A method for preparing a multichannel narrow-band filtering pixel array includes the following steps: 1, manufacturing alignment marks and metal louvers on a substrate; 2, manufacturing a metallic aluminium conductive thin film on the surface of the substrate as an initial substrate of electroplating; 3, forming a photoresist mask through ultraviolet lithography; 4, putting the substrate on whicha photoresist pattern is manufactured in an electroplating liquid tank to be electroplated; 5, removing the photoresist mask and corroding the metallic aluminium conductive thin film on the surface ofthe substrate, and forming an aluminium mask; 6, adopting an ion sputtering coating method to prepare an F-P type periodical interference film system with specific optical characteristics; 7, corroding the aluminium mask, and forming a narrow-band filtering pixel array of a first channel; repeating Steps 2 to 7 to complete preparation of pixel arrays of second, third and fourth channels in sequence; and 9, performing bonding packaging on multichannel micro optical filters and a CCD detector. While maintaining characteristics of an optical thin film, the method provided by the invention realizes patterning of a large-thickness optical thin film, has a simple and reliable manufacturing process, facilitates popularization, and has relatively high practical value.