Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Method for preparing metal sulfide diamond-like carbon composite film

A metal sulfide and composite film technology, applied in the field of preparation of composite film technology, can solve the problems of unfavorable friction and wear performance, low sulfur content of the composite film, etc.

Inactive Publication Date: 2010-07-28
CHINA UNIV OF GEOSCIENCES (BEIJING)
View PDF4 Cites 14 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At present, metal sulfide / DLC composite films are prepared by sputtering, and the sulfur content of the prepared composite films is low, which is not conducive to further improving the friction and wear properties of metal sulfide / DLC composite films.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0040] Firstly, ultrasonic cleaning technology is used to remove the contamination layer on the surface of the cemented carbide tool; the surface of the tool is bombarded and cleaned by the argon ion beam generated by the ion source of the anode layer; and then the titanium ion generated by the circular cathode arc source is used to The surface of the tool is cleaned by ion bombardment; then the Ti / TiN / TiCN / TiC gradient transition layer is prepared by cathodic arc deposition. The cathodic arc target material is Ti, and argon, argon / nitrogen mixed gas, nitrogen, and nitrogen are successively introduced into the vacuum chamber / methane mixed gas, methane, the negative bias of the workpiece is -100~-800V; use ion beam deposition + magnetron sputtering to synthesize a DLC film doped with W and Mo at the same time, the ion source adopts the anode layer ion source, and passes into the anode layer The gas of the ion source includes argon and methane, and the magnetron sputtering targe...

Embodiment 2

[0042] First, use ultrasonic cleaning technology to remove the surface contamination layer of high-speed steel mold; use the anode layer ion source to bombard the surface of the mold with argon ion beam; The surface is cleaned by ion bombardment; then the Cr / CrN / CrCN / CrC gradient transition layer is prepared by cathodic arc deposition. The cathodic arc target material is Cr, and argon, argon / nitrogen mixed gas, nitrogen, nitrogen / Methane mixed gas, methane, workpiece negative bias is -100 ~ -800V; use ion beam deposition + magnetron sputtering to synthesize DLC film doped with W, the ion source uses the anode layer ion source, and the gas that passes into the anode layer ion source Including argon and methane, the magnetron sputtering target adopts a DC magnetron sputtering target, and the target material is W; finally, WS is prepared by ion vulcanization 2 The DLC composite film adopts the pulse bias voltage of -500V~-600V, the gas in the vacuum chamber is ammonia gas, the p...

Embodiment 4

[0044] First, use ultrasonic cleaning technology to remove the contamination layer on the surface of the bearing steel; then use the argon / hydrogen mixed ion beam generated by the anode layer ion source to bombard and clean the bearing steel surface; then use the anode layer ion source to assist intermediate frequency magnetron sputtering deposition to prepare Zr / ZrN / ZrCN / ZrC gradient transition layer, the magnetron sputtering target material is Zr, the gas passed into the anode layer ion source includes argon, argon / acetylene mixed gas, and the ion energy of the ion beam is -1000~-2000eV; Beam deposition + magnetron sputtering synthesizes a DLC film doped with W and Fe at the same time. The ion source adopts the anode layer ion source, and the gas passing into the anode layer ion source includes argon and methane. The magnetron sputtering target adopts DC magnetron sputtering Target shooting, the target material is W, Fe. Finally, WS was prepared by ion vulcanization 2 / FeS...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a method for preparing a metal sulfide DLC composite film. The method is characterized by comprising the following steps: firstly using the ultrasonic washing technology to remove the surface contamination layer of a basal body; using the inert gas ion beam generated by an ion source to carry out the ion beam bombardment washing on the surface of the basal body; using the metal ion generated by a cathodic arc source to carry out the metal ion bombardment washing on the surface of the basal body under the high workpiece negative bias condition; using the cathodic arc deposition or ion beam assisted magnetron sputtering technology to prepare a gradient transition layer; using the ion beam deposition on an intermediate layer and magnetron sputtering technology to synthesize a doped DLC film doped with at least one metal element of W, Mo and Fe; and finally obtaining the high-sulfur metal sulfide / DLC composite film by using the ion vulcanization, wherein the ion beam deposition is realized by introducing carbonaceous gas to the ion source, and sulfureous gas is used as the sulfur source.

Description

Technical field: [0001] The patent of the present invention relates to a preparation method in the technical field of composite thin films, specifically a method for preparing metal sulfide diamond-like composite thin films. Background technique: [0002] Diamond-like carbon (DLC) films are widely used in various industries due to their high hardness, high elastic modulus, excellent friction and wear properties, chemical stability and biocompatibility. [0003] Aiming at the shortcomings of large internal stress, poor film / substrate binding force, and poor thermal stability that limit the application of DLC films under harsh working conditions, various solutions have been proposed, and DLC films doped with different elements have been developed, but there are also certain problems. The deficiencies; such as doping metal elements will generally lead to an increase in the coefficient of friction of the DLC film, doping F will lead to a decrease in the thermal stability of the ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/30C23C16/02C23C16/56C23C14/35
Inventor 岳文王成彪付志强彭志坚于翔
Owner CHINA UNIV OF GEOSCIENCES (BEIJING)
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com