Self-assembly nano oxynitride coating as well as preparation method thereof and application thereof
A technology of oxynitride and self-assembly, applied in coating, nanotechnology, metal material coating technology, etc., can solve the problems of high brittleness of oxide coating, increase equipment cost, limit popularization and application, etc., and achieve good economic benefits , low cost and strong operability
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Embodiment 1
[0030] A self-assembled nano-oxynitride coating includes an oxygen-rich layer AlCrSiON and a nitrogen-rich layer AlCrSiON. Among them, the thickness of the oxygen-rich layer is 2nm, the thickness of the nitrogen-rich layer is 5nm, and the atomic percentage content of each element in the coating is: Al: 20at.%, Cr: 10at.%, Si: 15at.%, O: 50at. .%, N: 5at.%.
[0031] The high-speed steel substrate is polished, ultrasonically cleaned with acetone and alcohol for 10 minutes, dried with nitrogen, and then put into a vacuum chamber. Install the target Cr target and AlCrSi target into the equipment, turn on the heater and raise the temperature to 300℃, and evacuate the vacuum chamber to a vacuum degree of 1.0×10 -3 Pa below. 300sccm of Ar gas was introduced, the workpiece support bias was set to -1000V, and the surface of the substrate was sputtered cleaning, and the bombardment time was 10min. After that, the bias voltage is reduced to -600V, the Cr target is ignited, the target curr...
Embodiment 2
[0035] A self-assembled nano multilayer oxynitride coating includes an oxygen-rich layer AlCrSiON and a nitrogen-rich layer AlCrSiON. Among them, the thickness of the oxygen-rich layer is 8nm, the thickness of the nitrogen-rich layer is 30nm, and the atomic percentage content of each element in the coating is: Al: 25at.%, Cr: 15at.%, Si: 5at.%, O: 5at. .%, N: 50at.%.
[0036] The cemented carbide substrate is polished, ultrasonically cleaned with acetone and alcohol for 15 minutes, dried with nitrogen, and then put into a vacuum chamber. Install the target Cr target and AlCrSi target into the equipment, turn on the heater and raise the temperature to 350℃, and evacuate the vacuum chamber to a vacuum of 5.0×10 -3 Pa below. Ar gas of 250 sccm was introduced, the workpiece support was set to be biased at -800V, and the surface of the substrate was sputtered and cleaned, and the bombardment time was 20 minutes. After that, the bias voltage is reduced to -800V, the Cr target is igni...
Embodiment 3
[0038] A self-assembled nano multilayer oxynitride coating includes an oxygen-rich layer AlCrSiON and a nitrogen-rich layer AlCrSiON. Among them, the thickness of the oxygen-rich layer is 12nm, the thickness of the nitrogen-rich layer is 60nm, and the atomic percentage content of each element in the coating is: Al: 30at.%, Cr: 20at.%, Si: 10at.%, O: 15at. .%, N: 25at.%.
[0039] The high-speed steel substrate is polished, ultrasonically cleaned with acetone and alcohol for 15 minutes, then dried with nitrogen, and then put into the vacuum chamber. Install the target Cr target and AlCrSi target into the equipment, turn on the heater and raise the temperature to 400℃, and evacuate the vacuum chamber to a vacuum degree of 5.0×10 -3 Pa below. 300sccm of Ar gas was introduced, the workpiece support was biased at -900V, and the surface of the substrate was sputtered and cleaned, and the bombardment time was 15 minutes. After that, the bias voltage is reduced to -700V, the Cr target i...
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