2622results about "Polarisation-affecting properties" patented technology

An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent. The radiation that is reflected off the substrate is radially polarized.

An apparatus includes a first section operable to detect polarization-sensitive radiation emitted by an object, and a second section operable to determine a Jones matrix based on information obtained by the first section from the polarization-sensitive radiation. The second section thereafter transforms the Jones matrix into a Mueller matrix, the Mueller matrix being representative of properties of the object.

Method and apparatus for reflected imaging analysis. Reflected imaging is used to perform non-invasive, in vivo analysis of a subject's vascular system. A raw reflected image (110) is normalized with respect to the background to form a corrected reflected image (120). An analysis image (130) is segmented from the corrected reflected image to include a scene of interest for analysis. The method and apparatus can be used to determine such characteristics as the hemoglobin concentration per unit volume of blood, the number of white blood cells per unit volume of blood, a mean cell volume, the number of platelets per unit volume of blood, and the hematocrit. Cross-polarizers can be used to improve visualization of the reflected image.

Registration correction for optical tomographic imaging in three dimensions. An object of interest is illuminated to produce an image. A lateral offset correction value is determined for the image. An axial offset correction value is determined for the image. The lateral offset correction value and the axial offset correction value are applied to the image to produce a corrected file image.

An apparatus and method for automatically tuning a resonant circuit in a chiroptical measurement system. A sample cell holds a sample being measured for a chiroptical property as the sample is modulated by the resonant circuit. A signal source coupled to the resonant circuit generates a driving signal at one of a plurality of frequencies to modulate the resonant circuit. The frequencies are within a range of expected resonant frequencies for the resonant circuit. A feedback loop circuit coupled to the signal source is used to adjust the frequency of the driving signal to another of the frequencies in response to a feedback signal associated with a measured parameter of the driving signal. In this way, the frequency of the driving signal is adjusted to create a resonant condition. The driving signal may also be applied at a reduced power level so that the resonant circuit can be driven at off-resonant frequencies within the range of frequencies.

Apparatus and methods for hyperspectral imaging analysis that assists in real and near-real time assessment of biological tissue condition, viability, and type, and monitoring the above over time. Embodiments of the invention are particularly useful in surgery, clinical procedures, tissue assessment, diagnostic procedures, health monitoring, and medical evaluations, especially in the detection and treatment of cancer.

To provide a measuring method which enables a highly accurate measurement of concentrations of specific components in subjects of measurement even when the concentration measuring contact of a concentration measuring instrument is contaminated with drinks or the like.

The concentration measuring instrument includes:

a main body that has a concentration measuring contact, a light source and a photodetector; and

judging means that calculates the difference between a non-contact-measured value, a value, measured by the photodetector while keeping a subject of measurement out of contact with the concentration measuring contact, of the quantity of light that is emitted and entered by the light source into the concentration measuring contact and returned to the concentration measuring contact and a predetermined reference value obtained in advance by making measurement while keeping the concentration measuring contact clean and judges whether the calculation of the concentration of the specific component in the subject of measurement is effective or not by comparing the calculated difference with a predetermined threshold.

A system for the identification and quantification of a biological sample suspended in a liquid includes a fluorescence excitation module with at least one excitation light source; a sample interface module optically coupled to the fluorescence excitation module for positioning a biological sample to receive excitation light from the at least one excitation light source; a fluorescence emission module optically coupled to the sample interface module and comprising at least one detection device for detecting fluorescence excitation-emission matrices of the biological sample; and a computer module operatively coupled to the fluorescence emission module. The computer module performs multivariate analysis on the fluorescence excitation-emission matrices of the biological sample to identify and quantify the biological sample. The multivariate analysis may comprise extended partial least squared analysis for identification and quantification of the biological sample. A method for the identification and quantification of a biological sample suspended in a liquid is also provided.

A surface inspection system, as well as related components and methods, are provided. The surface inspection system includes a beam source subsystem, a beam scanning subsystem, a workpiece movement subsystem, an optical collection and detection subsystem, and a processing subsystem. The signal processing subsystem comprises a series of data acquisition nodes, each dedicated to a collection detection module and a plurality of data reduction nodes, made available on a peer to peer basis to each data acquisition nodes. Improved methods for detecting signal in the presence of noise are also provided.

A method and apparatus for determining optical mask corrections for photolithography. A plurality of grating patterns is printed onto a wafer utilizing a photomask having at least one grating. Each grating pattern within the plurality of grating patterns is associated with known photolithographic settings. Each grating pattern is illuminated independently with a light source, so that light is diffracted off each grating pattern. The diffracted light is measured utilizing scatterometry techniques to determine measured diffracted values. The measured diffracted values are compared to values in a library to determine a profile match. A 2-dimensional profile description is assigned to each grating pattern based on the profile match. A database is compiled of the profile descriptions for the plurality of grating patterns. Photomask design rules are then generated by accessing the database containing the 2-dimensional profile descriptions. In preferred embodiments, the design rules are used to create and correct masks containing OPC corrections, phase-shifting mask corrections and binary masks. In a preferred embodiment the at least one grating is a bi-periodic grating. In a preferred embodiment, the scatterometry technique is optical digital profilometry utilizing a reflectometer or ellipsometer.

An in vivo imaging device having an illumination system that creates a virtual source within a tissue region of a subject in a non-invasive manner. The illumination system transforms a maximum amount of illumination energy from a light source into a high contrast illumination pattern. The illumination pattern is projected onto the object plane in a manner that maximizes the depth to which clear images of sub-surface features can be obtained. The high intensity portion of the illumination pattern is directed onto the object plane outside the field of view of an image capturing device that detects the image. In this configuration, scattered light from within the tissue region interacts with the object being imaged. This illumination technique provides for a high contrast image of sub-surface phenomena such as vein structure, blood flow within veins, gland structure, etc.

An apparatus and method to determine the surface orientation of objects in a field of view is provided by utilizing an array of polarizers and a means for microscanning an image of the objects over the polarizer array. In the preferred embodiment, a sequence of three image frames is captured using a focal plane array of photodetectors. Between frames the image is displaced by a distance equal to a polarizer array element. By combining the signals recorded in the three image frames, the intensity, percent of linear polarization, and angle of the polarization plane can be determined for radiation from each point on the object. The intensity can be used to determine the temperature at a corresponding point on the object. The percent of linear polarization and angle of the polarization plane can be used to determine the surface orientation at a corresponding point on the object. Surface orientation data from different points on the object can be combined to determine the object's shape and pose. Images of the Stokes parameters can be captured and viewed at video frequency. In an alternative embodiment, multi-spectral images can be captured for objects with point source resolution. Potential applications are in robotic vision, machine vision, computer vision, remote sensing, and infrared missile seekers. Other applications are detection and recognition of objects, automatic object recognition, and surveillance. This method of sensing is potentially useful in autonomous navigation and obstacle avoidance systems in automobiles and automated manufacturing and quality control systems.

Methods and systems for monitoring semiconductor fabrication processes are provided. A system may include a stage configured to support a specimen and coupled to a measurement device. The measurement device may include an illumination system and a detection system. The illumination system and the detection system may be configured such that the system may be configured to determine multiple properties of the specimen. For example, the system may be configured to determine multiple properties of a specimen including, but not limited to, critical dimension, a presence of defects, and a thin film characteristic. In this manner, a measurement device may perform multiple optical and/or non-optical metrology and/or inspection techniques.

The present invention provides a method for embedding particles in a solid structure including the steps of extruding a slurry of particles and a polymeric solution into a linear polymer medium having particles embedded into a polymer portion; and curing the polymer portion of the linear polymer medium.

A process control method to monitor ion implantation process conditions by measuring the optical properties of a masking material is provided. A patterned masking material may protect underlying regions of a semiconductor substrate from undergoing a chemical or physical change during an ion implantation process. The patterned masking material, however, may also undergo a chemical or physical change during processing. The chemical or physical changes to the masking material during such processing may also cause the optical properties of the material to change. The optical properties of the masking material may be used to determine the concentration of ions implanted into the semiconductor substrate.

Apparatus, method and storage medium which can provide at least one first electro-magnetic radiation to a sample and at least one second electromagnetic radiation to a reference, such that the first and/or second electromagnetic radiations have a spectrum which changes over time. In addition, a first polarization component of at least one third radiation associated with the first radiation can be combined with a second polarization component of at least one fourth radiation associated with the second radiation with one another. The first and second polarizations may be specifically controlled to be at least approximately orthogonal to one another.

An alignment target includes periodic patterns on two elements. The periodic patterns are aligned when the two elements are properly aligned. By measuring the two periodic patterns with an incident beam having a single polarization state and detecting the intensity of the resulting polarized light, it can be determined if the two elements are aligned. The same polarization state may be detected as is incident or different polarization states may be used. A reference measurement location may be used that includes a third periodic pattern on the first element and a fourth periodic pattern on the second element, which have a designed in offset, i.e., an offset when there is an offset of a known magnitude when the first and second element are properly aligned. The reference measurement location is similarly measured with a single polarization state.

An apparatus and a method of depositing a dielectric material film, including steps of initiating a process of depositing a dielectric material film under at least one controllable initial condition in an apparatus comprising a dielectric material deposition chamber and a spectroscopic ellipsometer; and measuring, by the spectroscopic ellipsometer, at least one ellipsometric parameter of the dielectric material film during the process of depositing the film.

An image analysis workstation for analyzing optical thin film arrays is disclosed. One disclosed embodiment relates to individual arrays that comprise a single optical thin film test surface that provides a plurality of discretely addressable locations, each comprising an immobilized capture reagent for an analyte of interest. These are referred to herein as "arrayed optical thin film test surfaces." Preferably, an individual arrayed optical thin film test surface comprises at least 4, more preferably at least 16, even more preferably at least 32, still more preferably at least 64, and most preferably 128 or more discretely addressable locations. One or more of the discretely addressable locations may provide control signals (e.g., for normalizing signals and/or that act as positive and/or negative controls) or fiducial signals (i.e., information that is used to determine the relative alignment of the arrayed optical thin film test surface within the device.

A method and apparatus for measuring microstructures, anistropy and birefringence in polymers using laser scattered light includes a laser which provides a beam that can be conditioned and is directed at a fiber or film which causes the beam to scatter. Backscatter light is received and processed with detectors and beam splitters to obtain data. The data is directed to a computer where it is processed to obtain information about the fiber or film, such as the birefringence and diameter. This information provides a basis for modifications to the production process to enhance the process.