A self-assembled nano-oxynitride coating and its preparation method and application

An oxynitride and self-assembly technology, applied in coating, nanotechnology, metal material coating process, etc., can solve the problems of high brittleness of oxide coating, limited popularization and application, increase equipment cost, etc., and achieve good economic benefits , The effect of strong operability and low cost

Active Publication Date: 2019-06-14
GUANGDONG UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Compared with nitride coatings, oxide coatings have better thermochemical stability. For example, the heat resistance of alumina coatings can reach above 1200 °C, but oxide coatings are highly brittle and low in hardness (less than 20GPa)
TiCN / Al 2 o 3 Composite coatings such as TiAlN / TiN improve the high-temperature performance of the coating to a certain extent, and are designed by alternating multilayer (10-400 layers) of oxide / nitride, TiAlN / Al 2 o 3 The multi-layer tool coating has the advantages of nitride hardness, good toughness and excellent high-temperature chemical stability of the oxide, and performs well in high-speed cutting and hot-working die processing aluminum; due to the high insulation of alumina, the coating needs to be used Special RF (radio frequency) sputtering and BP-DMS (bipolar pulsed twin target sputtering) technologies increase equipment costs and low deposition rates limit their popularization and application

Method used

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  • A self-assembled nano-oxynitride coating and its preparation method and application
  • A self-assembled nano-oxynitride coating and its preparation method and application
  • A self-assembled nano-oxynitride coating and its preparation method and application

Examples

Experimental program
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Effect test

Embodiment 1

[0030] A self-assembled nano-oxynitride coating comprises an oxygen-rich layer AlCrSiON and a nitrogen-rich layer AlCrSiON. Among them, the thickness of the oxygen-enriched layer is 2nm, the thickness of the nitrogen-enriched layer is 5nm, and the atomic percentage content of each element in the coating is: Al: 20at.%, Cr: 10at.%, Si: 15at.%, O: 50at. .%, N: 5 at.%.

[0031] Polish the high-speed steel substrate, ultrasonically clean it with acetone and alcohol for 10 minutes, dry it with nitrogen, and put it into a vacuum chamber. Install the target Cr target and AlCrSi target into the equipment, turn on the heater to raise the temperature to 300°C, and evacuate the vacuum chamber to a vacuum degree of 1.0×10 -3 Below Pa. 300 sccm of Ar gas was introduced, the bias voltage of the workpiece support was set to -1000V, and the surface of the substrate was cleaned by sputtering, and the bombardment time was 10 minutes. Afterwards, the bias voltage was reduced to -600V, the Cr ...

Embodiment 2

[0035] A self-assembled nanometer multilayer oxynitride coating comprises an oxygen-rich layer AlCrSiON and a nitrogen-rich layer AlCrSiON. Among them, the thickness of the oxygen-rich layer is 8nm, the thickness of the nitrogen-rich layer is 30nm, the atomic percentage content of each element in the coating is: Al: 25at.%, Cr: 15at.%, Si: 5at.%, O: 5at. .%, N: 50 at.%.

[0036]Polish the cemented carbide substrate, ultrasonically clean it with acetone and alcohol for 15 minutes, dry it with nitrogen, and put it into a vacuum chamber. Install the target Cr target and AlCrSi target into the equipment, turn on the heater to raise the temperature to 350°C, and vacuum the vacuum chamber to a vacuum degree of 5.0×10 -3 Below Pa. Introduce 250 sccm of Ar gas, set the bias voltage of the workpiece support to -800V, and perform sputter cleaning on the surface of the substrate, and the bombardment time is 20 minutes. Afterwards, the bias voltage was reduced to -800V, the Cr target w...

Embodiment 3

[0038] A self-assembled nanometer multilayer oxynitride coating comprises an oxygen-rich layer AlCrSiON and a nitrogen-rich layer AlCrSiON. Among them, the thickness of the oxygen-rich layer is 12nm, the thickness of the nitrogen-rich layer is 60nm, and the atomic percentage content of each element in the coating is: Al: 30at.%, Cr: 20at.%, Si: 10at.%, O: 15at. .%, N: 25 at.%.

[0039] The high-speed steel substrate is polished, ultrasonically cleaned with acetone and alcohol for 15 minutes, dried with nitrogen, and then placed in a vacuum chamber. Install the target Cr target and AlCrSi target into the equipment, turn on the heater to raise the temperature to 400°C, and evacuate the vacuum chamber to a vacuum degree of 5.0×10 -3 Below Pa. 300 sccm of Ar gas was introduced, the bias voltage of the workpiece support was set at -900V, and the surface of the substrate was cleaned by sputtering, and the bombardment time was 15 minutes. Afterwards, the bias voltage was reduced t...

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Abstract

The invention discloses a preparation method for a self-assembly nano oxynitride coating. A traditional PVD technology is adopted to prepare the self-assembly nano oxynitride coating; retention time, in different plasma regions, of a sample is changed by regulating autorotation and revolution speed of the sample according to a phenomenon that plasma energy and energy distribution within different distance ranges of a target is different, so that the self-assembly nano oxynitride coating is prepared. The coating comprises an oxygen-rich layer and a nitrogen-rich layer, wherein the oxygen-rich layer and the nitrogen-rich layer are alternatively deposited on a base body; and the coating comprises the following components: 20-35at.% of Al, 10-25at.% of Cr, 0-15at.% of Si, 5-50at.% of O and 10-50 at.% of N. The preparation method is simple in preparation process, is low in cost, is good in adaptation, integrates the advantages of a nitride coating and an oxide coating, and has great application and popularization potential.

Description

technical field [0001] The invention belongs to the field of material coatings, and more specifically relates to a self-assembled nano-oxynitride coating and its preparation method and application. Background technique [0002] In recent years, the use of PVD technology to coat metal nitrides, oxides, carbides, etc. on tools, molds, mechanical parts and other products to improve the surface properties and service life of products has become a widely used surface modification technology. Among them, metal nitride coating is the mainstream of tool coating. With the development of processing technology, high-temperature application environments such as high-speed cutting tools and hot-working molds have higher and higher requirements for high-temperature performance of coatings. The high-temperature oxidation resistance temperature of TiC, HfC, TiN, CrN, TiCN and other traditional carbon (nitride) coatings is below 600 ° C, which cannot meet the requirements of high-speed cutt...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/06C23C14/35C23C14/32C23C14/02B82Y40/00
CPCB82Y40/00C23C14/0036C23C14/0084C23C14/022C23C14/0676C23C14/325C23C14/35
Inventor 王启民耿东森代伟吴正涛黎海旭
Owner GUANGDONG UNIV OF TECH
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