109 results about "Diffraction order" patented technology

The invention discloses a space customization three-dimensional column vector light beam array generation method based on a metasurface, and belongs to the field of micro-nano optics, diffraction optics and structured light field regulation and control. The implementation method comprises the following steps of: independently regulating and controlling left-hand circular polarization and right-hand circular polarization components of incident light based on geometric and propagation phase joint modulation of the metasurface; a metasurface, a phase distribution coding lens factor of a polarization channel, a Dammann vortex grating with opposite basic topological charges and a spiral Dammann zone plate are independently optimized, and left-handed and right-handed circular polarization components generate a three-dimensional vortex beam array with opposite spatial topological charges in a near-field Fresnel domain; the left-handed circular polarization vortex array and the right-handed circular polarization vortex array with opposite topological charges are coherently superposed to form a spatially customized three-dimensional column vector light beam array, and the vector characteristic of each light beam in the array depends on the amplitude ratio, the phase difference and the topological charges of the left-handed circular polarization component and the right-handed circular polarization component on each diffraction order. According to the invention, the regulation dimension of the column vector light beam can be expanded.

The invention discloses an optical chip, a spectrum sensing device and method, a spectrometer and equipment. The optical chip comprises an encoder with a non-periodic diffraction unit, and is used for enabling different light in a light beam to enter different diffraction units in the non-periodic diffraction unit for modulation so as to obtain optical signals in different diffraction directions. Therefore, spectral information corresponding to the light beam can be determined subsequently according to the light signal. In the application, different light in the light beam enters different diffraction units in the non-periodic diffraction units to be modulated to obtain light in different diffraction directions, and every two adjacent light signals in the light signals corresponding to the light are different in phase and phase difference, so that the space separation distance of different wavelengths is relatively large; and a relatively high resolution can be obtained. Meanwhile, along with the increase of the diffraction order, the light of each wavelength in different diffraction directions is not easy to overlap, so that the effective wavelength detection area is relatively large, and the bandwidth is relatively wide. Therefore, the problem of restriction between the resolution and the bandwidth is eliminated.

The polarization diffraction spectrometer comprises a substrate and a plurality of rectangular nano-columns arranged on the substrate, the rectangular nano-columns are periodically stacked or arranged in the height direction to form a periodic superlattice unit, and the substrate layer is made of a nanoscale transparent medium material; according to a grating equation, the optimal diffraction series, the period length and the incident light wavelength of the super grating are selected through experimental simulation, and optimal structural parameters are determined by combining an electromagnetic simulation tool and an optimization algorithm; the heights, the widths and the intervals of the rectangular nanocolumns serve as parameters of a particle swarm optimization algorithm, a fitness function with target diffraction order energy concentration ratio and target order overall diffraction efficiency optimization serving as core indexes is constructed, full-wave optical simulation software is combined, and geometric distribution in periodic units of the rectangular nanocolumns is optimized and adjusted. According to the invention, under the incident condition of 45-degree linearly polarized light, the S polarization component and the P polarization component are respectively concentrated at the preset target diffraction order, and an efficient diffraction light splitting effect is achieved.

An optical metrology system can include an overlay metrology tool for characterizing an overlay target on a sample, where the overlay target includes first direction periodic features in a first set of layers of the sample and second direction periodic features in a second set of layers of the sample. The overlay metrology tool can simultaneously illuminate the overlay target using first and second illumination beams and can further generate an image of the overlay target based on diffraction of the first and second illumination beams through the overlay target, where diffraction orders of the first illumination beam contribute to resolved image formation of only the first direction periodic features, and where diffraction orders of the second illumination beam contribute to resolved image formation of only the second direction periodic features. The system can further generate overlay measurements along first and second measurement directions based on the image.

A diffractive optical waveguide and a display device having the same are disclosed. The diffractive optical waveguide includes a grating structure formed on a surface of a waveguide substrate, the grating structure including a plurality of grating lines arranged in a plane, the grating lines each extending along a first direction in the plane and arranged at a predetermined interval in a second direction perpendicular to the first direction; at least one sidewall of each grating line having a periodic structure along the first direction; and the grating structure configured to diffract light incident thereon at a non-zero angle with respect to the plane out of the plane through a predetermined diffraction order. The grating structure employed in the above-described diffractive optical waveguide can be used to adjust the diffraction efficiency at different angles and / or different diffraction orders, thereby providing a new effective and flexible means for improving the angular uniformity and / or the out-coupling efficiency of the diffractive optical waveguide.

An eyewear device includes a lightguide having a world-side surface and an eye-side surface, a display oriented to emit light toward the lightguide, and a beam steering element that includes a first polarization grating positioned along an optical path between the display. The first polarization grating diffracts light emitted by the display into orders having different polarizations and the orders are selectively conveyed into different eyeboxes. The eyewear device also includes a frame that supports the lightguide, the display, and the first polarization grating. In some cases, the different polarizations include a right circular polarization or a left circular polarization and the beam steering element includes a polarization dependent filter that filters right circularly polarized light in a first state and left circularly polarized light in a second state.

A diffractive multifocal lens is disclosed, comprising an optical element having at least one diffractive surface, the surface profile comprising a plurality of annular concentric zones. The optical thickness of the surface profile changes monotonically with radius within each zone, while a distinct step in optical thickness at the junction between adjacent zones defines a step height. The step heights for respective zones may differ from one zone to another periodically so as to tailor diffraction order efficiencies of the optical element. In one example of a trifocal lens, step heights alternate between two values, the even-numbered step heights being lower than the odd-numbered step heights. By plotting a topographical representation of the diffraction efficiencies resulting from such a surface profile, step heights may be optimized to direct a desired level of light power into the diffraction orders corresponding to near, intermediate, and distance vision, thereby optimizing the lens performance.

The invention discloses a field-of-view expansion type sun sensor based on diffraction order multiplexing, which comprises a dual-band band-pass optical filter, a diffraction type light introducer and a color CMOS (Complementary Metal Oxide Semiconductor) image sensor, and is characterized in that the dual-band band-pass optical filter is used for selecting two pieces of separated sunlight with a preset wave band for incidence; the diffractive light introducer diffracts transmitted sunlight into multi-level light beams; the color CMOS image sensor is used for acquiring a diffraction spot image containing spectral information of two wave bands; the current effective diffraction order can be determined through the mass center positions of the light spots in the two corresponding wave band channels and the mapping relation between the light spot distance and the diffraction order, and finally the sun vector is obtained through calculation in combination with a diffraction optical model. According to the invention, the inherent contradiction that a large view field and high precision of a traditional digital sun sensor cannot be considered is solved, the problem of level ambiguity in a diffraction extended view field is effectively overcome, the lightweight design of the sun sensor adapts to the high-density integration requirement, and technical support is provided for spacecraft attitude measurement.

The invention provides a plasma photoetching imaging method and device and a computer readable medium, and the method comprises the steps: obtaining the axial direction of an imaging structure of plasma photoetching imaging, the imaging structure comprises a plurality of mask patterns which change periodically in one dimension, and irradiating the plurality of mask patterns in one-dimensional periodical change by light in a target direction forming a preset off-axis angle with the axial direction to obtain plasma photoetching images corresponding to the plurality of mask patterns in one-dimensional periodical change. That is to say, the diffraction order of the light can be influenced by irradiating the mask pattern in the target direction of the preset off-axis angle, so that the transmission efficiency of the light in the prohibited period range is improved, the contrast of the light intensity of the mask image in the prohibited period range during imaging is improved, and the imaging quality of the mask image in the prohibited period range is improved. And finally, realizing exposure imaging of the mask pattern in the prohibition period range.

A multi-focal ophthalmic lens using suppressed diffraction orders. A multi-focal ophthalmic lens includes an ophthalmic lens and a diffractive element. The ophthalmic lens has a base curvature corresponding to a base power. The diffractive element produces constructive interference in at least four consecutive diffraction orders corresponding to a range of vision between near vision and distance vision. The constructive interference produces a near focus point, a distance focus point, and an intermediate focus point between the near focus point and the distance focus point corresponding to the base power of the ophthalmic lens. The diffraction efficiency of at least one of the diffraction orders is suppressed to less than 10%.

This invention relates to the field of optical detection technology, specifically a multifocal parallel phase extraction and alignment system based on a spatial light modulator, comprising: a wavefront modulation module, a parallel detection module, an information extraction module, a parameter calculation module, and a correction and execution module. The wavefront modulation module loads a phase modulation pattern through a spatial light modulator, generating a complex wavefront containing multiple diffraction orders via the objective lens, forming multiple spatially separated detection focal spots on the sample surface. The parallel detection module receives the reflected light signals from each focal spot in parallel through an array detector. The information extraction module analyzes the signals and extracts the phase offset of each focal spot, constructing a mapping set between position and phase offset. The parameter calculation module calculates the tilt angle and field curvature distribution parameters based on this set. The correction and execution module generates a comprehensive correction signal to drive the objective lens or sample stage to perform multidimensional attitude adjustments. This system achieves multifocal parallel detection and synchronous parameter calculation, improving alignment efficiency and accuracy.

The invention provides an optical system, a three-dimensional information acquisition method and a three-dimensional reconstruction method.The optical system comprises a super-structure grating, a focusing lens and an imaging detector which are sequentially arranged along an optical axis, and the super-structure grating splits reflected light beams of a target object on at least four different diffraction levels to obtain at least four polarization sensitive light beams; the focusing lens is used for focusing the light beams split by the super-structure grating to different imaging areas of the imaging detector to form a plurality of sub-images, and the plurality of sub-images comprise polarization sub-images in one-to-one correspondence with the at least four polarization sensitive light beams; the image processing module is in communication connection with the imaging detector, and the image processing module calculates the depth information of the target object according to the parallax of the at least two sub-images and calculates the polarization information of the reflected light beam according to the at least four polarization sub-images; depth information and polarization information can be obtained through single shooting, and the optical system is simple and compact in size.

The application discloses a design method and system of a polarization detection metasurface. The method comprises the following steps: establishing a microstructure model, scanning the phase delay of microstructures with different geometric sizes under x and y polarizations; specifying two groups of orthogonal polarization states and target propagation angles, calculating the supercell size and the number of microstructures contained therein, and confirming the polarization beam splitting target required under the two groups of orthogonal polarization states; calculating the Jones matrix of each microstructure in the supercell and selecting a group of microstructure parameters as the initial solution; establishing a supercell model according to the initial solution and performing forward propagation simulation to obtain the diffraction order intensity distribution under the two groups of orthogonal polarizations, and constructing a loss function to obtain the optimal supercell structure meeting the polarization beam splitting target after iterative optimization; and performing two-dimensional periodic expansion on the supercell structure to obtain a metasurface structure. The application can realize efficient separation of multiple polarization states on a single metasurface, avoids the crosstalk problem in the traditional space division multiplexing mode, and improves the spatial resolution.

The invention provides a photoetching device preparation method for inhibiting a mask three-dimensional effect. The photoetching device preparation method can be applied to the technical field of integrated circuit manufacturing and photoetching. The preparation method of the photoetching device for inhibiting the three-dimensional effect of the mask comprises the steps that a plurality of candidate metal-medium multilayer film structures are constructed based on preset configuration parameters, and metal layer materials in different candidate metal-medium multilayer film structures are different; acquiring optical transfer functions corresponding to the plurality of candidate metal-medium multilayer film structures; screening out a target metal-medium multilayer film structure supporting a single high-order diffraction order dominant imaging mode from the plurality of candidate metal-medium multilayer film structures according to response characteristics of each optical transfer function in a spatial frequency domain; and preparing the photoetching device based on the target metal-medium multilayer film structure. The invention also provides a photoetching device for inhibiting the three-dimensional effect of the mask.

In a first aspect, the invention relates to an optical arrangement (1, 12) for a diffractive display. Said display has, in sequence along a direction of extent, a first reflective diffraction grating (15), a polarisation modulator (16), a second reflective diffraction grating (17) and a polarisation filter (18) for the first polarisation, the second polarisation being a transmission polarisation. The polarisation modulator (16) is configured to convert, at least in part, a portion of light having a first linear polarisation and a portion of light having a second polarisation, perpendicular to the first polarisation, into one another, the portions depending on the angle of incidence of the light on the polarisation modulator (16). The second reflective diffraction grating (17) is configured to diffract light with a first angle of incidence on the diffraction grating at least partially in the direction of the first reflective diffraction grating (15) with a first angle of emergence, and the first reflective diffraction grating (15) is configured to diffract diffracted light from the second reflective diffraction grating (17) at least partially with a second angle of emergence in the direction of the polarisation filter (18). The portion of the light which is converted by the polarisation modulator (16) from the first polarisation to the second polarisation or, conversely, from the second polarisation to the first polarisation is not the same for the second angle of emergence as for the first angle of emergence. Further aspects of the invention relate to a display device having the optical arrangement.

A programmable 3D beam shaping device based on beamlet printing technology, comprising a laser source, the laser source emits initial laser, the initial laser adjusts the polarization state through a rotatable half-wave plate, and then is separated into orthogonal s component beam and p component beam through a first polarization beam splitter prism; the p component beam is expanded and then enters a Dammann grating to generate a diffraction beam containing several diffraction orders; the diffraction beam passes through a second polarization beam splitter prism, a quarter-wave plate and a first focusing element in turn, introduces focal shift by a multi-stage phase plate array, adjusts the angle and position offset of the sub-group of the sub-beam array beam by a spatial light modulator to generate a working beam, the working beam returns to the second polarization beam splitter prism from the original light path and is emitted into a working area by a second focusing element, generating a three-dimensional light field; the device can accurately control the three-dimensional irradiance distribution in the processing area, thereby realizing multi-level and depth-adjustable energy deposition, and significantly improving the quality, efficiency and consistency of processing.

The application provides an optical waveguide and an electronic device. The optical waveguide comprises a waveguide substrate, and a coupling-in region and a coupling-out region are arranged on the side surface of the waveguide substrate. The coupling-in region is used for coupling light into the waveguide substrate, and the light is coupled out from the coupling-out region after reflection propagation inside the waveguide substrate. One of the coupling-in region and the coupling-out region is a positive dispersion region, and the other is a negative dispersion region. The dispersion generated after the light passes through the positive dispersion region is used for compensating the dispersion generated after the light passes through the negative dispersion region. The processing effects of the positive dispersion region and the negative dispersion region on light of different wavelengths can be mutually compensated, so that light of different wavelengths incident at the same incident angle can be emitted at a similar refraction angle. In this way, the light of different wavelengths can have a similar diffraction order when being coupled out, the energy of the light of different wavelengths coupled out is similar, and thus the picture effect of the electronic device is improved.

A method for optimizing a source profile and wavefront profile to simulate a lithography process is disclosed. More particularly, a method for minimizing a phase offset between diffraction orders in a source profile to generate an optimized source profile and an optimized wavefront profile, using a cost function with a phase cost term is disclosed. The disclosed method may further include a diffraction overlap penalty term in the cost function.

This invention discloses a square lattice structured light-illuminated super-resolution microscopy system and method. The system integrates a square blazed grating hologram generation module, a digital lens hologram generation module, and a composite hologram generation module on its phase modulator. Wavefront phase modulation of the incident beam is achieved by loading the composite hologram onto the incident beam. The acquired raw image is pre-filtered, multiplied by a pre-calculated weighting function, and superimposed to obtain an intermediate image. Finally, deconvolution is performed on the intermediate image to obtain the final super-resolution image. This invention concentrates light energy into effective diffraction orders through the loaded square blazed grating hologram, improving the system's light energy utilization efficiency. Combining the digital lens hologram and adjusting the lens focal length allows control of the focusing position of the diffraction orders. Furthermore, adjusting optical elements enables switching between different magnification objectives, meeting the needs of multi-scale sample observation.

The application relates to the technical field of single-point diamond turning, in particular to a method for estimating the influence of a single-point diamond turning tool mark diffraction on image quality, which comprises the following steps: designing an optical system and modeling a tool mark diffraction surface as a phase diffraction annular grating in the optical system; calculating an amplitude spread function of light rays after the light rays pass through the optical system and reach an image plane; respectively calculating diffraction efficiencies of different diffraction orders under the amplitude spread function of the same wavelength, and superimposing the amplitude spread functions after the amplitude spread functions are normalized to the corresponding diffraction efficiencies; calculating a complex color intensity spread function based on the amplitude spread functions of different wavelengths; and obtaining a modulation transfer function after image quality is reduced based on the complex color intensity spread function, so that a design index can be effectively comprehensively evaluated, processing test cost is reduced, and a production cycle is shortened.

The invention relates to an X-ray optical unit (1) for focusing X-ray radiation (300) into a focal plane (100), comprising at least one diffractive X-ray lens (2), a diffraction order filter aperture (3), OSA, wherein the diffractive X-ray lens (2) and the diffraction order filter aperture (3) are arranged along an optical axis (200) of the X-ray optical unit (1), wherein the X-ray optical unit (1) has a holding device (12) running along the optical axis (200), and a first shielding device (11) running along the optical axis (200), wherein the holding device (12) is connected to the diffractive X-ray lens (2), wherein the first shielding device (11) is designed as a first shielding device (11) surrounding the optical axis (200), and is connected to the diffraction order filter aperture (3) and thus delimits a first volume (V1) in which both the holding device (12) and the diffractive X-ray lens (2) are circumferentially shielded such that electrons (e-) generated by X-ray radiation (300) in the first volume (V1) are shielded by way of the first shielding device (11).

The invention relates to a substrate and a processing method and system thereof, computer equipment, a computer readable storage medium and a computer program product. The method is applied to a substrate processing system, the substrate processing system comprises an optical multi-focus generator, a focus lens and a processing platform, the processing platform is used for placing a to-be-processed substrate, and the transparency of the to-be-processed substrate is greater than a preset transparency threshold; the method comprises the steps that a light beam emitted by a laser is received through an optical multi-focus generator, the light beam is separated at different diffraction orders based on a preset focus slope, and the focus slope is used for adjusting the vertical axial position of a focusing light spot; according to the method, light beams of different diffraction orders are converged through a focusing lens based on a preset focusing lens focal length, focusing light spots are formed on a focusing processing area of a to-be-processed substrate, the focusing light spots are used for processing the to-be-processed substrate, and the focusing lens focal length is used for adjusting the axial position of the focusing light spots. By adopting the method, the processing yield can be improved.

The invention relates to an X-ray optical unit (1) for focusing X-ray radiation (300) into a focal plane (100), comprising at least one diffractive X-ray lens (2), a diffraction order filter aperture (3), OSA, wherein the diffractive X-ray lens (2) and the diffraction order filter aperture (3) are arranged along an optical axis (200) of the X-ray optical unit (1), wherein the X-ray optical unit (1) has a holding device (12) running along the optical axis (200), and a first shielding device (11) running along the optical axis (200), wherein the holding device (12) is connected to the diffractive X-ray lens (2), wherein the first shielding device (11) is designed as a first shielding device (11) surrounding the optical axis (200), and is connected to the diffraction order filter aperture (3) and thus delimits a first volume (V1) in which both the holding device (12) and the diffractive X-ray lens (2) are circumferentially shielded such that electrons (e-) generated by X-ray radiation (300) in the first volume (V1) are shielded by way of the first shielding device (11).

The invention provides an all-round dynamic holographic three-dimensional display system, which comprises a light source module used for generating red, green and blue three-color high-coherence parallel light; the color imaging device is used for respectively loading red, green and blue three-color holograms and generating reproduction light; the combined prism is used for realizing beam splitting of the illumination light and beam combination of the reproduction light; the filtering and amplifying module is used for performing single side band filtering on the reproduced light to remove zero-order light, a conjugate image and high-order diffraction order, and amplifying and imaging a hologram in the air to form a display screen; the rotary scanning module comprises a hollow or coaxial rotating motor and a scanning structure composed of a lens and a reflecting mirror, and is used for emitting light emitted by the display screen at an inclined angle and realizing 360-degree conical scanning in the horizontal direction and seamless splicing of the window through high-speed rotation; the directional holographic scattering film is arranged in the real image reconstruction area, only provides a scattering angle in the vertical direction, and is used for expanding a vertical visual angle without influencing the horizontal resolution; the synchronous control module is used for synchronously controlling the refresh rate of the color imaging device and the rotating speed of the motor; and the three-dimensional data processing module is used for generating and transmitting a holographic video sequence. The system can realize color dynamic three-dimensional display with 800 windows, 0.45-degree visual angle resolution and more than 24 frames per second, has the capabilities of aerial suspension imaging, no visual angle shielding, smooth motion parallax and multi-user naked eye viewing, and remarkably improves the immersion and practicability.

a scale readable by the readhead and including a series of features that diffract light into a plurality of diffraction orders so as to determine the relative position of the scale and the readhead; and a readhead including a light source for illuminating the scale, a first sensor, and a second sensor, wherein at least one diffraction order has an optical state that is different from the optical state of at least one other diffraction order, and the optical states of the diffraction orders are configured such that a signal sensed by the first sensor is formed from a diffraction order composition that is different from the diffraction order composition of a signal sensed by the second sensor.

The invention discloses a diffraction element for generating an annular light source and a design method thereof, and belongs to the technical field of diffraction optics. The design method comprises the following steps: establishing a plane wave and spherical wave incident ray tracing model based on a geometrical optics theory; performing diffraction surface optical path difference and phase distribution calculation according to a ray tracing model; fitting the calculated phase distribution data into a grid phase surface type supported by optical simulation software; light path optimization is carried out in the grid phase surface type obtained through fitting until the annular light spots are converged; micro-nano structure parameters of the diffraction element corresponding to convergence of the annular light spots are calculated, the design of the diffraction element is completed, and the micro-nano structure parameters comprise the etching depth, the diffraction order, the minimum line width and the duty cycle. The problems that a traditional iterative algorithm is large in calculation amount and large in simulation deviation, a traditional axis prism system is large in size and low in efficiency, and an existing diffraction element is difficult in phase singular point fitting are solved, and high-precision and high-efficiency annular light source generation is achieved.

Disclosed is a photonic integrated circuit metrology sensor comprising: a first interference device being operable to receive at least a pair of corresponding diffraction orders having been scattered from a target and generate at least a first signal and a second signal; an imbalanced delay arrangement arranged to impose an imbalanced delay on a portion of said first signal and a portion of said second signal to obtain a first delayed signal and a second delayed signal; a second interference device being operable to receive at least said second first delayed signal and a second delayed signal and generate a third signal and a fourth signal; and a waveguide device arrangement being configured at least to guide said first signal, second signal, third signal and fourth signal for detection.

This invention provides a method and apparatus for measuring overlay error of integrated circuits based on small-angle X-ray scattering. The method includes acquiring the morphology and key dimensions of an overlay offset measurement mark in the integrated circuit; obtaining the shape factor of the overlay offset measurement mark based on a small-angle X-ray scattering model, combined with the morphology and key dimensions of the overlay error measurement mark; establishing a theoretical scattered light intensity model when small-angle X-rays are incident on the overlay offset measurement mark based on the shape factor of the overlay offset measurement mark; modulating the theoretical scattered light intensity model and determining the peak position of the modulated scattered light intensity at the target diffraction order position; and calculating the overlay error under the overlay offset measurement mark based on the peak position, the target diffraction order position, and the target overlay offset value. This invention can quickly calculate the overlay error of overlay structures with different shapes and improves the accuracy of the measurement results.

A sensor apparatus includes a sensor array and a metrology stage coupled to the sensor array. The sensor array includes a plurality of sensors. Each sensor of the sensor array is configured to illuminate radiation to a diffraction target on a substrate and detect a signal beam including diffraction order sub-beams diffracted from the diffraction target. The metrology stage is configured to move the sensor array relative to the substrate. The sensor apparatus is configured to measure a plurality of diffraction targets on the substrate at a rate based on a density of the plurality of sensors relative to the plurality of diffraction targets.