28 results about "Plasma energy" patented technology

The invention provides a diagnosis method and system for plasma energy storage in a quasi-ring symmetric star simulator, and relates to the technical field of star simulators, and the method comprises the steps: adjusting a temperature drift resistor of a diamagnetic differential integrator, executing a quasi-ring symmetric configuration vacuum field magnet coil power-on test according to a general discharge waveform, and completing the calibration of the diamagnetic differential integrator; respectively measuring and calculating the compensation coefficient of each magnet coil; carrying out a power-on experiment with the same coil configuration parameters in the plasma discharge experiment of the quasi-ring symmetric star simulator test device under a vacuum condition to obtain wall eddy current stray field data under a corresponding condition; the real diamagnetic flux in the plasma discharge experiment is calculated by combining the magnet coil compensation coefficient and the wall eddy stray field data; and real plasma energy storage information in plasma discharge is obtained through calculation. The device has the beneficial effects that the measurement precision of the plasma energy storage signal in the star simulator device is improved, and experimental data support is provided for the physical research of the plasma of the star simulator.

The invention discloses an improved cathode target external notch anode cap of a magnetron sputtering device based on conventional column target discharge and a use method. The method belongs to the field of surface treatment. The problem that effective adjustment of plasma energy is limited due to the fact that the target-substrate distance is small and an anode cannot be inserted in an existing method is solved. The anode cover is arranged outside the columnar cathode target material, and the columnar cathode target material, the anode cover and the slender pipe barrel part are coaxially arranged and can axially rotate. The whole circumference of the discharge surface is fixed to be a partially cylindrical plane with an axial section, meanwhile, the periphery of the columnar target is coated with the anode cover, the anode cover is a circular tube with an axial notch in the side face, the end face is arc-shaped, and the single side is open, so that the discharge distance from the target surface to the anode cover is increased, the discharge difficulty of the built-in columnar target is reduced, and the discharge efficiency of the built-in columnar target is improved. Plasma energy can be effectively regulated and controlled by an electric field; synchronous cleaning of the target surface and the inner wall of the slender pipe barrel part is achieved, and uniform and efficient coating deposition of the inner wall is achieved by rotating the slender pipe barrel part at a constant speed.

The invention provides a preparation method of a graphene aerogel composite electrode material for an energy storage capacitor. The preparation method comprises the following steps: preparing a graphene composite material; and putting the graphene composite material into a coaxial DBD reactor for treatment. Freeze-drying the wet gel, and reserving a pore structure to obtain the GA block material. GA is soaked in a manganous nitrate solution, and a metal oxide nanosheet grows in situ through a hydrothermal method. And cutting the GA block into sheets, directly pressing and attaching the sheets to a foamed nickel current collector, carrying out vacuum drying, and preparing an electrode plate by using a hydraulic machine. According to the method, rapid reduction, precise structure regulation and control and functional compounding of the graphene aerogel are realized, reduction of GO, three-dimensional crosslinking and in-situ loading of a functional material are synchronously completed under a vacuum condition by optimizing plasma energy input and a gas environment, pollution of a chemical reducing agent and energy consumption of high-temperature treatment are avoided, and the method is suitable for large-scale industrial production. And the porosity, the conductivity and the interface bonding strength of the GA can be accurately regulated and controlled.

Methods and apparatuses for depositing thin films using long and short conversion times during alternating cycles of atomic layer deposition (ALD) are provided herein. Embodiments involve alternating conversion duration of an ALD cycle in one or more cycles of a multi-cycle ALD process. Some embodiments involve modulation of dose, purge, pressure, plasma power or plasma energy in two or more ALD cycles.

A Plasma Enhanced Anneal (PEA) includes a exposing a top surface region of a substrate to a plasma to reduce the required activation energy temperature to anneal dopants for microelectronic devices. The plasma in a PEA process bombards surfaces with ions and atoms created in the plasma which allows controllable kinetic energy and ion flux to be transferred to the top surface region of the substrate and activate dopants at temperatures as low as 300° C. The plasma energy of the ions is known to dissipate into a region only a few nanometers in depth with energy densities large enough to activate dopants. PEA processing may be a promising method for dopant activation at temperatures lower than thermal techniques alone. PEA processing may also result in reduced thermal budget necessary for form silicides, anneal silicides, and anneal high-k dielectric materials.

The application provides a kind of quasi-ring symmetry stellator plasma energy storage diagnostic method and system, it is related to stellator technical field, including adjusting the temperature drift resistance of inverse magnetic differential integrator, according to general discharge waveform, the energization test of quasi-ring symmetry configuration vacuum field magnet coil is carried out, and then the calibration of inverse magnetic differential integrator is completed;Respectively measure and calculate the compensation coefficient of each magnet coil;In the vacuum condition, the same coil configuration parameter is carried out in the plasma discharge experiment of quasi-ring symmetry stellator test device, and the wall eddy current stray field data under corresponding condition is obtained;Combined with the compensation coefficient of magnet coil and wall eddy current stray field data, the real inverse magnetic flux in plasma discharge experiment is calculated;And then the real plasma energy storage information in plasma discharge is calculated.The beneficial effects of the application are to improve the measurement accuracy of plasma energy storage signal in stellator device, and to provide experimental data support for stellator plasma physics research.

The invention discloses a plasma excitation and maintenance device based on alpha decay ray auxiliary ionization, and belongs to the technical field of plasmas, the plasma excitation and maintenance device comprises a plasma excitation tube, a plasma excitation coil and a plasma detection device, one end of the plasma excitation tube is connected with working gas, the other end of the plasma excitation tube is open, and the open end is a plasma energy injection end; a radioactive substance is embedded in the inner wall of the plasma excitation tube or the air inlet end of the plasma excitation tube, the radioactive substance is one or a combination of more of americium, plutonium and radium, the radiation intensity of the radioactive substance is 0.1-2000 / mu Ci, the open end of the plasma excitation tube is a gradually-shrunk nozzle, and the diameter of the gradually-shrunk nozzle is 10-20 micrometers. And gas in the plasma excitation tube is ionized by utilizing high-energy rays generated by decay, so that the functions of auxiliary excitation and plasma maintenance are achieved.

A miniature light-emitting pixel unit and its formation method, a miniature light-emitting diode chip, and a micro-display panel are disclosed. The pixel unit includes: a first epitaxial layer and a multi-quantum-well layer; a second epitaxial layer, with the multi-quantum-well layer located between the first and second epitaxial layers; an ohmic contact layer in contact with the first epitaxial layer; and a metal reflective layer in contact with the ohmic contact layer. The metal reflective layer has several protrusions extending into the ohmic contact layer. Extending the protrusions of the metal reflective layer into the ohmic contact layer reduces the distance between the metal reflective layer and the multi-quantum-well layer, allowing plasma energy excited by the metal reflective layer to penetrate the ohmic contact layer and the first epitaxial layer, thereby enabling efficient coupling between the plasma energy excited by the metal reflective layer and the light emitted by the multi-quantum-well layer. By providing multiple protrusions, the surface area of ​​the metal reflective layer can be effectively increased, thereby improving its reflectivity.

The invention discloses a surface treatment process of a dry pump rotor, and relates to the field of surface treatment. Comprising the steps that pretreatment is conducted, the dry pump rotor is put into a cleaning agent to be soaked for 10-20 minutes, then the dry pump rotor is washed clean with deionized water, moisture on the surface is blown dry with a blower, coating treatment is conducted, and DLC film modification treatment is conducted on the pretreated dry pump rotor. When the microwave ECR plasma source is used for material processing, plasma is free of pollution, deposition purity can be increased, the energy conversion rate is high, more than 95% of microwave power can be converted into plasma energy, so that the energy utilization rate is high, high-purity reaction substances, especially reaction substances with high chemical activity, can be obtained at a high speed, and the method is suitable for industrial production. The damage of high-energy ions to the surface of a deposition substance or a matrix is reduced, the energy of particles participating in the reaction can be controlled, and a high-energy metastable phase structure which is difficult to obtain by other methods is obtained, so that the deposition quality can be improved, and the surface modification performance of the rotor is improved.

A system includes a first electrode, a second electrode, a third electrode, and a switch. The switch is electrically connected to the first electrode, the second electrode, and the third electrode. The first electrode, the second electrode, and the third electrode are electrically isolated when the switch is in an open configuration. The first electrode and the second electrode are electrically connected when the switch is in a closed configuration.

The invention provides methods and apparatus for depositing thin films using long and short switch times during alternating cycles of atomic layer deposition (ALD). Embodiments involve alternating the switch duration of ALD cycles in one or more cycles of a multi-cycle ALD process. Some embodiments involve adjustments in dosing, purging, pressure, plasma power, or plasma energy in two or more ALD cycles.

The present invention relates to the technical field of high entropy alloys, and discloses a method for preparing high melting point difference alloy powder for 3D printing, comprising the following steps: Step 1, powder metallurgy semi-alloying: alloying single elements with lower mixing enthalpy by hot pressing sintering or hot isostatic pressing sintering; Step 2, plasma complete alloying: secondary alloying of the alloyed elements with single elements with higher melting points by plasma rotating electrode atomization. This technical solution solves the problem of high melting point difference, and the low melting point elements and the adjacent higher melting point elements are partially alloyed in situ by powder metallurgy to form an "intermediate alloy". During the plasma rotating electrode atomization process, the intermediate alloy in the rod material is alloyed with the adjacent higher melting point elements under the action of plasma energy, thereby avoiding the low melting point elements from burning or evaporating due to excessive temperature or energy, and achieving a uniform structure of the refractory high entropy alloy powder and controllable composition.

The invention discloses a plasma ignition device and an operation method and system, and belongs to the technical field of thermal power generation. The operation method comprises the steps that the DCS controller collects state information of the plasma generator, the plasma combustor, the isolation transformer, the rectifier cabinet and the cooling water system; according to the collected state information, whether the cooling water system and the rectifier cabinet operate normally or not is judged, if the judgment result is normal, analysis is conducted according to the monitoring result of the flame monitoring system, feature extraction is conducted according to the analysis result, and the state of the plasma generator is predicted according to the feature extraction result; if it is predicted that the plasma energy generator can be used, the combustion stability of the plasma combustor is judged; and according to the combustion stability of the plasma combustor, whether the plasma combustor operates or not is determined. According to the method, the operation complexity is greatly simplified, the possibility of insufficient ignition stable combustion capacity or ignition failure is reduced, and the equipment safety is guaranteed.

The invention discloses a light, heat and cold plasma concerted catalytic reaction device which comprises a gas treatment unit, a cold plasma generation unit, a reaction unit and a control unit, and the gas treatment unit is responsible for gas pretreatment and product separation; the cold plasma generation unit generates dielectric barrier discharge plasma to activate reactants; the reaction unit integrates plasma generation, wide-range temperature control and illumination structures, and can be compatible with flat plate type and tubular reactors suitable for different temperature zones (300-800 DEG C); the control unit performs centralized programming through upper computer software and accurately regulates and controls gas flow, temperature, plasma parameters and illumination conditions, and the device can flexibly combine light, heat and cold plasma energy fields, supports multiple reaction modes such as segmented pre-activation and integrated cooperation, and is suitable for large-scale industrial production. The problems that existing equipment is single in function, limited in working temperature interval and low in intelligent degree are solved, and a standardized platform is provided for multi-field coupling catalysis research.

The invention discloses a metallized film evaporation system based on plasma heating and a method thereof. The metallized film evaporation system comprises a vacuum chamber; the plasma generating module is arranged in the vacuum chamber, the plasma generating module is provided with an ion generator, the plasma generating module can ionize working gas to generate plasma in the modes of radio frequency, direct current discharge or microwaves and the like, and the power, density and distribution state of the plasma can be adjusted; and the metal raw material supply module is connected with the vacuum chamber and provides metal raw materials to be evaporated into the vacuum chamber. The metal raw materials are heated through plasmas generated by the plasma generation module, and compared with traditional heating modes such as resistance heating and electron beam heating, plasma energy is more concentrated and controllable. And the magnetic field adjusting assembly is matched to restrain and guide the motion trail of the plasmas, so that the plasmas can act on the metal raw materials more accurately, the heating efficiency is greatly improved, the evaporation rate of the metal raw materials is increased, the evaporation period is shortened, and the production efficiency is improved.

According to the high-frequency high-voltage low-temperature plasma energy platform, an electrode and a tool bit are connected through a control panel, digital frequency and waveform are directly synthesized through the control panel, core modules of the control panel are a field-programmable gate array and a digital-to-analog converter, and frequency adjustment can be achieved. When the control panel is in a no-load and on-load working state, the cutting performance of the tool bit is good, and the electric energy output fluctuation is small. The power supply device comprises a mains supply access device and a power regulator, the ratio of the effective value of the total harmonic current to the effective value of the fundamental current of the input current is suppressed, the adverse effect on a power grid is reduced, and post-stage stable voltage is obtained and is made to be 400 V. And the isolator is electrically connected with the power regulator, so that the switching frequency is improved, and the ripple of the direct-current voltage is further reduced. And the low-frequency voltage stabilizer provides envelope direct-current voltage for the post-stage inverter circuit. The damping selector connects damping of different magnitudes in series to the post-stage inverter circuit, and provides different impedance channels for final output waveform attenuation.

A control device for a frequency generator of an ion thruster is described. The control device permits the detection of zero-crossings in a current and / or voltage characteristic during specific time intervals only, which detection is inhibited during other time intervals. Any incorrect switching performance of the control device associated with erroneously detected zero-crossings is prevented accordingly. A low-pass filter filters harmonics out of the detected current and / or voltage characteristics. A time-delay element offsets stray delays in the detection of zero-crossings. Additionally, plasma energy protective apparatuses are described, which attenuate the impact of any power flashover from a thruster unit to a power supply unit of an ion thruster.

The invention relates to the technical field of quartz sand treatment, and discloses a device for removing gas-liquid inclusion in high-purity quartz sand, the device comprises a shell, and an inert gas input pipe, an inert gas output pipe, a vacuum pipe and a plasma generator which are arranged on the outer side, a material conveying pipe is vertically inserted in the shell, and a material guide pipe is rotatably arranged at the bottom of the material conveying pipe; a discharging pipe is rotationally arranged at the tail end of the material guiding pipe. The discharging pipe is guided by the vortex-shaped linear guide rail to move in the radial direction, meanwhile, the distance change between the conical through hole and the adjusting plate is linked, a differentiated discharging mode of less discharging on the inner side and more discharging on the outer side is formed, and the design accurately adapts to the speed difference of the inner side and the outer side when the rotating mechanism operates; the problems that materials on the inner side are accumulated excessively and materials on the outer side are insufficient due to traditional uniform discharging are solved from the source, and through the synergistic effect of a mechanical structure, it is ensured that quartz sand forms a material layer with the uniform thickness in a treatment area, so that the materials at each position can fully receive the plasma energy effect, and gas-liquid inclusions are evenly broken.

The application relates to the technical field of plasma equipment, in particular to a system for enhancing plasma spectrum intensity and repeatability and a use method thereof, and aims to solve the problem of low energy of plasma formed on a sample surface, which leads to low plasma spectrum intensity and repeatability. The system comprises a shell with a containing cavity, a laser, a spectrum detector, an image collector and a plasma energy increaser, the shell has multiple different shell walls, the shell walls are provided with through holes communicating between the outside and the containing cavity, the laser, the image collector and the spectrum detector are respectively arranged at the through holes of the different shell walls, and are respectively used for generating plasma on a sample surface, collecting images of the plasma and detecting spectra of the plasma, and the plasma energy increaser arranged on the shell can increase the energy of the plasma, thereby enhancing the spectrum intensity and repeatability of the plasma.

Plasma energy equipment is used to solve the problem of exhaust gas emissions inside conventional processing facilities. [Solution] The furnace body includes a heating module and a gas induction device, the furnace body having an internal processing space and a gas collection passage, the heating module being installed in the furnace body, and the gas induction device being installed in the internal processing space, further including a first tube and a second tube, each having a hollow space inside and a plurality of first through holes and a plurality of second through holes, the first tube being fitted into the second tube, and gas being able to flow from the internal processing space through the plurality of first through holes, the plurality of second through holes, the space inside the first tube and the space inside the second tube, and further to the gas collection passage. This allows exhaust gas from inside the furnace body to be effectively discharged.

The invention discloses a broad-spectrum mass spectrum ionization source based on low-voltage glow discharge. The broad-spectrum mass spectrum ionization source comprises a sample introduction module, a low-voltage glow discharge adjustable module and an energy regulation and ionization module. Wherein the sample injection module is provided with a heating control assembly, and samples in different forms are controllably vaporized; the low-voltage glow discharge adjustable module comprises a high-voltage electrode and a low-voltage electrode and realizes continuous and accurate regulation and control of plasma energy; the energy regulation and ionization module comprises an energy regulation and control area formed by utilizing controllable direct-current voltage difference between a low-voltage electrode and a downstream ion funnel, kinetic energy and internal energy of ions can be regulated and controlled by regulating voltage, and continuous switching of collision induced ionization in the ion funnel between a soft ionization mode and a hard ionization mode is achieved. And the quasi-molecular ion peak is rapidly and accurately measured, so that the reliability of qualitative analysis is remarkably improved. The invention provides an effective technical solution for high-flux and high-coverage mass spectrometry of small molecular substances in a complex matrix.

The present invention provides a gas-liquid dispersed discharge plasma water treatment device and treatment method. A gas cylinder with a gas valve, a mass flow controller, and an air inlet pipe are sequentially connected via a pipeline. A hollow high-pressure needle-tube electrode is inserted into a conical dielectric tube. The upper end of the hollow high-pressure needle-tube electrode is connected to a high-voltage power supply, and the top end is connected to the air inlet pipe. The bottom end of the conical dielectric tube is inserted into the waste liquid in the water storage tank. The branch pipe of the conical dielectric tube is connected to an air guide pipe for recovering the discharge exhaust gas into the waste liquid in the water storage tank. The water storage tank is placed on a horizontally placed steel plate ground electrode. One end of a circulating pump is connected to the water outlet of the water storage tank, and the other end is connected to the water inlet of the water storage tank. The present invention uses a gas-liquid discharge excited by a high-voltage power supply, avoiding the occurrence of thermal instability and facilitating the maintenance of discharge stability. At the same time, a conical dielectric tube is used to shield the discharge space, which further concentrates the plasma energy, shields the air, improves the discharge uniformity and stability, and facilitates the mass transfer of gas-phase active species to the liquid surface.

The invention discloses a compatible plasma cleaning cavity and plasma processing equipment, the plasma cleaning cavity comprises a cavity body formed by sequentially connecting a sample cavity, a plasma generation cavity and a gas inlet cavity, and a gas uniformizing device is arranged between the gas inlet cavity and the plasma generation cavity; the gas uniformizing device comprises a lower gas uniformizing vessel, an outer shade ring and an inner shade ring which are sequentially and coaxially arranged from bottom to top, a plurality of gas uniformizing areas are formed in a top plate of the lower gas uniformizing vessel in the radial direction, and opening or closing of the gas uniformizing areas is adjusted by adjusting the positions of the outer shade ring and the inner shade ring. And adjusting the position of the process gas entering the plasma generation cavity and the partition flow. The gas uniformizing device is arranged between the gas inlet cavity and the plasma generating cavity, process gas enters the plasma generating cavity after being subjected to two-section gas uniformizing, gas rarefaction positions are different, plasma energy density distribution is different, the plasma uniformizing device is suitable for to-be-cleaned workpieces of different sizes, and energy waste is avoided.

The application relates to the technical field of quartz sand treatment, and discloses a device for removing gas-liquid inclusions in high-purity quartz sand, which comprises a shell and inert gas input pipes, inert gas output pipes, vacuum pipes and plasma generators arranged on the outside, a feed pipe is vertically inserted into the shell, a guide pipe is rotatably arranged at the bottom of the feed pipe, and a discharging pipe is rotatably arranged at the tail end of the guide pipe. The vortex-shaped linear guide rail guides the radial movement of the discharging pipe, and the spacing change between the linkage conical through hole and the adjusting plate forms a differential discharging mode of less discharging on the inside and more discharging on the outside. This design precisely adapts to the speed difference between the inside and the outside during the operation of the rotating mechanism, avoids the problems of excessive accumulation of the inside material and insufficient amount of the outside material caused by the traditional uniform discharging from the source, and through the synergistic effect of the mechanical structure, ensures that the quartz sand forms a material layer with uniform thickness in the treatment area, so that each material can fully accept the plasma energy effect, and the gas-liquid inclusions can be uniformly broken.

The utility model belongs to the technical field of beauty instruments, and provides a plasma beauty instrument handle which comprises a handle shell and four replaceable treatment heads, the handle shell comprises a handle lower shell and a handle upper shell, and the handle lower shell and the handle upper shell can be spliced together to form the complete handle shell; a plasma energy generator is arranged in the middle of an inner cavity of the handle shell, and the front side and the rear side of the plasma energy generator are electrically connected with a control line and a wire correspondingly. The plasma energy generator is connected with a host through a control line; a connecting piece is installed at the front end of the wire and installed at the front end of an inner cavity of the handle shell. A treatment head is inserted into the front end of the handle shell and comprises four replaceable shapes of an operation head A, an operation head B, an operation head C and an operation head D; the four replaceable treatment heads with different functions can achieve different functions of deep cleaning, skin repairing, acne nursing, spot eliminating, antisepsis and anti-inflammation, anti-aging and the like, and the diversified requirements of users are met.

A system includes a first electrode, a second electrode, a third electrode, and a switch. The switch is electrically connected to the first electrode, the second electrode, and the third electrode. The first electrode, the second electrode, and the third electrode are electrically isolated when the switch is in an open configuration. The first electrode and the second electrode are electrically connected when the switch is in a closed configuration.

The present invention provides a method, device, and system for real-time characterization of space plasma, relating to the field of aerospace technology. The method for real-time characterization of space plasma described in the present invention includes: initializing parameters; determining real-time position data and real-time velocity data of a spacecraft based on orbital parameters, and determining real-time space attitude data of the spacecraft based on attitude parameters; determining temperature and density parameters of the plasma environment based on the real-time position data, determining the plasma energy spectrum through Maxwell plasma energy distribution, and determining real-time space plasma environment data based on the temperature parameters, density parameters, and plasma energy spectrum; and determining real-time characterization simulation data based on the real-time position data, real-time velocity data, real-time space attitude data, and real-time space plasma environment data. The technical solution described in the present invention accurately describes the effects of space plasma on spacecraft, thereby improving spacecraft flight safety.

The invention discloses double-pulse confinement ion flow size screening equipment, which relates to the field of atomic-scale manufacturing and comprises a cathode, a filtering pipeline, a vacuum chamber, a parallel plate electrode, a coil, an electron suppression electrode, an energy adjusting electrode, a capillary tube bundle and a deposition target disc. And the parallel plate electrodes are arranged on the two sides of the electron suppression electrode and the energy regulation electrode. The coils are arranged on the two sides of the electron suppression electrode and the energy adjusting electrode. The cathode is used for generating plasma. The filtering pipeline is used for filtering plasma. The parallel plate electrode is used for generating an electric field. The coil is used for generating deflection magnetic fields. The electron suppression electrode is used for combining an electric field and a deflection magnetic field to adjust the filtered plasma to obtain single particles. The single particles are transmitted to the energy adjusting electrode through the capillary tube bundle. The energy adjusting electrode is used for adjusting the energy of the single particle by combining the electric field and the deflection magnetic field to obtain single-energy ions. The deposition target disc is used for depositing single-energy ions. According to the invention, accurate adjustment of plasma energy can be realized.