106 results about "Optical metrology" patented technology

The invention provides a vacuum ultraviolet deuterium lamp spectral radiance traceability method, device and equipment, and relates to the technical field of optical metrology. The method comprises the following steps: determining relative spectral distribution of a deuterium lamp in a vacuum ultraviolet band; acquiring the spectral radiation brightness of the deuterium lamp at 200nm under the condition that the black body is used as a standard radiation source; and determining the spectral radiation brightness of the deuterium lamp in the vacuum ultraviolet band according to the relative spectral distribution of the deuterium lamp in the vacuum ultraviolet band and the spectral radiation brightness of the deuterium lamp at 200nm. The method provided by the embodiment of the invention efficiently and accurately realizes the spectral radiance traceability of the vacuum ultraviolet deuterium lamp.

The invention provides a tunnel convergence deformation data acquisition system and method, and relates to the technical field of optical metrology, laser point cloud data of reflection mark points on the inner wall of a tunnel is acquired, local modeling is performed on the laser point cloud data to obtain a local point cloud subset, and then nonlinear fitting is performed on the local point cloud subset to obtain a local deformation descriptor; determining a registration error according to the local deformation descriptor and the space image information of the inner wall of the tunnel, and performing iterative elimination reconstruction on the laser point cloud data according to the registration error to obtain a local deformation matching model; determining a deformation characteristic reference of the inner wall of the tunnel through local reflection data obtained by performing local laser scanning on the reflection mark points of the inner wall of the tunnel; the local deformation matching model determines a deviation abnormal value of the tunnel inner wall based on the deformation feature reference, convergence deformation data of the tunnel inner wall are obtained through screening of the deviation abnormal value, nonlinear local tiny deformation detection can be achieved, and the sensing capacity of the irregular tunnel inner wall is improved.

A system for providing a contour map of the surface of a heliostat from reflected sunlight using a fly's eye camera. The system includes an entrance screen configured to receive sunlight reflected by said heliostat; an array of imaging apertures extending across the entrance screen, each aperture forming an image of said heliostat from a different viewpoint to provide a plurality of heliostat images; one or more digital cameras configured to view all of said plurality of heliostat images; an image processor configured to map out from the plurality of heliostat images a location of sunlight delivered to the entrance screen to obtain a plurality of maps, and to provide, based on centroids of said maps a tip and tilt of each said subsection The reflecting surface profile of the heliostat is obtained by integration of the subsection tilts across all the subsections.

The invention discloses a sine frequency modulation harmonic error compensation method based on Bessel function modulation characteristics, and relates to the technical field of sine frequency modulation nonlinear parameter compensation and high-precision measurement of target absolute distance based on multi-wavelength interference. The problem that the constant phase demodulation precision is insufficient due to the fact that carrier harmonic waves, accompanying amplitude modulation and modulation depth errors cannot be effectively suppressed due to laser modulation nonlinearity in existing sine frequency modulation distance measurement is solved. According to the method, after sine frequency modulation interference signals are collected, high-pass filtering is carried out to remove low-frequency components, Hilbert transform is carried out to remove envelope suppression associated amplitude modulation, window function frequency mixing is carried out to extract modulation depth, a matched carrier containing second harmonics is constructed, and frequency modulation harmonic parameter optimization is achieved through baseband amplitude maximization. And finally, carrying out orthogonal demodulation on the compensated interference signal to obtain a high-precision constant phase. The method is suitable for high-precision multi-wavelength interference ranging, precision displacement measurement and optical metering systems.

An illumination mode selector for use in an illumination branch of an optical metrology tool, and an associated optical metrology tool. The illumination mode selector includes a plurality of illumination apertures; and at least one polarization-changing optical element. Each of the illumination apertures and each of the at least one polarization-changing optical element are individually switchable into an illumination path of the optical metrology tool.

The utility model provides a spectral responsivity calibration device, and relates to the technical field of optical metrology. The device comprises a light source module, a light path module, a detection module, a control system and a packaging box, wherein the control system is respectively in communication connection with a light source, a light path and the detection module; the light source module is a direct-current voltage-stabilizing light source combined by a deuterium lamp and a halogen lamp; the light path module comprises an adjustable grating, a monochromator, a reflector and a lock-in amplifier, and the light path module is of a double-light-path design; the detection module comprises a reference detector, a standard detector and a detected detector. The standard detector is composed of a standard silicon detector, a standard indium gallium arsenic detector, a standard germanium detector and a standard lead sulfide detector. The device can be used for calibrating the spectral responsivity of ultraviolet, visible and near infrared detectors, and can be used for measuring and calibrating the spectral responsivity of the detected detector through a comparison method by arranging standard detectors such as silicon, germanium, indium gallium arsenic, lead sulfide and the like.

The methods and apparatus provide phase-resolved optical metrology for determining qualities of a substrate and films thereon. Transmitted and reflected signals are coupled using both amplitude and phase information to improve the metrology information obtained from film layers on the substrate.

The present invention relates to a shortwave telecentric optical system and an imaging method thereof. The optical system comprises a first lens, a second lens, a third lens, a fourth lens, a fifth lens, a sixth lens, a seventh lens, an eighth lens, a ninth lens, and a tenth lens, arranged sequentially along the incident direction of light. The present invention provides a large relative aperture, limited-yoke object-space telecentric system, compatible with a refrigerated shortwave infrared detector (640×512@15μm). The large relative aperture system offers high energy concentration, while the refrigerated shortwave detector operates in a low-temperature environment, resulting in a high signal-to-noise ratio and enhanced detail resolution. Telecentric optical systems have a wide range of applications in precision measurement, optical metrology instruments, and other fields, particularly in applications requiring high-precision measurements.

An optical metrology system for measuring a periodic target. The system comprises first and second emission paths configured to emit first and second illumination beams. The system comprises first and second collection paths configured to collect first and second reflected beams formed by the first and second illumination beams. The system comprises a detector optically coupled to the first and second collection paths and configured to measure intensities of the first and second reflected beams. The system comprises an actuation system configured to generate relative movement between the periodic target and the first and second illumination beams. The system comprises a processor configured to determine alignment information at least partly based on a phase of the measured intensities of the first and second reflected beams. The system maybe at least partly implemented in the form of a photonic integrated circuit.

A measurement system for use in optical metrology, the measurement system which includes a control system configured and operable to carry out the following: (i) receive raw measured data generated by a measurement unit that is configured and operable for performing normal-incidence spectral interferometric measurements on a sample and generating the raw measured data indicative of spectral interferometric signals measured on the sample for a number of different optical path differences (OPDs) between sample and reference arms using infrared wavelengths; (ii) extract, from the raw measured data, a portion of spectral interferometric signals describing variation of signal intensity with a change of an optical path difference OPD during interferometric measurements, said portion of the spectral interferometric signals being independent of interferometric signals returned from a bottom portion of the sample in response to said illuminating electromagnetic field; and (iii) directly determine, from the extracted portion of the spectral interferometric signals, both spectral amplitude and phase of reflection of the illuminating electromagnetic field from the top portion of the sample, thereby enabling to determine a measured spectral signature characterizing the top portion of the sample.

The invention relates to a computer-implemented method using an optical metrology system, which comprises an optical tool setting and measuring device, and using a computer system, comprising at least the following method steps: receiving and / or retrieving a digital data sheet of a tool, which includes a technical drawing of the tool and a dimensional specification of the tool, by the computer system, reading out the technical drawing and the dimensional specification from the digital data sheet at least by means of an analysis and evaluation module in order to extract at least some of the data and / or information which is contained in the digital data sheet and describes the tool, said module being part of the computer system and comprising at least one trained algorithm of machine learning, creating at least one measurement program for the optical tool setting and measuring device on the basis of measurement features, which were determined on the basis of the readout, by at least one trained algorithm of machine learning of the analysis and evaluation module and / or selecting a measurement program for the optical tool setting and measuring device from a list of measurement programs stored in the computer system, on the basis of the determined measurement features, by means of at least one trained algorithm of machine learning of the analysis and evaluation module.

An optical metrology system can include an overlay metrology tool for characterizing an overlay target on a sample, where the overlay target includes first direction periodic features in a first set of layers of the sample and second direction periodic features in a second set of layers of the sample. The overlay metrology tool can simultaneously illuminate the overlay target using first and second illumination beams and can further generate an image of the overlay target based on diffraction of the first and second illumination beams through the overlay target, where diffraction orders of the first illumination beam contribute to resolved image formation of only the first direction periodic features, and where diffraction orders of the second illumination beam contribute to resolved image formation of only the second direction periodic features. The system can further generate overlay measurements along first and second measurement directions based on the image.

An optical metrology system may include illumination optics to direct pairs of mutually-coherent illumination beams to an optical metrology target, where the optical metrology target includes sets of periodic features having features with periodicity along different measurement directions. A pair of mutually-coherent illumination beams has opposing azimuth incidence angles and a common altitude incidence angle, where the azimuth incidence angles are rotated with respect to the measurement directions. The system may further generate dark-field images of the optical metrology target, where an image of a periodic structures is formed as a sinusoidal interference pattern generated by interference of a single non-zero diffraction order of light from each of the illumination beams within a pair of mutually-coherent illumination beams. A controller may generate optical metrology measurements along the measurement directions based on the images. The system may mitigate an impact of zero-order side lobes through blocking or image filtering.

A method of characterizing a device under test (DUT) includes illuminating the DUT with a broadband optical beam within an optical field of view (FOV), illuminating the DUT with an X-ray beam within an X-ray FOV overlapping the optical FOV, and concurrently acquiring X-ray metrology information, e.g., one or more X-ray images utilizing various modalities, such as absorption, phase contrast difference, darkfield, small angle X-ray scattering (SAXS) and / or fluorescence, from the X-ray FOV and a plurality of optical images of the optical FOV, each of the optical images corresponding to respective selected wavelengths of the broadband optical beam from each of ultraviolet, visible, and infrared wavelengths, for example including deep ultraviolet, near infrared, or short-wavelength infrared wavelengths. The DUT may be one or more substrates, e.g., stacked, and include electronic devices such as three-dimensional integrated devices.

A computer-implemented method is described, comprising an optical metrology system including an optical tool presetting and measuring device, and a computer system, comprising at least the following steps: receiving and / or retrieving a digital datasheet of a tool, which includes a technical drawing of the tool and a dimension of the tool, by the computer system; reading the technical drawing and the dimension from the digital datasheet by means of an analysis and evaluation module of the computer system comprising at least one trained machine learning algorithm to extract at least a part of the data and / or information contained in the digital datasheet that describes the tool.Proposed: Creation of at least one measurement program for the optical tool presetting and measuring device based on measurement characteristics determined by reading out data, using at least one trained machine learning algorithm of the analysis and evaluation module, and / or selection of a measurement program for the optical tool presetting and measuring device from a list of measurement programs stored in the computer system based on the determined measurement characteristics, using at least one trained machine learning algorithm of the analysis and evaluation module.

A method of characterizing a device under test (DUT) includes illuminating the DUT with a broadband light beam within an optical field of view (FOV); irradiating the DUT with an X-ray beam within an X-ray FOV overlapping the optical FOV; and concurrently acquiring X-ray metrology information of the X-ray FOV (e.g., one or more X-ray images acquired with various modalities such as absorption, phase contrast difference, dark field, small angle X-ray scattering (SAXS), and / or fluorescence) and a plurality of optical images of the optical FOV, each of the optical images corresponds to a respective selected wavelength of each of an ultraviolet wavelength, a visible wavelength, and an infrared wavelength (e.g., including a deep ultraviolet wavelength, a near infrared wavelength, or a short-wave infrared wavelength) in the broadband beam. The DUT may be one or more substrates (e.g., in a stack) and include electronic devices such as three-dimensional integrated devices.

There are disclosed various methods and apparatuses for realizing optical referencing within an image transferring device. In some embodiments a projecting device is aligned with an input section of an image transferring device; a detecting device is aligned with an output section of the image transferring device; electromagnetic radiation is generated by the projecting device; the electromagnetic radiation is projected towards the input section of the image transferring device; the electromagnetic radiation transported by the image transferring device from the input section to the output section of the image transferring device is received; and the received electromagnetic radiation is analyzed.

An advance in high-resolution optical metrology has been achieved by the introduction of incoherent holographic imaging. FINCH, an example of incoherent holography, is shown to simplify the process, eliminating many steps in metrology and at the same time increasing throughput, resolution and accuracy of the method. A proposed technique requires only a single image capture with a non-moving camera rather than the capture of multiple stacks of images requiring many camera exposures and movement of the camera or sample in the conventional techniques.

An optical metrology device configured for transient ellipsometry includes a light source with at least one laser, that generates pump pulses at a first pulse repetition rate and probe pulses at a second, different, pulse repetition rate that produces a varying time delay between the pump pulses and the probe pulses. The pump pulses generate transient perturbations in the sample material and reflected probe pulses are modulated in response to the transient perturbation in the sample material based on the varying time delay. A polarization state generator generates a polarization state in the probe pulses and a polarization state analyzer analyzes the reflected probe pulses from the sample, which is received by a detector. Transient ellipsometric measurements are generated from the reflected probe pulses at a plurality of time delays between the pump pulses and probe pulses.

Semiconductor device metrology including creating a time-domain representation of wavelength-domain measurement data of light reflected by a patterned structure of a semiconductor device, selecting an earlier-in-time portion of the time-domain representation that excludes a later-in-time portion of the time-domain representation, and determining one or more measurements of one or more parameters of interest of the patterned structure by performing model-based processing using the earlier-in-time portion of the time-domain representation.

The invention discloses a high-precision alignment fitting and online metering reworking system and process of a flexible optical element, which are applied to the field of optical elements, and the scheme establishes a computable error model in the fitting process of a flexible substrate and an optical microstructure, completes estimation in a production takt, fuses visual, electrical and optical metering results, and improves the precision of the flexible substrate and the optical microstructure. According to the method, a unified'pass / rework / degradation / scrap 'decision is output, alignment error statistics and defect reason codes are recharged into manufacturing parameters and design parameters, alignment errors are converted into an estimable, compensable and traceable quantitative closed loop from'empirical debugging', the rejection rate is remarkably reduced through online metering and rework window control, the yield and consistency are improved, and the product quality is improved. And a systematic barrier of a process control loop and a data packet tracing interface is formed.

The invention relates to the technical field of optical metering and testing, in particular to an in-situ measurement device and method for surface infrared spectral emissivity of a high-frequency induction wind tunnel stationary point test model. Comprising a heating wind tunnel, a light path switching unit, a motion unit, a temperature detection unit, an infrared spectrometer and a variable temperature black body. The heating wind tunnel is used for simulating and manufacturing a plasma ultra-high-temperature environment for the aircraft test model in the heating wind tunnel when the aircraft returns to the atmosphere; the light path switching unit is used for reflecting light of the aircraft test model to the infrared spectrometer; or the light of the variable-temperature black body is reflected to the infrared spectrometer; an emergent light path of the light path switching unit is a first light path; the motion unit is used for moving the temperature detection unit into or out of the first light path; the temperature detection unit is used for detecting the temperature of the aircraft test model when the temperature detection unit moves into the first light path; the infrared spectrometer is located on the first light path and used for measuring spectral signals of the aircraft test model and the variable-temperature black body.

The invention relates to a method for operating a pulsed discharge plasma source, as well as a discharge plasma source and an optical metrology system. In the method, the discharge plasma source emits a plurality of light pulses, wherein a pulse rate set during this emission of light pulses is varied over time during the operation of the discharge plasma source.

The application discloses a sample wheel for optical metrological verification, which comprises a supporting mechanism, a rotating mechanism, a translation mechanism and a control unit; the supporting mechanism comprises a base, a sample wheel support and a sample wheel; the bottom of the sample wheel support is fixed on the base, and the sample wheel is arranged above the sample wheel support through a rotating shaft; a plurality of sample chambers are arranged on the outer edge of the sample wheel, and a sample fixing device is arranged in each sample chamber; the rotating mechanism comprises a stepping motor, and the stepping motor drives the sample wheel to rotate; the translation mechanism comprises a hydraulic device and a slide rail; one end of a hydraulic rod of the hydraulic device is hinged to the base, and the other end of the hydraulic rod is arranged on the rotating shaft through a sleeve, and the hydraulic rod is controlled to stretch and retract by the control unit; a bearing is arranged between the sleeve and the rotating shaft, and gears are arranged at the two ends of the bearing; the bottom of the slide rail is embedded into a horizontal sliding groove at the top of the sample wheel support, and a rack meshing with the gears is arranged on the top of the slide rail along the sliding direction. The application can avoid the influence of manual sample replacement on the measurement result, avoid the influence of the sample measurement position on the measurement result, has high working efficiency and accurate measurement data.

An advance in high-resolution optical metrology has been achieved by the introduction of incoherent holographic imaging. FINCH, an example of incoherent holography, is shown to simplify the process, eliminating many steps in metrology and at the same time increasing throughput, resolution and accuracy of the method. A proposed technique requires only a single image capture with a non-moving camera rather than the capture of multiple stacks of images requiring many camera exposures and movement of the camera or sample in the conventional techniques.

The present application belongs to the technical field of optical metrology and image processing, and particularly relates to a pseudo displacement identification and data validity determination method in structural visual monitoring, comprising the following steps: S1: acquiring a monitoring image sequence, a stable reference area and auxiliary state information; S2: extracting monitoring point displacement, image quality and multi-source state characteristics; S3: constructing a multi-dimensional consistency index; S4: judging whether the multi-dimensional consistency index meets a true structure deformation criterion; S5: generating a data validity level according to credibility and abnormal type, and controlling whether the data participates in safety early warning; S6: storing original images, pseudo displacement labels, disposal processes, final displacement and validity levels, and returning to continuous monitoring. The present scheme can identify pseudo displacement sources and execute differentiated disposal by jointly analyzing images, space, time, structure, wave bands and equipment state information, and finally outputs structure deformation data with a validity level.

The present invention belongs to the field of optical metrology and discloses a focus evaluation method, system, device, and medium for wafer alignment marks. The method comprises the following steps: obtaining a sequence image set of the wafer alignment mark during a defocus-focus-defocus process; performing edge extraction on each sequence image in the sequence image set; performing focus evaluation in different directions of each edge-extracted sequence image based on a Brenner function and a Roberts function to obtain an initial focus evaluation function value corresponding to each sequence image; performing variance calculation on the initial focus evaluation function value corresponding to each sequence image to obtain a final focus evaluation function value; and determining the focus state of the wafer alignment mark based on the final focus evaluation function value. The technical solution of the present invention can achieve rapid and accurate automatic focusing of the wafer alignment mark.

The present application relates to a system and method for calibrating the axial consistency of a multi-axis window device, and belongs to the field of optical metrology and measurement technology. The calibration system includes a target generation component, a test bench, a fiber coupling component, a long focal length collimation component, and a control component. The calibration method is used to execute the operation process of the calibration system. The calibration system and calibration method proposed in this application can meet the measurement and calibration requirements of various types of multi-axis window devices, and provide a guarantee for the axial consistency parameter testing of multi-axis window devices.

A method for measuring characteristics of a workpiece. The method includes holding a workpiece to be tested at a specific measuring-position; forming a multi-spot-array over a test area of the workpiece, wherein said forming comprises manipulating light from at least one light source with an optical subsystem comprising a multi-spot generator; directing light emanating from the multi-spot-array towards at least one spectrometry device having an aperture; detecting Raman spectral characteristics of a plurality of spots of the multi-spot-array; and determining one or more properties of the test area of the workpiece based on the detected Raman spectral characteristics. Distribution of energy density of the multi-spot-array over the test area is configured to prevent affecting the workpiece during measurement.

The invention discloses a movable E-15 magnitude ultra-stable laser comparison test system, which relates to the technical field of optical metrology and comprises a PDH laser frequency stabilization unit, a beat frequency unit, matched test equipment and a computer. An output optical signal of a to-be-tested PDH system is directly connected to a beat frequency module in a cabinet, beat frequency is carried out on the output optical signal and original PDH laser of the cabinet in the beat frequency module, a radio frequency signal obtained after beat frequency can be respectively accessed to a frequency counter and a frequency spectrograph, and a signal processed by the frequency counter and the frequency spectrograph can be accessed to a computer. And finally, indexes such as frequency stability and line width can be directly read through a software control end of a computer.