134 results about "Plasma energy" patented technology

Improved methods and apparatuses for removing residue from the interior surfaces of the deposition reactor are provided. The methods involve increasing availability of cleaning reagent radicals inside the deposition chamber by generating cleaning reagent radicals in a remote plasma generator and then further delivering in-situ plasma energy while the cleaning reagent mixture is introduced into the deposition chamber. Certain embodiments involve a multi-stage process including a stage in which the cleaning reagent mixture is introduced at a high pressure (e.g., about 0.6 Torr or more) and a stage the cleaning reagent mixture is introduced at a low pressure (e.g., about 0.6 Torr or less).

A conventional plasma applied ALD apparatus has a problem in that physical shock is directly imposed on a substrate and a thin film thereby damaging the thin film. Further, many reports have said that since an apparatus for controlling plasma energy is not arranged well, the thin film is not formed uniformly due to plasma nonuniformity. Therefore, there is provided a remote plasma atomic layer deposition apparatus using a DC bias comprising: a reaction chamber having an inner space; a substrate supporting body on which a substrate on which a thin film is to be formed is loaded arranged at one side of the inner space of the reaction chamber; a remote plasma generating unit arranged outside of the reaction chamber to supply a remote plasma into the inner space of the reaction chamber; a DC bias unit controlling energy of the remote plasma; and a source gas supply unit supplying a source gas for forming the thin film into the reaction chamber.

An inductively coupled plasma source is provided with a peripheral ionization source for producing a high-density plasma in a vacuum chamber for semiconductor wafer coating or etching. The source includes a segmented configuration having high and low radiation segments and produces a generally ring-shaped array of energy concentrations in the plasma around the periphery of the chamber. Energy is coupled from a segmented low inductance antenna through a dielectric window or array of windows and through a segmented shield or baffle. The antenna has concentrated conductor segments through which current flows in one or more small cross-section conductors to produce high magnetic fields that couple through the high-transparency shield segments into the chamber, while alternating distributed conductor segments, formed of large cross-section conductor portions or diverging small conductor sections, permit magnetic fields to pass through or between the conductors and deliver only weak fields, which are aligned with opaque shield sections and couple insignificant energy to the plasma. The source provides spatial control of plasma energy distribution, which aids in control of the uniformity of plasma processing across the surface of the semiconductor being processed.

A method of modifying surfaces of a device, for example, a medical device, is disclosed. The method includes modifying a surface of a device by providing a device, exposing the device to a reactive gas and plasma energy to create a plasma deposited surface on the device, and quenching the device with the reactive gas. The device exhibits changes in its surface properties thereby making it more desirable for an intended use.

A process for producing single-walled carbon nanotubes in a continuous manner includes carbon plasma generation, plasma stabilization, and product deposition. The plasma is generated by electrical resistance heating or electron beam vaporization of feedstock. The plasma is stabilized with radio frequency energy from inductance coils and with electrical resistance heaters in the reactor. Stabilization homogenizes the plasma energy density and concentration, leading to a more efficient reactor. Finally, a transition metal catalyst and associated catalyst support are used to form the end product. The formation region may have variations of geometry and supporting equipment that will affect the rate and purity of the swcnt production. The formation region is immediately downstream from the plasma stabilization region. In addition, the entire apparatus is designed so that it can be mounted vertically such that continuous deposition of product can be applied with precision using an overhead robotic arm.

The invention adopts a large-diameter main culvert coaxial counter-rotating dual-rotor or a fan body to bear the main hoisting force, wherein multiple small-diameter auxiliary culvert rotors or fans are horizontally and symmetrically arranged at the periphery of the dual-rotor or the fan body; connecting arms of the rotors or fans can stretch and contract, twist and swing to carry out four degree-of-freedom actions, bear the auxiliary hoisting force, carry out direction control and serve as vertex prevention rings; a main side spout and a plasma energy wave generator vertex prevention ring are arranged on a main culvert; and a variable inertia system is arranged on the main rotors to realize the ability of preventing turbulent flow from changing into twisting wind. The slurry and flood current overhead-hoisting rescue method is competent for the overhead-hoisting rescue mission and can be combined with the slurry and flood current overhead-hoisting rescue amphibious medical ambulance to constitute a special overhead-hoisting rescue amphibious vehicle. Slurry current propellers such as an extension-type swing conical-head spiral front wing long roller floating type or gyro helix front wing floating head type, a crushing roller front wing floating type and a herringbone one-sided jagged-grain hub telescopic front wing crushing roller tire boosters are arranged at the four corners of a machine frame of the amphibious medical ambulance, so that the amphibious medical ambulance has the capability of floating and driving in the slurry current, and the design method of the slurry flood current special rescue method and the amphibious medical ambulance is solved.

A sputter deposition system comprises a vacuum chamber including a vacuum pump for maintaining a vacuum in the vacuum chamber, a gas inlet for supplying process gases to the vacuum chamber, a sputter target and a substrate holder within the vacuum chamber, and a plasma source attached to the vacuum chamber and positioned remotely from the sputter target, the plasma source being configured to form a high density plasma beam extending into the vacuum chamber. The plasma source may include a rectangular cross-section source chamber, an electromagnet, and a radio frequency coil, wherein the rectangular cross-section source chamber and the radio frequency coil are configured to give the high density plasma beam an elongated ovate cross-section. Furthermore, the surface of the sputter target may be configured in a non-planar form to provide uniform plasma energy deposition into the target and / or uniform sputter deposition at the surface of a substrate on the substrate holder. The sputter deposition system may include a plasma spreading system for reshaping the high density plasma beam for complete and uniform coverage of the sputter target.

A lubricous coating composition and methods for using same are provided. Specifically, a composition suitable for providing hydrophobic polymer surfaces with lubricious coatings is described wherein a polyolefin surface is reiteratively treated with hydrophilic polymer solutions and cross-linking solutions. Methods for reiterative coating polymer surfaces are also provided including methods wherein the hydrophobic polymer surface is pretreated using plasma energy.

A plasma processing apparatus, comprising: a RF driving electrode (25) and a passive electrode (22) mounted face to face; a first grounded ring (23) surrounding the passive electrode (22) and insulated from it, a second grounded ring (26) surrounding the RF driving electrode (25) and insulated from it; the RF driving electrode (25) is connected with a first RF source (271) and a second RF source (272) respectively; a first impedance adjusting element is connected in series between the passive electrode (22) and the ground. The plasma processing apparatus overcomes a shortcoming that plasma energy can only be changed over among several certain isolated values, and thus technical processes with different plasma density requirements can be realized in one and the same reaction chamber.

A printing apparatus includes a plasma treatment unit that performs plasma treatment on a surface of a treatment object to acidify at least the surface of the treatment object, a recording unit that performs an inkjet recording process on the surface of the treatment object subjected to the plasma treatment by the plasma treatment unit, and a control unit that adjusts plasma energy for the plasma treatment according to a type of an ink used in the inkjet recording process.

Improved methods and apparatuses for removing residue from the interior surfaces of the deposition reactor are provided. The methods involve increasing availability of cleaning reagent radicals inside the deposition chamber by generating cleaning reagent radicals in a remote plasma generator and then further delivering in-situ plasma energy while the cleaning reagent mixture is introduced into the deposition chamber. Certain embodiments involve a multi-stage process including a stage in which the cleaning reagent mixture is introduced at a high pressure (e.g., about 0.6 Torr or more) and a stage the cleaning reagent mixture is introduced at a low pressure (e.g., about 0.6 Torr or less).

The invention discloses a quick heating method for graphene and a deep processing method based on the same. In the heating method, by means of infrared, microwave / lightwave, laser and plasma energy, graphene starts to be heated from the inside and rises to a high temperature within a short time; and meanwhile, by regulating the reaction atmosphere, the reaction on a graphene lamella is controlled so as to perform deep processing on the graphene, wherein the deep processing type comprises graphene purification, perforation or doping. Compared with a traditional tube furnace, the quick heating manner such as infrared, microwave, lightwave, laser, plasma and the like in the invention can greatly save energy and improve energy utilization efficiency.

Embodiments described herein provide methods and apparatus for forming graphitic carbon such as graphene on a substrate. The method includes providing a precursor comprising a linear conjugated hydrocarbon, depositing a hydrocarbon layer from the precursor on the substrate, and forming graphene from the hydrocarbon layer by applying energy to the substrate. The precursor may include template molecules such as polynuclear aromatics, and may be deposited on the substrate by spinning on, by spraying, by flowing, by dipping, or by condensing. The energy may be applied as radiant energy, thermal energy, or plasma energy.

The invention provides a preparation method of WC-Co series nano-composite hard alloy powder, which includes: installing the front cover plate and electrode rod of the ball mill tank, and connecting the front cover plate and electrode rod to the two poles of the plasma power supply respectively ; Put grinding balls and a certain proportion of W, C, Co raw materials in the ball milling tank, and when the electrode rod contacts the grinding balls and W, C, Co raw materials, cover the rear cover of the ball milling tank; pass the vacuum valve Vacuum the closed ball mill tank to 0.01-0.1Pa, or pass the discharge gas medium through the vacuum valve until the pressure is 0.01-0.1MPa; turn on the plasma power supply, according to the discharge gas medium and its pressure Adjust the discharge parameters and carry out different types of corona discharge plasma high-energy ball milling; take out the mixed powder of W, C, and Co, place it in a heat source environment for synthesis reaction, and obtain the corresponding cemented carbide. The invention can not only save energy, but also improve synthesis efficiency.

The present invention relates to a carbon nano tube array, its preparation method and application in preparation of optical frequency dipole antenna array. The invented carbon nano tube optical frequency dipole antenna array is characterized by that the carbon nano tubes are perpendicular to the substrate material and arranged, the length and diameter ratio of carbon nano tube of fibre is greater then 10. The method for making the carbon nano tube array is characterized by that it uses transition metal film catalyst to regulate its thickness, and utilizes plasma chemical gas phase deposition system to regulate plasma energy density and distribution, controls reaction time, gas pressure and gas flow speed ratio so as to implement large-area perpendicular growth of carbon nano tube or fibre array on various substrates at lower temperature and accurately control length and diameter of produced carbon nano tube or fibre.

A thin fluorocarbon layer is deposited onto the surface of a substrate through the application of a plasma enhanced chemical vapor deposition process, wherein the substrate is placed on a chuck within a reaction chamber and fluorocarbon gas is introduced into the reaction chamber under the influence of a first plasma source and a second plasma source. The fluorocarbon gas is a CxFy gas, wherein the ratio y / x is less than 2. The plasma source ionizes the fluorocarbon gas by applying RF plasma energy, and the second plasma source applies a self-bias to the substrate at an RF frequency. The ionized fluorocarbon is deposited onto and adheres to the substrate to form a thin film of fluorocarbon on the substrate.

The invention relates to a method for performing fly-lifting rescue in mountain ravine and an off-road ambulance. A large-diameter main duct coaxial positive and negative rotation dual rotor wing or a fan bears the main lifting force; a plurality of small-diameter duct rotor wings and fans are horizontally and symmetrically arranged at the periphery of the large-diameter main duct coaxial positive and negative rotation dual rotor wing or the fan; a connecting arm can do telescopic torsional swing to do four-degree-of-freedom action and bear the auxiliary lifting force, direction control and vortex ring prevention; a variable inertia system is arranged in a fly lifter system and has the capacity of resisting turbulence transition wind; a plasma energy wave generator with a vortex ring prevention function is provided; and a fly lifter preferably consisting of the five-axis five-duct six-rotor wing or a fan is provided with an energy transmission pulling cable and is combined with an ambulance with high land off-road capability to form a multi-functional fly-lifting rescue ambulance scheme. The off-road ambulance has the take-off capability under the atrocious weather, has the arm far longer than that of the conventional lifting vertical crane, can perform long-distance lifting rescue task and solves the world problem that the conventional ambulance is difficult to go up and down the escarpment to rescue people and things to be rescued when the accident occurs in the mountain ravine.

A plasma processing device includes a plasma processing unit that performs plasma processing on a predetermined area on a target recording medium at least two times; and a control unit that sets a plasma energy amount used by the plasma processing unit to perform a first plasma processing on the predetermined area of the target recording medium as a first energy amount and sets a plasma energy amount used by the plasma processing unit to perform a second plasma processing on the predetermined area as a second energy amount smaller than the first energy amount.

The invention discloses a novel low-temperature plasma operation device which comprises a high-frequency generator main machine generating two frequencies, and an operation knife handle connected with the high-frequency generator main machine and provided with an operation electrode. A generator generates the 400 k high frequency and the 1.09-mega radio frequency. The electrode is covered by a 40-50 nanometer insulating coating, a slot of 5-30 microns is manufactured on the insulating coating of a knife bit electrode with a special technology, and a conductive electrode is exposed of a narrow area at the tip end of the slot. A corresponding cutting control switch on the knife handle is operated, the high-frequency generator main machine outputs 1.09-mega radio frequency processing waveforms with corresponding energy to the electrode, the tip end of the slot of 5-30 microns of the knife bit electrode conducts radio-frequency discharge to act on water molecules in tissue to generate plasma, plasma energy is highly concentrated within a narrow range of 5-30 microns, and therefore tissue cutting is achieved. The energy is concentrated in the very small range of 5-30 microns, and heat damage cannot be caused on peripheral tissue beyond 30 microns, and therefore low-temperature cutting is achieved.

Provided is a power source and / or power converter. The power source includes a cell 910 for the catalysis of atomic hydrogen to form novel hydrogen species and / or compositions of matter comprisi ng new forms of hydrogen. The reaction can be initiated and / or maintained by a microwave or glow discharge plasma of hydrogen and a source of catalyst. The plasma power may be converted to electricity by a magnetohydrodynamic power converter 913 or a plasmadynamic power converter.

A system and method for analysis of minute quantities of contaminants in water. Liquid water is converted to water vapor and then excited into a plasma state with microwave radiation. Optical emissions from the plasma are spectrally analyzed to provide qualitative and / or quantitative analyses of the contaminants in the water. Preferred embodiments provide special techniques for generating the water vapor from a water stream; exciting the water vapor to a plasma state; varying and controlling the plasma energy; introducing samples into an existing plasma; collecting emissions from the plasma from a variety of angles; selecting the optical collection angles; protecting the analysis optics from the plasma; exhausting the spent plasma gases back into the water stream; and analyzing the results to yield concentrations of elements and molecules in the sample.

The invention discloses a preparation method for a self-assembly nano oxynitride coating. A traditional PVD technology is adopted to prepare the self-assembly nano oxynitride coating; retention time, in different plasma regions, of a sample is changed by regulating autorotation and revolution speed of the sample according to a phenomenon that plasma energy and energy distribution within different distance ranges of a target is different, so that the self-assembly nano oxynitride coating is prepared. The coating comprises an oxygen-rich layer and a nitrogen-rich layer, wherein the oxygen-rich layer and the nitrogen-rich layer are alternatively deposited on a base body; and the coating comprises the following components: 20-35at.% of Al, 10-25at.% of Cr, 0-15at.% of Si, 5-50at.% of O and 10-50 at.% of N. The preparation method is simple in preparation process, is low in cost, is good in adaptation, integrates the advantages of a nitride coating and an oxide coating, and has great application and popularization potential.

A printing apparatus includes: a plasma processing unit that performs plasma processing on a processing target surface side of a processing object; a recording unit that ejects ink on the processing target surface side of the processing object; an acquiring unit that acquires setting information, in which an adjustment target area for adjusting surface roughness and surface roughness of the adjustment target area on a surface of an ink layer formed with the ink are set; and a plasma control unit that controls the plasma processing unit to perform plasma processing on a processing area corresponding to the adjustment target area, on the processing target surface side of the processing object, with an amount of plasma energy for obtaining the set surface roughness on the surface of the ink layer formed on the processing area.

The ignition device is comprised of a center electrode, an insulator having a tubular shape for covering the center electrode, and a ground electrode having an open portion communicating with an open portion of the insulator, the ground electrode covers the insulator The center electrode, the insulator and the ground electrode define a discharge space of the ignition device. The discharge space is provided with high voltage from a discharge power source and high current from a plasma energy supply power source to form plasma having high temperature and high pressure in the discharge space.

The invention relates to oil sand control screen complex sealing. The sheet tool electrode and the oil pipe connect with the positive and negative side of the controllable plasma, using discharged micro fine plasma high temperature etching for machining. Through the controlling of plasma energy and strength and frequency of the oscillating electromagnetic field, allowing the energy changing based on the preset rules, two sides of the plasma post generating regular reciprocating oscillation to realize the sealing machining. It can cut complex seal with outside narrow and inside wide one, featuring in high machining precision and low in cost.

A printing apparatus includes an acidification treatment unit that acidifies at least a surface of a treatment object by irradiating the treatment object with plasma; an inkjet recording unit that records to the treatment object having been acidified by the acidification pretreatment unit in an inkjet recording system; and a control unit that specifies an ink to be used by the inkjet recording unit from at least two types of inks having different properties, based on the type of the treatment object and an amount of plasma energy used in a plasma treatment performed by the acidification treatment unit or based on a pH value of the surface of the treatment object.

The invention provides the structural design of a water cooling module used for cooling the divertor target board structure in a magnetic confinement nuclear fusion device. The fusion device divertorwater cooling module structure is composed of a plasma facing structure, a stress buffer layer structure welded in the plasma facing structure and a heat sink pipeline structure welded in the buffer layer structure. In the cooling structure, the coolant flows through the heat sink structure to bring away the high energy of the fusion reaction to the divertor part. The plasma facing structure is ahexahedron structure of which one surface protrudes to the fusion center direction with the heat sink pipeline and the stress buffer layer structure penetrating in the center position. The protrusionsurface structure directly bears the heat flow from the fusion center. The protrusion arc surface is coaxial with the annular stress buffer layer structure and the heat sink structure. The heat exchange capacity of the divertor can be directly enhanced from the aspect of structural design. The plasma energy flow can be more effectively dispersed by the design and the compatibility of the coolant pipeline and the plasma facing surface structure can be improved so as to enhance the heat exchange capacity.

The present invention relates to methods of modifying the chemical structure of a surface by covalently attaching molecules containing desired functional groups on the surface using plasma energy. In these methods, chemical compounds containing the desired functional groups and having a vapor pressure lower than 0.001 bar are exposed in the plasma chamber together with the substrate. Surface area of the chemical compound is optimized to generate adequate evaporation rate. The modification of the substrate surface is achieved in a plasma state generated from the vapor of the chemical compounds; while the evaporation of the chemical compounds is accelerated by the plasma energy. Methods for producing non-fouling surface by covalently attaching ethylene glycol oligomers on the surface are disclosed.