The application relates to the technical field of
semiconductor packaging and relates to a kind of MSAP
processing technology of carrier-like,
copper foil is selected as starting material, the surface of
copper foil is cleaned and activated,
copper foil is immersed in special brown liquor, reaction time and temperature are controlled,
copper foil is uniformly thinned to 4 mu m,
copper foil is taken out from brown liquor, after washing and
drying, a layer of
photoresist is uniformly coated on the thinned
copper foil, specific
photomask is used to
expose photoresist, then development treatment is carried out, the required circuit pattern is formed,
electroplating is carried out in the area not protected by
photoresist, conductive path is formed, remaining photoresist is removed by
laser, and etchant is used to remove excess copper foil, leaving circuit pattern, the application can effectively replace the 18+3 mu m thick carrier copper foil manufactured by traditional technology by using brown liquor to thin copper foil to about 4 mu m, thereby solving the problems of thick carrier copper foil and high price in the prior art.