a thermal radiation effect evaluation result; measuring charging voltage and leakage current of different materials on the surface of a solar cell array in a plume plasma environment and surface potential of the solar cell array in the plume plasma environment to obtain charging and discharging effect evaluation results of the plume for the surfaces of the satellite solar wing and a satellite body; and measuring plasma plume pollution amount of sensitive equipment test samples on thesurfaces of the satellite solar wing and the satellite body to obtain a sediment pollution effect evaluation result of the plume for the sensitive equipment on the surfaces of the satellite solar wing and the satellite body. The method realizes test analysis and research of plume's pollution to satellite surface, ion sputtering corrosion and the impact of plume on satellite surface potential.

The present invention relates to components in an ion implanter that may see incidence of the ion beam, such as a beam dump or a beam stop. Such components will be prone to the ions sputtering material from their surfaces, and sputtered material may become entrained in the ion beam. This entrained material is a source of contamination. The present invention provides such components with a chamber having an elongate slot opening defined by edges, and operating the ion implanter such that a central portion of the ion beam enters the component through the opening with the edges clipping at least a peripheral portion of the ion beam. The arrangement mitigates the problem of sputtered material escaping back out from the component and becoming entrained in the ion beam.

The invention discloses a gold micron feather cluster modified with silver nanoparticles and a preparation method and application thereof. The gold micron feather cluster is characterized in that the silver nanoparticles are coated on an aluminum sheet, of which the surface is provided with pit arrays, wherein the particle diameter of the silver nanoparticles is 15-25 nm, and the gold micron feather cluster has the diameter of 32-658 microns and consists of gold micron feathers which consist of gold nanoparticles with the particle diameter of 200 nm to 1 micron and have the feather rod length of 16-329 microns, the feather branch length of 8-160 microns and the small feather branch length of 2-13 microns. The method comprises the following steps of: firstly obtaining the aluminum sheet, of which the surface is provided with the pit arrays which are hexagonally arranged in an orderly manner and are bowl-shaped, by using an anodic oxidation method; carrying out gold nanoparticle ion sputtering on the aluminum sheet so as to obtain the aluminum sheet coated with the gold nanoparticles; then putting the aluminum sheet coated with the gold nanoparticles in an argon atmosphere, and annealing so as to obtain the aluminum sheet coated with the gold micron feather cluster; and carrying out silver nanoparticle ion sputtering on the aluminum sheet coated with the gold micron feather cluster, thereby producing a target product. The gold micron feather cluster modified with the silver nanoparticles can serve as a surface-enhanced Raman scattering active substrate, and the content of rhodamine or tetrachlorobiphenyl attached onto the gold micron feather cluster is measured by using a laser Raman spectrometer.