Projection exposure apparatus

Abstract

The present invention discloses a projection exposure apparatus, which comprises an illumination system, a mask table for bearing a mask, a projection object lens and a work-piece table for bearing a substrate, wherein the illumination system generates an illumination light beam to irradiate the mask, and the projection object lens projects the pattern on the mask onto the substrate surface. The projection exposure apparatus is characterized by further comprising a focusing leveling device, wherein the focusing leveling device generates a plurality of measurement points in the visual field of the projection object lens, and each measurement point comprises at least three measurement sub-light spots. According to the present invention, with the projection exposure apparatus, the production efficiency of the exposure equipment can be substantially improved, and the equipment use cost can be reduced; the screen with the large size can be obtained through the single exposure so as to reduce the complex process and the increased manufacturing cost caused by the splitting exposure; and the synchronous scanning technology, the image sensor technology and the exposure process focal plane real-time control technology are utilized to substantially increase the projection exposure apparatus overlay precision and the imaging quality and meet the low-cost and high-yield production requirements.

Description

technical field [0001] The invention relates to the field of photolithography machines, in particular to a projection exposure device. Background technique [0002] The circuit pattern drawn on the reticle is imaged on the surface of the substrate of the circuit that is coated with photosensitive material (such as photoresist) through a projection exposure device, and then the pattern is formed on the substrate of the circuit by etching and other processes. This light and shadow etching method is widely used in various fields, such as the field of integrated circuit manufacturing, the field of printed circuit board manufacturing and the field of manufacturing thin film transistor arrays of flat panel displays. [0003] The projection exposure device is to expose the circuit pattern on the reticle through an optical system such as a projection exposure lens, and project the circuit pattern on the substrate of the circuit at a certain magnification or reduction ratio. In recen...

AI Technical Summary

Problems solved by technology

Therefore, when the objective lens described in this method is used for display panel manufacturing, there will be great difficulties in production efficiency. If it is used for the production of mobile terminal displays with a size of 7 inches or more and 12 inches or less, there will also be manufacturing problems caused by splicing exposure. Problems such as complex process and rising manufacturing costs

[0006] In order to improve the production efficiency of exposure equipment, the United States designed a dual-lens exposure device, which uses two lenses to expose at the same time to reduce the number of step exposures. Although this method can improve production efficiency, it also has the following shortcomings: using 2 One reticle, two sets of mask tables, two sets of illumination systems and projection objective lenses, the structure is relatively complicated and the design cost is relatively high; and because there is only one set of workpiece table, the vertical focus plane control of the exposure object and the horizontal overlay accuracy The control aspect is relatively complicated, and the risk of project implementation is relatively high

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