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121 results about "Rotational alignment" patented technology

Modular long bone prosthesis for partial or total bone replacement

ActiveUS20050071014A1Facilitate rotational alignmentEasy alignmentBone implantJoint implantsProsthesisBone replacement
A modular long bone prosthesis is provided having a proximal component and a retroversion component. The proximal component is configured at a proximal end to receive a head forming a portion of a joint and is formed at a distal end to mate with additional prosthesis components. The proximal component is formed to simulate an angle inherent in the proximal end of the bone to be replaced and includes an indicator adjacent the distal end to facilitate rotational alignment of the proximal component and additional prosthesis components. The retroversion component includes a proximal end configured to mate with the distal end of the proximal component. The proximal end includes alignment indicia for positioning relative to the indicator on the proximal component. When the indicator is in a first position relative to the alignment indicia the proximal component and the retroversion component establish a first alignment orientation forming an angle simulating the angle inherent in the proximal end of the right long bone of the long bone to be replaced. When the indicator is in a second position relative to the alignment indicia the proximal component and the retroversion component establish a second alignment orientation forming an angle simulating the angle inherent in the proximal end of the left long bone of the long bone to be replaced.
Owner:DEPUY PROD INC

Modular long bone prosthesis for partial or total bone replacement

A modular long bone prosthesis is provided having a proximal component and a retroversion component. The proximal component is configured at a proximal end to receive a head forming a portion of a joint and is formed at a distal end to mate with additional prosthesis components. The proximal component is formed to simulate an angle inherent in the proximal end of the bone to be replaced and includes an indicator adjacent the distal end to facilitate rotational alignment of the proximal component and additional prosthesis components. The retroversion component includes a proximal end configured to mate with the distal end of the proximal component. The proximal end includes alignment indicia for positioning relative to the indicator on the proximal component. When the indicator is in a first position relative to the alignment indicia the proximal component and the retroversion component establish a first alignment orientation forming an angle simulating the angle inherent in the proximal end of the right long bone of the long bone to be replaced. When the indicator is in a second position relative to the alignment indicia the proximal component and the retroversion component establish a second alignment orientation forming an angle simulating the angle inherent in the proximal end of the left long bone of the long bone to be replaced.
Owner:DEPUY PROD INC

Wafer edge deposition elimination

This invention provides a method and apparatus for substantially eliminating deposition on the edge of a wafer supported on a pedestal in a processing chamber. Process gas flow onto the wafer surface is inhibited from reaching the wafer edge and backside, by means of a shadow ring placed over the wafer without touching it. Deposition on the edge and backside of the wafer are therefore substantially eliminated. The shadow ring defines a cavity which circumscribes the wafer edge, into which purge gas is flowed. This purge gas flows out from the cavity through the gap between the shadow ring and the upper surface of the wafer. Alignment pins are placed on the wafer supporting surface of the pedestal. These pins have sloping surfaces and are arranged to guide the wafer to a centered position on the pedestal when the wafer is placed on the pedestal. These pins also serve to align the shadow ring to the pedestal and thence to the wafer. The shadow ring has a plurality of keyed formations which mate to the pins, and as the shadow ring and pedestal are brought together, the pins serve to align the shadow ring. This precise rotational alignment and centering of the shadow ring results in substantial elimination of edge deposition. The keyed formations have elliptical cross-sections to provide for radial movement of the pins with respect to the keyed formations due to thermal expansion.
Owner:APPLIED MATERIALS INC

Wafer edge deposition elimination

This invention provides a method and apparatus for substantially eliminating deposition on the edge of a wafer supported on a pedestal in a processing chamber. Process gas flow onto the wafer surface is inhibited from reaching the wafer edge and backside, by means of a shadow ring placed over the wafer without touching it. Deposition on the edge and backside of the wafer are therefore substantially eliminated. The shadow ring defines a cavity which circumscribes the wafer edge, into which purge gas is flowed. This purge gas flows out from the cavity through the gap between the shadow ring and the upper surface of the wafer. Alignment pins are placed on the wafer supporting surface of the pedestal. These pins have sloping surfaces and are arranged to guide the wafer to a centered position on the pedestal when the wafer is placed on the pedestal. These pins also serve to align the shadow ring to the pedestal and thence to the wafer. The shadow ring has a plurality of keyed formations which mate to the pins, and as the shadow ring and pedestal are brought together, the pins serve to align the shadow ring. This precise rotational alignment and centering of the shadow ring results in substantial elimination of edge deposition. The keyed formations have elliptical cross-sections to provide for radial movement of the pins with respect to the keyed formations due to thermal expansion.
Owner:APPLIED MATERIALS INC
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