Diamond single crystal surface metallization treatment method

Abstract

The invention discloses a diamond single crystal surface metallization treatment method. The method comprises steps as follows: the surface of a diamond single crystal is bombarded and sputtered with Fe, Co or Ni as a source electrode target material with a double-glow plasma diffusion metallizing technique; the single crystal is soaked in an acid solution, so that remaining metal and graphite are removed; a metal diffusion coating is prepared on the surface of the diamond single crystal with strong carbide metal as a target material with a double-glow plasma diffusion metallizing technique. Uniformly distributed micro pits are formed in the surface of the single crystal under the bombardment and sputtering functions of the double-glow plasma and the graphitized catalytic function of Fe, Co, Ni and other iron group metals, surface roughening and activation are realized, strong carbide metallic elements react with a part of carbon atoms on the surface of the diamond so that chemical bond combination is realized, and the bonding strength of the surface metallization coating and the single-crystal diamond is improved. Bombardment etching and metallization treatment are realized with one device, the process is simple, the cost is low, and the method is suitable for industrial production.

Description

technical field

[0001] The invention relates to a surface treatment method of a superhard material, in particular to a method for metallization treatment of a diamond single crystal surface. Background technique

[0002] Diamond single crystal material has many excellent properties, such as high hardness, wear resistance and thermal conductivity, so it is currently the material of choice for manufacturing knives and heat dissipation devices. However, the wettability of diamond and metal is poor, and it is difficult to meet the requirements of direct welding with the tool substrate or metal packaging of heat dissipation devices. At present, there are three methods to solve the welding or packaging of diamond single crystal: the first one is to use active flux that is better for diamond infiltration. The disadvantage of this method is that the ratio of active flux is complicated and not easy to master; Boron doping treatment is performed on the surface of the single crystal. ...

Examples

Embodiment 1

[0023] A method for metallizing the surface of a diamond single crystal, first using the double-glow plasma metallization technology, using the Fe target as the source, bombarding and sputtering the surface of the diamond single crystal, and then soaking the diamond single crystal with an acid solution to remove residual The metal and graphite; finally, using double-glow plasma metallization technology, using strong carbide metal W as a target to prepare a metal coating on the surface of diamond single crystal.

[0024] Among them, using the double-glow plasma metallization technology, using the Fe target as the source, bombarding and sputtering the surface of the diamond single crystal, and then soaking the single crystal in an acid solution to remove the residual metal and graphite process is as follows:

[0025] 1) Clean the diamond surface: ultrasonically clean the diamond single crystal produced by the high temperature and high pressure method with deionized water and alco...

Embodiment 2

[0036] A method for metallizing the surface of diamond single crystals. First, double-glow plasma metallization technology is used to bombard and sputter the surface of diamond single crystals with Ni target material as the source, and then the diamond single crystals are soaked in acid solution to remove residual metal. As well as graphite, finally, using the double-glow plasma metallization technology, the metal coating is prepared on the surface of the diamond single crystal with the strong carbide metal Ti as the target.

[0037] Among them, using the double-glow plasma metallization technology, using the Ni target as the source, bombarding and sputtering the surface of the diamond single crystal, and then soaking the single crystal in an acid solution to remove the residual metal and graphite process is as follows:

[0038] 1) Cleaning the diamond surface: The diamond single crystal produced by chemical vapor deposition is ultrasonically cleaned with deionized water and al...

Embodiment 3

[0049] A method for metallizing the surface of a diamond single crystal, first using a double-glow plasma metallization technology, using a Co target as a source, bombarding and sputtering the surface of a diamond single crystal, and then using an acid solution to soak the single crystal to remove residual metal and Graphite, and finally use the double-glow plasma metallization technology to prepare a metal coating on the surface of the diamond single crystal with the strong carbide metal Hf as the target.

[0050] Among them, using the double-glow plasma metallization technology, using the Co target as the source, bombarding and sputtering the surface of the diamond single crystal, and then soaking the diamond single crystal in an acid solution to remove the residual metal and graphite process is as follows:

[0051] 1) Clean the diamond surface: ultrasonically clean the natural diamond single crystal with deionized water and alcohol, and dry it with hot air;

[0052] 2) Furn...

technical field

[0001] The invention relates to a surface treatment method of a superhard material, in particular to a method for metallization treatment of a diamond single crystal surface. Background technique

[0002] Diamond single crystal material has many excellent properties, such as high hardness, wear resistance and thermal conductivity, so it is currently the material of choice for manufacturing knives and heat dissipation devices. However, the wettability of diamond and metal is poor, and it is difficult to meet the requirements of direct welding with the tool substrate or metal packaging of heat dissipation devices. At present, there are three methods to solve the welding or packaging of diamond single crystal: the first one is to use active flux that is better for diamond infiltration. The disadvantage of this method is that the ratio of active flux is complicated and not easy to master; Boron doping treatment is performed on the surface of the single crystal. ...

Examples

Embodiment 1

[0023] A method for metallizing the surface of a diamond single crystal, first using the double-glow plasma metallization technology, using the Fe target as the source, bombarding and sputtering the surface of the diamond single crystal, and then soaking the diamond single crystal with an acid solution to remove residual The metal and graphite; finally, using double-glow plasma metallization technology, using strong carbide metal W as a target to prepare a metal coating on the surface of diamond single crystal.

[0024] Among them, using the double-glow plasma metallization technology, using the Fe target as the source, bombarding and sputtering the surface of the diamond single crystal, and then soaking the single crystal in an acid solution to remove the residual metal and graphite process is as follows:

[0025] 1) Clean the diamond surface: ultrasonically clean the diamond single crystal produced by the high temperature and high pressure method with deionized water and alco...

Embodiment 2

[0036] A method for metallizing the surface of diamond single crystals. First, double-glow plasma metallization technology is used to bombard and sputter the surface of diamond single crystals with Ni target material as the source, and then the diamond single crystals are soaked in acid solution to remove residual metal. As well as graphite, finally, using the double-glow plasma metallization technology, the metal coating is prepared on the surface of the diamond single crystal with the strong carbide metal Ti as the target.

[0037] Among them, using the double-glow plasma metallization technology, using the Ni target as the source, bombarding and sputtering the surface of the diamond single crystal, and then soaking the single crystal in an acid solution to remove the residual metal and graphite process is as follows:

[0038] 1) Cleaning the diamond surface: The diamond single crystal produced by chemical vapor deposition is ultrasonically cleaned with deionized water and al...

Embodiment 3

[0049] A method for metallizing the surface of a diamond single crystal, first using a double-glow plasma metallization technology, using a Co target as a source, bombarding and sputtering the surface of a diamond single crystal, and then using an acid solution to soak the single crystal to remove residual metal and Graphite, and finally use the double-glow plasma metallization technology to prepare a metal coating on the surface of the diamond single crystal with the strong carbide metal Hf as the target.

[0050] Among them, using the double-glow plasma metallization technology, using the Co target as the source, bombarding and sputtering the surface of the diamond single crystal, and then soaking the diamond single crystal in an acid solution to remove the residual metal and graphite process is as follows:

[0051] 1) Clean the diamond surface: ultrasonically clean the natural diamond single crystal with deionized water and alcohol, and dry it with hot air;

[0052] 2) Furn...

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