13 results about "Plasma energy" patented technology

A Plasma Enhanced Anneal (PEA) includes a exposing a top surface region of a substrate to a plasma to reduce the required activation energy temperature to anneal dopants for microelectronic devices. The plasma in a PEA process bombards surfaces with ions and atoms created in the plasma which allows controllable kinetic energy and ion flux to be transferred to the top surface region of the substrate and activate dopants at temperatures as low as 300° C. The plasma energy of the ions is known to dissipate into a region only a few nanometers in depth with energy densities large enough to activate dopants. PEA processing may be a promising method for dopant activation at temperatures lower than thermal techniques alone. PEA processing may also result in reduced thermal budget necessary for form silicides, anneal silicides, and anneal high-k dielectric materials.

The application provides a kind of quasi-ring symmetry stellator plasma energy storage diagnostic method and system, it is related to stellator technical field, including adjusting the temperature drift resistance of inverse magnetic differential integrator, according to general discharge waveform, the energization test of quasi-ring symmetry configuration vacuum field magnet coil is carried out, and then the calibration of inverse magnetic differential integrator is completed;Respectively measure and calculate the compensation coefficient of each magnet coil;In the vacuum condition, the same coil configuration parameter is carried out in the plasma discharge experiment of quasi-ring symmetry stellator test device, and the wall eddy current stray field data under corresponding condition is obtained;Combined with the compensation coefficient of magnet coil and wall eddy current stray field data, the real inverse magnetic flux in plasma discharge experiment is calculated;And then the real plasma energy storage information in plasma discharge is calculated.The beneficial effects of the application are to improve the measurement accuracy of plasma energy storage signal in stellator device, and to provide experimental data support for stellator plasma physics research.

A miniature light-emitting pixel unit and its formation method, a miniature light-emitting diode chip, and a micro-display panel are disclosed. The pixel unit includes: a first epitaxial layer and a multi-quantum-well layer; a second epitaxial layer, with the multi-quantum-well layer located between the first and second epitaxial layers; an ohmic contact layer in contact with the first epitaxial layer; and a metal reflective layer in contact with the ohmic contact layer. The metal reflective layer has several protrusions extending into the ohmic contact layer. Extending the protrusions of the metal reflective layer into the ohmic contact layer reduces the distance between the metal reflective layer and the multi-quantum-well layer, allowing plasma energy excited by the metal reflective layer to penetrate the ohmic contact layer and the first epitaxial layer, thereby enabling efficient coupling between the plasma energy excited by the metal reflective layer and the light emitted by the multi-quantum-well layer. By providing multiple protrusions, the surface area of ​​the metal reflective layer can be effectively increased, thereby improving its reflectivity.

A system includes a first electrode, a second electrode, a third electrode, and a switch. The switch is electrically connected to the first electrode, the second electrode, and the third electrode. The first electrode, the second electrode, and the third electrode are electrically isolated when the switch is in an open configuration. The first electrode and the second electrode are electrically connected when the switch is in a closed configuration.

The invention discloses a plasma ignition device and an operation method and system, and belongs to the technical field of thermal power generation. The operation method comprises the steps that the DCS controller collects state information of the plasma generator, the plasma combustor, the isolation transformer, the rectifier cabinet and the cooling water system; according to the collected state information, whether the cooling water system and the rectifier cabinet operate normally or not is judged, if the judgment result is normal, analysis is conducted according to the monitoring result of the flame monitoring system, feature extraction is conducted according to the analysis result, and the state of the plasma generator is predicted according to the feature extraction result; if it is predicted that the plasma energy generator can be used, the combustion stability of the plasma combustor is judged; and according to the combustion stability of the plasma combustor, whether the plasma combustor operates or not is determined. According to the method, the operation complexity is greatly simplified, the possibility of insufficient ignition stable combustion capacity or ignition failure is reduced, and the equipment safety is guaranteed.

The invention discloses a light, heat and cold plasma concerted catalytic reaction device which comprises a gas treatment unit, a cold plasma generation unit, a reaction unit and a control unit, and the gas treatment unit is responsible for gas pretreatment and product separation; the cold plasma generation unit generates dielectric barrier discharge plasma to activate reactants; the reaction unit integrates plasma generation, wide-range temperature control and illumination structures, and can be compatible with flat plate type and tubular reactors suitable for different temperature zones (300-800 DEG C); the control unit performs centralized programming through upper computer software and accurately regulates and controls gas flow, temperature, plasma parameters and illumination conditions, and the device can flexibly combine light, heat and cold plasma energy fields, supports multiple reaction modes such as segmented pre-activation and integrated cooperation, and is suitable for large-scale industrial production. The problems that existing equipment is single in function, limited in working temperature interval and low in intelligent degree are solved, and a standardized platform is provided for multi-field coupling catalysis research.

The invention relates to the technical field of quartz sand treatment, and discloses a device for removing gas-liquid inclusion in high-purity quartz sand, the device comprises a shell, and an inert gas input pipe, an inert gas output pipe, a vacuum pipe and a plasma generator which are arranged on the outer side, a material conveying pipe is vertically inserted in the shell, and a material guide pipe is rotatably arranged at the bottom of the material conveying pipe; a discharging pipe is rotationally arranged at the tail end of the material guiding pipe. The discharging pipe is guided by the vortex-shaped linear guide rail to move in the radial direction, meanwhile, the distance change between the conical through hole and the adjusting plate is linked, a differentiated discharging mode of less discharging on the inner side and more discharging on the outer side is formed, and the design accurately adapts to the speed difference of the inner side and the outer side when the rotating mechanism operates; the problems that materials on the inner side are accumulated excessively and materials on the outer side are insufficient due to traditional uniform discharging are solved from the source, and through the synergistic effect of a mechanical structure, it is ensured that quartz sand forms a material layer with the uniform thickness in a treatment area, so that the materials at each position can fully receive the plasma energy effect, and gas-liquid inclusions are evenly broken.

Plasma energy equipment is used to solve the problem of exhaust gas emissions inside conventional processing facilities. [Solution] The furnace body includes a heating module and a gas induction device, the furnace body having an internal processing space and a gas collection passage, the heating module being installed in the furnace body, and the gas induction device being installed in the internal processing space, further including a first tube and a second tube, each having a hollow space inside and a plurality of first through holes and a plurality of second through holes, the first tube being fitted into the second tube, and gas being able to flow from the internal processing space through the plurality of first through holes, the plurality of second through holes, the space inside the first tube and the space inside the second tube, and further to the gas collection passage. This allows exhaust gas from inside the furnace body to be effectively discharged.

The invention discloses a broad-spectrum mass spectrum ionization source based on low-voltage glow discharge. The broad-spectrum mass spectrum ionization source comprises a sample introduction module, a low-voltage glow discharge adjustable module and an energy regulation and ionization module. Wherein the sample injection module is provided with a heating control assembly, and samples in different forms are controllably vaporized; the low-voltage glow discharge adjustable module comprises a high-voltage electrode and a low-voltage electrode and realizes continuous and accurate regulation and control of plasma energy; the energy regulation and ionization module comprises an energy regulation and control area formed by utilizing controllable direct-current voltage difference between a low-voltage electrode and a downstream ion funnel, kinetic energy and internal energy of ions can be regulated and controlled by regulating voltage, and continuous switching of collision induced ionization in the ion funnel between a soft ionization mode and a hard ionization mode is achieved. And the quasi-molecular ion peak is rapidly and accurately measured, so that the reliability of qualitative analysis is remarkably improved. The invention provides an effective technical solution for high-flux and high-coverage mass spectrometry of small molecular substances in a complex matrix.

The invention discloses a compatible plasma cleaning cavity and plasma processing equipment, the plasma cleaning cavity comprises a cavity body formed by sequentially connecting a sample cavity, a plasma generation cavity and a gas inlet cavity, and a gas uniformizing device is arranged between the gas inlet cavity and the plasma generation cavity; the gas uniformizing device comprises a lower gas uniformizing vessel, an outer shade ring and an inner shade ring which are sequentially and coaxially arranged from bottom to top, a plurality of gas uniformizing areas are formed in a top plate of the lower gas uniformizing vessel in the radial direction, and opening or closing of the gas uniformizing areas is adjusted by adjusting the positions of the outer shade ring and the inner shade ring. And adjusting the position of the process gas entering the plasma generation cavity and the partition flow. The gas uniformizing device is arranged between the gas inlet cavity and the plasma generating cavity, process gas enters the plasma generating cavity after being subjected to two-section gas uniformizing, gas rarefaction positions are different, plasma energy density distribution is different, the plasma uniformizing device is suitable for to-be-cleaned workpieces of different sizes, and energy waste is avoided.

The application relates to the technical field of quartz sand treatment, and discloses a device for removing gas-liquid inclusions in high-purity quartz sand, which comprises a shell and inert gas input pipes, inert gas output pipes, vacuum pipes and plasma generators arranged on the outside, a feed pipe is vertically inserted into the shell, a guide pipe is rotatably arranged at the bottom of the feed pipe, and a discharging pipe is rotatably arranged at the tail end of the guide pipe. The vortex-shaped linear guide rail guides the radial movement of the discharging pipe, and the spacing change between the linkage conical through hole and the adjusting plate forms a differential discharging mode of less discharging on the inside and more discharging on the outside. This design precisely adapts to the speed difference between the inside and the outside during the operation of the rotating mechanism, avoids the problems of excessive accumulation of the inside material and insufficient amount of the outside material caused by the traditional uniform discharging from the source, and through the synergistic effect of the mechanical structure, ensures that the quartz sand forms a material layer with uniform thickness in the treatment area, so that each material can fully accept the plasma energy effect, and the gas-liquid inclusions can be uniformly broken.

A system includes a first electrode, a second electrode, a third electrode, and a switch. The switch is electrically connected to the first electrode, the second electrode, and the third electrode. The first electrode, the second electrode, and the third electrode are electrically isolated when the switch is in an open configuration. The first electrode and the second electrode are electrically connected when the switch is in a closed configuration.

The invention discloses double-pulse confinement ion flow size screening equipment, which relates to the field of atomic-scale manufacturing and comprises a cathode, a filtering pipeline, a vacuum chamber, a parallel plate electrode, a coil, an electron suppression electrode, an energy adjusting electrode, a capillary tube bundle and a deposition target disc. And the parallel plate electrodes are arranged on the two sides of the electron suppression electrode and the energy regulation electrode. The coils are arranged on the two sides of the electron suppression electrode and the energy adjusting electrode. The cathode is used for generating plasma. The filtering pipeline is used for filtering plasma. The parallel plate electrode is used for generating an electric field. The coil is used for generating deflection magnetic fields. The electron suppression electrode is used for combining an electric field and a deflection magnetic field to adjust the filtered plasma to obtain single particles. The single particles are transmitted to the energy adjusting electrode through the capillary tube bundle. The energy adjusting electrode is used for adjusting the energy of the single particle by combining the electric field and the deflection magnetic field to obtain single-energy ions. The deposition target disc is used for depositing single-energy ions. According to the invention, accurate adjustment of plasma energy can be realized.