The invention belongs to the technical field of optical camera products, and provides a high-duty-ratio micro-
lens array preparation method and a
light field camera. The method comprises the following steps: S1, preparing a photoetching
mask plate with a high duty ratio, and performing contact photoetching
processing to obtain a
spin coating chromium plate photoetching
mask plate; s2, cleaning the
micro lens array substrate; s3, spin-
coating a hydrophobic layer; s4, patterning the sacrificial layer; s5, performing
plasma ashing and
selective surface modification; s6, removing the part, which is not modified, of the
photoresist; and S7, performing blade
coating of optical
cement to form a micro lens, thereby obtaining a wettability
micro lens array with a high duty ratio. By adopting the cheap
CMOS image sensor and by virtue of the advantages of the wettability micro-
lens array with high duty ratio, the
light field camera is constructed, so that the brightness, the
signal-to-
noise ratio, the spatial resolution and the three-dimensional
perception capability of a picture shot by the
light field camera are remarkably improved, and accurate analysis of the image is facilitated; the method is used in the fields of automatic driving, cultural relic
digitization, industrial detection, medical images and the like.