Middle infrared band broadband periodic?wave absorbing material based on medium regulation
A technology of infrared band and wave-absorbing materials, which is applied in the direction of optical components, optics, instruments, etc., can solve the problem of limited increase in the width of absorption peaks, and achieve the effects of small size, good compatibility, and simple preparation process
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Embodiment 1
[0035] Such as image 3 As shown, a double-layer "metal-dielectric" resonant layer structure and a periodic absorbing structure composed of a continuous metal film on the bottom layer are used to realize the broadband absorbing structure DM-1. On the supporting Si substrate, there is first a continuous metal Al thin film 1 with a thickness of 100nm, and a "metal-medium" resonant layer structure of N layers on it. The number of layers of the resonant layer is N=20, and the variation range of the dielectric constant of the dielectric layer is: 2≤ε d ≤11.5, the change gradient is: Δε=0.5. The period of DM-1 is P=1.4μm, the side length of the square patch is L=0.7μm, the thickness of the metal resonant layer is 15nm, and the thickness of the dielectric resonant layer is 25nm. Its absorption rate curve is as image 3 As shown, it can be seen from the figure that due to the electromagnetic coupling between the multilayer structures, the structure realizes an absorption peak with ...
Embodiment 2
[0037] Such as Figure 4As shown, a double-layer "metal-dielectric" resonant layer structure and a periodic absorbing structure composed of a continuous metal film on the bottom layer are used to realize the broadband absorbing structure DM-2. On the supporting Si substrate, there is first a continuous metal Al thin film 1 with a thickness of 100nm, and a "metal-medium" resonant layer structure of N layers on it. Among them, the number of layers of the resonant layer is N=15, and the variation range of the dielectric constant of the dielectric layer is: 2≤ε d ≤9, the change gradient is: Δε=0.5. The period of DM-2 is P=1.4μm, the side length of the square patch is L=0.7μm, the thickness of the metal resonance layer is 15nm, and the thickness of the dielectric resonance layer is 25nm. Its absorption rate curve is as image 3 As shown, it can be seen from the figure that due to the electromagnetic coupling between the multilayer structures, the structure realizes an absorption...
Embodiment 3
[0039] Such as Figure 5 As shown, a double-layer "metal-dielectric" resonant layer structure and a periodic absorbing structure composed of a continuous metal film on the bottom layer are used to realize the broadband absorbing structure DM-1. On the supporting Si substrate, there is first a continuous metal Al thin film 1 with a thickness of 100nm, and a "metal-medium" resonant layer structure of N layers on it. The number of layers of the resonant layer is N=20, and the variation range of the dielectric constant of the dielectric layer is: 2≤ε d ≤21, the change gradient is: Δε=1. The period of DM-3 is P=1.4μm, the side length of the square patch is L=0.7μm, the thickness of the metal resonant layer is 15nm, and the thickness of the dielectric resonant layer is 25nm. Its absorption rate curve is as image 3 As shown, it can be seen from the figure that due to the electromagnetic coupling between the multilayer structures, the structure realizes an absorption peak with an ...
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