Technology and equipment for coating film in deep hole

Abstract

The invention discloses a technology and equipment for coating a film in a deep hole. The equipment comprises two cathode target systems, two magnetic filtration systems, a vacuum chamber, a turnoversystem, a ceramic solenoid, a workpiece system, auxiliary anodes and the like. A bent tube is a direct current magnetic field; the cylindrical vacuum chamber is a strong pulse focusing magnetic field;and a ceramic tube wound in the vacuum chamber is also wound with the pulse focusing magnetic field. A cathode target is a pushable target when working; inert gases, Ar and hydrogen, are introduced into the vacuum chamber before coating the inner wall of a cylinder, surface cleaning is carried out through corona discharge between the auxiliary anodes and the inner wall of a piece to be coated, and arc deposition film coating is carried out after the cleaning. the length-diameter ratio of the cylinder capable of being coated by the technology and the equipment can be more than 20:1, wherein the diameter of the hole is not less than 20 mm, and the thickness uniformity of a film layer is better than +/-15%, thus making up the key technical bottleneck of poor uniformity and the limited length-diameter ratio of coating the film on the inner wall at home and abroad.

Description

technical field [0001] The invention solves the problem of coating in deep holes, and the specific technology is based on the magnetic filter deposition technology. technical background [0002] With the rapid development of science and technology, the requirements for material surface modification technology are getting higher and higher, and the traditional single surface modification technology has become more and more difficult to meet the technical requirements of industrial production; the surface coating of special-shaped parts has become the future development one of the directions. [0003] In recent years, some surface modification composite technologies have come out and been put into the industry one after another, and play an important role. For example, the composite technology of magnetron sputtering technology and arc ion plating technology is compatible with the advantages of magnetron sputtering technology that can deposit large-area and high-uniformity fi...

AI Technical Summary

Problems solved by technology

But it has an important disadvantage, that is, these techniques are not suitable for depositing films in holes, especially the deposition uniformity of cylinders with large aperture ratios is worse

Magnetic filter cathodic vacuum arc deposition technology is a new type of ion beam film preparation method developed in recent years. It uses magnetic filter technology to filter out large particles and neutral atoms generated by the arc source to obtain a pure plasma beam without large particles. It effectively overcomes the problems caused by the existence of large particles in the ordinary arc source deposition method, and the prepared film has excellent performance, but the important shortcoming of the existing magnetic filtration deposition technology is still the limited ability of deep hole coating. The workpiece surface with high aperture ratio cannot achieve uniform coating on the inner surface

Deep hole coating is a technical bottleneck restricting its development both abroad and domestically, and there is still no report on related deep hole technology

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