The invention relates to a method for texturing the surface of a
solar cell silicon wafer by
laser holography, which relates to the technical field of
laser holography texturing and comprises the following steps: S1, building a
laser holography system and setting parameters; s2,
silicon wafer pretreatment; s3, a laser holographic texturing process; and S4, post-
processing and detecting. According to the method for texturing the surface of the
solar cell silicon wafer through the
laser holography, the light
reflectivity of the surface of the silicon wafer is effectively reduced by accurately controlling the formation of the micro-nano structure, specifically, the
reflectivity of the silicon wafer in the visible
light wave band of 400-700 nm is stably controlled between 8% and 12% through the micro-nano structure formed through the method, the
reflectivity is reduced by 3%-5% compared with the reflectivity of a traditional chemical texturing method, and the quality of the surface of the
solar cell silicon wafer is improved. Due to the reduction of the reflectivity, more incident light can enter the silicon wafer, the
optical path is prolonged, and the number of
photon-generated carriers is obviously increased, so that the short-circuit
current density and the
photoelectric conversion efficiency of the
cell are improved, and high uniformity and high consistency of a micro-nano structure are realized by accurately controlling laser parameters and interference conditions.