The present invention discloses a projection
exposure apparatus, which comprises an illumination
system, a
mask table for bearing a
mask, a projection object lens and a work-
piece table for bearing a substrate, wherein the illumination
system generates an illumination
light beam to irradiate the
mask, and the projection object lens projects the pattern on the mask onto the
substrate surface. The projection
exposure apparatus is characterized by further comprising a focusing leveling device, wherein the focusing leveling device generates a plurality of measurement points in the visual field of the projection object lens, and each
measurement point comprises at least three measurement sub-light spots. According to the present invention, with the projection
exposure apparatus, the production efficiency of the exposure equipment can be substantially improved, and the
equipment use cost can be reduced; the screen with the
large size can be obtained through the
single exposure so as to reduce the complex process and the increased manufacturing cost caused by the splitting exposure; and the synchronous scanning technology, the
image sensor technology and the exposure process focal plane real-
time control technology are utilized to substantially increase the projection exposure apparatus
overlay precision and the
imaging quality and meet the low-cost and high-yield production requirements.