76 results about "Optical metrology" patented technology

The invention discloses a sine frequency modulation harmonic error compensation method based on Bessel function modulation characteristics, and relates to the technical field of sine frequency modulation nonlinear parameter compensation and high-precision measurement of target absolute distance based on multi-wavelength interference. The problem that the constant phase demodulation precision is insufficient due to the fact that carrier harmonic waves, accompanying amplitude modulation and modulation depth errors cannot be effectively suppressed due to laser modulation nonlinearity in existing sine frequency modulation distance measurement is solved. According to the method, after sine frequency modulation interference signals are collected, high-pass filtering is carried out to remove low-frequency components, Hilbert transform is carried out to remove envelope suppression associated amplitude modulation, window function frequency mixing is carried out to extract modulation depth, a matched carrier containing second harmonics is constructed, and frequency modulation harmonic parameter optimization is achieved through baseband amplitude maximization. And finally, carrying out orthogonal demodulation on the compensated interference signal to obtain a high-precision constant phase. The method is suitable for high-precision multi-wavelength interference ranging, precision displacement measurement and optical metering systems.

An optical metrology system for measuring a periodic target. The system comprises first and second emission paths configured to emit first and second illumination beams. The system comprises first and second collection paths configured to collect first and second reflected beams formed by the first and second illumination beams. The system comprises a detector optically coupled to the first and second collection paths and configured to measure intensities of the first and second reflected beams. The system comprises an actuation system configured to generate relative movement between the periodic target and the first and second illumination beams. The system comprises a processor configured to determine alignment information at least partly based on a phase of the measured intensities of the first and second reflected beams. The system maybe at least partly implemented in the form of a photonic integrated circuit.

The invention relates to a computer-implemented method using an optical metrology system, which comprises an optical tool setting and measuring device, and using a computer system, comprising at least the following method steps: receiving and / or retrieving a digital data sheet of a tool, which includes a technical drawing of the tool and a dimensional specification of the tool, by the computer system, reading out the technical drawing and the dimensional specification from the digital data sheet at least by means of an analysis and evaluation module in order to extract at least some of the data and / or information which is contained in the digital data sheet and describes the tool, said module being part of the computer system and comprising at least one trained algorithm of machine learning, creating at least one measurement program for the optical tool setting and measuring device on the basis of measurement features, which were determined on the basis of the readout, by at least one trained algorithm of machine learning of the analysis and evaluation module and / or selecting a measurement program for the optical tool setting and measuring device from a list of measurement programs stored in the computer system, on the basis of the determined measurement features, by means of at least one trained algorithm of machine learning of the analysis and evaluation module.

An optical metrology system can include an overlay metrology tool for characterizing an overlay target on a sample, where the overlay target includes first direction periodic features in a first set of layers of the sample and second direction periodic features in a second set of layers of the sample. The overlay metrology tool can simultaneously illuminate the overlay target using first and second illumination beams and can further generate an image of the overlay target based on diffraction of the first and second illumination beams through the overlay target, where diffraction orders of the first illumination beam contribute to resolved image formation of only the first direction periodic features, and where diffraction orders of the second illumination beam contribute to resolved image formation of only the second direction periodic features. The system can further generate overlay measurements along first and second measurement directions based on the image.

A method of characterizing a device under test (DUT) includes illuminating the DUT with a broadband optical beam within an optical field of view (FOV), illuminating the DUT with an X-ray beam within an X-ray FOV overlapping the optical FOV, and concurrently acquiring X-ray metrology information, e.g., one or more X-ray images utilizing various modalities, such as absorption, phase contrast difference, darkfield, small angle X-ray scattering (SAXS) and / or fluorescence, from the X-ray FOV and a plurality of optical images of the optical FOV, each of the optical images corresponding to respective selected wavelengths of the broadband optical beam from each of ultraviolet, visible, and infrared wavelengths, for example including deep ultraviolet, near infrared, or short-wavelength infrared wavelengths. The DUT may be one or more substrates, e.g., stacked, and include electronic devices such as three-dimensional integrated devices.

A computer-implemented method is described, comprising an optical metrology system including an optical tool presetting and measuring device, and a computer system, comprising at least the following steps: receiving and / or retrieving a digital datasheet of a tool, which includes a technical drawing of the tool and a dimension of the tool, by the computer system; reading the technical drawing and the dimension from the digital datasheet by means of an analysis and evaluation module of the computer system comprising at least one trained machine learning algorithm to extract at least a part of the data and / or information contained in the digital datasheet that describes the tool.Proposed: Creation of at least one measurement program for the optical tool presetting and measuring device based on measurement characteristics determined by reading out data, using at least one trained machine learning algorithm of the analysis and evaluation module, and / or selection of a measurement program for the optical tool presetting and measuring device from a list of measurement programs stored in the computer system based on the determined measurement characteristics, using at least one trained machine learning algorithm of the analysis and evaluation module.

A method of characterizing a device under test (DUT) includes illuminating the DUT with a broadband light beam within an optical field of view (FOV); irradiating the DUT with an X-ray beam within an X-ray FOV overlapping the optical FOV; and concurrently acquiring X-ray metrology information of the X-ray FOV (e.g., one or more X-ray images acquired with various modalities such as absorption, phase contrast difference, dark field, small angle X-ray scattering (SAXS), and / or fluorescence) and a plurality of optical images of the optical FOV, each of the optical images corresponds to a respective selected wavelength of each of an ultraviolet wavelength, a visible wavelength, and an infrared wavelength (e.g., including a deep ultraviolet wavelength, a near infrared wavelength, or a short-wave infrared wavelength) in the broadband beam. The DUT may be one or more substrates (e.g., in a stack) and include electronic devices such as three-dimensional integrated devices.

An advance in high-resolution optical metrology has been achieved by the introduction of incoherent holographic imaging. FINCH, an example of incoherent holography, is shown to simplify the process, eliminating many steps in metrology and at the same time increasing throughput, resolution and accuracy of the method. A proposed technique requires only a single image capture with a non-moving camera rather than the capture of multiple stacks of images requiring many camera exposures and movement of the camera or sample in the conventional techniques.

An optical metrology device configured for transient ellipsometry includes a light source with at least one laser, that generates pump pulses at a first pulse repetition rate and probe pulses at a second, different, pulse repetition rate that produces a varying time delay between the pump pulses and the probe pulses. The pump pulses generate transient perturbations in the sample material and reflected probe pulses are modulated in response to the transient perturbation in the sample material based on the varying time delay. A polarization state generator generates a polarization state in the probe pulses and a polarization state analyzer analyzes the reflected probe pulses from the sample, which is received by a detector. Transient ellipsometric measurements are generated from the reflected probe pulses at a plurality of time delays between the pump pulses and probe pulses.

Semiconductor device metrology including creating a time-domain representation of wavelength-domain measurement data of light reflected by a patterned structure of a semiconductor device, selecting an earlier-in-time portion of the time-domain representation that excludes a later-in-time portion of the time-domain representation, and determining one or more measurements of one or more parameters of interest of the patterned structure by performing model-based processing using the earlier-in-time portion of the time-domain representation.

The invention discloses a high-precision alignment fitting and online metering reworking system and process of a flexible optical element, which are applied to the field of optical elements, and the scheme establishes a computable error model in the fitting process of a flexible substrate and an optical microstructure, completes estimation in a production takt, fuses visual, electrical and optical metering results, and improves the precision of the flexible substrate and the optical microstructure. According to the method, a unified'pass / rework / degradation / scrap 'decision is output, alignment error statistics and defect reason codes are recharged into manufacturing parameters and design parameters, alignment errors are converted into an estimable, compensable and traceable quantitative closed loop from'empirical debugging', the rejection rate is remarkably reduced through online metering and rework window control, the yield and consistency are improved, and the product quality is improved. And a systematic barrier of a process control loop and a data packet tracing interface is formed.

The invention relates to the technical field of optical metering and testing, in particular to an in-situ measurement device and method for surface infrared spectral emissivity of a high-frequency induction wind tunnel stationary point test model. Comprising a heating wind tunnel, a light path switching unit, a motion unit, a temperature detection unit, an infrared spectrometer and a variable temperature black body. The heating wind tunnel is used for simulating and manufacturing a plasma ultra-high-temperature environment for the aircraft test model in the heating wind tunnel when the aircraft returns to the atmosphere; the light path switching unit is used for reflecting light of the aircraft test model to the infrared spectrometer; or the light of the variable-temperature black body is reflected to the infrared spectrometer; an emergent light path of the light path switching unit is a first light path; the motion unit is used for moving the temperature detection unit into or out of the first light path; the temperature detection unit is used for detecting the temperature of the aircraft test model when the temperature detection unit moves into the first light path; the infrared spectrometer is located on the first light path and used for measuring spectral signals of the aircraft test model and the variable-temperature black body.

The invention relates to a method for operating a pulsed discharge plasma source, as well as a discharge plasma source and an optical metrology system. In the method, the discharge plasma source emits a plurality of light pulses, wherein a pulse rate set during this emission of light pulses is varied over time during the operation of the discharge plasma source.

The application discloses a sample wheel for optical metrological verification, which comprises a supporting mechanism, a rotating mechanism, a translation mechanism and a control unit; the supporting mechanism comprises a base, a sample wheel support and a sample wheel; the bottom of the sample wheel support is fixed on the base, and the sample wheel is arranged above the sample wheel support through a rotating shaft; a plurality of sample chambers are arranged on the outer edge of the sample wheel, and a sample fixing device is arranged in each sample chamber; the rotating mechanism comprises a stepping motor, and the stepping motor drives the sample wheel to rotate; the translation mechanism comprises a hydraulic device and a slide rail; one end of a hydraulic rod of the hydraulic device is hinged to the base, and the other end of the hydraulic rod is arranged on the rotating shaft through a sleeve, and the hydraulic rod is controlled to stretch and retract by the control unit; a bearing is arranged between the sleeve and the rotating shaft, and gears are arranged at the two ends of the bearing; the bottom of the slide rail is embedded into a horizontal sliding groove at the top of the sample wheel support, and a rack meshing with the gears is arranged on the top of the slide rail along the sliding direction. The application can avoid the influence of manual sample replacement on the measurement result, avoid the influence of the sample measurement position on the measurement result, has high working efficiency and accurate measurement data.

An advance in high-resolution optical metrology has been achieved by the introduction of incoherent holographic imaging. FINCH, an example of incoherent holography, is shown to simplify the process, eliminating many steps in metrology and at the same time increasing throughput, resolution and accuracy of the method. A proposed technique requires only a single image capture with a non-moving camera rather than the capture of multiple stacks of images requiring many camera exposures and movement of the camera or sample in the conventional techniques.

The present application belongs to the technical field of optical metrology and image processing, and particularly relates to a pseudo displacement identification and data validity determination method in structural visual monitoring, comprising the following steps: S1: acquiring a monitoring image sequence, a stable reference area and auxiliary state information; S2: extracting monitoring point displacement, image quality and multi-source state characteristics; S3: constructing a multi-dimensional consistency index; S4: judging whether the multi-dimensional consistency index meets a true structure deformation criterion; S5: generating a data validity level according to credibility and abnormal type, and controlling whether the data participates in safety early warning; S6: storing original images, pseudo displacement labels, disposal processes, final displacement and validity levels, and returning to continuous monitoring. The present scheme can identify pseudo displacement sources and execute differentiated disposal by jointly analyzing images, space, time, structure, wave bands and equipment state information, and finally outputs structure deformation data with a validity level.

A method for measuring characteristics of a workpiece. The method includes holding a workpiece to be tested at a specific measuring-position; forming a multi-spot-array over a test area of the workpiece, wherein said forming comprises manipulating light from at least one light source with an optical subsystem comprising a multi-spot generator; directing light emanating from the multi-spot-array towards at least one spectrometry device having an aperture; detecting Raman spectral characteristics of a plurality of spots of the multi-spot-array; and determining one or more properties of the test area of the workpiece based on the detected Raman spectral characteristics. Distribution of energy density of the multi-spot-array over the test area is configured to prevent affecting the workpiece during measurement.

The invention discloses a movable E-15 magnitude ultra-stable laser comparison test system, which relates to the technical field of optical metrology and comprises a PDH laser frequency stabilization unit, a beat frequency unit, matched test equipment and a computer. An output optical signal of a to-be-tested PDH system is directly connected to a beat frequency module in a cabinet, beat frequency is carried out on the output optical signal and original PDH laser of the cabinet in the beat frequency module, a radio frequency signal obtained after beat frequency can be respectively accessed to a frequency counter and a frequency spectrograph, and a signal processed by the frequency counter and the frequency spectrograph can be accessed to a computer. And finally, indexes such as frequency stability and line width can be directly read through a software control end of a computer.

The invention relates to the technical field of optical metering and testing, in particular to a multi-source beam-combining spectrum output system for calibrating an optical detector and a working method thereof. The multi-source beam-combining spectrum output system comprises a light source module, a wavelength selection module, a modulation synchronization module and a light splitting output module, the control acquisition module is electrically connected with the light source module, the wavelength selection module, the modulation synchronization module and the monitoring detector respectively; the control acquisition module generates an acquisition trigger signal according to the synchronous feedback signal and controls synchronous acquisition of a detector signal; the invention provides a spectrum calibration system which can realize multi-light-source beam combination, continuously adjustable wavelength, synchronous control of light intensity modulation, real-time power feedback, simultaneous output of multiple ports and unified upper computer management, and overcomes the problems of single light source, dispersed control, poor repeatability, asynchronous time sequence and the like in the prior art. Therefore, the calibration precision, stability and automation level of the optical detector are obviously improved.

Methods and systems for generating measurement models for complex semiconductor structures based on reusable parametric models are presented herein. In some embodiments, the reusable parametric model enables measurement of large aspect ratio (HAR) structures with complex shape profiles. In these embodiments, the reusable parametric model includes a plurality of geometric segments each characterized by a different shape profile. Each shape profile is parameterized by at least one shape parameter. In another aspect, at least one of the plurality of geometric segments includes a plurality of sub-segments. In some other embodiments, the reusable parametric model enables measurement of nanowire-based semiconductor structures. The reusable parametric models described herein can be used to generate measurement models for both optical metrology and x-ray metrology, such as soft x-ray metrology and hard x-ray metrology. The resulting measurement model yields more accurate measurements with improved robustness.

An optical metrology device, such as an ellipsometer, includes a focusing system that adjusts the focal position of the metrology device in real time so that focus may be maintained during movement of the measurement locations on the sample, e.g., using closed loop control. A filtered focus signal may be used to adjust the focal position while moving to a measurement location. Additionally, the focus signal may be coarsely filtered and finely filtered, where a coarse filtered focus signal is used to adjust the focal position while moving to a measurement location and a fine filtered focus signal is used to adjust the focal position when at the measurement location. An open loop control may be used in which once at the measurement location, a filtered focus signal is used to adjust the focal position when the filtered focus signal has no offset with respect to the focus signal.

The invention relates to a method for measuring parameter values of at least one parameter of an optical measuring process that uses an optical metrology system for measuring properties of an object comprising integrated circuit patterns, comprising: acquiring an imaging dataset (22) of the object using the optical metrology system; providing a prior probability distribution (32) for the at least one parameter of the optical measuring process, and providing a likelihood function (40) that evaluates the likelihood of parameter values of the at least one parameter using the acquired imaging dataset (22) of the object; measuring parameter values of the at least one parameter of the optical measuring process by estimating statistical properties of a posterior probability distribution (46) of the at least one parameter. The invention also relates to a corresponding optical metrology system.

Optical metrology is performed using a light source and a normalization channel. A portion of the light is directed to the normalization channel, which detects the intensity of the light while measurements are acquired from the light reflected from a sample. The measurements are normalized based on the detected intensity of the light in the normalization channel. The light detected in the normalization channel may be synchronized with the measurements. Moreover, the acquisition of the intensity of the light in the normalization channel may be aligned with the measurements. The normalization channel measurements may be a single total intensity value that is applied to all wavelengths in the measurements, or may be a function of wavelength that is applied to the corresponding wavelengths in the spectral measurements.

The invention relates to a method for measuring parameter values ​​of at least one parameter of an optical measurement process, which uses an optical metrology system for measuring properties of an object comprising integrated circuit structures, comprising: acquiring an imaging data set (22) of the object using the optical metrology system; providing a prior probability distribution (32) for the at least one parameter of the optical measurement process, and providing a likelihood function (40) that evaluates the likelihood of parameter values ​​of the at least one parameter using the acquired imaging data set (22) of the object; measuring parameter values ​​of the at least one parameter of the optical measurement process by estimating statistical properties of a posterior probability distribution (46) of the at least one parameter.The invention also relates to a corresponding optical metrology system.

Embodiments described herein provide an asymmetric optical metrology system for evaluating and checking the performance of an optical element, such as an augmented reality (AR) waveguide combiner. The system utilizes an asymmetric optical configuration and compound eye illumination to enhance the detection limit of image definition and the accuracy of brightness uniformity. By employing different lenses with various focal lengths, the system improves the sampling rate in the angular space, solving the challenges of shape factor limits and pixel density inherent in known metrology tools. Embodiments described herein provide improved contrast and clear image details, as well as a compact design that is suitable for the development, optimization, and quality control of optical elements, such as AR waveguide combiners.

An optical metrology device simultaneously performs confocal and non-confocal Raman spectroscopy. The optical metrology device includes a double-clad fiber with a core that acts as a confocal pinhole to receive the confocal signal from the Raman response while simultaneously receiving the non-confocal signal from the Raman response over the inner cladding and core of the double-clad fiber. A spectrometer receives the Raman response via the double-clad fiber to detect the confocal spectroscopic signal from the core and to detect the non-confocal spectroscopic signal from the inner cladding and the core.

The invention provides a measurement system for infinitesimal displacement, and the system comprises a laser transmitting module which is used for transmitting an original laser beam; the light beam shaping module is used for shaping the original laser beam and outputting a vortex light beam and a plane wave reference light beam; the focusing module is used for superposing the vortex light beam and the plane wave reference light beam to construct a measurement focal field, and the measurement focal field comprises a longitudinal optical singular point; the imaging acquisition module is used for acquiring a real image of a longitudinal optical singular point in a measurement focal field; and the data processing module is electrically connected with the imaging acquisition module and is used for determining the displacement of the focusing module according to the real image. The unique advantages that the spatial scale of a longitudinal optical singular point is infinitely small and the phase gradient is steep are fully utilized, optical diffraction limit restriction caused by the fact that a traditional optical metering method depends on a structured light field or an interference effect is avoided, and the precision of a displacement reference datum is improved.

A sample that includes a target structure with a structure-of-interest (SOI) having a set of known parameters optically coupled to an unknown structure, e.g., having unknown parameters, is optically measured using light that is incident on the target structure. Light detected from the target structure in response to the incident illumination light incident is used to obtain metrology data, which is a combination of a from the SOI and a contribution from the unknown structure. A set of parameter values characterizing the SOI and a set of parameter values characterizing the unknown structure are determined from a trained neural network based on the metrology data.

The present disclosure relates to metrology measurement systems and related methods. In one or more embodiments a measurement system is provided. The measurement system includes a stage operable to retain an object and a light engine disposed above the stage. The light engine includes a light source directed towards the object, a first lens operable to collimate or focus a light from the light source, a reticle tray disposed between the light source and the first lens, and a reticle coupled to a reticle tray. The reticle includes a pattern and an anti-reflective coating disposed on the reticle. The coating is aligned with the pattern.

Systems and methods of optical metrology and inspection are provided, including shaping a pump pulse to have a concave wavefront that generates, in a sample, an acoustic wave that converges at a focal location. When a subsurface feature is at the focal location, a reflected acoustic wave is generated, with a convex acoustic wavefront. A probe assembly is configured to shape a probe pulse to have a spherical wavefront and to impinge on the surface simultaneously with the return to the surface of a reflected acoustic wave. A detection assembly is configured to receive a reflected probe pulse, reflected from the surface, and, responsively, to determine whether the reflected probe pulse is indicative of surface changes induced by a reflected acoustic wave from a subsurface feature at the focal location.