Method for magnetic filtration of strip-sectional vacuum cathodic arc plasma

A plasma and cathodic arc technology, applied in ion implantation plating, vacuum evaporation plating, circuit, etc., can solve problems such as small deposition area, unsuitable for large-scale industrial coating application, uneven deposition film, etc., and the method is simple Effect

Inactive Publication Date: 2012-08-15
李刘合
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Problems solved by technology

[0004] The present invention aims at the above-mentioned deficiencies and defects existing in the background technology, and provides a magnetic filtration method of strip-shaped vacuum cathode arc plasma, which overcomes the small deposition area and poor deposition film of the existing elbow vacuum cathode arc magnetic filtration method. Uniform, unsuitable defects for large-scale industrial coating applications

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  • Method for magnetic filtration of strip-sectional vacuum cathodic arc plasma
  • Method for magnetic filtration of strip-sectional vacuum cathodic arc plasma
  • Method for magnetic filtration of strip-sectional vacuum cathodic arc plasma

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Embodiment Construction

[0023] The following provides examples in conjunction with the accompanying drawings and the content of the method of the present invention, so as to further understand the specific implementation manners of the present invention.

[0024] figure 1 A schematic diagram of the device for magnetically filtering the ribbon plasma generated by the rectangular vacuum cathode arc source using the arc-shaped curved ribbon plasma bending magnetic filter channel is given. After the arc plasma is generated by the vacuum cathode arc target 1 , it enters into the strip-shaped plasma bending magnetic filter channel 2 . Outside the arc-shaped curved ribbon-shaped plasma bending magnetic filter channel, an electromagnetic coil 3 wound with copper wire is wound. The electromagnetic coil 3 surrounds the outside of the ribbon-shaped plasma bending magnetic filter channel 2. Inside the filter channel is formed a magnetic force line (not shown) that is substantially parallel to the inner wall of ...

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Abstract

The invention provides a method for removing electrically neutral drops and macroscopic particles in strip-sectional vacuum cathodic arc plasma, which belongs to the field of vacuum surface modification for materials, and particularly provides a method for magnetic filtration of electrically neutral drops and macroscopic particles by bending strip vacuum cathodic arc plasma by applying a magnetic field to a strip-sectional vacuum cathodic arc plasma channel. By the method, the defects that deposition area is small, deposition film is uneven, and scanning system equipment is complex and expensive and unsuitable for large-scale industrial coating application and the like in existing vacuum cathodic arc magnetic filtration methods for bends are overcome. By the method, coating plasma can be provided within a long strip range. By means of a rotating workpiece target table, application field of filtering arc can be widened greatly. Deposition efficiency is improved, large-space coating is achieved, coating efficiency is improved, and cost is reduced.

Description

technical field [0001] The invention relates to a method for filtering electrically neutral liquid droplets and macroscopic particles in a vacuum cathode arc, specifically a method of using a magnetic field to bend the vacuum cathode arc plasma to filter out electrically neutral liquid droplets and macroscopic particles The magnetic filtration method belongs to the field of vacuum surface modification of materials. Background technique [0002] The vacuum cathodic arc coating technology of materials has been developed to this day, and has achieved remarkable results, becoming the most widely used coating technology in the field of surface modification. But, this coating method still has some problems at present, mainly shows that because this method relies on vacuum cathode arc evaporation cathode material to obtain arc plasma, there is very large current density (up to 10 6 -10 8 A / cm 2 ), therefore, even under vacuum, the cathode spot of the vacuum arc has a very high t...

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/22H01J37/32
Inventor 李刘合
Owner 李刘合
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