Oriented ZnO nanorod or nanowire film and preparation process thereof

A technology of nanorods and zinc oxide, which is applied in the field of thin film preparation of low-dimensional nanomaterials, can solve the problems that are not conducive to large-scale industrial production, complex and expensive equipment, and harsh preparation conditions, and achieve low cost, good orientation, and simple equipment Effect

Inactive Publication Date: 2006-04-26
TSINGHUA UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

At present, the preparation of ZnO nanowires (rods) is mostly carried out by gas-liquid-solid (VLS) growth mechanism or chemical vapor deposition methods. However, these methods mostly use expensive sapphire and single crystal silicon as solid substrates, which require complex and expensive equipment and higher temperature
For the VLS method, the required temperature is greater than 800°C, and for the CVD method, the required temperature is greater than 500°C. The preparation conditions are quite harsh, which is not conducive to mass industrial production.

Method used

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  • Oriented ZnO nanorod or nanowire film and preparation process thereof
  • Oriented ZnO nanorod or nanowire film and preparation process thereof

Examples

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Effect test

Embodiment 1

[0016] After the zinc nitrate solution with a molar concentration of 1mM and the hexamethylenetetramine solution with a molar concentration of 2mM were evenly mixed, they were placed in a stainless steel reaction kettle lined with polytetrafluoroethylene, and at the same time, the ZnO(002) oriented The silicon wafer substrate with the textured seed crystal was placed inside the PTFE lining, and the surface of the deposition substrate seed crystal was at an angle of 90° to the surface of the PTFE inner substrate. The ZnO nano-rod (wire) array thin film with directional growth and good crystallinity is grown on the substrate, and the diameter of the nano-rod (wire) is about 10-30nm.

Embodiment 2

[0018] After the zinc acetate solution with a molar concentration of 6mM and the hexamethylenetetramine solution with a molar concentration of 5mM were evenly mixed, they were placed in a stainless steel reaction kettle lined with polytetrafluoroethylene, and at the same time, the ZnO(002) oriented The plastic substrate of the textured seed crystal was placed inside the PTFE lining, and the surface of the deposition substrate seed crystal was at an angle of 70° to the surface of the PTFE inner substrate. The ZnO nano-rod (wire) array thin film with good crystallinity grows directional growth on the bottom, and the diameter of the nano-rod (wire) is about 40-60nm.

Embodiment 3

[0020] After uniformly mixing the zinc citrate solution with a molar concentration of 10mM and the cyclodextrin-hexamethylenetetramine solution with a molar concentration of 10mM, they were placed in a stainless steel reaction kettle lined with polytetrafluoroethylene. The glass substrate of the ZnO(002) oriented textured seed crystal was placed inside the PTFE lining, and the surface of the deposition substrate seed crystal was at an angle of 50° to the surface of the PTFE inner substrate, kept at 90°C for 2 hours, and then cooled naturally Finally, grow directional growth on the substrate, ZnO nanorod (wire) array thin film with good crystallinity, the diameter of nanorod (wire) is about 50-80nm.

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Abstract

The present invention relates to directional nanometer zinc oxide stick or linear film and its preparation process, and belongs to the field of low-dimensional nanometer film material technology. The present invention adopts hydrothermal deposition process, in which zinc salt solution in molar concentration 1-25 mM and amine surfactant solution are mixed homogeneously and set inside stainless steel reactor with PTFE lining, substrate of glass, polymer, inorganic metal, non-metal or other material and with directional texture ZnO crystal seed is set inside the lining, so as to react at 50-150 deg.c for 1-6 hr. After cooling naturally, directionally grown and high crystallized ZnO nanometer stick array film or nanometer stick of diameter 10-500 nm may be form. The process has low synthesis temperature and easy control, and the grown ZnO film is well directional. The present invention is suitable for industrial production of directional nanometer ZnO stick or film.

Description

technical field [0001] The invention belongs to the preparation of low-dimensional nano material thin films, in particular to a crystal seed induced hydrothermal deposition method for synthesizing oriented array zinc oxide nanorod or wire thin films and its preparation technology. technical background [0002] Zinc oxide is an important wide-bandgap semiconductor functional material. The bandgap is 3.3eV at room temperature, and the exciton binding energy is as high as 60meV. It has strong free exciton transition luminescence in the ultraviolet band. It is cheap, non-toxic and harmless to the environment, suitable for epitaxial growth of thin films, and has broad application prospects in the field of information optoelectronics. It is another research hotspot in the world after GaN and GaS in recent years. Since the highly ordered growth of ZnO nanostructures on the substrate can make short-wave lasers and dye-sensitized nano-oxide solar electrodes, it has become a research ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C30B7/10C01G9/02C30B29/16C30B29/62
Inventor 林红王宁张罗正李建保杨晓战
Owner TSINGHUA UNIV
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