The invention discloses an alignment method for internal
layers in a
direct writing type photoetching
system. According to the method, during
exposure of a front
circuit diagram of a circuit board, a marking apparatus leaves marks on the back surface of the circuit board at same time, the marks are left at blank positions on the lower frame of the circuit board, and the position data (x[bi], y[bi]) of the marks relative to the coordinate
system of a carrier platform are transformed into the coordinate
system of the circuit board to obtain the coordinate (x[Bi], y[Bi]), wherein i is in range of 0 to n and n may be 7 in the position data (x[bi], y[bi]), i is in range of 0 to n in the coordinate (x[Bi], y[Bi]), the center of the circuit board has to be the datum of the coordinate system of the circuit board, and the
circuit diagram overturns around a direction perpendicular to an
exposure operation direction during
exposure of the back surface, i.e., up-and-down overturning; the position data (x[bi], y[bi]) of the marks relative to the coordinate system of the carrier platform are measured, recorded and stored in advance by area array CCD in the system; after up-and-down overturning, exposure of the back surface of the circuit board is carried out, the area array CCD in the system is also used for measuring the position coordinate (x[ci], y[ci]) of the marks, wherein i is in range of 0 to n, the position coordinate (x[ci], y[ci]) and the transformed coordinate (x[Bi], y[Bi]) of the marks in the
circuit diagram are analyzed, and rotation and translation data of the circuit diagram are calculated, wherein the
angle of rotation is calculated before calculation of the translation data during calculation.