Alignment method for internal layers in direct writing type photoetching system
A lithography system and direct-writing technology, which is applied in microlithography exposure equipment, optics, photoplate-making process of pattern surface, etc., can solve the problem that the front and back of the circuit board cannot be accurately aligned, and achieve exposure saving time, ensuring alignment accuracy, and simple calculation
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[0021] In order to make the objectives, technical solutions, and beneficial effects of the present invention clearer and clearer, the present invention will be further described in detail below in conjunction with embodiments. It should be understood that the specific embodiments described herein are only used to explain the present invention and not used to limit the protection scope of the present invention.
[0022] The working principle of the present invention is: when exposing the front circuit diagram of the circuit board in the direct writing lithography system, the marking device simultaneously marks the mark on the reverse side of the circuit board, marking the blank part on the lower frame of the circuit board, and at the same time The position data of the mark relative to the carrier platform coordinate system (x bi , Y bi ), i=0-n, where n can be 7, converted to the coordinate system of the circuit diagram, that is (x Bi , Y Bi ), i=0-n, the coordinate system of the...
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