3 results about "Plasma effect" patented technology

The application provides a chemical vapor deposition method, relates to the technical field of semiconductors, and can solve the problem that the plasma effect of different processing chambers has different influences on a hard mask layer. A manufacturing method of a substrate comprises the following steps: placing a substrate into a processing chamber, and forming a hard mask layer on the substrate; introducing gas required for forming plasma into the processing chamber; turning on a power supply of the processing chamber to form a pre-plasma; continuously introducing a precursor and gas required for forming the plasma into the processing chamber to perform a chemical vapor deposition process, and forming a thin film on the hard mask layer.

The invention relates to a timepiece or jewelry part made entirely or partially of a material comprising gold between 9 and 21 carat, the material (1) comprising a matrix (2) of a predetermined color and at least gold particles (3) dispersed in the matrix, the predetermined color matrix is defined by coordinates a *, b * and L * of the predetermined color matrix in the CIE L * a * b * space, the density of the predetermined color matrix being less than or equal to 10 g / cm3, preferably less than or equal to 8 g / cm3. According to the invention, the size of the gold particles (3) is such that, in the plane of the surface of the material under study, the maximum size of the gold particles (3) is less than 60 [mu] m, preferably less than 30 [mu] m, and, in the plane of the surface of the material under study, the minimum size of the gold particles (3) is greater than 1 nm, preferably greater than 10 nm, preferably greater than 200 nm, preferably greater than 0.5 [mu] m, more preferably greater than 1 [mu] m, the gold particles (3) do not have a plasma effect and are uniformly dispersed in the matrix (2), and the amount of gold particles (3) dispersed in the matrix (2) is predetermined such that, for the same observer placed at a distance of at least 30 cm, preferably at least 10 cm, from the surface of the material (1), the gold particles (3) are irradiated by the light source under the same irradiation conditions. The material (1) appears such that the color of the material is the same as or close to the predetermined color of the substrate (2), the color of the material being such that in the CIE L * a * b * color space, the color difference [Delta] E * between the color of the material and the color of the substrate is less than 10, preferably less than or equal to 5, preferably less than or equal to 4, more preferably less than or equal to 3. The invention also relates to a method for manufacturing a timepiece or jewelry part as defined above.

This invention discloses a three-dimensional visualization analysis method for space charge transfer based on in-situ light-assisted XPS, belonging to the fields of energy materials technology and material surface analysis methods. The method comprises the following steps: First, an FTO / WO3@Au device material is prepared as the research object. This material has a heterojunction structure between stacked interfaces. Noble metal doping can improve the charge transfer efficiency. Through the plasma effect and electronic mediation of Au, a highly efficient synergistic path from light absorption, charge separation to surface reaction is constructed. Etching is performed on the FTO / WO3@Au surface, so that different layers yield peak intensities of different strengths under XPS spectral analysis. Under XPS spectral imaging, a series of spectra at binding energies are obtained by sampling every 0.1 eV. The data is output in a data table, and then a 3D view is plotted using the best fit formula, which visualizes the charge transfer process and intuitively shows the transfer path of photogenerated charge.