Variable-angle variable-diameter magnetic filtered cathode arc thin film deposition equipment and method

A cathodic arc and thin film deposition technology, applied in metal material coating process, vacuum evaporation coating, coating and other directions, can solve the problems of poor filtering of macroscopic particles and low transmission efficiency.

Active Publication Date: 2020-10-09
JIHUA LAB
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  • Claims
  • Application Information

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Problems solved by technology

[0007] The purpose of the embodiments of the present invention is to provide a variable-angle and variable-diameter magnetic filter cathodic arc film deposition equipment and method to solve the problems of poor filtration of macroscopic particles and low transmission efficiency in existing cathodic arc film deposition equipment and methods

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  • Variable-angle variable-diameter magnetic filtered cathode arc thin film deposition equipment and method
  • Variable-angle variable-diameter magnetic filtered cathode arc thin film deposition equipment and method
  • Variable-angle variable-diameter magnetic filtered cathode arc thin film deposition equipment and method

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Embodiment Construction

[0028] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the drawings in the embodiments of the present invention.

[0029] In the description of the present invention, it should be noted that the orientation or positional relationship indicated by the terms "inner", "outer" and so on is based on the orientation or positional relationship shown in the drawings, or the conventionally placed position when the product of the invention is used. Orientation or positional relationship is only for the convenience of describing the present invention and simplifying the description, and does not indicate or imply that the referred device or element must have a specific orientation, be constructed and operated in a specific orientation, and thus should not be construed as a limitation of the present invention. In addition, the terms "first", "second", etc. are only used for distinguishing descriptions,...

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Abstract

The invention provides variable-angle variable-diameter magnetic filtered cathode arc thin film deposition equipment and method. The equipment comprises a cathode arc generating system, a plasma transmission system, a vacuum coating cavity and a power source. The cathode arc generating system comprises an arc generator and a target. The plasma transmission system comprises a variable-diameter magnetic filtered pipeline, an electromagnetic coil and a scanning electromagnetic coil. The electromagnetic coil is wound around the variable-diameter magnetic filtered pipeline, and the variable-diameter magnetic filtered pipeline is in a double-horn shape with the two ends larger than the middle. As the variable-diameter magnetic filtered pipeline in the double-horn shape with the two ends larger than the middle is designed in the cathode arc deposition equipment, in cooperation with the electromagnetic coil wound around the variable-diameter magnetic filtered pipeline, focusing and deflectingelectromagnetic fields can guide plasma flow towards a substrate, neutral macroparticles not affected by the electromagnetic fields continue to advance along a straight line from a cathode to be filtered, and through the design of the simple magnetic filtered pipeline, dense uniform cathode arc thin films can be obtained.

Description

technical field [0001] The invention relates to the technical field of film deposition, in particular to a variable-angle variable-diameter magnetic filter cathodic arc film deposition device and method. Background technique [0002] The cathodic vacuum arc deposition method is a method in which the plasma generated by the vacuum arc evaporation source is attracted to the substrate by means of a negative bias voltage, etc., and a thin film is formed on the surface of the substrate. Wherein, the cathode vacuum arc evaporation source evaporates the cathode target by vacuum arc discharge, thereby generating plasma containing the cathode target material. The cathodic vacuum arc deposition method has a series of advantages such as high ionization rate, high ion energy, low deposition temperature, high deposition rate, and good film-substrate bonding, and a notable feature of cathodic arc thin film deposition is that the energy of incident evaporated ions is sufficient High to pr...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/32
CPCC23C14/325
Inventor 卫红胡琅徐平侯立涛冯杰胡强侯少毅
Owner JIHUA LAB
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