Preparation method for flexible mask plate used for patterning curved surface

A technology of patterning and masking, which is applied in the manufacturing field of curved surface occlusion patterning, can solve problems such as difficulty in execution, and achieve the effect of avoiding cumbersome process steps.

Active Publication Date: 2016-01-20
SHANGHAI JIAO TONG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This operation step is difficult to perform, and it is difficult to achieve the required graphics in a 1:1 ratio

Method used

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  • Preparation method for flexible mask plate used for patterning curved surface
  • Preparation method for flexible mask plate used for patterning curved surface
  • Preparation method for flexible mask plate used for patterning curved surface

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0035] The metal Ni film is etched for depositing a layer of thermistor wire sensor structure on the insulating curved surface.

[0036] The first step is to carry out the film sticking process on the convex and concave sides of the curved surface. Make sure the blades are cleaned before applying the film, and pay attention to avoid air bubbles when applying the film. After the film is pasted, put it into the oven and bake at 90°C for 30 minutes.

[0037] In the second step, fix the curved surface with polyimide tape, place it well, and perform sputtering to sputter the Cr / Cu seed layer. The thickness of the Cr metal layer is 1-100 nm, and the thickness of the Cu metal layer is 1-200 nm.

[0038] The third step is electroplating a Ni metal layer on the curved substrate seed layer. Dots of photoresist on the curved surface are used to create release holes. Electroplating needs to be carried out in a water bath at 50°C, the workpiece is connected to the negative electrode, a...

Embodiment 2

[0046] Laser-cut metal Ni film patterns are used for occlusion curved surface masks, and a layer of thermistor wire sensor structure is deposited on the insulating curved surface.

[0047] The first step is to carry out the film sticking process on the convex and concave sides of the curved surface. Make sure the blades are cleaned before applying the film, and pay attention to avoid air bubbles when applying the film. After the film is pasted, put it into the oven and bake at 90°C for 30 minutes.

[0048] In the second step, the curved surface is fixed with polyimide tape, placed, and sputtered. A Cr / Cu seed layer was sputtered. The thickness of the Cr metal layer is 1-100 nm, and the thickness of the Cu metal layer is 1-200 nm.

[0049] The third step is electroplating a Ni metal layer on the curved substrate seed layer. Dots of photoresist on the curved surface are used to create release holes. Electroplating needs to be carried out in a water bath at 50°C, the workpie...

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Abstract

The invention discloses a preparation method for a flexible mask plate used for patterning a curved surface. The preparation method comprises the steps of pretreating a surface of a substrate; attaching a dry film to the surface of the substrate; sputtering a Cr/Cu seed layer on the dry film; electroplating a Ni metal film on the substrate seed layer; soaking into a NaOH solution, ultrasonic processing and releasing the Ni metal film; fixing a Ni metal mask on a glass, and attaching a dry film; exposing and the developing the dry film; etching or laser cutting for patterning the Ni metal film; then attaching the Ni metal film to the substrate, and spluttering a required metal pattern; and taking off the Ni film to obtain the required metal graphic structure. According to the preparation method, the flexible metal mask is used to replace the conventional hard mask, so that fine and delicate graphic structures can be manufactured on the surface of the curved surface; and in addition, the preparation method can realize the patterning of the curved surface, reuse of the flexible Ni film, low cost, and flexible and convenient operation.

Description

technical field [0001] The invention relates to the field of micromachining, in particular to a manufacturing method for using a flexible metal mask to perform patterning of curved surface shielding, and belongs to the technical field of micro-nano processing. Background technique [0002] Micromachining is the cornerstone of modern microelectronics technology. It is the basis of microprocessors, memory devices and other information microelectronic devices. It will also increasingly be used in fields other than microelectronics. Existing lithography techniques are widely used in integrated circuits (ICs) and microelectromechanical systems (MEMS), organic semiconductors, and digital memory devices. High-resolution microlithography advances many areas of research. At present, some micro-processing technologies have been developed, such as: soft etching, embossing (Embossing or Imprinting), injection molding (Injectmolding), screen printing, inkjet printing, etc. These meth...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F1/00G03F7/00
Inventor 吴凯峰戴旭涵汪红王慧颖丁桂甫
Owner SHANGHAI JIAO TONG UNIV
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