Photoetching machine in-situ multichannel imaging quality detection apparatus and photoetching machine in-situ multichannel imaging quality detection method

A technology for imaging quality and detection devices, applied in the field of lithography machines, can solve the problems of limited detector pixels, reduced number of effective detection pixels, and difficulty in increasing the number of parallel detection channels, so as to increase the number of parallel detection channels and reduce data The effect of increasing the amount of computation and detection speed

Active Publication Date: 2017-01-11
SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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Problems solved by technology

[0004] However, due to the limited number of detector pixels, simultaneous detection of wave aberrations in seven field points will inevitably lead to

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  • Photoetching machine in-situ multichannel imaging quality detection apparatus and photoetching machine in-situ multichannel imaging quality detection method
  • Photoetching machine in-situ multichannel imaging quality detection apparatus and photoetching machine in-situ multichannel imaging quality detection method
  • Photoetching machine in-situ multichannel imaging quality detection apparatus and photoetching machine in-situ multichannel imaging quality detection method

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[0042] The present invention will be further described below in conjunction with the embodiments and accompanying drawings, but the protection scope of the present invention should not be limited by this embodiment.

[0043] figure 1 It is a structural diagram of an in-situ multi-channel imaging quality detection device for a lithography machine of the present invention. The in-situ multi-channel imaging quality detection device of the lithography machine of the present invention includes a light source 1 of the lithography machine, an illumination system 2, a mask table 4, a projection objective lens 5 of the lithography machine, a workpiece table 7, and a mask table 4 The object plane grating plate 3 and the wave aberration sensor 6 placed on the workpiece table 7 and the data processing computer 8 connected with the wave aberration sensor 6; the wavelength of the light source 1 of the present embodiment is 193nm; n=14, the described The object plane grating plate 3 is comp...

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Abstract

The invention relates to a photoetching machine in-situ multichannel imaging quality detection apparatus and a photoetching machine in-situ multichannel imaging quality detection method, wherein the photoetching machine in-situ multichannel imaging quality detection apparatus comprises a photoetching machine light source, an illumination system, a mask table, a projection object lens, a work-piece table and a computer, and further comprises an object surface grating plate and a wavefront aberration sensor. According to the present invention, the photoetching machine imaging qualities such as the wavefront aberration, the distortion and the field curvature are detected by using the photoetching machine in-situ multichannel imaging quality detection apparatus so as to improve the parallel channel number and the detection speed of the imaging quality detection.

Description

technical field [0001] The invention relates to a lithography machine, in particular to an in-situ multi-channel imaging quality detection device and method for a lithography machine. Background technique [0002] The lithography machine is one of the core equipment for the manufacture of very large scale integrated circuits. The projection objective lens is one of the most important subsystems of the lithography machine. The imaging quality of projection objective lens is one of the key factors to determine the quality of lithography lines. As the lithography node develops below 1x nm resolution, the required yield reaches 250wph. The increase in productivity causes the thermal effect of the mask of the lithography machine and the thermal aberration of the projection objective lens, which affects the engraving accuracy of the lithography machine and the imaging quality of the projection objective lens. It is required to be able to measure the distortion, field curvature ...

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Application Information

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IPC IPC(8): G03F7/20
CPCG01M11/02G03F7/20
Inventor 唐锋李杰王向朝冯鹏徐世福卢云君
Owner SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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