The application discloses a kind of
radiation-resistant sealing materials for photoetching process and preparation method thereof, belong to high molecular sealing material technical field.The material is made of
fluorine rubber
raw rubber, 1-
iodine perfluorohexane or 1-
iodine perfluorooctane, reinforcing filler,
bisphenol AF vulcanizing agent and benzyl
triphenyl phosphonium chloride accelerator, etc.According to
specific weight part, it is made by batch dropwise mixing and gradual temperature two-step
vulcanization.The application utilizes perfluoroalkyl
iodide under
plasma C-I bond preferentially homolysis generates I·, terminates
fluorine rubber free radical chain degradation;And through theoretical calculation and
ion chromatography verification, ensure that
processing process does not decompose, no corrosive
iodine ion release in service.The application breaks the application technology prejudice of
halogen, solves the defect that conventional
fluorine rubber particle releases high,
plasma life is short, avoids the problem that
perfluoroether rubber is high in cost and difficult to process, the obtained material is low in particle release amount, long in
radiation life, small in compression permanent deformation, adapts to 7nm and below node
semiconductor equipment sealing demand, easy to scale up.