Method for welding CVD diamond thick film and hard alloy

Abstract

The invention relates to a method for welding a CVD diamond thick film and hard alloy. The method comprises the steps that firstly, a double-glow plasma diffusion metal device metallizes a growth face of the CVD diamond thick film, and secondly, the double-glow plasma diffusion metal device is used for welding the metallized face and a hard alloy substrate in a brazing mode. According to the method, metal atoms are evenly diffused on the surface of the growth face of the diamond thick film according to the double-glow plasma diffusion metal technology, metal carbide is formed by the metal atoms and the diamond thick film, and superior bonding strength between a metal layer and the diamond thick film is guaranteed through chemical bonding. The metallized diamond thick film has good ground surface wettability, and a welding connector with high bonding strength can be formed through the metallized diamond thick film and the hard alloy under the heating action of plasma. The surface metallization of the diamond thick film and brazing can be finished through the same device, manufacturing production cost is greatly reduced, and industrialization can be achieved.

Description

technical field

[0001] The invention relates to the welding field of superhard materials, in particular to a welding method of CVD diamond thick film and hard alloy. Background technique

[0002] Diamond is the hardest substance in nature, and it has many excellent properties, such as ultra-high wear resistance, high thermal conductivity, etc., so it is the most ideal material for making knives among known materials. Natural diamond and polycrystalline diamond (PCD) tools are rapidly replacing traditional high-speed steel and carbide tools within a certain range of use. However, due to the extremely limited resources of natural diamond, its large-scale promotion is limited, and the PCD tool contains 5-10% binder components, resulting in the surface quality of the processed material being lower than that of natural diamond. Diamond thick film welding tool is a new type of cutting tool manufactured by welding chemical vapor deposition (CVD) diamond thick film and hard alloy. ...

Examples

Embodiment 1

[0024] A welding method of CVD diamond thick film and cemented carbide, first using double glow plasma metallization equipment to metallize the growth surface of CVD diamond thick film, and then using the same double glow plasma metallization equipment to metallize The final CVD diamond thick film growth surface is brazed with the cemented carbide substrate;

[0025] Among them, the metallization process of CVD diamond thick film growth surface is:

[0026] The CVD diamond thick film was prepared by microwave plasma CVD method, hot wire CVD method or DC arc plasma CVD method, and the CVD diamond thick film was ultrasonically cleaned with deionized water and alcohol for 5 minutes, and dried with hot air; The CVD diamond thick film growth side is placed on the substrate table in the vacuum furnace of the double-glow plasma metallization equipment, and the metal W with a purity of 99.9% that can form strong carbides with carbon is selected as the target material. The distance be...

Embodiment 2

[0036] A welding method of CVD diamond thick film and cemented carbide, first using double glow plasma metallization equipment to metallize the growth surface of CVD diamond thick film, and then using the same double glow plasma metallization equipment to metallize The final CVD diamond thick film growth surface is brazed with the cemented carbide substrate;

[0037] Among them, the metallization process of CVD diamond thick film growth surface is:

[0038] The CVD diamond thick film was prepared by microwave plasma CVD method, hot wire CVD method or DC arc plasma CVD method, and the CVD diamond thick film was ultrasonically cleaned with deionized water and alcohol for 5 minutes, and dried with hot air; The CVD diamond thick film growth side is placed on the substrate table in the vacuum furnace of the double-glow plasma metallization equipment, and Ti, which can form strong carbides with carbon elements, is selected as the target material. The target material and the CVD diam...

Embodiment 3

[0044] A welding method of CVD diamond thick film and cemented carbide, first using double glow plasma metallization equipment to metallize the growth surface of CVD diamond thick film, and then using the same double glow plasma metallization equipment to metallize The final CVD diamond thick film growth surface is brazed with the cemented carbide substrate;

[0045] Among them, the metallization process of CVD diamond thick film growth surface is:

[0046] The CVD diamond thick film was prepared by microwave plasma CVD method, hot wire CVD method or DC arc plasma CVD method, and the CVD diamond thick film was ultrasonically cleaned with deionized water and alcohol for 4 minutes, and dried with hot air; The CVD diamond thick film growth side is placed on the substrate table in the vacuum furnace of the double-glow plasma metallization equipment, and Zr, which can form strong carbides with carbon elements, is selected as the target material. The target material and the CVD diam...

technical field

[0001] The invention relates to the welding field of superhard materials, in particular to a welding method of CVD diamond thick film and hard alloy. Background technique

[0002] Diamond is the hardest substance in nature, and it has many excellent properties, such as ultra-high wear resistance, high thermal conductivity, etc., so it is the most ideal material for making knives among known materials. Natural diamond and polycrystalline diamond (PCD) tools are rapidly replacing traditional high-speed steel and carbide tools within a certain range of use. However, due to the extremely limited resources of natural diamond, its large-scale promotion is limited, and the PCD tool contains 5-10% binder components, resulting in the surface quality of the processed material being lower than that of natural diamond. Diamond thick film welding tool is a new type of cutting tool manufactured by welding chemical vapor deposition (CVD) diamond thick film and hard alloy. ...

Examples

Embodiment 1

[0024] A welding method of CVD diamond thick film and cemented carbide, first using double glow plasma metallization equipment to metallize the growth surface of CVD diamond thick film, and then using the same double glow plasma metallization equipment to metallize The final CVD diamond thick film growth surface is brazed with the cemented carbide substrate;

[0025] Among them, the metallization process of CVD diamond thick film growth surface is:

[0026] The CVD diamond thick film was prepared by microwave plasma CVD method, hot wire CVD method or DC arc plasma CVD method, and the CVD diamond thick film was ultrasonically cleaned with deionized water and alcohol for 5 minutes, and dried with hot air; The CVD diamond thick film growth side is placed on the substrate table in the vacuum furnace of the double-glow plasma metallization equipment, and the metal W with a purity of 99.9% that can form strong carbides with carbon is selected as the target material. The distance be...

Embodiment 2

[0036] A welding method of CVD diamond thick film and cemented carbide, first using double glow plasma metallization equipment to metallize the growth surface of CVD diamond thick film, and then using the same double glow plasma metallization equipment to metallize The final CVD diamond thick film growth surface is brazed with the cemented carbide substrate;

[0037] Among them, the metallization process of CVD diamond thick film growth surface is:

[0038] The CVD diamond thick film was prepared by microwave plasma CVD method, hot wire CVD method or DC arc plasma CVD method, and the CVD diamond thick film was ultrasonically cleaned with deionized water and alcohol for 5 minutes, and dried with hot air; The CVD diamond thick film growth side is placed on the substrate table in the vacuum furnace of the double-glow plasma metallization equipment, and Ti, which can form strong carbides with carbon elements, is selected as the target material. The target material and the CVD diam...

Embodiment 3

[0044] A welding method of CVD diamond thick film and cemented carbide, first using double glow plasma metallization equipment to metallize the growth surface of CVD diamond thick film, and then using the same double glow plasma metallization equipment to metallize The final CVD diamond thick film growth surface is brazed with the cemented carbide substrate;

[0045] Among them, the metallization process of CVD diamond thick film growth surface is:

[0046] The CVD diamond thick film was prepared by microwave plasma CVD method, hot wire CVD method or DC arc plasma CVD method, and the CVD diamond thick film was ultrasonically cleaned with deionized water and alcohol for 4 minutes, and dried with hot air; The CVD diamond thick film growth side is placed on the substrate table in the vacuum furnace of the double-glow plasma metallization equipment, and Zr, which can form strong carbides with carbon elements, is selected as the target material. The target material and the CVD diam...

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