Patents
Literature
Eureka-AI is an intelligent assistant for R&D personnel, combined with Patent DNA, to facilitate innovative research.
Eureka AI

264results about How to "Reduce turbulence" patented technology

Squitieri hemodialysis and vascular access systems

A hemodialysis and vascular access system comprises a subcutaneous composite PTFE silastic arteriovenous fistula having an indwelling silastic venous end which is inserted percutaneously into a vein and a PTFE arterial end which is anastomosed to an artery. Access to a blood stream within the system is gained by direct puncture of needle(s) into a needle receiving site having a tubular passage within a metal or plastic frame and a silicone upper surface through which needle(s) are inserted. In an alternate embodiment of the invention, percutaneous access to a blood stream may be gained by placing needles directly into the system (i.e. into the PTFE arterial end). The invention also proposes an additional embodiment having an arterialized indwelling venous catheter where blood flows from an artery through a tube and a port into an arterial reservoir and is returned to a vein via a port and a venous outlet tube distinct and distant from the area where the blood from the artery enters the arterial reservoir. The site where blood is returned to the vein is not directly fixed to the venous wall but is free floating within the vein. This system provides a hemodialysis and venous access graft which has superior longevity and performance, is easier to implant and is much more user friendly.
Owner:HEMOSPHERE

Apparatus for inverted multi-wafer MOCVD fabrication

A semiconductor fabrication reactor according to the invention comprises a rotatable susceptor mounted to the top of a reactor chamber. One or more wafers are mounted to a surface of the susceptor and the rotation of the susceptor causes the wafers to rotate within the chamber. A heater heats the susceptor and a chamber gas inlet allows semiconductor growth gasses into the reactor chamber to deposit semiconductor material on said wafers. A chamber gas outlet is included to allow growth gasses to exit the chamber. In a preferred embodiment, the inlet is at or below the level of said wafers and the outlet is preferably at or above the level of the wafers. A semiconductor fabrication system according to the invention comprises a source of gasses for forming epitaxial layers on wafers and a source of gasses for dopants in said epitaxial layers. A gas line carries the dopant and epitaxial source gasses to a reactor for growing semiconductor devices on wafers, and the source gasses in the gas line are injected into the reactor chamber through a reactor inlet. The reactor comprises an inverted susceptor mounted in a reactor chamber that is capable of rotating. One or more wafers are mounted to a surface of the susceptor, the rotation of the susceptor causing the wafers to rotate within the chamber. A heater heats the susceptor and the source gasses deposit semiconductor material on the wafers.
Owner:CREE INC

Eccentric wheel capable of intelligently adjusting eccentricity

InactiveCN102642445AThe process is smoothReduce turbulenceWheelsElectric machineryAuto regulation
The invention discloses an eccentric wheel capable of intelligently adjusting eccentricity. The eccentric wheel comprises a shaft, a wheel hub, a wheel rim and a tire, wherein the wheel hub is provided with a driving gear I, a motor I, a supporting wheel, an inclination angle sensor, a deviation adjusting tank and a deviation adjusting device; the deviation adjusting device comprises two supports, a screw rod which is arranged between the supports, a guide rail, a screw rod nut, a driven gear which is coaxially and fixedly connected with the screw rod, a driving gear II, a motor II and a fixed frame thereof; the screw rod nut is fixedly connected with the shaft through a flange, and the inner side of the wheel rim is provided with an internal gear. The structure of the eccentric wheel also comprises a shaft driving device, a road condition detection device and a processor, wherein the output terminal of the processor is connected with the motor I, the motor II and the shaft driving device. The eccentric wheel can detect road conditions and automatically adjust the distance between the shaft and the wheel center according to the road conditions so as to enable the traveling process to be smoother, not only can reduce the vibration degree on roads with greater fluctuation, but also solves the difficulty that common wheels are not easy to climb steps, and can be applied on various vehicles.
Owner:侯九霄 +6
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products