The invention relates to a pure organic homogeneous phase deposition method for preparing nanometer oxide under normal temperature. In situ reaction is adopted by the method; the prepared nanometer oxide has the characteristics of simple preparation method, normal temperature compounding, small grain size, controllable structure, morphology and chemical constitution, low cost, batch production, and the like; the nanometer oxide can be further compounded into the oxides with efficient activity, such as, titanium oxide, silicon oxide, zirconium oxide, aluminum oxide and zinc oxide, under normal temperature. The method is characterized by comprising the following steps: taking alcohol solution as a solvent, amine solution as a buffering agent, metal salts, such as titanium, zinc, silicon, aluminum and zirconium, as metal sources and organic acid as a precipitator; dissolving the metal salts and the amine solution into the alcohol, thereby acquiring a solution A; preparing a solution B from the organic acid solution in the alcohol; mixing and stirring the solution A and the solution B, thereby causing the organic acid and alcohol uniformly distributed in the system to react with each other and generate water molecules; utilizing the water molecules to directly generate hydrolysis reaction with the metal salts uniformly distributed in the solution, thereby generating the high-activity nanometer oxidation material.