146 results about "Plasma Gases" patented technology

The utility model discloses a wide-width atmosphere gun plasma device, which belongs to the technical field of plasma, and comprises a protective shell, a plasma gas outlet, a gas inlet, a gas outlet, a gas inlet, a gas outlet, a gas outlet, a gas outlet, a gas inlet and a gas outlet, and is characterized in that the protective shell is provided with an accommodating cavity extending along the length direction and a plasma gas outlet communicated with the accommodating cavity; the ceramic insulation tube is arranged in the containing cavity, an airflow channel is formed between the ceramic insulation tube and the containing cavity, the ceramic insulation tube is provided with a containing cavity, and the two ends of the containing cavity are communicated with the airflow channel; the electrode is arranged in the accommodating cavity and is used for generating plasma gas; the gas inlet connecting block is connected with the protective shell and comprises a first gas inlet and a first gas outlet which are communicated with each other, the first gas inlet is used for feeding process gas, and the first gas outlet is communicated with the gas flow channel. Compared with the prior art, the wide atmosphere gun plasma equipment is high in stability, and can cool the equipment and plasma gas.

A plasma torch system includes a regulator configured to direct a first portion of the gas flow from a gas source toward a consumable of a plasma torch, the regulator being configured to regulate a pressure of the first portion of the gas flow directed toward the consumable based on a pressure in a pilot chamber. The plasma torch system also includes a valve fluidly coupled to the pilot chamber and configured to direct a second portion of the gas flow from the gas source toward the pilot chamber. The valve, in the first position, is configured to increase the pressure in the pilot chamber at a first ramp rate, and the valve, in the second position, is configured to decrease the pressure in the pilot chamber at a second ramp rate.

The invention relates to the field of activated carbon modification, in particular to high-hydrophobicity activated carbon and a preparation method thereof. According to the technical scheme, the method comprises the following steps: grinding a biomass material, adding a solution containing aluminum salt and / or magnesium salt, carrying out hydrothermal reaction to obtain a hydrothermal precursor, drying, carbonizing under the protection of inert gas to obtain a carbonized precursor, activating to obtain an activated precursor, and finally cleaning and drying to obtain the high-hydrophobicity activated carbon. Wherein in the activation step, water vapor is firstly introduced to carry out an activation reaction on the carbonized precursor, then plasma gas is circularly introduced to further react to obtain an activated precursor, and the plasma gas is acetylene and fluorinated benzene mixed plasma gas. The process is simple, complex equipment is not needed, the whole preparation process is short in period, low in cost and easy to industrialize, and the prepared activated carbon is high in hydrophobicity, good in oil absorbency and large in specific surface area.

The invention relates to the technical field of plasma, in particular to a plasma cleaning device capable of being spliced. The plasma generator comprises a main cavity, side plates, an electrode assembly and a high-voltage electric connector, the side plates are connected to the two sides of the main cavity in a sealed mode, the main cavity is formed by splicing a plurality of cavity modules, each cavity module is provided with a discharge area, an exhaust area, a plasma air outlet, an exhaust inlet and a splicing installation position, the discharge areas of the multiple cavity modules are communicated, and the exhaust areas of the multiple cavity modules are communicated with the splicing installation position. The exhaust areas of the plurality of cavity modules are communicated, the discharge areas are isolated from the exhaust areas, the plasma gas outlets are communicated with the discharge areas, the exhaust inlets are communicated with the exhaust areas, an electrode assembly is installed in the discharge area of each cavity module, and the high-voltage electric connectors are connected with the electrode assemblies. And the side plates and the cavity modules are positioned, butted and fixed through the splicing mounting positions. The cleaning heads with different lengths are composed of a modular product and can be spliced and customized according to customer requirements, and the overall transformation cost and the manufacturing cost can be reduced.

The purpose of the present invention is to provide: an etching method with which anisotropic etching of silicon is possible even if a gas having a low GWP is used; a method for manufacturing a semiconductor device; and an etching apparatus. The present invention relates to an etching method for etching silicon at 40°C or lower with use of a plasma gas that is obtained by converting, into plasma, an etching gas composition that contains at least one gas selected from the group consisting of fluorine-containing interhalogens, F2, Cl2, Br2, and I2.　

The present application relates to the technical field of high-temperature oxidation-resistant coating, and particularly relates to a modified NiCoCrAlYTa bonding layer and a preparation method thereof.The present application adopts low-pressure plasma gas spraying to prepare a NiCoCrAlYTa bonding layer on the surface of a high-temperature alloy substrate, then performs shot peening treatment to reduce the surface roughness of the coating, then performs Al-Cr co-diffusion, and forms a co-diffusion bonding layer with an outer Al-rich layer, an intermediate Cr-rich layer and an inner NiCoCrAlYTa layer, finally performs vacuum pre-oxidation to form a TGO layer on the surface of the co-diffusion bonding layer, thereby obtaining the modified NiCoCrAlYTa bonding layer.The modified NiCoCrAlYTa bonding layer prepared by the present application has excellent high-temperature oxidation resistance and corrosion resistance, and can realize long-time service.

The invention relates to a method of directly bonding (200) a first microelectronic device (100) on a second microelectronic device, comprising: providing a first device having a first flat surface (110) and a second device having a second flat surface (210), at least the first and second surfaces are treated with a plasma gas comprising at least a first fluorine-containing gas (having an atomic percentage F of fluorine), the first and second devices are transferred to a bonding apparatus, the first and second surfaces are immersed in a bonding atmosphere (1), and the first and second surfaces are bonded under the bonding atmosphere. By cooperatively controlling the atomic percentage F of fluorine and the relative humidity RH, the bonding speed Vc is less than or equal to 15 mm / s, more particularly less than 10 mm / s. The reduced bonding speed significantly reduces the deformation in the bonding process, and can obtain sufficiently high bonding energy, thereby ensuring good bonding between the two surfaces.

The application discloses a plasma gas heating furnace, and relates to the technical field of heating furnaces.The heating furnace is of an inner-outer sleeve structure, and comprises a furnace body inner sleeve, which is a plasma gas passage and is provided with a gas outlet; a furnace body outer sleeve, which is a working gas passage and is sleeved on the outer side of the furnace body inner sleeve and is in communication with the furnace body inner sleeve; and an arc plasma torch, which is arranged at the end of the furnace body inner sleeve far from the gas outlet; and an air inlet assembly, which is arranged in communication with the furnace body outer sleeve and is used for feeding working gas into the furnace body outer sleeve. The arc plasma torch is used for spraying high-temperature plasma jet into the furnace body, and the working gas fed from the air inlet assembly is mixed with the high-temperature plasma jet to form target gas, so that high-temperature inert gas heated by electric energy is used to replace high-temperature flue gas generated by combustion of fossil fuel, a heat source is provided for an industrial furnace, and nearly zero carbon dioxide emission is realized in the whole heating process.

The invention discloses a consumable electrode plasma multifunctional welding gun, a welding system and a welding method, and belongs to the technical field of advanced welding and additive manufacturing. The welding gun is of a coaxial multi-layer integrated structure and is sequentially provided with a welding wire channel, a shielding gas channel, a water-cooling inner plasma contact tube, a hollow tungsten electrode, a plasma gas channel, a water-cooling outer plasma contact tube of an integrated powder feeding channel and an outer shielding gas channel from inside to outside. Coaxial conveying of shielding gas, plasma gas, metal wires and metal powder is achieved, and highly-compressed composite electric arcs can be generated. By adjusting the polarity of the power source, the material conveying mode and the technological parameters, the multiple functions of large-fusion-depth welding, efficient cladding, wire or wire powder collaborative additive manufacturing and high-precision repairing can be achieved through one gun, the problems that in the prior art, the function is single, efficiency is insufficient or cost is high are solved, and the advantages of being high in integration degree, powerful in function and flexible in application are achieved.

The utility model discloses a cooling structure on non - vacuum coating gun traditional chinese medicine liquid reaction device, including liquid medicine reaction spraying device, and liquid medicine reaction spraying device includes spray gun main part, shunt core subassembly, spray gun head subassembly, rear positioning subassembly, and each subassembly is installed in spray gun main part and forms the mixed channel for the plasma gas to pass, and the shunt core subassembly includes the shunt main core, the shunt tail core, a plurality of shunt auxiliary core, and the rear cooling cavity is formed between a plurality of shunt auxiliary core and spray gun main part, and the front cooling cavity is formed between the shunt main core and spray gun main part, is provided with cooling inlet connection mouth, cooling outlet connection mouth respectively on spray gun main part. The utility model can carry out the circulating heat dissipation to the high temperature plasma gas of mixed channel in whole device, and after cooling, plasma gas and liquid medicine fully atomized reaction are carried out, avoid the influence of high temperature reaction to the coating quality, improve the service life of device.

The application provides a double sandwich cup type dielectric barrier discharge fuel plasma gasification research device, three quartz cups with different sizes are nested and combined, a double layer cavity is formed at the bottom of the quartz cup, air in the upper layer cavity is extracted to form a vacuum layer, heat transfer in the heating area to the dielectric layer and the sealing area of the upper quartz cup is blocked, the quartz dielectric is prevented from being broken down under high temperature conditions, and air leakage caused by melting of the sealing structure under high temperature conditions is avoided. The lower layer cavity is used for placing a solid sample to carry out high temperature plasma reaction, reaction kinetics is obtained by detecting tail gas of the reaction, the thickness of the reaction cavity is controlled through the sealing pad, and the dead volume of the reaction is reduced. The circular protrusion in the grounding heating block binds the electric arc generated by the discharge electrode, and the discharge phenomenon at the edge of the discharge electrode is avoided. The integrated design reduces the complexity of installation of the experimental instrument, is easy to operate, and realizes the research on the plasma gas-solid reaction mechanism under the dielectric barrier discharge under high temperature conditions.

The application provides a micro-channel gas-liquid two-phase discharge nitrogen fixation device, which comprises a gas supply system and a liquid supply system, further comprises a micro-fluid chip and a dielectric barrier discharge system, the micro-fluid chip comprises a planar substrate and a transverse channel and a longitudinal channel which are arranged in communication along the planar substrate and are connected with the gas supply system and the liquid supply system respectively, wherein the gas-liquid two-phase forms a two-phase region in the longitudinal channel, and the dielectric barrier discharge system comprises a positive electrode and a negative electrode which are superimposed on the micro-fluid chip along the two-phase region to form an electric field. The micro-channel discharge of the application greatly improves the DBD discharge energy density and promotes the nitrogen dissociation; the micro-channel generates a stable gas-liquid two-phase flow pattern, strengthens the interface reaction and mass transfer between the plasma gas bubble group and the liquid phase, promotes the reaction equilibrium to move to the nitrogen fixation direction, so as to realize the improvement of the plasma nitrogen fixation energy efficiency.

The invention discloses a plasma hot blast stove consolidation reduction material system using CO as a medium. The plasma hot blast stove consolidation reduction material system comprises a plasma heating device, a consolidation reduction material device, a preheating air supply device and a cooling device. The material consolidation and reduction device comprises a preheating section, a consolidation and reduction section and a cooling section and is used for sequentially preheating, consolidating and reducing and cooling the materials, so that the materials in the form of powder pellets form target materials; the preheating gas supply device is used for conveying preheating gas generated by flue gas waste heat and material sensible heat in the consolidation reduction section according to a preset first temperature range into the preheating section and preheating the materials; the plasma heating device adopts CO as a medium to generate high-temperature CO plasma gas, and the materials in the consolidation reduction section are consolidated and reduced through the high-temperature CO plasma gas according to a preset second temperature range; and the cooling device adopts CO as a medium to generate low-temperature gas in a preset third temperature range, and conveys the low-temperature gas to the cooling section, so that a target material can be formed when the material is cooled to be less than or equal to 100 DEG C.

The plasma equipment electrode bar structure comprises a columnar main body made of conductive metal, the main body is provided with a cooling water channel, the cooling water channel comprises a water inlet channel and a water drainage channel, the water inlet channel extends into the inner end of the main body from a water inlet at the tail end of the outer end of the main body, and the water drainage channel extends into the inner end of the main body from a water outlet at the tail end of the outer end of the main body. The drainage channel is communicated with the water inlet channel at the tail end of the inner end part of the main body, is arranged in parallel with the water inlet channel and extends to a drainage port at the outer end part of the main body, and the water inlet and the drainage port are respectively connected with a water delivery port and a water pumping port of a cooling-water machine through hose bundles; an electrode connecting part and a mounting part are arranged at the tail end of the outer end part of the main body, and an insulating sealing structure is arranged outside the mounting part and is used for being inserted into a box mounting hole of equipment to form a sealing and insulating connecting structure; and the electrode connecting part is provided with a metal connecting point which is electrically connected with one electrode of an external plasma radio frequency power supply. The plasma cleaning device is simple in structure, the space in the plasma cleaning box body is larger, and plasma gas excitation is more stable and efficient.

Embodiments of the present disclosure generally relate to an injector assembly for use in a processing chamber, and related components and methods. In one or more embodiments, a method of substrate processing includes performing an ignition process including flowing a plasma gas into a plasma volume and igniting the plasma gas into a plasma. The method further includes performing a deposition process including flowing a processing gas into an internal volume of a process chamber and across a substrate in the internal volume and depositing a deposition structure over the substrate. The method further includes performing an insertion process including flowing an insertion gas for a time of less than 5 seconds into the plasma within the plasma volume to form effluents from the insertion gas, flowing the effluents into the internal volume and across the substrate in the internal volume, and inserting the effluents into the deposition structure.

In a RH vacuum degassing device of a steelmaking process, a refining reaction such as deoxidation, denitrification, desulfurization, and the like is rapidly performed when hydrogen plasma is given to molten steel, and molten steel with less impurities is efficiently produced. The present application is a molten steel refining method in which, in a process of refining molten steel (3) accommodated in a ladle using a RH vacuum degassing device (1), a surface of the molten steel circulating in a vacuum tank of the RH vacuum degassing device is subjected to plasma treatment in which hydrogen gas or non-active gas containing hydrogen gas is irradiated as plasma gas under a condition satisfying the following formula (1), and the content of one or more than two elements selected from oxygen, nitrogen, and sulfur contained in the molten steel is reduced. In formula (1), G P is a flow rate (Nm 3 / minute) of the plasma gas, (H2) is a hydrogen gas concentration (vol%) in the plasma gas, and Q is a circulation flow rate (tons / minute) of the molten steel circulating in the vacuum tank. G P × (H2) / Q ≥ 0.1 …… (1).

The utility model relates to a lens plasma cleaning tray, include: tray, be equipped with a plurality of with array form distribution's convex on the upper surface of tray, the area of the region of distribution convex on tray is bigger than the area of single lens, and the gap between two adjacent convexes has and the size of center spacing is smaller than the size of single lens. Advantageous effect is: the tray can place a plurality of lenses in the region of distribution convex, and can guarantee that the lens is not inclined after placing, since the lens is supported by a plurality of convexes, compared with sticking to the tray, the other surfaces (five surfaces) of the lens and the downward surface can contact the plasma gas during plasma cleaning, and the corresponding bonding standard can be cleaned, so that the situation of confusing A and B surfaces will not occur, and the tray can use an automatic suction nozzle to suck the lens, which greatly improves the efficiency compared with manual use of tweezers.

This invention relates to a method for preparing electronic-grade hydrofluoric acid. The invention utilizes a microchannel reactor for the fluorine oxidation reaction, significantly reducing fluorine consumption and safety hazards during production. Furthermore, the microchannel reactor enhances the gas-liquid two-phase mass transfer during the oxidation reaction, further improving impurity removal and product quality. The addition of multi-effect distillation to the distillation process not only enables secondary heat utilization but also saves on the use of high-temperature heating media at the bottom of the column, effectively reducing energy consumption. In the modified liquid, DMF serves as the solvent, cobalt nitrate provides cobalt ions, and vinylguanidine provides guanidine functional groups and amino groups. Ammonia and propanethiol are used as plasma gases to introduce amino and thiol groups onto the membrane surface. These groups help improve membrane selectivity, effectively separating metal and non-metal ions, as well as acidic impurities in the raw materials.

The utility model provides an intelligent control system for plasma spraying, which belongs to the technical field of spraying and comprises a control cabinet, and the control cabinet is used for controlling and monitoring a power supply cabinet, a gas management center, a powder feeder, a transfer box, a spray gun and a cooling unit. The power supply cabinet is connected with the spray gun through the transfer box and is used for generating plasma; the gas management center comprises a gas carrying pipeline, a plurality of gas pipes and a gas mixing structure, the gas carrying pipeline and the gas pipes are connected into the gas mixing structure, and the gas mixing structure is connected with the spray gun through a transfer box and used for providing plasma gas; the gas carrying pipeline is further provided with a branch pipe, and the branch pipe is communicated with the powder feeder. According to the scheme, the production data is monitored in real time, the parameters are dynamically corrected based on the production data, manual intervention is reduced, the amplitude threshold is adjusted according to the set parameters of all the components, sound-light alarm is triggered when the parameters exceed the set range, equipment overload is prevented, early fault positioning is achieved for key parameters of all the components, and the shutdown risk is reduced.

In the method for providing thermal energy, a plasma gas is fed into the area of ​​influence of at least one electric arc discharge (5) formed between two electrodes (18, 19) connected to an electric current source (10), thereby generating a plasma (1). The thermal energy of the plasma (1) is used to heat at least one thermal absorber (6), thus providing thermal energy for external use. A plasma gas composed of at least 10 vol% pure molecular hydrogen and a maximum of 90 vol% of at least one gas selected from nitrogen and a gas of group VIII of the periodic table is fed to the electric arc discharge (5).

The invention relates to the technical field of additive manufacturing, and discloses a 3D printing nozzle and system and a low-temperature plasma jet 3D printing device.The 3D printing nozzle comprises a nozzle body and a plasma generation module; an aerosol inlet and a plasma gas source inlet are formed in the spray head main body; an aerosol channel and a plasma gas source channel are arranged in the spray head main body; the plasma generation module comprises an inner electrode and an outer electrode and forms a plasma excitation area, and gas introduced from the plasma gas source inlet is excited into plasma jet flow by the plasma generation module in the plasma excitation area; and after passing through the aerosol channel, the aerosol is coupled with the plasma jet flow and is sprayed out. The 3D printing nozzle has the advantages that the 3D printing nozzle can realize 3D printing of materials such as an organic conductive polymer, a metal salt solution and nano-particle slurry on a flexible substrate, particularly on a substrate which is not resistant to high temperature, and is high in printing precision, high in integration level and compact in structure.

Provided are systems and methods for regulation of mass flow and monitoring of volumetric flow, for regulation of volumetric flow and monitoring of mass flow, and for regulation of both mass and volumetric flow of gas to a plasma torch for wire-plasma arc additive manufacturing processes, and methods for manufacturing metal objects by additive manufacturing using one or more of the systems.

This application relates to the field of additive manufacturing technology, disclosing a 3D printing nozzle, system, and low-temperature plasma jet 3D printing device. The 3D printing nozzle includes: a nozzle body and a plasma generating module; the nozzle body has an aerosol inlet and a plasma gas source inlet; the nozzle body has an aerosol channel and a plasma gas source channel; the plasma generating module includes an inner electrode and an outer electrode, forming a plasma excitation region; gas introduced from the plasma gas source inlet is excited into a plasma jet by the plasma generating module in the plasma excitation region; the aerosol, after passing through the aerosol channel, couples with the plasma jet and is ejected. The advantages of this application are that the 3D printing nozzle can realize the 3D printing of materials such as organic conductive polymers, metal salt solutions, and nanoparticle slurries on flexible substrates, especially those not resistant to high temperatures, with high printing accuracy, high integration, and a compact structure.

The application relates to the technical field of plasma, and discloses a plasma gas-liquid discharge device and a device control method. The discharge device comprises a high-voltage electrode, a low-voltage electrode, an insulating substrate and a plurality of liquid feeding pipelines. A plurality of groove channels are formed in the first surface of the insulating substrate, and the depth of each groove channel is micron-level. The high-voltage electrode and the low-voltage electrode are used for forming an electric field, and each groove channel is located in the electric field. The outlets of the liquid feeding pipelines are respectively communicated with the groove channels. Thus, the micron-level groove channels provide micron-level liquid to be treated, so that the action area of the plasma can cover the liquid in the groove channels, and the liquid flowing through the groove channels has good treatment effect, thereby comprehensively improving the treatment effect of the plasma on the gas-liquid two-phase medium.

The application provides a normal-pressure local dry-method welding drainage device, relates to the technical field of underwater welding equipment technology, and solves the technical problem that in the prior art, a large amount of welding smoke accumulates in a drainage cover during a long-time underwater laser welding process, and cannot be discharged in time, in a large amount and effectively. The device comprises a drainage cover, a welding component, a smoke discharging component and a sealing component. The smoke discharging component comprises an air suction pump and an air suction grid. The air suction pump is fixedly connected to the drainage cover, the air suction end of the air suction pump is communicated with a containing cavity, and the air suction grid is fixedly connected to the inner wall of the drainage cover. The air suction pump and the air suction grid are matched to suck the smoke generated by welding in the drainage cover. The air suction grid can suck the welding smoke and plasma gas at the back according to the flow trend of the smoke, so that the problem that a large amount of welding smoke accumulates in the drainage cover during a long-time underwater laser welding process and cannot be discharged in time, in a large amount and effectively is solved.

The invention discloses a low-temperature sterilization device and process for fresh and wet rice noodles based on a cold plasma technology, and relates to the technical field of rice noodle sterilization. The low-temperature sterilization device comprises a sterilization tank and a plasma generator which is arranged on one side of the sterilization tank and used for introducing cold plasma air mass into the sterilization tank, and a feeding assembly is arranged above the sterilization tank; a discharging assembly is arranged at the bottom of the sterilization tank, a mixing assembly and an air guide assembly are movably arranged in the sterilization tank, and the air guide assembly is located under the mixing assembly; the mixing assembly comprises a rotating shaft movably arranged in the middle of the interior of the sterilization tank, a plurality of spiral pieces fixedly arranged on the side face of the rotating shaft, and supporting assemblies fixedly arranged at the corners of the spiral pieces; the pressure of rice flour on the spiral piece is utilized to enable the spiral piece to generate obvious elastic deformation, and the supporting assembly is utilized to elastically support the spiral piece, so that the spiral piece shakes, and accumulation of the rice flour is avoided.

This invention relates to a method and system for peeling off silicon carbide ingots, belonging to the field of crystal processing technology. The method includes the following steps: S1, using an ultrashort pulse laser to form a slightly split modified layer inside the silicon carbide ingot, creating modified layer channels within the ingot and forming slightly split regions between adjacent paths; S2, placing the silicon carbide ingot upright on a base with suction function, and using a focused nozzle to spray plasma gas from the modified layer channels at the edge of the ingot; S3, after the side of the silicon carbide ingot moves relative to the focused nozzle for several revolutions, a substrate and the target ingot with low surface damage are obtained. This invention forms a slightly split modified layer inside the silicon carbide ingot using an ultrashort pulse laser, and uses a focused nozzle to spray plasma gas under pressure to etch and separate the target ingot from the substrate, achieving low-damage ingot peeling. This method is characterized by low damage, simple process, and low cost.

This utility model discloses an ion generating device for a non-vacuum coating gun, including an ion generating gun. The ion generating gun comprises an ion gun head assembly, an ion gun body assembly, an ignition assembly, and an air inlet connector. The ignition assembly is connected to an external ignition power supply and is inserted into the ion gun body assembly, with a ventilation gap between them. The ignition assembly cooperates with the ion gun head assembly to generate ignition ionization. The air inlet connector is connected to the ion gun body assembly and is provided with an air inlet channel. The incoming air passes through the air inlet channel and the ventilation gap and is ionized into plasma gas at the ion gun head assembly. The ion generating device of this utility model has a reasonable structural design and compact size, making it easy to install and use. It has a better ionization effect, improves the contact reaction between the ionized plasma gas and the chemical solution, and further enhances the coating effect.

To provide a gas conversion device using plasma that exhibits excellent gas conversion efficiency. [Solution] The plasma gas conversion apparatus 1 according to the present invention comprises a reaction tube 7 that generates plasma inside, a gas supply tube 9 connected to the reaction tube 7 to supply reaction gas, a high conversion gas recovery tube 11 located downstream of the plasma generation region 16 in the reaction tube 7 to recover high conversion gas with a relatively high conversion rate other than the gas near the inner wall of the reaction tube 7, and a low conversion gas recovery tube 13 located downstream of the high conversion gas recovery tube 11 to recover low conversion gas with a relatively low conversion rate that was not recovered by the high conversion gas recovery tube 11, wherein the recovery port 11a of the high conversion gas recovery tube 11 is located between it and the inner wall of the reaction tube 7 with a gap extending around its entire circumference.

The application provides a silicon-carbon powder, a manufacturing device thereof, and a dispersion adsorption process based on the silicon-carbon powder. The dispersion adsorption process based on the silicon-carbon powder comprises the following steps: obtaining porous carbon powder; introducing a modified gas into the porous carbon powder for fluidization treatment, wherein the modified gas at least comprises a silane compound and a hydrocarbon compound, and the flow rate of the modified gas is 10-200 sccm; and performing plasma treatment on the modified gas, and introducing the plasma gas into the porous carbon powder, so that the porous carbon powder and the plasma gas can be uniformly dispersed and mixed, the plasma power is 100-4000 W, the discharge voltage is 500-5000 V, the discharge current is 0.2-3 A, and the temperature is 50-400 DEG C. The dispersion adsorption process based on the silicon-carbon powder can better optimize the dispersion uniformity of the porous carbon and the plasma gas, and further improve the doping and coating uniformity.