Point-diffraction interference wave aberration measuring instrument

A point-diffraction interference and wave aberration technology, applied in the field of interferometry, can solve problems such as increased system cost, uneven thickness, and non-adjustable

Active Publication Date: 2013-08-28
SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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Problems solved by technology

However, the light intensity of the 0th-order diffracted light and the 1st-order diffracted light is determined by the diffraction efficiency of the diffraction grating and cannot be adjusted
When the 1st-order diffracted light is used to filter the reference light wave through the pinhole, the visibility of interference fringes is too low; when the 0th-order diffracted light is used to filter the pinhole to generate the reference light wave, the coma aberration generated by the grating diffraction will affect the measurement accuracy, and...

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  • Point-diffraction interference wave aberration measuring instrument
  • Point-diffraction interference wave aberration measuring instrument

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Embodiment Construction

[0071] The present invention will be further described below in conjunction with the accompanying drawings and embodiments, but the embodiments should not limit the protection scope of the present invention.

[0072] Such as figure 1 As shown, the point diffraction interference wave aberration measuring instrument of the present invention includes: a light source 1, a beam splitter 2, a first light intensity and polarization state adjuster 3, a phase shifter 4, a second light intensity and polarization state adjuster 5, ideally A wavefront generation unit 6 , an object-side precision adjustment platform 7 , an optical system under test 8 , an image square wavefront detection unit 9 , an image-side precision adjustment platform 10 and a data processing unit 11 . Described like square wave front detection unit 9 is made of like square mask 901, photoelectric sensor 902, support 903, like square mask 901 comprises light-transmitting window 901b and filtering circular hole 901a (c...

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Abstract

A point-diffraction interference wave aberration measuring instrument consists of a light source, a light splitter, a first light intensity and polarization adjuster, a phase shifter, a second light intensity and polarization adjuster, an ideal wave front generating unit, an object precise adjusting platform, a measured optical system, an image wave front detecting unit, an image precise adjusting platform and a data processing unit. The interference instrument has the advantages of simplicity in structure, no systematic error of a phase shifting element, high interference grain visibility and capability of calibrating the systematic error.

Description

technical field [0001] The invention relates to the field of interferometry, in particular to a point-diffraction interference wave aberration measuring instrument and a detection method. Background technique [0002] Waveform aberration is an important parameter to describe the performance of small aberration imaging optical system. The wave aberration of high-quality microscope objectives and space telescopes should be less than λ / 4PV or λ / 14RMS (λ is the working wavelength, and RMS is the root mean square value). The wave aberration of the projection objective lens for deep ultraviolet lithography is required to reach several nm RMS, and the wave aberration of the projection objective lens for extreme ultraviolet lithography needs to be less than 1nm RMS. This puts high demands on wave aberration detection technology. [0003] Prior art 1 (see H. Medecki, E. Tejnil, K.A. Goldberg, "Phase-shifting point diffraction interferometer", OPTICS LETTERS Vol.21, No.19, 1526-1528...

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Application Information

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IPC IPC(8): G01M11/02
Inventor 唐锋王向朝张国先万修龙
Owner SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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