7 results about "Patterned media" patented technology

The invention discloses a Fabry-Perot resonant cavity for testing a Josephson junction and a manufacturing method, and relates to the technical field of Josephson junction testing devices. Comprising a reflecting spherical surface and a reflecting plane, and the reflecting plane is formed by the surface of one side of the metal reflecting substrate; a patterned dielectric layer is locally arranged on the surface of the metal reflection substrate; a metal redistribution layer is arranged on the patterned dielectric layer, and the metal redistribution layer forms an electrical path connected with a Josephson junction chip; wherein the patterned dielectric layer is only located right below the area covered by the metal redistribution layer. According to the invention, reliable electrical connection of Josephson junctions can be realized on the premise of not sacrificing the high Q value characteristic of the resonant cavity.

The invention discloses a heterojunction cell and a photovoltaic module, and the heterojunction cell comprises a silicon wafer, and an intrinsic layer, a doping layer and a transparent conductive layer which are sequentially laminated on the front surface or the back surface of the silicon wafer, and also comprises a dielectric layer laminated on the transparent conductive layer and an electrode in contact with the transparent conductive layer, the first electrode part extends into the dielectric layer along the thickness direction of the silicon wafer and is in contact with the transparent conductive layer, the second electrode part is positioned on the first electrode part and extends to the surface of the dielectric layer, and the maximum width of the second electrode part is greater than that of the first electrode part. According to the invention, the patterned dielectric layer is formed on the transparent conductive layer, so that a finer grid line design can be realized, and the cell efficiency and the module power are improved; meanwhile, the patterned dielectric layer serves as a mask for preparing the electrode, expensive photosensitive ink does not need to be adopted, and the process cost is greatly reduced.

The invention discloses a method for patterning on the surface of a proton ceramic electrolyte by adopting a flexible material, and aims to solve the technical problems of low connection strength, few active reaction sites, poor electrochemical performance and the like in the interface of the existing PCFC electrolyte and a cathode. The method for patterning the surface of the proton ceramic electrolyte comprises the following steps: 1, preparing a patterning medium; 2, attaching and fixing the patterned medium and the surface of the proton ceramic electrolyte green body; 3, pressurizing treatment; 4, carrying out sintering treatment on the patterned proton ceramic electrolyte green body; and 5, coating the cathode material on the surface of the proton ceramic electrolyte with the patterned surface by using a silk-screen printing process, and carrying out heat treatment. According to the invention, the flexible patterned medium with periodic holes is adopted to realize lossless grooving of the electrolyte on the surface of the proton ceramic electrolyte, so that the peel strength and binding sites of an electrolyte / cathode interface are improved, the active reaction area is increased, the ohmic resistance and polarization resistance are reduced, and the cycling stability is improved.

This invention discloses a multi-spectral intelligent control device based on programmable patterned electrodeposition, comprising at least two types of reversible metal electrodeposition units with different patterns, arranged in a pixelated array. Each reversible metal electrodeposition unit consists of an infrared high-transmittance substrate layer, a conductive thin film layer, a patterned dielectric layer, a metal ion electrolyte layer, and a counter electrode. The patterned dielectric layer has patterned grooves; when an electric field is applied, metal is deposited on the patterned grooves, thus presenting the corresponding pattern. This invention arranges the reversible metal electrodeposition units in a specific order to form a large-area pixelated array device. Each reversible metal electrodeposition unit is equivalent to a unit of an electromagnetic metasurface and can be independently controlled, realizing spatial programming and dynamic reconstruction of the target multi-spectral characteristics. This allows for real-time, dynamic, and reversible reconstruction of large-area macroscopic optical patterns, thermal radiation distributions, and microwave scattering fields.

The application discloses a memory and a manufacturing method thereof. The method comprises the following steps: forming a bottom electrode of a storage array region and a first top contact of a logic region on an upper surface of a bottom circuit layer at the same time; forming a patterned medium layer on an upper surface of a to-be-processed storage cell layer of the storage array region and the logic region; simultaneously forming a hard mask layer and a second top contact in a through hole of the patterned medium layer; the hard mask layer corresponds to the bottom electrode, and the second top contact is in contact connection with the first top contact; etching the to-be-processed storage cell layer to form a storage cell layer, and obtaining the memory. The first top contact of the logic region is formed at the same time when the bottom electrode of the storage array region is formed, and the second top contact of the logic region is formed at the same time when the hard mask layer of the storage array region is formed, that is, the top contact of the logic region is manufactured twice, and each manufacturing is completed at the same time as the structure in the storage array region, so that the manufacturing process of the memory is simplified, the use of a mask is reduced, and the cost is lowered.

A super-resolution system for nano-patterning is disclosed, comprising an exposure head that enables a super-resolution patterning exposures. The super-resolution exposures are carried out using electromagnetic radiation and plasmonic structures, and in some embodiments, plasmonic structures having specially designed super-resolution apertures, of which the “bow-tie” and “C-aperture” are examples. These apertures create small but bright images in the near-field transmission pattern. A writing head comprising one or more of these apertures is held in close proximity to a medium for patterning. In some embodiments, a data processing system is provided to re-interpret the data to be patterned into a set of modulation signals used to drive the multiple individual channels and multiple exposures, and a detection means is provided to verify the data as written.

A proposed fabrication technique for a polarization-absorbing wire grid polarizer avoids the need to etch through the multilayer stack of materials to form the grid structure. Initial reflective metal and dielectric buffer layers are patterned and etched in a conventional manner to create the desired grid topology. A small-angle coating process is then used to complete the fabrication process by first coating the top surface of the patterned dielectric with a polarization-absorbing metal. A second coating process is used to cover the created metal coating with a dielectric cladding material. Maintaining a small angle of incidence between the coating source and the wire grid structure ensures that top portions of the grid are suitably covered to create the desired multilayer wire configuration.