Method for designing coating uniformity correction mask for spherical optical elements on planetary rotating jigs of vacuum coating machines

Abstract

The invention discloses a method for designing a coating uniformity correction mask for spherical optical elements on planetary rotating jigs of vacuum coating machines, which is used for studying the film thickness distribution of a plane or spherical optical element (subjected to coating) on a planetary rotating jig through establishing a coating model in a vacuum environment. Through enabling an optical element coating process in a planetary rotating jig to be equivalent to a coating process in a simple rotating jig, the initial shape of the coating uniformity correction mask in the planetary rotating jig is designed. Through optimizing the arc length magnification factor of the correction mask by using a computer until the film thickness uniformity reaches the optimal result, the actual shape of the coating uniformity correction mask for the spherical optical elements is obtained. According to the invention, the control on the film thickness uniformity of the spherical optical element with a large caliber and a large caliber / curvature radius ratio can be realized, thereby obtaining the uniformity of multilayer-film spectral characteristics of the spherical optical element with a large caliber and a large caliber / curvature radius ratio.

Description

technical field [0001] The invention relates to the technical field of thin film preparation, in particular to a design method for a correction baffle used in a planetary rotating fixture of a vacuum coating machine to control the uniformity of the film thickness of a spherical optical element. Background technique [0002] Optical thin films are an important part of modern optical systems. On the surface of almost all optical components, the preparation of thin films with special properties by physical or chemical methods has become a necessary means to improve the optical properties of optical components. With the development of high-precision optical measuring instruments, high-resolution optical imaging technology and lithography technology, the aperture of optical elements and the ratio of aperture / radius of curvature of spherical optical elements are getting larger and larger. In order to ensure the use of large aperture, large aperture / radius of curvature ratio The op...

AI Technical Summary

Problems solved by technology

This modified baffle design process takes a long time, usually requires several or even more than ten experiments to obtain satisfactory results, and requires experienced designers

The method of using theory-aided design to correct the baffle has not been applied to the planetary rotation fixture, mainly because in the planetary rotation fixture, the optical element always rotates at high speed, and the position of the point on the mirror surface has no fixed relationship with the position of the correction baffle. Therefore, the mathematical expression for the modified baffle shape cannot be directly obtained

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