3 results about "Patterned media" patented technology

This invention discloses a multi-spectral intelligent control device based on programmable patterned electrodeposition, comprising at least two types of reversible metal electrodeposition units with different patterns, arranged in a pixelated array. Each reversible metal electrodeposition unit consists of an infrared high-transmittance substrate layer, a conductive thin film layer, a patterned dielectric layer, a metal ion electrolyte layer, and a counter electrode. The patterned dielectric layer has patterned grooves; when an electric field is applied, metal is deposited on the patterned grooves, thus presenting the corresponding pattern. This invention arranges the reversible metal electrodeposition units in a specific order to form a large-area pixelated array device. Each reversible metal electrodeposition unit is equivalent to a unit of an electromagnetic metasurface and can be independently controlled, realizing spatial programming and dynamic reconstruction of the target multi-spectral characteristics. This allows for real-time, dynamic, and reversible reconstruction of large-area macroscopic optical patterns, thermal radiation distributions, and microwave scattering fields.

The application discloses a memory and a manufacturing method thereof. The method comprises the following steps: forming a bottom electrode of a storage array region and a first top contact of a logic region on an upper surface of a bottom circuit layer at the same time; forming a patterned medium layer on an upper surface of a to-be-processed storage cell layer of the storage array region and the logic region; simultaneously forming a hard mask layer and a second top contact in a through hole of the patterned medium layer; the hard mask layer corresponds to the bottom electrode, and the second top contact is in contact connection with the first top contact; etching the to-be-processed storage cell layer to form a storage cell layer, and obtaining the memory. The first top contact of the logic region is formed at the same time when the bottom electrode of the storage array region is formed, and the second top contact of the logic region is formed at the same time when the hard mask layer of the storage array region is formed, that is, the top contact of the logic region is manufactured twice, and each manufacturing is completed at the same time as the structure in the storage array region, so that the manufacturing process of the memory is simplified, the use of a mask is reduced, and the cost is lowered.

A super-resolution system for nano-patterning is disclosed, comprising an exposure head that enables a super-resolution patterning exposures. The super-resolution exposures are carried out using electromagnetic radiation and plasmonic structures, and in some embodiments, plasmonic structures having specially designed super-resolution apertures, of which the “bow-tie” and “C-aperture” are examples. These apertures create small but bright images in the near-field transmission pattern. A writing head comprising one or more of these apertures is held in close proximity to a medium for patterning. In some embodiments, a data processing system is provided to re-interpret the data to be patterned into a set of modulation signals used to drive the multiple individual channels and multiple exposures, and a detection means is provided to verify the data as written.